Patent application number | Description | Published |
20120323111 | METHOD AND SYSTEM FOR CHARACTERIZING AND VISUALIZING ELECTROMAGNETIC TRACKING ERRORS - A calibration/surgical tool ( | 12-20-2012 |
20130041252 | ULTRASONIC TRACKING OF ULTRASOUND TRANSDUCER(S) ABOARD AN INTERVENTIONAL TOOL - In one aspect, an ultrasound receive beamformer ( | 02-14-2013 |
20130245433 | LOCATION DETERMINATION APPARATUS - The invention relates to location determination apparatus for determining a location of a first object ( | 09-19-2013 |
20130266178 | REAL-TIME QUALITY CONTROL OF EM CALIBRATION | 10-10-2013 |
20130281839 | VISUALIZATION OF CATHETER OF THREE-DIMENSIONAL ULTRASOUND - An image-guided system employs an X-ray imaging device ( | 10-24-2013 |
20140114180 | LIVE 3D ANGIOGRAM USING REGISTRATION OF A SURGICAL TOOL CURVE TO AN X-RAY IMAGE - A method, system, and program product are provided for providing a live 3D image of a body lumen. The 3D shape of a flexible surgical tool in the body lumen is determined using optical shape sensing. An x-ray image is taken of the body lumen, with at least one of the body lumen and the surgical tool being radiopaque. The determined 3D surgical tool shape is registered to the x-ray image. | 04-24-2014 |
20140147027 | INTRA-OPERATIVE IMAGE CORRECTION FOR IMAGE-GUIDED INTERVENTIONS - An imaging correction system includes a tracked imaging probe ( | 05-29-2014 |
20140206994 | ACCURATE VISUALIZATION OF SOFT TISSUE MOTION ON X-RAY - A method, system, and program product are provided for accurately visualizing soft tissue motion on an x-ray image. Real time ultrasound images are registered to an x-ray image space. A point of interest is defined. Motion of the selected point is determined from the real time ultrasound images. The determined motion is applied to the selected point on the x-ray image. | 07-24-2014 |
20140334744 | REMOVAL OF ARTIFACTS FROM AN EM FIELD GENERATOR FROM A 3D SCAN - A method, system, and program product are provided for removing artifacts from an EM field generator from a rotational 3D scan. The method comprises: preoperatively, characterizing the artifacts from the EM field generator over a range of rotational positions of an x-ray source and detector; intraoperatively, determining the position of the EM field generator relative to the x-ray source and detector; and removing the preoperatively characterized artifacts for the determined relative position of the EM field generator from current x-ray image | 11-13-2014 |
20140354300 | DISTORSION FINGERPRINTING FOR EM TRACKING COMPENSATION, DETECTION AND ERROR CORRECTION - A system for accounting for electromagnetic (EM) distortion with an EM tracking system includes a sensor array ( | 12-04-2014 |
20140375822 | INTRA-OPERATIVE QUALITY MONITORING OF TRACKING SYSTEMS - An interventional system employing an interventional tool ( | 12-25-2014 |
20150269728 | ACCURATE AND RAPID MAPPING OF POINTS FROM ULTRASOUND IMAGES TO TRACKING SYSTEMS - A method for mapping coordinates between images and tracking systems includes providing ( | 09-24-2015 |
20150306423 | REAL-TIME ADAPTIVE DOSE COMPUTATION RADIATION THERAPY - A radiation therapy system ( | 10-29-2015 |
20160045269 | LOCALIZATION OF ROBOTIC REMOTE CENTER OF MOTION POINT USING CUSTOM TROCAR - A system for providing a remote center of motion for robotic control includes a marker device ( | 02-18-2016 |
Patent application number | Description | Published |
20110127643 | METHOD AND APPARATUS FOR CONFORMABLE POLISHING - A multi-station polish system and process for polishing thin, flat (planar) and rigid workpieces. Workpieces are conveyed through multiple polishing stations that include a bulk material removal belt polishing station and finishing rotary polishing station. The bulk of the material is relatively quickly removed at the bulk removal station using a conformable abrasive belt and the workpiece surface is then polished to the desired finish at the finishing station using a conformable annular rotary polishing pad. | 06-02-2011 |
20110130003 | METHOD AND APPARATUS FOR CONFORMABLE POLISHING - Methods and apparatus provide for a conformable polishing head for uniformly polishing a workpiece. The polishing head includes an elastic polishing pad mounted on an elastic membrane that seals a cavity in the polishing head. The cavity is pressurized to expand the membrane and press the polishing pad down on the top surface of the workpiece, such that the polishing pad conforms to the surface and applies a substantially uniform pressure distribution across the workpiece and thereby uniformly removes material across high and low spots on the workpiece. | 06-02-2011 |
