Patent application number | Description | Published |
20080231824 | Liquid recovery member, exposure apparatus, exposing method, and device fabricating method - An exposure apparatus comprises a recovery member that recover a liquid. The recovery ability with which the recovery member recovers the liquid differs in accordance with the region of the recovery member. | 09-25-2008 |
20080233512 | Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method - A liquid recovery system is used by an immersion exposure apparatus. The liquid recovery system comprises: a plate that has a first surface and a second surface on the side opposite the first surface; and a liquid recovery part, at least part of which opposes the second surface with a first gap interposed therebetween. The liquid recovery system recovers the liquid on a movable object that opposes the first surface of the plate via the liquid recovery part. | 09-25-2008 |
20080239256 | Exposure apparatus, exposing method, and device fabricating method - An exposure apparatus performs a multiple exposure of a substrate and comprises: a first station that exposes the substrate; a second station that exposes the substrate that was exposed at the first station; movable members each of that holds the substrate and is capable of moving between the first station and the second station; and a first detection system that is disposed in the first station and acquires alignment information about the substrate. | 10-02-2008 |
20080246937 | Exposing Method, Exposure Apparatus, Device Fabricating Method, and Film Evaluating Method - An exposing method has: a process that forms an immersion region of a liquid on a substrate; a process that determines exposure conditions in accordance with an adhesive force that acts between a surface of the substrate and the liquid; and a process that, based on the exposure conditions, exposes the substrate through the liquid of the immersion region. | 10-09-2008 |
20080252865 | Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device - An exposure apparatus forms an immersion area of a liquid on the side of the image plane of a projection optical system and performs exposure of a substrate via the projection optical system and the liquid of the immersion region. The exposure apparatus has an optical cleaning unit which irradiates a predetermined irradiation light, having an optical cleaning effect, onto, for example, the upper surface of the substrate stage which makes contact with the liquid for forming the immersion area. Thus, it is possible to prevent deterioration of the exposure accuracy and measurement accuracy due to pollution of the member in contact with the liquid in the immersion region. | 10-16-2008 |
20080291408 | Projection optical system, exposing method, exposure apparatus, and device fabricating method - A projection optical system projects an image of a first surface to a second surface through a liquid. The projection optical system comprises an optical element, wherein the first surface side contacts a gas and the second surface side contacts the liquid. The optical element has an incident surface, which is convex toward the first surface, an emergent surface, an outer circumferential surface between an outer circumference of the incident surface and an outer circumference of the emergent surface, and holding parts, which are formed at a circumferential edge part of the outer circumferential surface so that they project toward the second surface. | 11-27-2008 |
20080297746 | Exposure method, exposure apparatus, and method for producing device - A liquid immersion exposure apparatus in which a substrate is exposed with an exposure beam, includes a projection optical system by which the substrate is exposed to the exposure beam, a first inlet disposed at a first position, which is capable of supplying a first liquid to a space adjacent to a bottom surface of the projection optical system, and a second inlet disposed at a second position which is different from the first position, the second inlet being capable of supplying a second liquid that is different from the first liquid to the space. | 12-04-2008 |
20080316453 | Exposure apparatus, exposure method, and method for producing device - An exposure apparatus includes an optical system irradiating a first exposure light from a first pattern and a second exposure light from a second pattern onto a first exposure area and second exposure area respectively to form an image of the first pattern and an image of the second pattern on the first and exposing areas respectively; a light receiving device receiving a detecting light via at least a part of the optical system; and a detection system obtaining, in parallel to at least a part of an operation of multiple-exposing a predetermined area on a substrate with the images of first and second patterns, informations about a positional relationship between the image of the first pattern and the substrate and a positional relationship between the image of the second pattern and the substrate via at least a part of the optical system. The substrate can be efficiently well multi-exposed. | 12-25-2008 |
