Patent application number | Description | Published |
20080210258 | SCRUBBER BOX AND METHODS FOR USING THE SAME - A scrubber box is provided that includes a tank adapted to receive a substrate for cleaning, supports outside of the tank and adapted to couple to ends of scrubber brushes disposed within the tank, a motor mounted to each of the supports and adapted to rotate the scrubber brushes, a base to which the supports are pivotally mounted via spherical bearings adapted to permit toe-in of the scrubber brushes, a brush gap actuator adapted, via a crank and rocker mechanism, to substantially simultaneously pivot the supports toward or away from each other so as to permit the scrubber brushes to substantially simultaneously achieve or break contact with the substrate, and a toe-in actuator adapted to move two of the spherical bearings toward or away from each other so as to adjust a toe-in angle between the scrubber brushes. | 09-04-2008 |
20080291448 | METHODS AND APPARATUS FOR FINDING A SUBSTRATE NOTCH CENTER - Methods and apparatus are provided for locating a notch and/or a center of the notch of a substrate. An exemplary method includes rotating a substrate; illuminating an edge of the substrate with a light beam as the substrate rotates; detecting a change in light intensity of the light beam as the substrate rotates; determining a rough location of a notch in the edge of the substrate based on a position of the substrate when the change in light intensity of the light beam is detected; and reversing a rotational direction of the substrate to determine a fine location of the notch in the edge of the substrate. Numerous other aspects are provided. | 11-27-2008 |
20090025757 | LID FOR A SEMICONDUCTOR DEVICE PROCESSING APPARATUS AND METHODS FOR USING THE SAME - A method of reducing sticking of a door of a semiconductor device processing apparatus is provided. The method comprises providing rinsing fluid to a lid of a semiconductor devise processing chamber so as to rinse particulates therefrom; and sliding a door that is operatively coupled to the lid so as to move between a closed position wherein the door occludes an opening formed in the lid, and an open position wherein the door does not occlude the opening. Numerous other aspects are provided. | 01-29-2009 |
20090032071 | LID FOR A SEMICONDUCTOR DEVICE PROCESSING APPARATUS AND METHODS FOR USING THE SAME - A lid for a semiconductor device processing apparatus is provided. The lid comprises a cover having an opening and a wall formed around the opening, the wall adapted to prevent fluid present on the lid from entering a body of the processing apparatus through the opening, and one or more cover edges including one or more edge walls; an outer door adapted to prevent fluid from entering the body of the processing apparatus through the opening of the cover, wherein the outer door interfaces with the wall formed around the opening and the one or more edge walls; and an inner door coupled to the outer door and adapted to prevent fluid from exiting the body of the processing apparatus through the opening of the cover. Numerous other aspects are provided. | 02-05-2009 |
20090217953 | DRIVE ROLLER FOR A CLEANING SYSTEM - A drive roller for use in a semiconductor substrate cleaning system is provided. In one embodiment, a drive roller includes an outer ring having a disk-shaped body, wherein the disk-shaped body has an inner cylindrical, an upper wall, and an outer cylindrical wall defining a cavity within the disk-shaped body. An inner ring is disposed within the cavity. A groove is formed along an outer side of the inner ring. The groove faces an inner surface of the outer cylindrical wall of the outer ring. | 09-03-2009 |
20090320875 | DUAL CHAMBER MEGASONIC CLEANER - Embodiments described herein relate to semiconductor device manufacturing, and more particularly to a vertically oriented dual megasonic module for simultaneously cleaning multiple substrates. In one embodiment, an apparatus for cleaning multiple substrates is provided. The apparatus comprises an outer tank for collecting overflow processing fluid comprising at least one sidewall and a bottom. A first inner module adapted to contain a processing fluid is positioned partially within the outer tank. The first inner module comprises one or more roller assemblies to hold a substrate in a substantially vertical orientation. A second inner module adapted to contain a processing fluid is positioned partially within the outer tank. The second inner module comprises one or more roller assemblies adapted to hold a substrate in a substantially vertical orientation. Each inner module contains a transducer adapted to direct vibrational energy through the processing fluid toward the substrates. | 12-31-2009 |