20130331006 | METHOD AND APPARATUS FOR CONFORMABLE POLISHING - Methods and apparatus provide for a conformable polishing head for uniformly polishing a workpiece. The polishing head includes an elastic polishing pad mounted on an elastic membrane that seals a cavity in the polishing head. The cavity is pressurized to expand the membrane and press the polishing pad down on the top surface of the workpiece, such that the polishing pad conforms to the surface and applies a substantially uniform pressure distribution across the workpiece and thereby uniformly removes material across high and low spots on the workpiece. | 12-12-2013 |
20140087159 | METHODS FOR PRODUCING ION EXCHANGED GLASS AND RESULTING APPARATUS - A laminate structure having a first glass layer, a second glass layer, and at least one polymer interlayer intermediate the first and second glass layers. The first glass layer is comprised of a thin, chemically strengthened glass having a surface compressive stress of between about 250 MPa and about 350 MPa and a depth of layer (DOL) of compressive stress greater than about 60 μm. The second glass layer can also be comprised of a thin, chemically strengthened glass having a surface compressive stress of between about 250 MPa and about 350 MPa and a depth of layer (DOL) of compressive stress greater than about 60 μm. | 03-27-2014 |
20150064374 | LIGHT-WEIGHT, HIGH STIFFNESS GLASS LAMINATE STRUCTURE - A laminate structure having a first chemically strengthened glass layer, a second chemically strengthened glass layer, and a polymer interlayer structure intermediate the first and second glass layers. The polymer interlayer structure can include a first polymeric layer adjacent to the first glass layer, a second polymeric layer adjacent to the second glass layer, and a polymeric rigid core intermediate the first and second polymeric layers. | 03-05-2015 |
20150111016 | STIFF INTERLAYERS FOR LAMINATED GLASS STRUCTURES - A new laminated glass structure for automotive glazing, architectural window and other applications that includes two sheets of relatively thin, optionally chemically strengthened glass, such as Corning® Gorilla® Glass, with a composite interlayer structure that includes at least one relatively stiff layer having relatively high Young's modulus of 50 MPa or higher and a relatively softer polymer layer having a relatively low Young's modulus of 20 MPa or lower. | 04-23-2015 |
20150274571 | METHOD AND LIFT JET FLOATATION SYSTEM FOR SHAPING THIN GLASS - Disclosed herein are systems for shaping a glass sheet comprising a roll conveyor comprising a plurality of rollers for conveying the glass sheet along a plane; a lift jet array comprising a plurality of nozzles, one or more of the plurality of nozzles comprising a tip having a plurality of orifices; and a shaping mold located above the roll conveyor, wherein the lift jet array is positioned below the roll conveyor such that each nozzle tip is located above the centerline of the plurality of rollers. Also disclosed herein are methods for shaping a glass sheet comprising heating the glass sheet and conveying the glass sheet on a roll conveyor to a position between the lift jet array and the shaping mold, wherein gas flows from the lift jet array with a force sufficient to lift the glass sheet from the roll conveyor. | 10-01-2015 |
20150274575 | METHOD AND LIFT JET FLOATATION SYSTEM FOR SHAPING THIN GLASS - Disclosed herein are systems for shaping a glass sheet comprising a roll conveyor comprising a plurality of rollers for conveying the glass sheet along a plane; a lift jet array comprising a plurality of nozzles, one or more of the plurality of nozzles comprising a tip having a plurality of orifices; and a shaping mold located above the roll conveyor, wherein the lift jet array is positioned below the roll conveyor such that each nozzle tip is located above the centerline of the plurality of rollers. Also disclosed herein are methods for shaping a glass sheet comprising heating the glass sheet and conveying the glass sheet on a roll conveyor to a position between the lift jet array and the shaping mold, wherein gas flows from the lift jet array with a force sufficient to lift the glass sheet from the roll conveyor. | 10-01-2015 |
Patent application number | Description | Published |
20090146223 | PROCESS AND METHOD TO LOWER CONTACT RESISTANCE - A method removes the spacers from the sides of a transistor gate stack, and after the spacers are removed, the method implants an additional impurity into surface regions of the substrate not protected by the gate conductor (or alternatively just amorphizes these surface regions, without adding more impurity). The method then performs a laser anneal on the additional impurity (to activate the additional impurity) or amorphized regions (to recrystallize the amorphized regions). After this, permanent spacers are formed on the sidewalls of the gate conductor. Then, the surface regions of the substrate not protected by the gate conductor and the permanent spacers are silicided, to create silicide source/drain regions. This forms the silicide regions in the additional impurity or in the recrystallized amorphized regions to reduce the source/drain resistance by improving the active dopant concentration at the silicon-silicide interface. | 06-11-2009 |
