Patent application number | Description | Published |
20100245738 | LIQUID CRYSTAL DISPLAY DEVICE - A liquid crystal display device of the present invention includes a liquid crystal display panel, and a light diffusing layer which has first and second major surfaces and which is arranged such that the first major surface opposes a viewer side surface of the liquid crystal display panel. The light diffusing layer includes a first region formed of a first substance which has a first refractive index N | 09-30-2010 |
20100283947 | LIQUID CRYSTAL DISPLAY - A liquid crystal display device of the present invention includes: a liquid crystal display panel; and first and second light diffusing layers, each of which has a first major surface and a second major surface and each of which is arranged such that the first major surface opposes a viewer side surface of the liquid crystal display panel. Each of the first and second light diffusing layers includes a first region formed of a first substance which has a first refractive index N | 11-11-2010 |
20110007254 | COMPOSITION FOR FORMING A LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY DEVICE - The present invention provides: a composition for forming a liquid crystal alignment film capable of forming a liquid crystal alignment film excellent in evenness; and a liquid crystal display device. The present invention provides a composition for forming a liquid crystal alignment film, wherein the composition comprises: a material for forming a liquid crystal alignment film; diethylene glycol diethyl ether; diisobutyl ketone; and at least one of γ-butyrolactone and N-methyl- | 01-13-2011 |
20130194524 | DISPLAY PANEL AND DISPLAY DEVICE PROVIDED WITH SAME - A liquid crystal panel includes a liquid crystal layer that can switch to a light transmitting state and a light scattering state, and lines provided on a portion of the liquid crystal layer on the side opposite to the observation side. The lines are provided with a reflecting portion by which at least a portion of light that entered from the observation side is reflected toward the observation side. | 08-01-2013 |
20140036192 | THIN FILM TRANSISTOR ARRAY SUBSTRATE AND LIQUID CRYSTAL DISPLAY DEVICE - The present invention provides a liquid crystal display device that can achieve a sufficiently-high-speed response and has a sufficiently excellent transmittance and a thin film transistor array substrate preferably used in the liquid crystal display device. The thin film transistor array substrate according to the present invention is a thin film transistor array substrate that includes, as electrodes, one pair of comb electrodes and a sheet electrode, and at least one electrode selected from the group consisting of the pair of comb electrodes and the sheet electrode being electrically connected along a pixel line. | 02-06-2014 |
20140111561 | LIQUID CRYSTAL DRIVE DEVICE AND LIQUID CRYSTAL DISPLAY DEVICE - The present invention provides a liquid crystal drive device and a liquid crystal display device each of which has a sufficiently excellent transmittance, provides a sufficiently high response speed, and sufficiently reduces the load on the circuit and the driver. The liquid crystal drive device of the present invention includes a first electrode pair that is a pair of electrodes and second electrode pair that is a pair of electrodes different from the first electrode pair. The device implements a driving operation that generates a potential difference between the electrodes of the first electrode pair and simultaneously generates a potential difference between the electrodes of the second electrode pair when a displayed image has a gray scale value that is half or smaller of the total number of gray scale values for image display. | 04-24-2014 |
20140118671 | LIQUID CRYSTAL DISPLAY PANEL AND LIQUID CRYSTAL DISPLAY DEVICE - The present invention provides a liquid crystal display panel and a liquid crystal display device each of which exhibits a sufficiently high response speed and an excellent transmittance. The liquid crystal display panel of the present invention includes a first substrate; a second substrate; and a liquid crystal layer disposed between the substrates, the first substrate and the second substrate each comprising an electrode, the electrode of the second substrate including a pair of comb-shaped electrodes and a planar electrode, the liquid crystal layer containing liquid crystal molecules which are inclined from an orthogonal direction to the main faces of the substrates between the pair of comb-shaped electrodes in a plan view of the main faces of the substrates when a voltage lower than a threshold voltage is applied. | 05-01-2014 |
20140132906 | LIQUID CRYSTAL DISPLAY PANEL, AND LIQUID CRYSTAL DISPLAY DEVICE - The present invention provides a liquid crystal display panel which is capable of providing a sufficiently high response speed and an excellent transmittance, and a liquid crystal display device. The liquid crystal display panel of the present invention includes a first substrate, a second substrate, and a liquid crystal layer disposed between the substrates. The first substrate and the second substrate have electrodes. The electrodes of the second substrate include a pair of comb-shaped electrodes and a slit-formed electrode. | 05-15-2014 |
