Patent application number | Description | Published |
20080198344 | Lithographic apparatus and method of removing liquid - A method of removing liquid from a substrate supported on a substrate table and from a gap between the substrate and the substrate table includes: providing a liquid removal device with at least one outlet connected to an under pressure source, the outlet forming an elongated extractor of a predetermined geometry; relatively moving the substrate table and the liquid removal device such that the extractor is adapted to pass over all of the-substrate and gap and such that substantially at any given time any local part of the extractor at the edge of a non-dried portion of the gap has, in a plane, its local tangent orientated at an angle of between about 35° and 90° to the local tangent of the gap. | 08-21-2008 |
20090296056 | SUBSTRATE TABLE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A table is disclosed in which measures are taken to seal between the table and an edge of an object, in use, supported on the table. In particular, a capillary passage is formed between the object on the table and the table itself. A meniscus pinning feature and/or the presence of an overpressure at the radially inward side of the capillary passage holds the liquid in the passage and helps prevent it from advancing further radially inwardly. The features to perform this function may be associated with or formed in a member surrounding the object. The member may be thermally decoupled from a part of the table. | 12-03-2009 |
20100154564 | CORIOLIS FLOW SENSOR WITH RESILIENTLY SUSPENDED BALANCING MASS - A Coriolis flow sensor with a Coriolis tube that is fastened in a housing and that can be excited with a certain frequency, wherein a balancing mass (inertia) is arranged with rotational flexibility between the tube fastening and the housing. In particular, a spring steel plate is used for providing a connection rigidity between the balancing mass and the housing, which plate comprises a fixed portion and a movable portion cut out from the fixed portion, wherein the incisions are formed such that the fixed and movable portions are interconnected via resilient plate portions, which resilient plate portions are in particular elongate strips lying in one line and realizing a rotational flexibility (torsion), while abutments are provided which limit the amplitude of movements of the balancing mass. | 06-24-2010 |
20100208224 | LITHOGRAPHIC APPARATUS AND METHOD OF REMOVING LIQUID - A method of removing liquid from a substrate supported on a substrate table and from a gap between the substrate and the substrate table includes: providing a liquid removal device with at least one outlet connected to an under pressure source, the outlet forming an elongated extractor of a predetermined geometry; relatively moving the substrate table and the liquid removal device such that the extractor is adapted to pass over all of the substrate and gap and such that substantially at any given time any local part of the extractor at the edge of a non-dried portion of the gap has, in a plane, its local tangent orientated at an angle of between about 35° and 90° to the local tangent of the gap. | 08-19-2010 |
Patent application number | Description | Published |
20090284730 | Substrate Handler, Lithographic Apparatus and Device Manufacturing Method - An apparatus, method, and system is provided to condition a substrate. The apparatus can include a substrate handler, an array of diodes, and a projection system. The substrate handler can include a conditioning device, a float device, and a displacing device. The array of diodes can be configured to provide a patterned radiation beam, where the projection system projects the patterned radiation beam onto a target portion of a conditioned substrate. | 11-19-2009 |
20100044593 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap. | 02-25-2010 |
20100085553 | Lithographic Apparatus and Device Manufacturing Method Utilizing a Substrate Handler - A substrate handler is provided. The substrate handler includes a support surface configured to carry a substrate and a pre-conditioning unit configured to pre-condition the substrate. The substrate handler is configured to move the substrate relative to a substrate table. | 04-08-2010 |
20100165319 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system and the liquid removal system may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained such that the vapor pressure of liquid is relatively high. | 07-01-2010 |