20090166770 | METHOD OF FABRICATING GATE ELECTRODE FOR GATE OF MOSFET AND STRUCTURE THEREOF - A method of fabricating a gate electrode for a gate of a metal oxide semiconductor field effect transistor (MOSFET), where the transistor has a structure incorporating a gate disposed on a substrate. The substrate comprises a source-drain region. The gate includes a gate electrode disposed on a gate dielectric and surrounded by a spacer. The gate electrode includes a capping layer of polysilicon (poly-Si) and a thin polycrystalline intermixed silicon-germanium (SiGe) layer superposed on the gate dielectric. The thin polycrystalline intermixed silicon-germanium (SiGe) layer may be formed by a high-temperature ultrafast melt-crystalization annealing process. The melt-crystallization process of the intermixed silicon-germanium provides an active dopant concentration that reduces the width of a depletion region formed at an interface of the polycrystalline intermixed silicon-germanium (SiGe) layer and the gate dielectric. | 07-02-2009 |
20110298017 | REPLACEMENT GATE MOSFET WITH SELF-ALIGNED DIFFUSION CONTACT - A replacement gate field effect transistor includes at least one self-aligned contact that overlies a portion of a dielectric gate cap. A replacement gate stack is formed in a cavity formed by removal of a disposable gate stack. The replacement gate stack is subsequently recessed, and a dielectric gate cap having sidewalls that are vertically coincident with outer sidewalls of the gate spacer is formed by filling the recess over the replacement gate stack. An anisotropic etch removes the dielectric material of the planarization layer selective to the material of the dielectric gate cap, thereby forming at least one via cavity having sidewalls that coincide with a portion of the sidewalls of the gate spacer. A portion of each diffusion contact formed by filling the at least one via cavity overlies a portion of the gate spacer and protrudes into the dielectric gate cap. | 12-08-2011 |
20130015580 | REPLACEMENT METAL GATE STRUCTURE AND METHODS OF MANUFACTUREAANM JAIN; SAMEER HAACI BeaconAAST NYAACO USAAGP JAIN; SAMEER H Beacon NY USAANM Johnson; Jeffrey B.AACI Essex JunctionAAST VTAACO USAAGP Johnson; Jeffrey B. Essex Junction VT USAANM Li; YingAACI NewburghAAST NYAACO USAAGP Li; Ying Newburgh NY USAANM Nayfeh; Hasan M.AACI PoughkeepsieAAST NYAACO USAAGP Nayfeh; Hasan M. Poughkeepsie NY USAANM Ramachandran; RavikumarAACI PleasantvilleAAST NYAACO USAAGP Ramachandran; Ravikumar Pleasantville NY US - A replacement metal gate structure and methods of manufacturing the same is provided. The method includes forming at least one trench structure and forming a liner of high-k dielectric material in the at least one trench structure. The method further includes adjusting a height of the liner of high-k dielectric material. The method further includes forming at least one workfunction metal over the liner, and forming a metal gate structure in the at least one trench structure, over the at least one workfunction metal and the liner of high-k dielectric material. | 01-17-2013 |
20150200291 | FIN END SPACER FOR PREVENTING MERGER OF RAISED ACTIVE REGIONS - After formation of gate structures over semiconductor fins and prior to formation of raised active regions, a directional ion beam is employed to form a dielectric material portion on end walls of semiconductor fins that are perpendicular to the lengthwise direction of the semiconductor fins. The angle of the directional ion beam is selected to be with a vertical plane including the lengthwise direction of the semiconductor fins, thereby avoiding formation of the dielectric material portion on lengthwise sidewalls of the semiconductor fins. Selective epitaxy of semiconductor material is performed to grow raised active regions from sidewall surfaces of the semiconductor fins. Optionally, horizontal portions of the dielectric material portion may be removed prior to the selective epitaxy process. Further, the dielectric material portion may optionally be removed after the selective epitaxy process. | 07-16-2015 |
20150249086 | THIRD TYPE OF METAL GATE STACK FOR CMOS DEVICES - A third type of metal gate stack is provided above an isolation structure and between a replacement metal gate n-type field effect transistor and a replacement metal gate p-type field effect transistor. The third type of metal gate stack includes at least three different components. Notably, the third type of metal gate stack includes, as a first component, an n-type workfunction metal layer, as a second component, a p-type workfunction metal layer, and as a third component, a low resistance metal layer. In some embodiments, the uppermost surface of the first, second and third components of the third type of metal gate stack are all substantially coplanar with each other. In other embodiments, an uppermost surface of the third component of the third type of metal gate stack is non-substantially coplanar with an uppermost surface of both the first and second components of the third type of metal gate stack. | 09-03-2015 |