20150212377 | LIQUID CRYSTAL DISPLAY PANEL AND LIQUID CRYSTAL DISPLAY DEVICE - The present invention provides a liquid crystal display panel and a liquid crystal display device each of which exhibits a sufficiently increased transmittance and an excellent response speed in falling, with its three-layered electrode structure that controls the alignment of liquid crystal molecules by an electric field in both rising and falling. The liquid crystal display panel of the present invention includes: a first substrate; a second substrate; and a liquid crystal layer disposed between the substrates, the first substrate and the second substrate each having an electrode, the first substrate further having a dielectric layer, the electrode of the second substrate including a pair of comb-shaped electrodes and a planar electrode. | 07-30-2015 |
20150287380 | OPTICAL DEVICE AND DISPLAY DEVICE PROVIDED WITH SAME - An optical device ( | 10-08-2015 |
20150293413 | THIN-FILM TRANSISTOR ARRAY SUBSTRATE AND LIQUID CRYSTAL DISPLAY DEVICE - The present invention provides a thin-film transistor array substrate capable of sufficiently preventing a decrease in the aperture ratio and insufficient charging of thin-film transistor elements due to shortening of signal writing time for pixels while achieving high speed driving; and a liquid crystal display device including the thin-film transistor array substrate. The thin-film transistor array substrate of the present invention includes thin-film transistor elements; first and second gate bus lines extending in a first direction; and first and second source bus lines extending in a second direction that intersects the first direction, the thin-film transistor elements arranged in the second direction including a first thin-film transistor element connected to the first gate bus line and the first source bus line, and a second thin-film transistor element connected to the second gate bus line and the second source bus line, the first or second source bus line including a first division site or a second division site that divides the first source bus line or the second source bus line into two lines connected to different source drivers, and is in a region where the first or second source bus line overlaps the second or first gate bus line. | 10-15-2015 |
Patent application number | Description | Published |
20100223384 | DATA DELIVERY SYSTEM AND DATA DELIVERY METHOD - A data delivery system and method include storing software resources in a central equipment, receiving and storing software resources sent from the central equipment, and communicating with the central equipment, terminal devices and with the intermediate server. The central equipment includes a registration-accepting unit for accepting registration of software resources, a resource information storage unit for storing resource information having a version number corresponding to the software resources accepted by the registration-accepting unit, a resource transfer unit for sending the software resources accepted and the resource information stored in the resource information storage unit to the intermediate server, a server list-creating unit for creating a server list of the intermediate servers to be sent to the terminal devices, and a sending unit for sending the server list created by the server list-creating unit. | 09-02-2010 |
20100251387 | TERMINAL APPARATUS, DATA PROVIDING SYSTEM, DATA PROVIDING METHOD, AND COMPUTER PROGRAM - A terminal apparatus includes requester that requests data used for installed software from an external apparatus, a receiver that receives the data requested by the requester, a storage unit that stores the data received by the receiver, a restoring unit that restores the storage unit to the state at an arbitrary point of time; and a restoration controller that enables or disables the restoration operation of the restoring unit, wherein the storage unit stores the data that is requested by the requester and received by the receiver after the restoration controller disables the restoration operation of the restoring unit, the restoration controller enables the restoration operation of the restoring unit after the data received by the receiver is stored in the storage unit, and the restoring unit restores the storing unit to the state at a point of time when or after the restoration controller enables the restoration operation. | 09-30-2010 |
Patent application number | Description | Published |
20130259537 | POWDER ACCOMMODATION CONTAINER, IMAGE FORMING APPARATUS AND MANUFACTURING METHOD OF THE IMAGE FORMING APPARATUS - A powder accommodation container includes an accommodation container body, a regulation member, and a transport member. The accommodation container body has a hole portion to outside and accommodates powder. The regulation member is provided in the hole portion to regulate a passage of the powder accommodated in the accommodation container body. The transport member is arranged in an inside of the accommodation container body to rotate about a rotating shaft and to transport the powder in the inside of the accommodation container body. The transport member has one end side in a short direction that is arranged on the rotating shaft and the other end side that is a free end, the free end includes a flexible member that is in contact with the accommodation container body to be flexed. The flexible member is locatable to face the hole portion. | 10-03-2013 |