20090002655 | Exposure apparatus, exposure method, and method for producing device - A liquid immersion exposure apparatus includes an optical member through which a substrate is exposed with an exposure beam, and a liquid supply system having a supply port from which a liquid is supplied. The liquid supply system supplies the liquid from the supply port to a space between the optical member and the substrate during the exposure. The optical member has a lyophobic surface which is lyophobic for the liquid. | 01-01-2009 |
20090009745 | Exposure method, exposure apparatus, and method for producing device - A method for forming a liquid immersion area with a liquid on an object, includes determining a condition for forming the liquid immersion area based on affinity between the liquid and a liquid contact surface of the object, and forming the liquid immersion area under the determined condition. | 01-08-2009 |
20090015808 | Exposure method, substrate stage, exposure apparatus, and device manufacturing method - An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate. | 01-15-2009 |
20090015816 | Exposure method, substrate stage, exposure apparatus, and device manufacturing method - An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate. | 01-15-2009 |
20090021709 | Exposure apparatus, exposure method, and method for producing device - An exposure apparatus fills an optical path space on a side of an image plane of a projection optical system with liquid and exposes a substrate via the projection optical system and the liquid. The exposure apparatus has a measurement unit which measures an optical property of the liquid. According to the measurement result, it is possible to adjust the optical characteristic of the liquid by a liquid mixing unit. Thus, it is possible to maintain the exposure accuracy at a desired state when performing immersion exposure. | 01-22-2009 |
20090079950 | Exposure apparatus, exposure method, and method for producing device - A liquid immersion exposure apparatus includes an optical member through which an exposure beam passes, a flow passage in which a liquid flows, the flow passage being in fluidic communication with a space between the optical member and an object opposite to the optical member, and an opening at which a plurality of slits are provided, and from which the liquid is supplied to the space through the flow passage. | 03-26-2009 |
20090115977 | Exposure Apparatus, Exposure Method, and Device Manufacturing Method - An exposure apparatus includes an immersion space forming member ( | 05-07-2009 |
20090153820 | Exposure apparatus and device manufacturing method - An exposure apparatus exposes a substrate by forming a liquid immersion region on the substrate, and projecting a pattern image onto the substrate via a projection optical system and a liquid that forms the liquid immersion region. The exposure apparatus includes a projection optical system having a plurality of optical elements, by which a pattern image is projected onto a substrate via a liquid to expose the substrate and a liquid recovery system that recovers the liquid along with a gas and has a separator that separates the recovered liquid and the recovered gas. | 06-18-2009 |
20090208883 | Stage device, exposure apparatus, exposure method and device manufacturing method - A stage apparatus | 08-20-2009 |
20090218653 | Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device - A lithography apparatus includes a part having a photocatalytic coating. The lithography apparatus can be an extreme ultraviolet lithography apparatus or an immersion lithography apparatus. | 09-03-2009 |
20090218743 | Substrate holding apparatus, exposure apparatus, exposing method, device fabricating method, plate member, and wall - A substrate holding apparatus holds a substrate that is exposed by exposure light that passes through a liquid. The substrate holding apparatus comprises: an opening; and a first holding part, which has a holding surface for holding the substrate inside the opening. At least part of an edge part that defines the opening has a first surface and a second surface, which is provided above and is nonparallel to the first surface. The second surface extends from a boundary part between the first surface and the second surface both upward and toward the outer side with respect to a center of the opening. The boundary part between the first surface and the second surface is substantially the same height as or higher than a front surface of the substrate, which is held by the first holding part. | 09-03-2009 |
20090251672 | Exposure apparatus, device production method, cleaning apparatus, cleaning method, and exposure method - An exposure apparatus exposes a substrate with an exposure light through an exposure liquid. The exposure apparatus includes an optical element from which the exposure light exits; a stage which is movable on the light-exit side of the optical element; a certain member which is provided on the stage; and a vibration generator which vibrates the certain member to apply vibration to the liquid in the liquid immersion space formed on the certain member. It is possible to suppress the deterioration of the performance which would be otherwise caused by any contamination. | 10-08-2009 |
