Patent application number | Description | Published |
20080297758 | Lithographic support structure - The invention relates to a transfer apparatus for transferring an object (W). the transfer apparatus comprises a gripper ( | 12-04-2008 |
20080309893 | Contamination prevention system, lithographic apparatus, radiation source, and method for manufacturing a device - A contamination prevention system is constructed and arranged to prevent material from propagating with radiation into a lithographic apparatus. The contamination prevention system includes a rotatable carrier provided with a plurality of generally radially outwardly extending blades. The blades are constructed and arranged to absorb or deflect the material. The system also includes a stationary shaft, and a bearing constructed and arranged to rotate the rotatable carrier and the blades around the shaft. The rotatable carrier is provided with a space for at least partially receiving a portion of the shaft. | 12-18-2008 |
20090001288 | Lithographic apparatus, radiation system, device manufacturing method, and radiation generating method - A lithographic apparatus includes a radiation system constructed to provide a beam of radiation from radiation emitted by a radiation source. The radiation system includes a contaminant trap configured to trap material emanating from the radiation source. The contaminant trap includes a contaminant engaging surface arranged in the path of the radiation beam that receives the material emanating from the radiation source during propagation of the radiation beam in the radiation system. The radiation system also includes a liquid tin cooling system constructed to cooling the contaminant trap with liquid tin. The apparatus includes an illumination system configured to condition the radiation beam, a support constructed to support a patterning device configured to impart the radiation beam with a pattern in its cross-section, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. | 01-01-2009 |
20090073401 | Lithographic apparatus with rotation filter device - A lithographic apparatus including a filter device is disclosed. The filter device has a plurality of foils attached to a holder which is able to rotate around a rotation axis. The foils are arranged substantially parallel to the rotation axis. The foils comprise a uni-directional carbon-fiber composite material selected from the group consisting of carbon-carbon composite (C-C composite) and carbon-silicon carbide composite (C—SiC composite). During operation, the filter device rotates and filters out debris from a radiation source, such as a Sn plasma source. Such a filter device per se may be provided. | 03-19-2009 |
20090323038 | OBJECT SUPPORT POSITIONING DEVICE AND LITHOGRAPHIC APPARATUS - An object support positioning device configured to position an object support includes first and second side-beams having respective first and second sliders mounted thereon, first and second motors configured to move the first and second sliders along each respective side beam, a cross beam mounted proximate first and second ends thereof to the first and second sliders respectively and having a third slider mounted thereto, the cross-beam and the first and second slider being mounted together, and a third motor configured to move the third slider longitudinally along the cross-beam, the third slider being adapted to support the one object support. A fluid bearing is provided in at least one of the first, second and third sliders, the fluid bearing including multiple bearing surfaces to exert reaction forces in a first direction, the first direction being perpendicular to the sliding direction of the at least one slider. | 12-31-2009 |
20100149506 | Actuator System, Lithographic Apparatus, Method of Controlling the Position of a Component and Device Manufacturing Method - An actuator system is provided that is configured to move a component relative to a base of the actuator system. The actuator system may include first and second actuating elements, each including two sections of material that are joined to each other and have different coefficients of thermal expansion. The two actuating elements may be configured such that if the temperature of one is increased it applies a force on the component in a direction that is opposite to the force applied by the other actuating element if its temperature is increased. The actuator system may further include at least one power supply configured to provide independently controllable heating to the first and second actuating elements. | 06-17-2010 |
20110205516 | LITHOGRAPHIC APPARATUS AND METHOD - A lithographic apparatus includes an illumination system configured to condition a radiation beam and a support constructed to support a patterning device. The patterning device is configured to form a patterned radiation beam. A substrate table is constructed to hold a substrate, and a projection system is configured to project the patterned radiation beam onto a target portion of the substrate. The apparatus includes a heater arrangement that includes an electron beam generator configured to generate an electron beam, and an electron beam guide arrangement configured to guide the electron beam onto an optical element of the lithographic apparatus. The optical element forms a part of the illumination system or the projection system which, in use, is traversed by the radiation beam. The heater arrangement is controllable to provide a distribution of heat on the optical element by deflection of the electron beam. | 08-25-2011 |
20120105989 | MOUNTINGS FOR ROTATION OF ARRAY OF REFLECTIVE ELEMENTS AND LITHOGRAPHIC APPARATUS INCORPORATING SAME - An array of reflective elements in which at least one of the reflective elements is mounted on a mounting which comprises a rod at least partially located within a sleeve. A first end of the rod is fixed to a first end of the sleeve and a second end of the rod is moveable, the sleeve including a first resiliently flexible portion which is configured to bend in order to allow the movement of the second end of the rod to take place, wherein the reflective element is mounted at the first end of the sleeve such that bending of the sleeve causes rotation of the reflective element. | 05-03-2012 |
20120147345 | OPTICAL APPARATUS, AND METHOD OF ORIENTING A REFLECTIVE ELEMENT - An optical apparatus has a moveable reflective element and associated actuator. The actuator includes a first magnet which is connected to the moveable reflective element such that movement of the first magnet will cause the moveable reflective element to move, and a second magnet which is connected to a motor such that operation of the motor will cause the second magnet to move. The second magnet is positioned relative to the first magnet such that moving the second magnet will cause the first magnet to move. | 06-14-2012 |
20120154777 | ILLUMINATION SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD OF ADJUSTING AN ILLUMINATION MODE - An illumination system is disclosed that had a plurality of moveable reflective elements and associated actuators which may be configured to form an illumination mode. One or more of the actuators is arranged to move between first, second and third positions, and so move an associated moveable reflective element between first, second and third orientations, the first and second orientations being such that radiation reflected from the moveable reflective element forms part of the illumination mode, and the third orientation being such that radiation reflected from the moveable reflective element does not form part of the illumination mode. | 06-21-2012 |
20120162628 | Actuator - An actuator comprising a first part and a second part, the first part being configured to move relative to the second part, wherein a labyrinth seal is provided between the first part and the second part, the labyrinth seal being configured to restrict the flow of gas from a first side of the labyrinth seal to a second side of the labyrinth seal, wherein one or more inlets and one or more outlets are provided within the labyrinth seal, the one or more inlets being configured to provide gas to a location within the labyrinth seal and the one or more outlets being configured to remove at least part of the gas from a location within the labyrinth seal. | 06-28-2012 |
20120249991 | PLANAR MOTOR AND LITHOGRAPHIC APPARATUS COMPRISING SUCH PLANAR MOTOR - A motor includes a stator including a plurality of stator poles arranged in a repetitive arrangement with a first pitch, the stator poles facing a first side of a plane of movement, and a mover including a plurality of mover poles arranged in a repetitive arrangement with a second pitch, the mover poles facing a second, opposite side of the plane of movement. The poles of the stator and/or the mover are provided with a winding to alter a magnetic field in the respective ones of the stator poles and the mover poles in response to an electric current through the respective winding. At least one of the stator and the mover includes a permanent magnet for generating a magnetic field extending from the permanent magnet via at least one respective pole of the stator and the mover to the other one of the stator and the mover and back. | 10-04-2012 |