Patent application number | Description | Published |
20080241485 | INK COMPOSITION AND IMAGE RECORDING METHOD AND IMAGE RECORDED MATTER USING SAME - An ink composition containing at least a polymerizable composition, a pigment, and a polymer represented by General Formula (1): | 10-02-2008 |
20090059138 | METHOD OF PRODUCING ORGANIC NANOPARTICLES, ORGANIC NANOPARTICLES THUS OBTAINED, INKJET INK FOR COLOR FILTER, COLORED PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE RESIN TRANSFER MATERIAL, CONTAINING THE SAME, AND COLOR FILTER, LIQUID CRYSTAL DISPLAY DEVICE AND CCD DEVICE, PREPARED USING THE SAME - A method of producing organic nanoparticles, comprising:
| 03-05-2009 |
20100076108 | METHOD OF PRODUCING PHTHALOCYANINE PIGMENT NANO-SIZED PARTICLE DISPERSION, AND METHOD OF PRODUCING AN INKJET INK FOR A COLOR FILTER CONTAINING THE DISPERSION; AND COLORED LIGHT-SENSITIVE RESIN COMPOSITION, LIGHT-SENSITIVE TRANSFER MATERIAL, AND COLOR FILTER, CONTAINING THE DISPERSION; AND COLORED LIGHT-SENSITIVE RESIN COMPOSITION, LIGHT-SENSITIVE TRANSFER MATERIAL, AND COLOR FILTER, CONTAINING THE DISPERSION, AND LIQUID CRYSTAL DISPLAY DEVICE AND CCD DEVICE USING THE SAME - A method of producing a phthalocyanine pigment nano-sized particle dispersion, containing: mixing a phthalocyanine compound solution of a phthalocyanine compound dissolved in an acid or a good solvent containing an acid, with an organic solvent that is a poor solvent with respect to the phthalocyanine compound, to prepare a mixed liquid in which a phthalocyanine compound crystal is formed, wherein a phthalocyanine compound crystal having one crystalline form selected from the group consisting of α, β, γ, ε, δ, π, ρ, A, B, X, Y, and R is added to the organic poor solvent or the mixed liquid, thereby producing the thus-formed phthalocyanine compound crystal having the same crystalline form as that of the added phthalocyanine compound crystal, and wherein an additive having a mass average molecular weight of 1,000 or more is incorporated therein. | 03-25-2010 |
20100248149 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION - Provided is an actinic ray-sensitive or radiation-sensitive resin composition including (P) a resin which contains (A) a repeating unit having an ionic structure moiety capable of producing an acid anion on the side chain upon irradiation with an actinic ray or radiation, wherein a cation moiety of the ionic structure moiety has an acid-decomposable group or an alkali-decomposable group. | 09-30-2010 |
20100261103 | ORGANIC PIGMENT FINE PARTICLES AND METHOD OF PRODUCING THE SAME, PIGMENT-DISPERSION COMPOSITION, PHOTOCURABLE COMPOSITION AND INK-JET INK CONTAINING THE SAME, AND COLOR FILTER USING THE SAME AND METHOD OF PRODUCING THE SAME - Organic pigment fine particles, having capability of self-dispersion, having an organic pigment and a polymer compound, the organic pigment fine particles of being nanometer-sized fine particles obtained by mixing an organic pigment solution and a second solvent, thereby to precipitate the fine particles in the mixed liquid, the organic pigment solution prepared by dissolving the organic pigment and the polymer compound in a first solvent, the second solvent of being served as a poor solvent for the organic pigment and being compatible with the first solvent, in which a compound insoluble in the second solvent is used as the polymer compound, and the organic pigment fine particles are provided with a capability of self-dispersing in a third solvent different from any of the first solvent and the second solvent. | 10-14-2010 |
20110159433 | PHOTOSENSITIVE COMPOSITION, PATTERN-FORMING METHOD USING THE COMPOSITION, AND RESIN USED IN THE COMPOSITION - Provided are a radiation-sensitive composition including a compound (P) having a partial structure (A) having an ionic structural site and capable of decomposing upon irradiation with an actinic ray or radiation to generate an acid and a partial structure (B) having at least one phenolic hydroxyl group, a part or all of hydrogen atoms of the hydroxyl group or groups each being protected by a group capable of leaving by the action of an acid, wherein the ionic structural site of the partial structure (A) contained in the compound (P) is a structure capable of generating an acid anion in the compound (P) upon irradiation with an actinic ray or radiation; a pattern-forming method using the same; and a resin which is used in the composition. | 06-30-2011 |
20110318693 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME - An embodiment of the composition contains a resin (P) containing a repeating unit (A) that is configured to decompose when exposed to actinic rays or radiation to thereby generate an acid. The repeating unit (A) contains a cation structure with a monocyclic or polycyclic heterocycle containing a nitrogen atom. | 12-29-2011 |
20120003590 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME - An actinic ray-sensitive or radiation-sensitive resin composition containing a resin having (A) a repeating unit represented by a specific formula (I) and (B) a repeating unit capable of generating an acid upon irradiation with an actinic ray or radiation. | 01-05-2012 |
20120006788 | CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME - A chemical amplification resist composition that is used for preparation of a mold, and a mold preparation method and a resist film each using the composition are provided. | 01-12-2012 |
20120034559 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM THEREFROM AND METHOD OF FORMING PATTERN THEREWITH - Provided is an actinic-ray- or radiation-sensitive resin composition, includes a resin (P) containing a repeating unit (A) that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and a repeating unit (B) with a structure that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, and a compound (U) structured so that when the composition is formed into a film, the compound is unevenly distributed in a surface of the film. | 02-09-2012 |