20090253083 | Exposure Apparatus, Exposure Method, and Method for Producing Device - An exposure apparatus includes a liquid supply unit which supplies a liquid to fill an optical path space for an exposure light beam therewith, a first land surface which is opposed to a surface of a substrate arranged at an exposure position and which surrounds the optical path space for the exposure light beam, and second land surfaces which are arranged outside the first land surface. The first land surface is capable of retaining the liquid between the surface of the substrate and the first land surface. The second land surface is provided to make no contact with a film of the liquid existing between the second land surface and the surface of the substrate. Accordingly, the exposure apparatus is provided, in which the optical path space for the exposure light beam can be filled with the liquid in a desired state even when the exposure is performed while moving the substrate. | 10-08-2009 |
20090262316 | EXPOSURE APPARATUS AND METHOD FOR PRODUCING DEVICE - An exposure apparatus EX includes a recovery port which recovers a liquid, a blow port which is provided outside the recovery port with respect to an optical path space and which blows a gas therefrom, and a gas discharge port which is provided between the recovery port and blow port and which discharges at least a part of the gas blown from the blow port. An exposure apparatus which makes it possible to avoid the leakage of the liquid with which the optical path space of the exposure light between a projection optical system and a substrate is filled is provided. | 10-22-2009 |
20100134772 | Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device - An exposure apparatus forms an immersion area of a liquid on the side of the image plane of a projection optical system and performs exposure of a substrate via the projection optical system and the liquid of the immersion region. The exposure apparatus has an optical cleaning unit which irradiates a predetermined irradiation light, having an optical cleaning effect, onto, for example, the upper surface of the substrate stage which makes contact with the liquid for forming the immersion area. Thus, it is possible to prevent deterioration of the exposure accuracy and measurement accuracy due to pollution of the member in contact with the liquid in the immersion region. | 06-03-2010 |
20100157262 | Exposure apparatus and device manufacturing method - An exposure apparatus for emitting exposure light onto a substrate via a projection optical system and a liquid to expose the substrate includes a supply pipe which supplies the liquid; a recovery pipe which recovers the liquid; a connection pipe which connects the supply pipe and the recovery pipe; and a switching device which switches a flow path of the liquid so that when liquid supply is stopped, the liquid that has flowed into the supply pipe flows to the recovery pipe via the connection pipe. The apparatus may further include a temperature regulation apparatus connected to the supply pipe, which performs temperature regulation of the liquid supplied to the supply pipe, and has a rough temperature regulator which roughly regulates the temperature of the liquid, and a fine temperature regulator which is arranged between the rough temperature regulator and the supply pipe and performs fine regulation of this temperature. | 06-24-2010 |
20100195067 | Exposure apparatus, exposure method, and method for producing device - A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate through a liquid confined in a space adjacent the substrate. The apparatus includes a structure substantially parallel to a surface of a substrate table configured to hold the substrate, to divide the space into two parts. The structure has an aperture to allow transmission of the pattern and a recess at the bottom side of the structure to extract a fluid from the space. | 08-05-2010 |
20100196832 | EXPOSURE APPARATUS, EXPOSING METHOD, LIQUID IMMERSION MEMBER AND DEVICE FABRICATING METHOD - An exposure apparatus comprises: an optical system, which has an emergent surface wherefrom exposure light emerges; a first surface, which is disposed at least partly around an optical path of the exposure light from the emergent surface; and a second surface, which is disposed at least partly around the first surface; and a first supply port, which is disposed at least partly around the first surface such that it faces in an outward radial direction with respect to an optical axis of the projection optical system, that supplies a first liquid to the second surface; wherein, during at least part of an exposure of a substrate, a front surface of the substrate opposes the emergent surface, the first surface, and the second surface; and the substrate is exposed with the exposure light that emerges from the emergent surface and transits a second liquid between the emergent surface and the front surface of the substrate. | 08-05-2010 |
20100231879 | Exposure apparatus, exposure method, and device manufacturing method - An exposure apparatus includes: an optical system having an optical element on which a first exposure light and a second exposure light are incident, the first exposure light and the second exposure light from the optical element being irradiated onto a first exposure field and a second exposure field; and a detection device that detects at least one of the first exposure light and the second exposure light, which are from the optical element and are directed towards a different direction from directions towards the first and second exposure fields. | 09-16-2010 |
