Dae Hyeon
Dae Hyeon Kim, Daejeon KR
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20130264222 | MONITORING METHOD AND SYSTEM OF METAL IONS OR OXYGEN IONS APPLICABLE TO HIGH CONCENTRATION NON-AQUEOUS ELECTROLYTE - A monitoring method of metal ions or oxygen ions applicable to a high concentration non-aqueous electrolyte includes: applying a potential in a non-aqueous electrolyte to obtain current information with respect to the potential; varying the potential applied in the non-aqueous electrolyte containing metal ion concentration or oxygen ion concentration such that the metal ion concentration or the oxygen ion concentration is maintained in spite of the potential being applied; detecting a linear relationship among the concentration, the current, and passed charges in the non-aqueous electrolyte by repeatedly performing the obtaining step and the varying step, while changing the concentration; and calculating metal ion concentration or oxygen ion concentration of the non-aqueous electrolyte in pyroprocessing of the non-aqueous electrolyte by using the linear relationship. Concentration and components of a solute existing in a non-aqueous electrolyte can be measured while an electrowinning process and pyroprocessing is being conducted. | 10-10-2013 |
20150050816 | METHOD OF ELECTROCHEMICALLY PREPARING SILICON FILM - A method of preparing a silicon thin film, silicon thin film prepared using the method, and an electronic device including the silicon thin film are provided. The method includes applying an oxidized silicon element solution to a substrate and sintering the silicon oxide film to prepare a compact silicon oxide thin film, electrochemically reducing the silicon oxide thin film to form a porous silicon film, and re-sintering the porous silicon film. Therefore, the silicon thin film used in semiconductors, solar cells, secondary batteries and the like can be easily prepared at a low cost with a smaller number of processes than the conventional methods, and thus price competitiveness of products can be enhanced. | 02-19-2015 |
Dae Hyeon Park, Andong-Si KR
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20140168192 | ORGANIC LIGHT EMITTING DISPLAY DEVICE AND METHOD FOR DRIVING THE SAME - Disclosed is an organic light emitting display device and a method for driving the same to prevent luminance variations caused by degradation variations, and to prevent picture quality from being deteriorated by residual images caused by the luminance variations. The device includes a display panel having a plurality of sub-pixels, each sub-pixel having an organic light emitting diode; a memory which stores accumulated data of each sub-pixel therein; and a panel driver which accumulates input data of each sub-pixel every accumulation period, stores the accumulated data in the memory, generates a degradation compensation gain value of each sub-pixel, generates modulated data of each sub-pixel by modulating the input data of each sub-pixel in accordance with the degradation compensation gain value of each sub-pixel, converts the modulated data into the data voltage, and supplies the data voltage to each sub-pixel. | 06-19-2014 |
Dae Hyeon Shin, Seoul KR
Patent application number | Description | Published |
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20100075256 | Onium salt compound, polymer compound comprising the salt compound, chemically amplified resist composition comprising the polymer compound, and method for patterning using the composition - A compound represented by the following formula (1) is provided: | 03-25-2010 |
20100143843 | PHOTOACID GENERATOR, COPOLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND METHOD OF FORMING PATTERN USING THE CHEMICALLY AMPLIFIED RESIST COMPOSITION - Disclosed are a photoacid generator, a copolymer, a chemically amplified resist composition, and a method of forming a pattern using the chemically amplified resist composition. The photoacid is connected with a main chain of the copolymer, whereby the photoacid is equally dispersed within a resist layer, and characteristics of line edge roughness of a resist pattern is improved. | 06-10-2010 |
20120172606 | SULFONIUM COMPOUND, PHOTO-ACID GENERATOR, AND METHOD FOR MANUFACTURING THE SAME - A sulfonium compound represented by formula (1), a photo-acid generator, and a method for producing a sulfonium compound are provided: | 07-05-2012 |
20120251952 | COPOLYMER FOR RESIST COMPRISING NOVEL ACRYL BASED MONOMER AND RESIN COMPOSITION FOR RESIST COMPRISING THE SAME - A resist resin composition includes 100 parts by weight of a copolymer represented by Formula 3 below; 0.5 to 1.5 parts by weight of a photoacid generator and 700 to 1,500 parts by weight of a solvent: | 10-04-2012 |
20130164674 | NOVEL ACRYL MONOMER, POLYMER AND RESIST COMPOSITION COMPRISING SAME - Disclosed are an acrylic monomer having a structure represented by formula (1), a polymer containing a repeating unit derived from the acrylic monomer, and a resist composition prepared by using the polymer, which exhibits excellent adhesiveness, storage stability, and enhanced line width roughness, exhibits excellent resolution in both C/H patterns and L/S patterns, has an excellent process window so that an excellent pattern profile can be obtained regardless of the type of the substrate, and exhibits improved contrast. | 06-27-2013 |