20140105651 | POWDER ACCOMMODATION CONTAINER, IMAGE FORMING APPARATUS AND MANUFACTURING METHOD OF THE IMAGE FORMING APPARATUS - A powder accommodation container includes an accommodation container body, a regulation member, and a transport member. The accommodation container body has a hole portion to outside and accommodates powder. The regulation member is provided in the hole portion to regulate a passage of the powder accommodated in the accommodation container body. The transport member is arranged in an inside of the accommodation container body to rotate about a rotating shaft and to transport the powder in the inside of the accommodation container body. The transport member has one end side in a short direction that is arranged on the rotating shaft and the other end side that is a free end, the free end includes a flexible member that is in contact with the accommodation container body to be flexed. The flexible member is locatable to face the hole portion. | 04-17-2014 |
20140105652 | POWDER ACCOMMODATION CONTAINER, IMAGE FORMING APPARATUS AND MANUFACTURING METHOD OF THE IMAGE FORMING APPARATUS - A powder accommodation container includes an accommodation container body, a regulation member, and a transport member. The accommodation container body has a hole portion to outside and accommodates powder. The regulation member is provided in the hole portion to regulate a passage of the powder accommodated in the accommodation container body. The transport member is arranged in an inside of the accommodation container body to rotate about a rotating shaft and to transport the powder in the inside of the accommodation container body. The transport member has one end side in a short direction that is arranged on the rotating shaft and the other end side that is a free end, the free end includes a flexible member that is in contact with the accommodation container body to be flexed. The flexible member is locatable to face the hole portion. | 04-17-2014 |
Patent application number | Description | Published |
20090176373 | POLISHING AGENT FOR SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE, POLISHING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE - The present invention is to provide a polishing technique ensuring that when polishing a to-be-polished surface in the production of a semiconductor integrated circuit device, appropriate polishing rate ratios can be obtained between a borophosphosilicate glass material layer and other materials and high planarization of the to-be-polished surface containing a borophosphosilicate glass material layer can be thereby realized. The present invention relates to a polishing agent for chemical mechanical polishing, containing a cerium oxide particle, a water-soluble polyamine, one or more basic compounds selected from the group consisting of monoethanolamine, ethylethanolamine, diethanolamine and ammonia, and water, wherein the polishing agent has a pH of from 10 to 13 and wherein the basic compound is contained in an amount of more than 0.01 mass %. | 07-09-2009 |
20140057438 | POLISHING METHOD OF NON-OXIDE SINGLE-CRYSTAL SUBSTRATE - There is provided a polishing method for polishing a non-oxide single-crystal substrate such as a silicon carbide single-crystal substrate at a high polishing rate to obtain a high-quality surface that is smooth and excellent in surface properties. This polishing method is a method of supplying a polishing liquid to a polishing pad not including abrasive grains to bring a surface to be polished of the non-oxide single-crystal substrate and the polishing pad into contact with each other and polishing the surface to be polished by a relative movement between them, the method characterized in that the polishing liquid comprises: an oxidant whose redox potential is 0.5 V or more and which contains a transition metal; and water, and does not contain abrasive grains. | 02-27-2014 |
20150159047 | POLISHING COMPOSITION AND POLISHING METHOD - A polishing composition contains cerium oxide particles, at least one selected from a methonium compound and an alkanolamine compound which is a primary or secondary alkanolamine compound, and a cyclic oligosaccharide of 0.005 mass % or more to less than 0.1 mass % and/or a nonionic surfactant of 0.0007 mass % or more to 1.7 mass % or less which has an acetylenic group and to which an ethylene oxide is added, wherein a pH is 3.5 or more to less than 6. A polishing method includes bringing a surface to be polished of an object into contact with a polishing pad while a polishing composition according to claim | 06-11-2015 |