20100323303 | LIQUID IMMERSION MEMBER, EXPOSURE APPARATUS, EXPOSING METHOD, AND DEVICE FABRICATING METHOD - An exposure apparatus including: an optical system, which has an emergent surface; a first surface, which is disposed at least partly around an optical path of exposure light from the emergent surface; a second surface, which is disposed at least partly around the first surface; a third surface, which is disposed at least partly around the second surface; a first supply port, which is disposed at least partly around the first surface such that the first supply port is directed in an outward radial direction with respect to an optical axis of the optical system, that supplies a first liquid to the second surface; and a second supply port, which is disposed at least partly around the second surface such that the second supply port is directed in an outward radial direction with respect to the optical axis, that supplies a second liquid to the third surface. | 12-23-2010 |
20110032498 | Exposure apparatus, exposure method, and method for producing device - An exposure apparatus exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate. The exposure apparatus includes a projection optical system which performs the projection, and a liquid supply mechanism which supplies the liquid onto the substrate to form a liquid immersion area on a part of the substrate. The liquid supply mechanism supplies the liquid onto the substrate simultaneously from a plurality of positions which are apart, in a plurality of different directions, from the projection area. The exposure apparatus is capable of forming the liquid immersion area stably and recovering the liquid satisfactorily. It is possible to perform the exposure process accurately while avoiding, for example, the outflow of the liquid to the surroundings. | 02-10-2011 |
20110051112 | Exposure apparatus, exposure method, and method for producing device - An exposure apparatus fills an optical path space of an exposure light beam with a liquid, and exposes a substrate by irradiating the substrate with the exposure light beam via a projection optical system and the liquid. A first optical element of the projection optical system is provided with a removing device for removing foreign matters in a space inside of the concave surface portion. Immersion exposure is performed by permitting the exposure light beam to excellently reach an image plane via the projection optical system and the liquid. | 03-03-2011 |
20110063589 | Exposure apparatus and method for manufacturing device - An exposure apparatus which exposes a substrate by projecting an image of a pattern, via an projection optical system and a liquid of a liquid immersion area formed on the substrate, onto the substrate, includes a liquid supply mechanism having supply ports for supplying the liquid on both sides of a projection area respectively and capable of simultaneously supplying the liquid from the supply ports, the image of the pattern being projected onto the projection area. The liquid supply mechanism supplies the liquid from only one of the supply ports disposed on the both sides when the mechanism starts to supply the liquid. The liquid may be supplied while moving an object such as a substrate placed to face the projection optical system. Accordingly, an optical path space on the image side of the projection optical system can be filled with the liquid quickly while suppressing formation of air bubbles. | 03-17-2011 |
20110211186 | Exposure apparatus, exposure method and device manufacturing method - An exposure method sequentially exposes a plurality of shot areas of a substrate. The method includes: (i) holding the substrate on a substrate holder such that a gap is formed along an edge of the substrate; (ii) exposing one of the shot areas, located near a center of the substrate, through a liquid of a liquid immersion area which covers only a portion of a surface of the substrate, while moving the substrate at a first scanning speed; and (iii) exposing an other one of the shot areas through the liquid of the liquid immersion area, while moving the substrate at a second scanning speed lower than the first scanning speed. The other one of the shot areas is located near the edge of the substrate and the gap is included in the liquid immersion area during the exposure of the other one of the shot areas. | 09-01-2011 |
20120002186 | PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD - An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis ( | 01-05-2012 |
20120013860 | Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method - A liquid recovery system is used by an immersion exposure apparatus. The liquid recovery system is provided with: a first opening; a gap portion that is provided so that a liquid on an object that opposes the first opening can flow into the gap portion through the first opening; a liquid recovery part that suctions, through a porous member, at least part of the liquid that flows into the gap portion; and a second opening that is different from the first opening. The gap portion is open to the atmosphere through the second opening. | 01-19-2012 |
20120033192 | Exposure apparatus, exposure method, and device producing method - An exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) on the substrate (P) via a projection optical system (PL) and a liquid (LQ) supplied from a liquid supply mechanism ( | 02-09-2012 |
20120062861 | EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD - An exposure apparatus includes an immersion space forming member ( | 03-15-2012 |