20150270365 | SELECTIVE DIELECTRIC SPACER DEPOSITION FOR EXPOSING SIDEWALLS OF A FINFET - Angled directional ion beams are directed to sidewalls of a gate structure that straddles at least one semiconductor fin. The directions of the angled directional ion beams are contained within a vertical plane that is parallel to the sidewalls of the at least one semiconductor. A pair of gate spacers are formed on sidewalls of the gate structure by accumulation of the deposited dielectric material from the angled directional ion beams and without use of an anisotropic etch, while the sidewalls of the semiconductor fins parallel to the directional ion beams remain physically exposed. A selective epitaxy process can be performed to form raised active regions by growing a semiconductor material from the sidewalls of the semiconductor fins. | 09-24-2015 |
20160035864 | FIN END SPACER FOR PREVENTING MERGER OF RAISED ACTIVE REGIONS - After formation of gate structures over semiconductor fins and prior to formation of raised active regions, a directional ion beam is employed to form a dielectric material portion on end walls of semiconductor fins that are perpendicular to the lengthwise direction of the semiconductor fins. The angle of the directional ion beam is selected to be with a vertical plane including the lengthwise direction of the semiconductor fins, thereby avoiding formation of the dielectric material portion on lengthwise sidewalls of the semiconductor fins. Selective epitaxy of semiconductor material is performed to grow raised active regions from sidewall surfaces of the semiconductor fins. Optionally, horizontal portions of the dielectric material portion may be removed prior to the selective epitaxy process. Further, the dielectric material portion may optionally be removed after the selective epitaxy process. | 02-04-2016 |
20160035875 | FIN END SPACER FOR PREVENTING MERGER OF RAISED ACTIVE REGIONS - After formation of gate structures over semiconductor fins and prior to formation of raised active regions, a directional ion beam is employed to form a dielectric material portion on end walls of semiconductor fins that are perpendicular to the lengthwise direction of the semiconductor fins. The angle of the directional ion beam is selected to be with a vertical plane including the lengthwise direction of the semiconductor fins, thereby avoiding formation of the dielectric material portion on lengthwise sidewalls of the semiconductor fins. Selective epitaxy of semiconductor material is performed to grow raised active regions from sidewall surfaces of the semiconductor fins. Optionally, horizontal portions of the dielectric material portion may be removed prior to the selective epitaxy process. Further, the dielectric material portion may optionally be removed after the selective epitaxy process. | 02-04-2016 |
20160035876 | FIN END SPACER FOR PREVENTING MERGER OF RAISED ACTIVE REGIONS - After formation of gate structures over semiconductor fins and prior to formation of raised active regions, a directional ion beam is employed to form a dielectric material portion on end walls of semiconductor fins that are perpendicular to the lengthwise direction of the semiconductor fins. The angle of the directional ion beam is selected to be with a vertical plane including the lengthwise direction of the semiconductor fins, thereby avoiding formation of the dielectric material portion on lengthwise sidewalls of the semiconductor fins. Selective epitaxy of semiconductor material is performed to grow raised active regions from sidewall surfaces of the semiconductor fins. Optionally, horizontal portions of the dielectric material portion may be removed prior to the selective epitaxy process. Further, the dielectric material portion may optionally be removed after the selective epitaxy process. | 02-04-2016 |
Patent application number | Description | Published |
20120297308 | AUTO-SUGGESTED CONTENT ITEM REQUESTS - Methods, systems, and apparatus, including computer programs encoded on a computer-readable storage medium, including a method comprising: receiving a content item request from a resource, the resource associated with a resource sponsor; verifying the content item request including filtering out spam requests and determining if the content item request is valid; for any invalid requests, providing a content item in response to the content item request that is in conformance with an existing definition provided by the resource sponsor; and presenting information related to invalid requests to the resource sponsor in a user interface, the user interface including tools for enabling the resource sponsor to automatically accept and validate a content item request so that subsequent requests of the same type are validated upon receipt. | 11-22-2012 |