20150159048 | POLISHING COMPOSITION AND POLISHING METHOD - A polishing composition contains cerium oxide particles of 50 nm or more to 160 nm or less in average secondary particle diameter and at least one kind of nitride film polishing accelerating agent selected from a group consisting of a methonium compound and a primary or secondary alkanolamine compound, wherein a concentration of the methonium compound is 1.0 mass % or less, and a pH is 3.5 or more to less than 6. A polishing method includes bringing a surface to be polished of an object into contact with a polishing pad while a polishing composition according to claim | 06-11-2015 |
20150175848 | POLISHING AGENT, POLISHING METHOD, AND MANUFACTURING METHOD OF SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE - A first polishing agent contains: cerium oxide particles; and water, wherein, in IR spectrum of the cerium oxide particle, a value A found by a formula below from a ratio (I/I′) between a value I of an absorbance of 3566 cm | 06-25-2015 |
Patent application number | Description | Published |
20080261400 | POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR FORMING COPPER WIRING FOR SEMICONDUCTOR INTEGRATED CIRCUIT - The present invention provides a technique for realizing highly flat surface of a semiconductor integrated circuit employing copper as a wiring metal. | 10-23-2008 |
20100099259 | POLISHING COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE - In polishing of a to-be-polished surface in the production of a semiconductor integrated circuit device, a flat surface of an insulating layer having an embedded metal interconnect can be obtained. Further, a semiconductor integrated circuit device having a highly planarized multilayer structure can be obtained. Provided is a polishing composition which is a chemical mechanical polishing composition for polishing a to-be-polished surface of a semiconductor integrated circuit device, contains one or more oxidizing agents selected from the group consisting of hydrogen peroxide, ammonium persulfate and potassium persulfate, an abrasive grain, an alicyclic resin acid, a basic compound and inorganic acid, and has a pH ranging from 8 to 12. | 04-22-2010 |
20110212621 | ABRASIVE COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE - The present invention relates to a polishing composition used in a step of polishing until a barrier layer adjacent to a copper layer is exposed, in a pattern formation of polishing the copper layer provided on an insulating layer through the barrier layer thereby alternately forming a copper embedded wiring and the insulating layer, the polishing composition including: an alicyclic resin acid; a colloidal silica in which a content thereof in the polishing composition is from 0.1 to 1.5% by mass, an average primary particle size thereof is from 10 to 40 nm, an average secondary particle size thereof is from 30 to 80 nm, and (the average secondary particle size×the content) is in a range of from 10 to 40; and tetramethylammonium ion. | 09-01-2011 |
20140094032 | POLISHING AGENT AND POLISHING METHOD - A polishing agent for polishing a non-oxide single-crystal substrate such as a silicon carbide single-crystal substrate with a high polishing rate to obtain a smooth surface is provided. This polishing agent comprises an oxidant having redox potential of 0.5 V or more and containing a transition metal, silicon oxide particles, cerium oxide particles and a dispersion medium, in which a mass ratio of the silicon oxide particles to the cerium oxide particles is from 0.2 to 20. | 04-03-2014 |
20140187043 | POLISHING AGENT AND POLISHING METHOD - A non-oxide single-crystal substrate such as a silicon carbide single-crystal substrate is polished at a high polishing rate, whereby a smooth surface is obtained. There is provided a polishing agent containing: an oxidant that contains a transition metal and has a redox potential of 0.5 V or more; silica particles that have an average secondary particle size of 0.2 μm or less; and a dispersion medium, wherein a content ratio of the oxidant is not less than 0.25 mass % nor more than 5 mass %, and a content ratio of the silica particles is not less than 0.01 mass % and less than 20 mass %. | 07-03-2014 |
20140220299 | SINGLE-CRYSTAL SILICON-CARBIDE SUBSTRATE AND POLISHING SOLUTION - The present invention relates to a single-crystal silicon-carbide substrate provided with a principal surface having an atomic step-and-terrace structure containing atomic steps and terraces derived from a crystal structure, in which the atomic step-and-terrace structure has a proportion of an average line roughness of a front edge portion of the atomic step to a height of the atomic step being 20% or less. | 08-07-2014 |
20140248775 | CLEANING AGENT AND METHOD FOR PRODUCING SILICON CARBIDE SINGLE-CRYSTAL SUBSTRATE - The present invention provides a detergent for effectively cleaning, by a safe and simple method, a manganese component remaining on and adhered to a substrate surface, after polishing a silicon carbide single crystal substrate with a manganese compound-containing polishing agent. The present invention relates to a detergent for cleaning a silicon carbide single crystal substrate polished with a manganese compound-containing polishing agent, the detergent including at least one of ascorbic acid and erythorbic acid, in which the detergent has a pH of 6 or less. | 09-04-2014 |