20120067380 | CLEANING LIQUID, CLEANING METHOD, LIQUID GENERATING APPARATUS, EXPOSURE APPARATUS, AND DEVICE FABRICATING METHOD - An exposure apparatus exposes a substrate through an exposure liquid with exposure light. A cleaning liquid is provided to the exposure apparatus, in order to clean at least part of the exposure apparatus. In the cleaning liquid, a prescribed gas of an amount that is greater than or equal to the saturation concentration is dissolved. | 03-22-2012 |
20120094238 | SUBSTRATE HOLDING DEVICE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - To provide a substrate holding apparatus which can prevent a liquid from entering into a rear surface side of a substrate. A substrate holding apparatus is provided with a base material, a first holding portion formed on the base material for holding the substrate, and a second holding portion formed on the base material for holding a plate member by surrounding the circumference of a processing substrate held by the first holding portion. The second holding portion holds the plate member so as to form a second space on the side of the rear surface of the plate member. On the rear surface of the plate member, an absorbing member is arranged for absorbing the liquid entered from a gap between the substrate held by the first holding portion and the plate member held by the second holding portion. | 04-19-2012 |
20120133912 | LIQUID RECOVERY SYSTEM, IMMERSION EXPOSURE APPARATUS, IMMERSION EXPOSING METHOD, AND DEVICE FABRICATING METHOD - A liquid recovery system is used by an immersion exposure apparatus. The liquid recovery system comprises: a plate that has a first surface and a second surface on the side opposite the first surface; and a liquid recovery part, at least part of which opposes the second surface with a first gap interposed therebetween. The liquid recovery system recovers the liquid on a movable object that opposes the first surface of the plate via the liquid recovery part. | 05-31-2012 |
20120176589 | EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE - An exposure apparatus is provided with a projection optical system, and the projection optical system includes a first optical element disposed most closely to an image plane of the projection optical system. The exposure apparatus includes a first liquid immersion mechanism which forms a first liquid immersion area of a first liquid between the first optical element and an upper surface of a transparent member provided on a side of the image plane of the projection optical system, and an observation unit which observes a state of the first liquid immersion area. It is possible to grasp the state of the liquid immersion area of the liquid, thereby executing optimum liquid immersion exposure. | 07-12-2012 |
20120200836 | EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An exposure apparatus exposes a substrate by forming a liquid immersion region on the substrate, and projecting a pattern image onto the substrate via a projection optical system and a liquid that forms the liquid immersion region. The exposure apparatus includes a projection optical system having a plurality of optical elements, by which a pattern image is projected onto a substrate via a liquid to expose the substrate and a liquid recovery system that recovers the liquid along with a gas and has a separator that separates the recovered liquid and the recovered gas. | 08-09-2012 |
20120204913 | EXPOSURE APPARATUS, DEVICE PRODUCTION METHOD, CLEANING APPARATUS, CLEANING METHOD, AND EXPOSURE METHOD - An exposure apparatus exposes a substrate with an exposure light through an exposure liquid. The exposure apparatus includes an optical element from which the exposure light exits; a stage which is movable on the light-exit side of the optical element; a certain member which is provided on the stage; and a vibration generator which vibrates the certain member to apply vibration to the liquid in the liquid immersion space formed on the certain member. It is possible to suppress the deterioration of the performance which would be otherwise caused by any contamination. | 08-16-2012 |
20120307220 | Maintenance Method, Exposure Method, Exposure Apparatus, and Method for Producing Device - An exposure apparatus irradiates an exposure light beam EL in a state that a space KS, between predetermined optical elements LS | 12-06-2012 |
20130059253 | EXPOSURE APPARATUS, LIQUID HOLDING METHOD, AND DEVICE MANUFACTURING METHOD - An exposure apparatus includes a first member disposed at least in a part of a periphery of an optical path of the exposure light, and has a first face that faces an upper face of the object through a first gap and holds the liquid between the upper face of the object and the first face, a second member disposed at an outer side of the first face with respect to the optical path and has a second face facing the upper face of the object through a second gap, a first supply port disposed at an outer side of the second face and supplies a fluid, and a first suction port disposed between the first face and the second face, and suctions at least part of gas in an outer space of the second member via a gap between the second face and the upper face of the object. | 03-07-2013 |