20140278682 | SCHEDULING INTERVIEWS - Interview scheduling technologies are described. In one method, the interview-scheduling tool presents an interface to receive candidate availability information from a user for possible interview schedules for an interview candidate. The user interface permits the user to define an interview schedule framework that specifies desired criteria for a desired interview schedule for the interview candidate. The desired criteria of the interview schedule framework specify one or more interview sessions. The interview-scheduling tool receives the candidate availability information and the desired criteria and defines a data structure representing the interview schedule framework, wherein the data structure comprises a set of constraint satisfaction problems (CSPs). The interview-scheduling tool presents the interview schedule results that fit the desired interview schedule for selection by the user. The interview schedule results are automatically generated from the set of CSPs by a constraint solver tool and without additional user interaction at the user interface. | 09-18-2014 |
20140278683 | SYSTEMS AND METHODS OF SCHEDULING INTERVIEWS - Interview scheduling technologies are described. In one method of scheduling an interview with a candidate, the method receives scheduling information including constraint and parameter information for scheduling the interview with the candidate and receives candidate information including candidate availability. The method determines, by a computer system, at least one optimized interview schedule matching the constraint information, the parameter information, and the candidate availability, the at least one optimized interview schedule including at least one interview slot and at least one interviewer associated with the at least one interview slot. The method provides the at least one optimized interview schedule to a user. | 09-18-2014 |
Patent application number | Description | Published |
20120178019 | METHOD OF MAKING HOLOGRAPHIC RECORDING MATERIALS AND ARTICLES FORMED THEREBY - A method of manufacturing an article for display of a holographic image is described that includes thermally fusing a holographic recording medium containing a photochemically active dye dispersed in a transparent thermoplastic polymer binder to another layer or material; and then exposing the holographic film to intersecting beams of coherent light to form a holographic image therein formed by photoreacted areas of the photochemically active dye and unreacted areas of the photochemically active dye. | 07-12-2012 |
20120208109 | REFLECTION HOLOGRAM STORAGE METHOD - A method is described for recording a volume reflection holographic image that is viewable when illuminated by light at a wavelength W | 08-16-2012 |
20120208110 | HOLOGRAPHIC STORAGE MEDIUM AND METHOD OF MAKING HOLOGRAPHIC STORAGE MEDIUM - Articles for recording a holographic image are described. The articles include a holographic recording medium having a plurality of surfaces, having a transparent polymeric binder and a photochemically active dye, the holographic recording medium having a holographic image recorded therein formed by exposed areas of the photochemically active dye and unexposed areas of the photochemically active dye; and a first light-blocking layer or material over a first surface of the holographic recording medium from which surface the holographic image is viewed, the light blocking layer or material absorbing light in the wavelength range to which the photochemically active dye is sensitive and allowing transmission of light in a different wavelength range for viewing the holographic image. | 08-16-2012 |
20120250119 | HOLOGRAPHIC STORAGE METHOD - A method of recording a volume holographic image is described in which a holographic recording medium containing a photoreactive dye is exposed to a plurality of coherent light sources emitting at a wavelength to which the dye is sensitive, thereby forming an interference fringe pattern therein. The photoreaction occurring in the areas of constructive interference generates a periodic array of photoreacted areas of the dye and unreacted areas of the dye. This generated interference fringe pattern may contain, but does not have to contain any image or other encoded information. Selected areas of the interference fringe pattern are then exposed to actinic radiation in such a manner to partially or fully bleach, remove, or deactivate the photoreactive dye fringe pattern, thereby producing a holographic pattern, shape, or image formed by areas of the interference fringe pattern that were not bleached, removed, or deactivated. | 10-04-2012 |
