Patent application number | Description | Published |
20100081265 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE - According to an aspect of the present invention, there is provided a method of manufacturing a semiconductor device, the method including: forming a first film on a target film; forming resist patterns on the first film; processing the first film with the resist patterns to form first patterns including: periodic patterns; and aperiodic patterns; removing the resist patterns; forming a second film over the target film; processing the second film to form second side wall patterns on side walls of the first patterns; removing the periodic patterns; and processing the target film with the aperiodic patterns and the second side wall patterns, thereby forming a target patterns including: periodic target patterns; aperiodic target patterns; and dummy patterns arranged between the periodic target patterns and the aperiodic patterns and arranged periodically with the periodic target patterns. | 04-01-2010 |
20100168895 | MASK VERIFICATION METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND COMPUTER READABLE MEDIUM - A mask verification method includes setting optical parameters, verifying whether a pattern, which is obtained when a mask pattern other than a reference pattern of patterns on a mask is transferred on a substrate with use of the set optical parameters, satisfies dimensional specifications, and varying, when the pattern which is obtained when the mask pattern is transferred on the substrate is determined to fail to satisfy the dimensional specifications, the optical parameters at the time of transfer such that the pattern, which is obtained when the reference pattern is transferred on the substrate, satisfies a target dimensional condition, and verifying whether a pattern, which is obtained when the mask pattern other than the reference pattern of the patterns on the mask is transferred on the substrate with use of the varied optical parameters, satisfies the dimensional specifications. | 07-01-2010 |
20110176347 | SEMICONDUCTOR INTEGRATED CIRCUIT INCLUDING SEMICONDUCTOR MEMORY - According to one embodiment, a memory cell array includes memory cells arranged at crossing points of bit lines and word lines. The bit lines include first, second, third, and fourth bit lines sequentially arranged. A first sense circuit is arranged on a first end side of the memory cell array, electrically connected to the first and third bit lines. A second sense circuit is arranged on a second end side of the memory cell array, electrically connected to the second and fourth bit lines. A first hookup region is arranged between the memory cell array and the first sense circuit and includes a first transfer transistor connected to the first bit line and the first sense circuit. A second hookup region is arranged between the first hookup region and the first sense circuit and includes a second transfer transistor connected to the third bit line and the first sense circuit. | 07-21-2011 |
20120020158 | SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD THEREOF - A memory cell array includes memory strings arranged in a first direction. Word-lines and select gate lines extend in a second direction perpendicular to the first direction. The select gate line also extends in the second direction. The word-lines have a first line width in the first direction and arranged with a first distance therebetween. The select gate line includes a first interconnection in the first direction, the first interconnection having a second line width larger than the first line width, and a second interconnection extending from an end portion of the first interconnection, the second interconnection having a third line width the same as the first line width. A first word-line adjacent to the select gate line is arranged having a second distance to the second interconnection, the second distance being (4N+1) times the first distance (N being an integer of 1 or more). | 01-26-2012 |
20120241834 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - According to one embodiment, a semiconductor device includes interconnects extending from a element formation area to the drawing area, and connected with semiconductor elements in the element formation area and connected with contacts in the drawing area. The interconnects are formed based on a pattern of a (n+1) | 09-27-2012 |
20140017887 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - According to one embodiment, a semiconductor device includes interconnects extending from a element formation area to the drawing area, and connected with semiconductor elements in the element formation area and connected with contacts in the drawing area. The interconnects are formed based on a pattern of a (n+1) | 01-16-2014 |
20150162281 | INTEGRATED CIRCUIT DEVICE AND METHOD FOR MANUFACTURING THE SAME - In general, according to one embodiment, an integrated circuit device includes a first conductive member extending in a first direction, a second conductive member extending in the first direction, a first contact having a lower end connected to the first conductive member, and a second contact having a lower end connected to the second conductive member. A position of the first contact in the first direction is different from a position of the second contact in the first direction. Cross sections of the first contact and the second contact have longitudinal directions in a second direction as viewed from above. The second direction is from the first contact toward the second contact. | 06-11-2015 |
20150262932 | NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING SAME - According to one embodiment, a nonvolatile semiconductor memory device includes: a semiconductor substrate; a multilayer interconnection structure unit; a stacked body; a channel body layer; a memory film; a contact electrode. The multilayer interconnection structure unit is provided on the semiconductor substrate, and the multilayer interconnection structure unit has interconnections. The stacked body is provided on the multilayer interconnection structure unit, and each of electrode layers and each of first insulating layers are alternately arranged in the stacked body. The channel body layer extends in the stacked body in a stacking direction of the stacked body. The memory film is provided between the channel body layer and each of the electrode layers. And the contact electrode extends in the stacked body in the stacking direction, and the contact electrode electrically connects any one of the electrode layers and any one of the interconnection layers. | 09-17-2015 |