20130128244 | Exposure Apparatus and Device Manufacturing Method Having Lower Scanning Speed to Expose Peripheral Shot Area - An exposure apparatus includes a substrate stage having a substrate holder to hold a substrate, a gap being formed between an edge of the held substrate and a surface surrounding the held substrate, and a controller that controls an exposure operation in which shot areas of the substrate are exposed sequentially and respectively with an image through liquid of a liquid immersion area which covers a portion of an upper surface of the substrate. The controller moves the substrate stage at a first speed to expose one of the shot areas to the image through the liquid, moves the substrate stage at a second speed, that is lower than the first speed, to expose another one of the shot areas to the image through the liquid, and during the exposing of the another one of the shot areas, the liquid immersion area is formed over a portion of the gap. | 05-23-2013 |
20130141701 | EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate. | 06-06-2013 |
20130141703 | EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate. | 06-06-2013 |
20130169944 | EXPOSURE APPARATUS, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, PROGRAM, AND RECORDING MEDIUM - An exposure apparatus that exposes a substrate with exposure light through a first liquid. The exposure apparatus includes: an optical member that has an emission surface which emits the exposure light; a first member that forms a first liquid immersion space of the first liquid in at least a part of a first space under the first lower surface and an optical path space including an optical path of the exposure light from the emission surface; and a second member that forms a second liquid immersion space of a second liquid, the second member being capable of moving in a state where the second liquid immersion space is formed separated from the first liquid immersion space. | 07-04-2013 |
20130250258 | EXPOSURE METHOD, EXPOSURE APPARATUS, AND METHOD FOR PRODUCING DEVICE - A liquid immersion exposure apparatus in which a substrate is exposed with an exposure beam, includes a projection optical system by which the substrate is exposed to the exposure beam, a first inlet disposed at a first position, which is capable of supplying a first liquid to a space adjacent to a bottom surface of the projection optical system, and a second inlet disposed at a second position which is different from the first position, the second inlet being capable of supplying a second liquid that is different from the first liquid to the space. | 09-26-2013 |
20130250259 | EXPOSURE METHOD, EXPOSURE APPARATUS, AND METHOD FOR PRODUCING DEVICE - A liquid immersion exposure apparatus in which a substrate is exposed with an exposure beam, includes a projection optical system by which the substrate is exposed to the exposure beam, a first inlet disposed at a first position, which is capable of supplying a first liquid to a space adjacent to a bottom surface of the projection optical system, and a second inlet disposed at a second position which is different from the first position, the second inlet being capable of supplying a second liquid that is different from the first liquid to the space. | 09-26-2013 |
20130271739 | EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An exposure apparatus where liquid supply operation and liquid recovery operation for forming a liquid immersion region are excellently performed to form the liquid immersion region in a desired condition, enabling high exposure accuracy and measurement accuracy to be achieved. An exposure apparatus (EX) is an apparatus that exposes a substrate (P) by emitting exposure light (EL) on the substrate (P) through liquid (LQ). The exposure apparatus has a liquid supply mechanism ( | 10-17-2013 |
20130293860 | EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE - Exposure apparatus exposes a substrate by irradiating the substrate with exposure light via a projection optical system and a liquid. The exposure apparatus is provided with a liquid immersion mechanism for supplying the liquid and recovering the liquid. The liquid immersion mechanism has an inclined surface, which is opposite to a surface of the substrate and is inclined with respect to the surface of the substrate, and a liquid recovering port of the liquid immersion mechanism is formed in the inclined surface. A flat portion is provided between the substrate and the projection optical system. A liquid immersion area can be maintained to be small. | 11-07-2013 |
20140022523 | EXPOSURE APPARATUS, EXPOSURE METHOD, METHOD FOR PRODUCING DEVICE, AND OPTICAL PART - An exposure apparatus exposes a substrate by irradiating exposure light onto the substrate via a projection optical system and a liquid. The exposure apparatus has a stage which includes a substrate holder for holding the substrate, a detachable member detachably disposed on the stage so that its upper surface contacts an immersion region, and a sensor having a light transmissive member. The detachable member, on which an opening is formed in the upper surface, is disposed on the stage so that the light transmissive member is arranged within the opening. | 01-23-2014 |
