Fudo
Heishiro Fudo, Miyagi-Ken JP
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20140353303 | HEATER FOR FIXING DEVICE - A heater for fixing devices includes a glass substrate, a heating element, electrode patterns connected to the heating element, a first protective layer, and a second protective layer. The glass substrate is made of an alkali-free glass. The first protective layer is formed by firing a mixture of a first glass powder and a first filler. The first glass powder contains no alkali metal oxide and has a lower softening point than the glass substrate. The first filler has a lower thermal expansion coefficient than the alkali-free glass for the glass substrate. The second protective layer is made of a material that does not contain the first filler contained in the first protective layer. | 12-04-2014 |
Hidekimi Fudo, Hitachinaka JP
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20090286174 | MANUFACTURING METHOD AND MANUFACTURING SYSTEM OF SEMICONDUCTOR DEVICE - In an exposure process forming a predetermined circuit pattern of a semiconductor device on a wafer, a resist dimension of the resist pattern formed on a wafer and a focus position in the exposure process at past time are measured, a resist dimension and a focus position of a wafer to which the exposure process is secondly performed are estimated by using measurement results of these measured resist dimension and focus position, and a focus offset value is calculated by using estimated values of these estimated resist dimension and focus position, and then, an exposure dose is calculated as considering this focus offset value, and a resist pattern is formed on the wafer to which the exposure process is performed by using these calculated exposure dose and focus offset value. | 11-19-2009 |
Hidekimi Fudo, Tokyo JP
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20080292977 | MANUFACTURING METHOD OF SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE - In the semiconductor integrated circuit device lithography process it is becoming more and more essential to control both exposure dose and focus value independently with a high accuracy. Using a wafer treated precedingly, a section profile of a photoresist is acquired by the technique of scatterometry, then both exposure dose and focus value are estimated independently with a high accuracy on the basis of the section profile thus acquired and using a conjectural expression obtained by the technique of multivariate analysis, and a focus setting in the exposure of a succeedingly treated wafer is corrected on the basis of the estimated exposure dose and focus value. | 11-27-2008 |
Ryosuke Fudo, Kanagawa JP
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20140065186 | Immunostimulant for Animals, Feed Containing the Same, and Method for Producing the Same - By administering sterilized bacterial cells obtained by heat treating cells of a coryneform bacterium or an enterobacterium under a condition of pH 2 to 5 at 90 to 120° C. for 3 minutes to 4 hours, or a feed containing such sterilized bacterial cells to a mammal, fowl, fish, or crustacean, immunity of these animals is enhanced. | 03-06-2014 |
Takayuki Fudo, Toyama-Shi JP
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20110300040 | METHOD FOR PRODUCING SODIUM TUNGSTATE, METHOD FOR COLLECTING TUNGSTEN, APPARATUS FOR PRODUCING SODIUM TUNGSTATE, AND METHOD FOR PRODUCING SODIUM TUNGSTATE AQUEOUS SOLUTION - Provided are a method for producing sodium tungstate by supplying an oxidant made of sodium nitrate or sodium nitrite to bring a tungsten containing material and the oxidant into contact with each other in an atmosphere containing oxygen to thereby continuously produce a reaction product; a method for collecting tungsten using the method; and an apparatus for producing sodium tungstate. Also provided are a method for producing a sodium tungstate aqueous solution in which a reductant is introduced into a melt containing the above-described reaction product which is then dissolved in water; and a method for collecting tungsten using the method. | 12-08-2011 |
20140112847 | METHOD FOR PRODUCING SODIUM TUNGSTATE, METHOD FOR COLLECTING TUNGSTEN, APPARATUS FOR PRODUCING SODIUM TUNGSTATE, AND METHOD FOR PRODUCING SODIUM TUNGSTATE AQUEOUS SOLUTION - Provided are a method for producing sodium tungstate by supplying an oxidant made of sodium nitrate or sodium nitrite to bring a tungsten containing material and the oxidant into contact with each other in an atmosphere containing oxygen to thereby continuously produce a reaction product; a method for collecting tungsten using the method; and an apparatus for producing sodium tungstate. Also provided are a method for producing a sodium tungstate aqueous solution in which a reductant is introduced into a melt containing the above-described reaction product which is then dissolved in water; and a method for collecting tungsten using the method. | 04-24-2014 |
20140119998 | METHOD FOR PRODUCING SODIUM TUNGSTATE, METHOD FOR COLLECTING TUNGSTEN, APPARATUS FOR PRODUCING SODIUM TUNGSTATE, AND METHOD FOR PRODUCING SODIUM TUNGSTATE AQUEOUS SOLUTION - Provided are a method for producing sodium tungstate by supplying an oxidant made of sodium nitrate or sodium nitrite to bring a tungsten containing material and the oxidant into contact with each other in an atmosphere containing oxygen to thereby continuously produce a reaction product; a method for collecting tungsten using the method; and an apparatus for producing sodium tungstate. Also provided are a method for producing a sodium tungstate aqueous solution in which a reductant is introduced into a melt containing the above-described reaction product which is then dissolved in water; and a method for collecting tungsten using the method. | 05-01-2014 |