20110067727 | BRUSH ALIGNMENT CONTROL MECHANISM - A method and apparatus for providing uniform pressure, friction and/or contact between a substrate and a cylindrical roller in a brush-type cleaning system is described. The apparatus includes an alignment member adapted to allow pivotal movement of the cylindrical roller based on the topography of a substrate and/or the outer surface of the cylindrical roller. The method includes positioning a substrate between two cylindrical rollers, moving each of the two cylindrical rollers to a position where at least a portion of an outer surface of each of the cylindrical rollers are in contact with the major surfaces of the substrate, and rotating one or both of the substrate and the two cylindrical rollers relative to each other while allowing a longitudinal axis of one or both of the two cylindrical rollers to pivot relative to a plane defined by one of the major surfaces of the substrate. | 03-24-2011 |
20110265816 | DISK-BRUSH CLEANER MODULE WITH FLUID JET - Embodiments of the present invention relates to an apparatus and method for cleaning a substrate using a disk brush. One embodiment provides a substrate cleaner comprising a substrate chuck disposed in the processing volume, and a brush assembly disposed in the processing volume, wherein the brush assembly comprises a disk brush movably disposed opposing the substrate chuck, and a processing surface of the disk brush contacts a surface of the substrate on the substrate chuck. | 11-03-2011 |
20130111678 | BRUSH BOX MODULE FOR CHEMICAL MECHANICAL POLISHING CLEANER - Embodiments of the invention generally relate to a method and apparatus for cleaning a substrate. Particularly, embodiments of the invention relate to an apparatus and method for cleaning a substrate using a scrub brush. One embodiment provides a brush box assembly for cleaning a substrate. The assembly comprises a chamber body having a cleaning chamber disposed therein, a rotatable chuck disposed in the cleaning chamber, and an edge cleaner module positioned adjacent the chuck. | 05-09-2013 |
20130196572 | CONDITIONING A PAD IN A CLEANING MODULE - A particle cleaning module includes a housing, a substrate holder, a pad holder, an actuator and a pad conditioner. The substrate holder is disposed in the housing, is configured to retain a substrate in a substantially vertical orientation, and is rotatable on a first axis. The pad holder is disposed in the housing, has a pad retaining surface facing the substrate holder in a parallel and spaced apart relation, and is rotatable on a second axis parallel to the first axis. The actuator is operable to move the pad holder relative to the substrate holder to change a distance defined between the pad retaining surface and the substrate. The pad conditioner is disposed in the housing and has a conditioning surface oriented parallel to the pad retaining surface. | 08-01-2013 |
20130283553 | ANTI-SLIP SCRUBBER BRUSH AND ASSEMBLY METHODS - In one aspect, a scrubber brush assembly is provided. The scrubber brush assembly includes a scrubber brush including exterior molded surfaces and a mounting passage having interior molded surfaces, the interior molded surfaces having molded foam, raised rotation-restraining features, and a mandrel including recesses directly coupled to the molded foam, raised rotation-restraining features of the scrubber brush to prevent slippage. Scrubber brushes and methods of assembly are provided, as are numerous other aspects. | 10-31-2013 |
20130283556 | HIGH STIFFNESS, ANTI-SLIP SCRUBBER BRUSH ASSEMBLY, HIGH-STIFFNESS MANDREL, SUBASSEMBLIES, AND ASSEMBLY METHODS - In one aspect, a scrubber brush assembly is provided. The scrubber brush assembly includes a scrubber brush having a body of open-cell foam including an interior surface, a sleeve received in contact with the scrubber brush, the sleeve including peripherally-spaced, longitudinal walls and reinforcing segments interconnecting adjacent ones of the longitudinal walls and forming elongated pockets along the length, the sleeve having raised ribs extending along the length, and a mandrel having recesses formed on an outer surface, the mandrel being coupled to the sleeve by receiving the raised ribs within the recesses. Scrubber brush subassemblies, high stiffness mandrels, and methods of assembly are provided, as are numerous other aspects. | 10-31-2013 |
20130284215 | METHODS AND APPARATUS FOR ISOLATING A RUNNING BEAM CONVEYOR FROM A SEMICONDUCTOR SUBSTRATE CLEANING ENVIRONMENT - In one aspect, a substrate cleaning system is provided. The substrate cleaning system includes a plurality of cleaning modules; a conveyor for transporting a substrate between the cleaning modules; and a partition assembly that isolates the cleaning modules from the conveyor. Apparatus and methods for isolating CMP cleaning modules from a conveyor are provided, as are numerous other aspects. | 10-31-2013 |
