Patent application number | Description | Published |
20100286042 | Medicinal Composition Containing Highly Functionalized Chimeric Protein - There is provided an FGF2 substitute containing medicinal composition which comprises, as an active ingredient, a chimeric protein comprising the amino acid sequence of an FGF1 protein in which a partial sequence including a sequence of at least positions 62-83 within a sequence of positions 41-83 is substituted with a partial sequence at the corresponding positions in the amino acid sequence of an FGF2 protein; and the remaining region is formed of the amino acid sequence of FGF1. In particular, this medicinal composition is used for wound healing and for the prevention and treatment of radiation-induced damage, and it exhibits a pharmacological action superior to that of an FGF2 medicinal composition, and further, it can be easily formulated into a preparation. | 11-11-2010 |
20120214740 | Medicinal Compositions Containing Highly Functionalized Chimeric Protein - There is provided an FGF2 substitute-containing medicinal composition which comprises, as an active ingredient, a chimeric protein comprising the amino acid sequence of an FGF1 protein in which a partial sequence including a sequence of at least positions 62-83 within a sequence of positions 41-83 is substituted with a partial sequence at the corresponding positions in the amino acid sequence of an FGF2 protein; and the remaining region is formed of the amino acid sequence of FGF1. In particular, this medicinal composition is used for wound healing and for the prevention and treatment of radiation-induced damage, and it exhibits a pharmacological action superior to that of an FGF2 medicinal composition, and further, it can be easily formulated into a preparation. | 08-23-2012 |
Patent application number | Description | Published |
20080253796 | Image forming apparatus - An image writing unit causes, upon being set in a write position, an optical system unit to be movable and positions the optical system unit, with a hitting portion of the optical system unit hitting a blocking portion in a chassis. A holding unit includes, in a state in which the image writing unit is set in the write position, a portion defining an opening that faces either one of an air intake unit and an air exhaust unit. The air intake unit blows an intake air to the optical system unit through the opening, or the air exhaust unit draws an exhaust air around the optical system unit through the opening. | 10-16-2008 |
20090074446 | Image forming apparatus - A biasing unit biases an exposing unit with respect to a main unit in at least one direction in a direction approaching the main body, so that the exposing unit makes contact with the main body in at least one portion to determine a position of the exposing unit with respect to the main body. A buffer unit relieves an impact the exposing unit receives from the main body, provided at or near the portion where the exposing unit makes contact with the main body. An attachment forming portion is provided for attaching the buffer unit in switching a functional state of the buffer unit between a buffer functional state and a buffer non-functional state. | 03-19-2009 |
20090110432 | Image forming apparatus - When a lever is pulled upwards, an engaging member comes into contact with a retracted contacting member. An optical writing device rotates with a hooking member at a center and is lifted. As a result, positions of a first reference position component and a second reference position component switches from a contacting position to a retracted position. When the lever is pulled downward, the engaging member separates from the retracted contacting member. The optical writing device rotates in a counter-clockwise direction with the hooking member as the center. As a result, the positions of the reference position components switch from the retracted position to the contacting position. The reference position components come into contact with positioning members. | 04-30-2009 |
20110298171 | Paper feeder and image forming apparatus - In a paper feeder, a signal switching unit switches a paper present signal output from a paper detector to a paper absent signal indicative of absence of a paper in the second paper cassette if a first paper cassette is pulled out from a specific position. | 12-08-2011 |
Patent application number | Description | Published |
20090273070 | Liquid Resin Composition for Electronic Components and Electronic Component Device - The invention relates to a liquid resin composition for electronic components which is used in sealing of electronic components, comprising a liquid epoxy resin, a curing agent containing a liquid aromatic amine, and an inorganic filler, and further comprising at least one member selected from a hardening accelerator, silicone polymer particles, and a nonionic surfactant. There is thereby provided a liquid resin composition for electronic components, which is excellent in fluidity in narrow gaps, is free of void generation, is excellent in adhesiveness and low-stress characteristic and is excellent in fillet formation, as well as an electronic component device having high reliability (moisture resistance, thermal shock resistance), which is sealed therewith. | 11-05-2009 |
20090286930 | Liquid Resin Composition for Electronic Components and Electronic Component Device - The present invention provides a liquid resin composition for electronic components, which is excellent in migration resistance and also superior in formability and reliability, as well as an electronic component device sealed therewith, and relates to a liquid resin composition for electronic components, which comprises (A) an epoxy resin, (B) a cyclic acid anhydride which is liquid at ordinary temperature and has an acid anhydride equivalent of 200 or more, and (C) a coupling agent. | 11-19-2009 |
Patent application number | Description | Published |
20090092932 | METHOD FOR FORMING PATTERN - In an exposure step, a combination of a first photomask and a second mask is used. The first mask has a real pattern corresponding to the pattern actually formed on the film to be processed, and a dummy pattern added for controlling pattern pitch in the first photomask within a prescribed range; and the second photomask has a pattern isolating a real-pattern-formed region from a dummy-pattern-formed region. In forming the pattern, after forming a film to be processed on a substrate, a first mask is formed on the film to be processed, by lithography, using the first photomask, and a second mask is formed on the film to be processed, by lithography, using the second photomask. Thereafter, the film to be processed is etched and removed using the first and second masks as masks to form the pattern. | 04-09-2009 |
20100104986 | METHOD FOR FORMING PATTERN - In an exposure step, a combination of a first photomask and a second mask is used. The first mask has a real pattern corresponding to the pattern actually formed on the film to be processed, and a dummy pattern added for controlling pattern pitch in the first photomask within a prescribed range; and the second photomask has a pattern isolating a real-pattern-formed region from a dummy-pattern-formed region. In forming the pattern, after forming a film to be processed on a substrate, a first mask is formed on the film to be processed, by lithography, using the first photomask, and a second mask is formed on the film to be processed, by lithography, using the second photomask. Thereafter, the film to be processed is etched and removed using the first and second masks as masks to form the pattern. | 04-29-2010 |
20110091819 | METHOD FOR FORMING PATTERN - In an exposure step, a combination of a first photomask and a second mask is used. The first mask has a real pattern corresponding to the pattern actually formed on the film to be processed, and a dummy pattern added for controlling pattern pitch in the first photomask within a prescribed range; and the second photomask has a pattern isolating a real-pattern-formed region from a dummy-pattern-formed region. In forming the pattern, after forming a film to be processed on a substrate, a first mask is formed on the film to be processed, by lithography, using the first photomask, and a second mask is formed on the film to be processed, by lithography, using the second photomask. Thereafter, the film to be processed is etched and removed using the first and second masks as masks to form the pattern. | 04-21-2011 |