20120156618 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION - According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin (P) containing not only at least one repeating unit (A) that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and is expressed by any of general formulae (I) to (III) below but also a repeating unit (B) containing at least an aromatic ring group provided that the repeating unit (B) does not include any of those of general formulae (I) to (III). (The characters used in general formulae (I) to (III) have the meanings mentioned in the description.) | 06-21-2012 |
20120171618 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING A PATTERN USING THE SAME - According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin containing a repeating unit (A) containing both a structural moiety (S1) that is decomposed by an action of an acid to thereby generate an alkali-soluble group and a structural moiety (S2) that is decomposed by an action of an alkali developer to thereby increase its rate of dissolution into the alkali developer, and a compound that generates an acid when exposed to actinic rays or radiation. | 07-05-2012 |
20120219758 | RESIST COMPOSITION, RESIST FILM THEREFROM AND METHOD OF FORMING NEGATIVE PATTERN USING THE COMPOSITION - Provided is a resist composition including a resin (A) containing any of repeating units (a) of general formulae (RI-a) and (RI-b) below, any of repeating units (b) of general formula (R2) below, any of repeating units (c) of general formula (R3) below and a repeating unit (d) being different from the repeating units (c) and containing a group that when acted on by an acid, is decomposed, a compound (B) that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid, and any of compounds (C) of general formula (PDA-1) below. | 08-30-2012 |
20120219891 | RESIST COMPOSITION, RESIST FILM THEREFROM AND METHOD OF FORMING NEGATIVE PATTERN USING THE COMPOSITION - Provided is a resist composition including a resin (A) containing any of repeating units (a) of general formulae (I-a) and (I-b) below and any of repeating units (b) of general formula (II) below but containing substantially no repeating unit in which an alcoholic hydroxyl group is introduced, and any of compounds (B) of general formulae (III-a) and (III-b) below. | 08-30-2012 |
20120219913 | PATTERN FORMING METHOD, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM - Provided is a pattern forming method that is excellent in roughness performance such as line width roughness and exposure latitude, and an actinic-ray-sensitive or radiation-sensitive resin composition and a resist film used for the pattern forming method. | 08-30-2012 |
20120231393 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING A PATTERN USING THE SAME - According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin that is decomposed when acted on by an acid to thereby increase its solubility in an alkali developer, a compound that generates an acid when exposed to actinic rays or radiation, and any of basic compounds of general formula (1) below. | 09-13-2012 |
20130040096 | PATTERN FORMING METHOD AND ACTINIC-RAY- OR RADIATION-SENSTIVE RESIN COMPOSITION - Provided is a method of forming a pattern and an actinic-ray- or radiation-sensitive resin composition that excels in the limiting resolving power, roughness characteristics, exposure latitude (EL) and bridge defect performance. The method of forming a pattern includes (1) forming an actinic-ray- or radiation-sensitive resin composition into a film, (2) exposing the film to light, and (3) developing the exposed film with a developer containing an organic solvent. The actinic-ray- or radiation-sensitive resin composition contains (A) a resin containing a repeating unit with a structural moiety that is configured to decompose when exposed to actinic rays or radiation to thereby generate an acid, and (B) a solvent. | 02-14-2013 |
20130095429 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME - Provided is an actinic-ray- or radiation-sensitive resin composition that simultaneously achieves excellent developability and excellent immersion-liquid tracking properties, and a method of forming a pattern using the same. The composition contains a resin (B) containing at least either a fluorine atom or a silicon atom, the resin (B) containing any of repeating units of general formula (I) below. | 04-18-2013 |
20140127627 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND PATTERN-FORMING METHOD USING THE SAME - Provided is an actinic ray-sensitive or radiation-sensitive resin composition, a resist film formed with the composition, and a pattern-forming method using the same. The actinic ray-sensitive or radiation-sensitive resin composition includes (P) a resin that contains the following repeating units (A), (B) and (C); and a solvent having a boiling temperature of 150° C. or less,
| 05-08-2014 |
20140356771 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, MANUFACTURING METHOD OF ELECTRONIC DEVICE AND ELECTRONIC DEVICE - There is provided an actinic ray-sensitive or radiation-sensitive resin composition, having: (A) a resin having a repeating unit represented by formula (I); (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a resin having at least one repeating unit (x) out of a repeating unit represented by formula (II) and a repeating unit represented by formula (III) and containing substantially neither fluorine atom nor silicon atom, wherein the content of the repeating unit (x) is 90% or more by mole based on all repeating units in the resin (C). | 12-04-2014 |