20130003151 | HOLOGRAPHIC STORAGE METHOD AND ARTICLE - A method of recording a holographic record is described. According to this method, a holographic recording medium is exposed to a desired pattern, shape, or image from a coherent light source emitting light at one or more wavelengths to which the holographic recording medium is sensitive. In this method, light having the desired pattern, shape, or image to which the holographic recording medium is exposed is diffracted by a spatially homogeneous optical diffraction element so that the holographic recording medium is exposed to a plurality of interfering light beams, thereby forming a holographic record in the holographic recording medium. Holographic recording articles are described that include a holographic recording medium and a spatially homogeneous optical diffraction element. | 01-03-2013 |
20130004887 | HOLOGRAPHIC RECORDING MEDIUM - Disclosed herein are novel nitrone compounds, holographic recording media that include the nitrone compound(s) and a polymer binder, a method of manufacturing a holographic recording medium where the nitrone compound, as a photochromic dye, is mixed with a polymer binder to form a holographic composition and molding the holographic composition into holographic data recording medium. Disclosed herein too is a method for recording a hologram by exposing the holographic recording medium to mutually coherent signal and reference light sources at a wavelength that causes a change in the chemical structure of the nitrone compound. | 01-03-2013 |
20130038916 | METHOD OF MAKING MULTIPLEXED TRANSMISSION HOLOGRAMS - A method for recording a volume transmission hologram having multiplexed diffraction fringe patterns that can cooperate to display polychromatic images and can be recorded with a single wavelength exposure source. | 02-14-2013 |
20130071773 | HOLOGRAPHIC STORAGE MEDIUM - Disclosed herein are novel amidic nitrone and a method of manufacturing a data storage media comprising mixing the amidic nitrone, as a photochromic dye, with an organic material or an inorganic material to form a holographic composition and molding the holographic composition into holographic data storage media. Disclosed herein too is an article comprising a photochromic dye and an organic material, wherein the article is used as a data storage media. Disclosed herein too is a method for recording information comprising irradiating an article that comprises a photochromic dye, wherein the irradiation is conducted with electromagnetic energy having a wavelength of about 350 to about 1,100 nanometers; and reacting the photochromic dye. | 03-21-2013 |
20130164531 | High-Density Fluorescent Dye Clusters - The present invention relates to modular sterically enhanced emission dye (SEED) clusters, wherein multiple SEED molecules are appended to a single polymeric chain. | 06-27-2013 |
20130183608 | HOLOGRAPHIC RECORDING MEDIUM AND METHOD OF MAKING HOLOGRAPHIC RECORDING MEDIUM - Articles for recording a hologram are described. The articles include a holographic recording medium having a transparent polymeric binder and a photoreactive dye dispersed therein. The articles also include a first compound, dispersed in the holographic recording medium or disposed over a first surface of the holographic recording medium from which surface the hologram is viewed, that is transparent to light in the wavelength range to which the photoreactive dye is sensitive and which is capable of being converted to a converted compound that is opaque to light in the wavelength range to which the photoreactive dye is sensitive and transparent to light in a different wavelength range for viewing the hologram. | 07-18-2013 |
20150050196 | COLORIMETRIC INDICATORS FOR USE IN MEDICAL DEVICES - A colorimetric time indicator configured to indicate time specificity is provided. The colorimetric time indicator includes a colorimetric layer configured to be operatively coupled to a disposable medical device. The colorimetric time indicator is configured to indicate the time specificity via one or more visual indicators upon exposure to one or more external stimuli. | 02-19-2015 |
Patent application number | Description | Published |
20090325078 | HOLOGRAPHIC RECORDING MEDIUM - A holographic recording medium including an optically transparent substrate is provided. The optically transparent substrate includes an optically transparent plastic material and a photochemically active dye. The optically transparent substrate has an absorbance of greater than 1 at a wavelength that is in a range of from about 300 nanometers to about 1000 nanometers. The holograms recorded in the optically transparent substrate are capable of having diffraction efficiencies of greater than about 20 percent. The holographic recording medium may include a photo-product. A method of making the holographic recording medium, an optical writing and reading method, a method for using a holographic recording article, and a method of manufacturing the holographic recording medium are provided. | 12-31-2009 |
