Patent application number | Description | Published |
20090296056 | SUBSTRATE TABLE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A table is disclosed in which measures are taken to seal between the table and an edge of an object, in use, supported on the table. In particular, a capillary passage is formed between the object on the table and the table itself. A meniscus pinning feature and/or the presence of an overpressure at the radially inward side of the capillary passage holds the liquid in the passage and helps prevent it from advancing further radially inwardly. The features to perform this function may be associated with or formed in a member surrounding the object. The member may be thermally decoupled from a part of the table. | 12-03-2009 |
20100141914 | LITHOGRAPHIC APPARATUS AND POSITIONING APPARATUS - A lithographic apparatus includes a movable first object, and a heat exchanger including a heat exchanging body, the heat exchanging body including a material with electro-caloric or magneto-caloric properties and configured to affect the temperature of the first object by exchanging heat with the movable first object, and a generator configured to supply an electromagnetic field to the heat exchanging body to change the temperature of the heat exchanging body in order to cool or heat the first object. | 06-10-2010 |
20100214549 | LITHOGRAPHIC APPARATUS, A METHOD FOR REMOVING MATERIAL OF ONE OR MORE PROTRUSIONS ON A SUPPORT SURFACE, AND AN ARTICLE SUPPORT SYSTEM - A lithographic projection apparatus includes a beam production system to provide a beam of radiation, pattern the beam of radiation, and project the patterned beam onto a target portion of a substrate, a support table including protrusions to support an article, a detector to detect height deviations of the protrusions, a material removing device arranged to modify a height of the protrusion material, a controller coupled between the detector and the material removing device, wherein material removing device includes a removal tool selected from the group consisting of a mechanical polishing device, a magneto rheological finishing tool, and a single or multipoint diamond tool. | 08-26-2010 |
20100272846 | ACTUATOR - An actuator is disclosed that includes a body, the body having a face, and a plurality of conduits located in the body, each conduit deformable in response to a change of pressure within the conduit, the deformation of the conduit configured to cause a deformation of the face. | 10-28-2010 |
20110069298 | SUPPORT OR TABLE FOR LITHOGRAPHIC APPARATUS, METHOD OF MANUFACTURING SUCH SUPPORT OR TABLE AND LITHOGRAPHIC APPARATUS COMPRISING SUCH SUPPORT OR TABLE - A substrate table or a patterning device support includes an aerogel. The aerogel may be very light weight, for example the aerogel may have a density between 0.5 and 500 mg/cm | 03-24-2011 |
20120058434 | LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF APPLYING A PATTERN TO A SUBSTRATE - A lithographic apparatus is arranged to transfer a pattern from a patterning device onto a substrate, in which a measuring subsystem comprises one or (preferably) more alignment & level sensors (AS, LS) directed at the substrate near a patterning location of a patterning subsystem. The alignment sensor(s) is operable to recognize and measure alignment marks (P | 03-08-2012 |
20130146785 | SUPPORT, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A support for an object having a support surface configured to support the object; wherein the support surface includes a main part and a moveable part, the moveable part of the support surface being moveable between a retracted position in which the moveable part of the support surface is adapted to be substantially in the same plane as the main part of the support surface and an extended position in which the moveable part of the support surface protrudes from the plane of the main part of the support surface. | 06-13-2013 |
20130321788 | Lithographic Apparatus and Device Manufacturing Method - A substrate support is provided for a lithographic apparatus. The support comprises a substrate table constructed to hold a substrate and a chuck for the substrate table. In operation, the substrate table is supported by the chuck and clamped thereto. The substrate support comprises a first set of burls on a surface of the support block for abutting against the substrate table during the clamping and a second set of burls on a surface of the substrate table for abutting against the support block during the clamping. | 12-05-2013 |
20140253900 | Chuck, a Chuck Control System, a Lithography Apparatus and a Method of Using a Chuck - A chuck, chuck control system, lithographic apparatus and method of using a chuck are disclosed. In an embodiment, there is provided a chuck ( | 09-11-2014 |
Patent application number | Description | Published |
20080278697 | Lithographic apparatus and device manufacturing method - A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate. A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa. | 11-13-2008 |
20110241259 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate. A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa. | 10-06-2011 |