Patent application number | Description | Published |
20090155725 | Method of fine patterning semiconductor device - For patterning during integrated circuit fabrication, an image layer is activated for forming a respective first type polymer block at each of two nearest activated areas. A layer of block copolymer is formed on the image layer, and a plurality of the first type polymer blocks and a plurality of second and third types of polymer blocks are formed on an area of the image layer between outer edges of the two nearest activated areas, from the block copolymer. At least one of the first, second, and third types of polymer blocks are removed to form a variety of mask structures. | 06-18-2009 |
20090176376 | Method of fine patterning semiconductor device - For patterning during integrated circuit fabrication, a first pattern of first masking structures is formed, and a buffer layer is formed on exposed surfaces of the first masking structures. Also, a second pattern of second masking structures is formed in recesses between the buffer layer at sidewalls of the first masking structures. Furthermore, the first and masking structures are formed from spin-coating respective high carbon containing materials. Such first and second masking structures pattern a target layer with higher pitch than possible with traditional photolithography. | 07-09-2009 |
20090191713 | METHOD OF FORMING FINE PATTERN USING BLOCK COPOLYMER - Provided is a method of forming a fine pattern using a block copolymer. The method comprises forming a coating layer including a block copolymer having a plurality of repeating units on a substrate. A mold is provided having a first pattern comprising a plurality of ridges and valleys. The first pattern is transferred from the mold into the coating layer. Then, a self-assembly structure is formed comprising a plurality of polymer blocks aligned in a direction guided by the ridges and valleys of the mold thereby rearranging the repeating units of the block copolymer within the coating layer by phase separation while the coating layer is located within the valleys of the mold. A portion of the polymer blocks are removed from among the plurality of polymer blocks and a self-assembly fine pattern of remaining polymer blocks is formed. | 07-30-2009 |
20100167214 | Method of forming fine pattern using block copolymer - A method of forming a fine pattern includes forming an organic guide layer on a substrate, forming a photoresist pattern on the organic guide layer, the photoresist pattern including a plurality of openings exposing portions of the organic guide layer, forming a material layer on the exposed portions of the organic guide layer and on the photoresist pattern, the material layer including block copolymers, and rearranging the material layer through phase separation of the block copolymers into a fine pattern layer, such that the fine pattern layer includes a plurality of first blocks and a plurality of second blocks arranged in an alternating pattern, the plurality of first blocks and the plurality of the second blocks having different repeating units of the block copolymers. | 07-01-2010 |
20100248492 | Method of forming patterns of semiconductor device - A method of forming fine patterns of a semiconductor device by using carbon (C)-containing films includes forming an etching target film on a substrate including first and second regions; forming a plurality of first C-containing film patterns on the etching target film in the first region; forming a buffer layer which covers top and side surfaces of the plurality of first C-containing film patterns; forming a second C-containing film; removing the second C-containing film in the second region; exposing the plurality of first C-containing film patterns by removing a portion of the buffer layer in the first and second regions; and etching the etching target film by using the plurality of first C-containing film patterns, and portions of the second C-containing film which remain in the first region, as an etching mask. | 09-30-2010 |
20110081777 | Methods of forming a pattern and methods of fabricating a semiconductor device having a pattern - Methods of forming a pattern and methods of fabricating a semiconductor device having a pattern are provided, the methods include forming a self-assembly induction layer including a first region and a second region on a semiconductor substrate. A block copolymer layer is coated on the self-assembly induction layer. A first pattern, a second pattern and a third pattern are formed by phase separating the block copolymer. At least one of the first, second and third patterns may be removed to form a preliminary pattern. An etching process may be performed using the preliminary pattern as an etching mask. The first pattern contains the same material as that of the second pattern, and the third pattern contains a material different from that of the first pattern. | 04-07-2011 |
20110312183 | Method of Fine Patterning Semiconductor Device - For patterning during integrated circuit fabrication, a first pattern of first masking structures is formed, and a buffer layer is formed on exposed surfaces of the first masking structures. Also, a second pattern of second masking structures is formed in recesses between the buffer layer at sidewalls of the first masking structures. Furthermore, the first and masking structures are formed from spin-coating respective high carbon containing materials. Such first and second masking structures pattern a target layer with higher pitch than possible with traditional photolithography. | 12-22-2011 |
20120015527 | Method of Fine Patterning Semiconductor Device - For patterning during integrated circuit fabrication, an image layer is activated for forming a respective first type polymer block at each of two nearest activated areas. A layer of block copolymer is formed on the image layer, and a plurality of the first type polymer blocks and a plurality of second and third types of polymer blocks are formed on an area of the image layer between outer edges of the two nearest activated areas, from the block copolymer. At least one of the first, second, and third types of polymer blocks are removed to form a variety of mask structures. | 01-19-2012 |
Patent application number | Description | Published |
20130238752 | APPARATUS AND METHOD FOR MANAGING CONTENT FOR CLOUD COMPUTING - A cloud service system includes at least one user device, a plurality of clouds for providing different cloud services, and a gateway connected between the user device and the clouds. The gateway selects at least one of the clouds according to predefined Service Level Agreement (SLA) information, and stores content provided from the user device to the selected cloud. | 09-12-2013 |