20100009269 | HOLOGRAPHIC RECORDING MEDIA - A holographic recording medium includes an optically transparent substrate. The optically transparent substrate includes an optically transparent plastic material, a photochemically active dye, and a protonated form of the photochemically active dye. The protonated form of the photochemically active dye is a composition having a structure as shown in formula I | 01-14-2010 |
20100010262 | COMPOSITIONS AND METHOD FOR MAKING THEREOF - A composition has a structure as shown in formula I: | 01-14-2010 |
20100180937 | HOLOGRAPHIC ENERGY-COLLECTING MEDIUM AND ASSOCIATED DEVICE - An energy-collecting medium including an optically transparent holographic layer is presented. The energy-collecting medium includes a photochemically active dye and an optically transparent polymer material. Also provided is a method for making an optically transparent holographic layer. An energy conversion device including the energy-collecting medium is also provided. | 07-22-2010 |
20100216917 | ALIPHATIC POLYCARBONATES FOR USE IN THERMOSETTING POWDER COATINGS - A thermosetting polymer material capable of being used in powder coatings. The thermosetting polymer material includes at least one hydroxyl functional aliphatic polycarbonates that is formulated and crosslinked with isocyanates to yield a thermoset organic coating material. These materials provide improved weatherability as compared to prior art powder coating materials while also being less expensive than prior art materials utilizing fluorinated polymers. | 08-26-2010 |
20100328741 | HOLOGRAPHIC DEVICE - A device comprising an authentication hologram recorded within a defined volume of a holographic recording medium, wherein the authentication hologram is configured to convey authentication information; wherein the authentication hologram comprises a plurality of related volumetric holograms recorded within the defined volume; and wherein the holographic recording medium comprises an optically transparent plastic material and a photochemically active dye. In one embodiment, all the holograms are identical. In one embodiment, the holograms are different. | 12-30-2010 |
20120026564 | COMPLEX HOLOGRAMS, METHOD OF MAKING AND USING COMPLEX HOLOGRAMS - A method of making a hologram includes recording a first hologram in a holographic recording medium at a first deformation ratio; changing the first deformation ratio to a second deformation ratio that is different from the first deformation ratio; and recording a second hologram in the holographic recording medium at the second deformation ratio to form a recorded holographic medium. | 02-02-2012 |
Patent application number | Description | Published |
20150122727 | MITIGATING LEAKS IN MEMBRANES - Two-dimensional material based filters, their method of manufacture, and their use are disclosed. In one embodiment, a membrane may include an active layer including a plurality of defects and a deposited material associated with the plurality of defects may reduce flow therethrough. Additionally, a majority of the active layer may be free from the material. In another embodiment, a membrane may include a porous substrate and an atomic layer deposited material disposed on a surface of the porous substrate. The atomic layer deposited material may be less hydrophilic than the porous substrate and an atomically thin active layer may be disposed on the atomic layer deposited material. | 05-07-2015 |
20150283514 | NANOFLUIDIC SORTING SYSTEM FOR GENE SYNTHESIS AND PCR REACTION PRODUCTS - Devices and methods integrate nanopore and microfluidic technologies for recording molecular characteristics of individual molecules such as, for example, biomolecules. Devices comprise a first substrate comprising a microchannel, a second substrate comprising a microchannel, the second substrate positioned below the first substrate, and a membrane having a thickness of about 0.3 nm to about 1 nm and comprising at least one nanopore, the membrane positioned between the first substrate and the second substrate, wherein a single nanopore of the membrane is constructed and arranged for electrical and fluid communication between the microchannel of the first substrate and the microchannel of the second substrate. To mitigate the effect of errors that occur during de novo DNA synthesis, longer DNA molecules are typically synthesized from shorter oligonucleotides by polymerase construction and amplification (PCA), or by other methods. | 10-08-2015 |