20140043593 | EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE - A liquid immersion exposure apparatus includes a nozzle member having a recovery port and an opening via which an exposure beam passes. A projection system includes a first element closest to an image surface and a second element which is second closest to the image surface. The first element has a first surface facing the image surface, a second surface facing a lower surface of the second element, an inclined outer surface extending upwardly and radially outwardly from the first surface and facing an inner surface of the nozzle member, and a flange portion provided above the inclined outer surface. A support member supports the flange portion of the first element. A substrate stage has a holder for holding a substrate to be exposed and moves the substrate below and relative to the nozzle member and the projection system. | 02-13-2014 |
20140204359 | EXPOSURE METHOD, EXPOSURE APPARATUS, EXPOSURE SYSTEM AND DEVICE MANUFACTURING METHOD - When exposing a same resist layer of a wafer a plurality of times, at least in one exposure of the plurality of exposures, by filling a space between a projection optical system, which projects an exposure light on the wafer, and the wafer with water by a liquid supply/drainage unit, a substantial wavelength of exposure light that reaches the wafer is made to differ from a substantial wavelength of exposure light in another exposure. Accordingly, exposure with high precision and high throughput can be achieved. | 07-24-2014 |
20140240684 | EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE - An exposure apparatus having a projection system with a final element projects exposure light to an upper surface of a substrate through liquid between the final element and the substrate upper surface. A liquid confinement member has a recovery outlet via which the liquid is removed along with gas, the recovery outlet being arranged such that the substrate upper surface faces the recovery outlet, the recovery outlet surrounding a path of the exposure light and the liquid confinement member confining the liquid to an area that is smaller than an area of the substrate upper surface by removing the liquid from a gap between the confinement member and the substrate upper surface. A first support member supports the projection system, and a second support member supports the liquid confinement member. An anti-vibration system limits vibrations from being transmitted from the second support member to the projection system. | 08-28-2014 |
20140253889 | EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE - An exposure apparatus includes a projection system having a final element that projects exposure light to an upper surface of a substrate through liquid between the final element and the substrate. A liquid confinement member has a recovery outlet, via which the liquid is removed along with gas, arranged such that the upper surface of the substrate faces the recovery outlet, and the recovery outlet surrounds a path of the exposure light. The liquid confinement member confines the liquid to an area smaller than an area of the upper surface of the substrate by removing the liquid via the recovery outlet from a gap between the liquid confinement member and the upper surface of the substrate. A first support member supports the projection system, and a second support member supports the liquid confinement member, wherein the projection system is isolated from vibrations of the liquid confinement member. | 09-11-2014 |
20140300878 | EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - In an immersion exposure apparatus, a projection system includes an optical element having a light emitting surface that contacts immersion liquid and an outer surface above the light emitting surface. A holding member holds the optical element, and a liquid confinement member surrounds the optical element to form a gap between the optical element and the liquid confinement member. The outer surface of the optical element includes a first part extending upwardly with respect to the light emitting surface, and a second part above the gap and extending radially outwardly with respect to the first part. The gap is between the first part and an inner surface of the liquid confinement member, which has an upper surface extending radially outwardly with respect to the inner surface. The holding member holds the optical element over a portion of the upper surface of the liquid confinement member. | 10-09-2014 |
20140307238 | EXPOSURE APPARATUS AND METHOD FOR PRODUCING DEVICE - A liquid immersion exposure apparatus exposes a substrate with an exposure beam via a liquid immersion area formed on a portion of a surface of the substrate. The apparatus includes a projection system, a first nozzle member having an aperture through which the exposure beam is projected, the first nozzle member having a liquid supply inlet and a liquid recovery outlet, a second nozzle member having a gas supply inlet via which a gas is supplied to a space surrounding the liquid immersion area during the exposure, a driving system which moves the second nozzle member relative to the first nozzle member, and a stage system having a holder which holds the substrate and which is movable relative to and below the projection system, the first nozzle member and the second nozzle member. | 10-16-2014 |
20150029476 | PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD - An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis ( | 01-29-2015 |
20150029482 | PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD - An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis ( | 01-29-2015 |