20130246616 | APPARATUS AND METHOD FOR DETERMINING SOURCE DEVICE IN CONTENTS SHARING SYSTEM - A method for determining a source and a transmission path to provide content includes receiving a message comprising at least one of channel information of a link between a request device which requests content download and a central management device, available resource amount information of a candidate device, channel information of a link between the candidate device and the central management device, and channel information of a link between the request device and one candidate device. The method also includes determining a source device and the transmission path for providing the content to the request device using an available resource amount of the candidate device, a data rate of the link between the request device and the central management device, a data rate of the link between the request device and the candidate device, and a data rate of the link between the candidate device and the central management device. | 09-19-2013 |
20130247223 | APPARATUS AND METHOD FOR ENSURING PRIVACY IN CONTENTS SHARING SYSTEM - A privacy protection policy is present in a content sharing system. A method for managing contents in a content sharing system includes receiving a content download request from a first account through a first device; and determining whether to carry out the download by considering at least one of a sharing range of a download-requested content, a content access right of the first account, a content access right of an owner account of the first device, a sharing range of a download folder, and sharing acceptance or rejection of an owner of the content. | 09-19-2013 |
Patent application number | Description | Published |
20130093247 | Apparatus and method for modulating supply for a power amplifier - An apparatus and method for improving the efficiency of a power supply modulator for modulating a supply voltage of a power amplifier are provided. The apparatus for generating a supply voltage includes a Switching Mode Power Supplier (SMPS) module for generating a current of a power supply signal, and a linear regulator for generating a source current for supplementing an insufficient amount of the current generated by the SMPS module and a sink current for eliminating an excessive amount of the current generated by the SMPS module. The SMPS module generates the current of the power supply signal by selecting at least one of a plurality of power supplies that have different voltages according to a voltage level of an input signal of the SMPS module. | 04-18-2013 |
20130093521 | APPARATUS AND METHOD FOR INTERLEAVING SWITCHING IN POWER AMPLIFIER - An apparatus of a hybrid power modulator using interleaving switching is provided. The apparatus includes a linear switching unit for generating an output signal by comparing an envelope input signal and a feedback signal, an interleaving signal generator for generating an interleaving switching signal arranged not to supply the signal to input stages of P-type Metal-Oxide-Semiconductor (MOS) Field Effect Transistors (FETs) and N-type MOS FETs of power cells at the same time by comparing the output signal and a reference signal, and a switching amplifying unit for determining a level of the switching signal using the interleaving switching signal. Hence, the hybrid power modulator using the interleaving switching method in the envelope signal of the wide bandwidth maintains high efficiency and high linearity. In addition, the buck converter can use the single inductor by preventing the simultaneous on/off of the power cells. | 04-18-2013 |
20130094553 | APPARATUS AND METHOD FOR CALIBRATION OF SUPPLY MODULATION IN TRANSMITTER - A transmit apparatus having a supply modulator is provided. The apparatus includes a detector and the supply modulator. In the method, the detector detects an output signal of the supply modulator. Also, the supply modulator receives the detected output signal of the supply modulator from the detector and calibrates a modulation characteristic of the supply modulator. The transmit apparatus having a supply modulator includes a modulator/demodulator (modem) and the supply modulator. The modem provides a calibration signal for calibrating a modulation characteristic of the supply modulator, to the supply modulator. The supply modulator outputs a modulated signal in accordance with the calibrated modulation characteristic of the supply modulator based on the calibration signal from the modem. | 04-18-2013 |
Patent application number | Description | Published |
20150119343 | Production of TSG-6 Protein - A method of producing a protein or polypeptide, such as, for example, TSG-6 protein, or a biologically active fragment, derivative or analogue thereof, by introducing into mammalian cells a polynucleotide encoding the biologically active protein or polypeptide or biologically active fragment, derivative, or analogue thereof. The cells then are suspended in a protein-free medium that includes at least one agent that suppresses production of hyaluronic acid, hyaluronan, or a salt thereof by the cells. The cells are cultured for a time sufficient to express the biologically active protein or polypeptide or biologically active fragment, derivative or analogue thereof. The biologically active protein or polypeptide, or fragment, derivative, or analogue thereof then is recovered from the cells, such as, for example, by recovering the protein or polypeptide secreted by the cells from the cell culture medium. | 04-30-2015 |
20150265675 | Treatment of Brain Injury or Trauma with TSG-6 Protein - A method of treating brain injury or brain trauma in an animal by administering to an animal TSG-6 protein or a biologically active fragment, derivative, or analogue thereof. | 09-24-2015 |
20160075750 | Production of TSG-6 Protein - A method of producing a protein or polypeptide, such as, for example, TSG-6 protein, or a biologically active fragment, derivative or analogue thereof, by introducing into mammalian cells a polynucleotide encoding the biologically active protein or polypeptide or biologically active fragment, derivative, or analogue thereof. The cells then are suspended in a protein-free medium that includes at least one agent that suppresses production of hyaluronic acid, hyaluronan, or a salt thereof by the cells. The cells are cultured for a time sufficient to express the biologically active protein or polypeptide or biologically active fragment, derivative or analogue thereof. The biologically active protein or polypeptide, or fragment, derivative, or analogue thereof then is recovered from the cells, such as, for example, by recovering the protein or polypeptide secreted by the cells from the cell culture medium. | 03-17-2016 |