20130288578 | METHODS AND APPARATUS FOR PRE-CHEMICAL MECHANICAL PLANARIZATION BUFFING MODULE - The present invention provides methods and apparatus for a pre-CMP semiconductor substrate buffing module. The invention includes a polishing pad assembly adapted to be rotated against a major surface of a substrate; a chuck adapted to hold the substrate and to rotate the substrate against the polishing pad assembly as the polishing pad assembly is rotated; and a lateral motion motor adapted to oscillate the polishing pad assembly laterally across the major surface of the substrate while the polishing pad assembly is rotated against the rotating substrate. Numerous additional features are disclosed. | 10-31-2013 |
20140150815 | DISC-BRUSH HOLDER APPARATUS, DISC-BRUSH ASSEMBLY, AND SUBSTRATE PROCESSING METHODS - In one aspect, a disc-brush pad holder apparatus is disclosed. The disc-brush pad holder apparatus has a first portion adapted to couple to a rotatable adapter, and a pad holding portion having a frontal surface receiving a disc-brush pad, the pad holding portion having a flexible radially-extending disc portion that flexes during cleaning. Disc-brush assemblies and methods of processing substrates are provided, as are numerous other aspects. | 06-05-2014 |
20140261539 | DISK/PAD CLEAN WITH WAFER AND WAFER EDGE/BEVEL CLEAN MODULE FOR CHEMICAL MECHANICAL POLISHING - A method and apparatus for cleaning a substrate after chemical mechanical planarizing (CMP) is provided. The apparatus comprises a housing, a substrate holder rotatable on a first axis and configured to retain a substrate in a substantially vertical orientation, a first pad holder having a pad retaining surface facing the substrate holder in a parallel and space apart relation, the first pad holder rotatable on a second axis rotatable parallel to the first axis, a first actuator operable to move the pad holder relative to the substrate holder to change a distance defined between the first axis and the second axis, and a second pad holder disposed in the housing, the second pad holder having a pad retaining surface facing the substrate holder in a parallel and spaced apart relation, wherein the second pad holder is couple with a rotary arm. | 09-18-2014 |
20140310895 | SCRUBBER BRUSH FORCE CONTROL ASSEMBLIES, APPARATUS AND METHODS FOR CHEMICAL MECHANICAL POLISHING - A control assembly that may be used with a chemical mechanical polishing (CMP) cleaning unit may include a linkage arm that extends and retracts, a load cell sensor that senses a force on the linkage arm, and a motor. The motor may drive the linkage arm to an extended or retracted position to cause a scrubber brush assembly of the cleaning unit to move away from or into contact with a substrate to be cleaned. In response to a force sensed by the load cell sensor, the motor may adjust the position of the linkage arm to cause an adjustment of the scrubber brush assembly position relative to the substrate being cleaned. Methods of controlling a scrubber brush force are also provided, as are other aspects. | 10-23-2014 |
20150027491 | DOUBLE SIDED BUFF MODULE FOR POST CMP CLEANING - A buff module and method for using the same are provided. In one embodiment, a buff module includes housing having an interior volume, a plurality of drive rollers and a pair of buff heads. The drive rollers are arranged to rotate a substrate within the interior volume on a substantially horizontal axis. The buff heads are disposed in the housing, each buff head rotatable on an axis substantially aligned with the horizontal axis and movable to a position substantially parallel with the horizontal axis. | 01-29-2015 |
20150050105 | VAPOR DRYER MODULE WITH REDUCED PARTICLE GENERATION - Embodiments described herein generally relate to a vapor dryer module for cleaning substrates during a chemical mechanical polishing (CMP) process. In one embodiment, a module for processing a substrate is provided. The module includes a tank having sidewalls with an outer surface and an inner surface defining a processing volume, a substrate support structure for transferring a substrate within the processing volume, the substrate support structure having a first portion that is at least partially disposed in the processing volume and a second portion that is outside of the processing volume, and one or more actuators disposed on an outer surface of one of the sidewalls of the tank and coupled between the outer surface and the second portion of the support structure, the one or more actuators operable to move the support structure relative to the tank. | 02-19-2015 |