Chan Ha
Chan Ha Hwang, Gyeonggi-Do KR
Patent application number | Description | Published |
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20150041324 | MICROFLUIDIC SENSOR PACKAGE STRUCTURE AND METHOD - In one embodiment, a microfluidic sensor device includes microfluidic sensor mounted on and electrically connected a micro lead frame substrate. The microfluidic sensor is molded to form a package body. The package body includes a molded panel portion and, in some embodiments, a mask portion having one or more open channels, sealed channels, and/or a sealed chamber exposing an active surface of the microfluidic sensor. The molded panel portions and mask portions are configured to allow a material to dynamically or statically contact the microfluidic sensor for analysis. | 02-12-2015 |
Chan Ha Kim, Seoul KR
Patent application number | Description | Published |
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20150026394 | MEMORY SYSTEM AND METHOD OF OPERATING THE SAME - A method of operating a memory system includes the operations of outputting dirty cache lines from a data cache to a volatile memory device as instructions are executed, and outputting from the volatile memory device to a non-volatile memory device as many dirty cache lines as the size of a page of the non-volatile memory. | 01-22-2015 |
Chan Ha Park, Yongin-Si KR
Patent application number | Description | Published |
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20090317979 | METHOD FOR PATTERNING AN ACTIVE REGION IN A SEMICONDUCTOR DEVICE USING A SPACE PATTERNING PROCESS - Disclosed here in is a method for patterning an active region in a semiconductor device using a space patterning process that includes forming a partition pattern having partition pattern elements arranged in a square shape on a semiconductor substrate; forming a spacer on side walls of the partition pattern; removing the partition pattern; separating the spacer into first and second spacer portions to expose a portion of the semiconductor substrate; and etching the exposed portion of the semiconductor substrate to form a trench, wherein portions of the semiconductor substrate overlapped with the first and second spacer portions define an active region. | 12-24-2009 |
20090319970 | Method for Correcting Layout with Pitch Change Section - A method for correcting a layout with a pitch change section may include disposing a pattern layout with the pitch change section having a first pattern and a second pattern at a pitch relatively larger than that of the first pattern, measuring the pitch change from the pattern layout, a step of measuring an aerial image intensity by performing a simulation operation on the area with the pitch change section; modifying the pitch of the layout in the pitch change section based on a threshold intensity value at which the pattern is formed; and processing the layout correction to cause the pitch to exist within the threshold range by comparing the image intensity of the modified layout with the image intensity of the reference area. | 12-24-2009 |
20100330465 | Photomask For Forming A Line-Type Pattern And Method Of Fabricating The Pattern Using The Photomask - Disclosed is a photomask for forming a line-type pattern extending in a first direction, which includes a light transmitting substrate, and a main pattern corresponding to the line-type pattern provided with a plurality of unit patterns slanted relative to the first direction by a predetermined angle and arranged on the light transmitting substrate along the first direction. | 12-30-2010 |