Patent application number | Description | Published |
20120096412 | Method and System for Forming High Accuracy Patterns Using Charged Particle Beam Lithography - A method and system for fracturing or mask data preparation for charged particle beam lithography are disclosed in which accuracy and/or edge slope of a pattern formed on a surface by a set of charged particle beam shots is enhanced by use of partially-overlapping shots. In some embodiments, dosages of the shots may vary with respect to each other before proximity effect correction. Particle beam simulation may be used to calculate the pattern and the edge slope. Enhanced edge slope can improve critical dimension (CD) variation and line-edge roughness (LER) of the pattern produced on the surface. | 04-19-2012 |
20120221980 | METHOD AND SYSTEM FOR DESIGN OF ENHANCED ACCURACY PATTERNS FOR CHARGED PARTICLE BEAM LITHOGRAPHY - A method and system for fracturing or mask data preparation are presented in which overlapping shots are generated to increase dosage in selected portions of a pattern, thus improving the fidelity and/or the critical dimension variation of the transferred pattern. In various embodiments, the improvements may affect the ends of paths or lines, or square or nearly-square patterns. Simulation is used to determine the pattern that will be produced on the surface. | 08-30-2012 |
20120221981 | METHOD AND SYSTEM FOR DESIGN OF ENHANCED EDGE SLOPE PATTERNS FOR CHARGED PARTICLE BEAM LITHOGRAPHY - A method and system for fracturing or mask data preparation are presented in which overlapping shots are generated to increase dosage in selected portions of a pattern, thus improving the fidelity and/or the critical dimension variation of the transferred pattern. In various embodiments, the improvements may affect the ends of paths or lines, or square or nearly-square patterns. Simulation is used to determine the pattern that will be produced on the surface. | 08-30-2012 |
20120278770 | METHOD AND SYSTEM FOR FORMING NON-MANHATTAN PATTERNS USING VARIABLE SHAPED BEAM LITHOGRAPHY - A method and system for fracturing or mask data preparation or proximity effect correction is disclosed in which a series of charged particle beam shots is determined, where the series of shots is capable of forming a continuous non-manhattan track on a surface, such that the non-manhattan track has a line width roughness (LWR) which nearly equals a target LWR. A method and system for fracturing or mask data preparation or proximity effect correction is also disclosed in which at least two series of shots are determined, where each series of shots is capable of forming a continuous non-manhattan track on a surface, and where the space between tracks has space width roughness (SWR) which nearly equals a target SWR. | 11-01-2012 |
20120329289 | Method and System for Forming Patterns with Charged Particle Beam Lithography - In a method for fracturing or mask data preparation or mask process correction for charged particle beam lithography, a plurality of shots are determined that will form a pattern on a surface, where shots are determined so as to reduce sensitivity of the resulting pattern to changes in beam blur (β | 12-27-2012 |
20130252143 | METHOD AND SYSTEM FOR DESIGN OF ENHANCED ACCURACY PATTERNS FOR CHARGED PARTICLE BEAM LITHOGRAPHY - A method and system for fracturing or mask data preparation are presented in which overlapping shots are generated to increase dosage in selected portions of a pattern, thus improving the fidelity and/or the critical dimension variation of the transferred pattern. In various embodiments, the improvements may affect the ends of paths or lines, or square or nearly-square patterns. Simulation is used to determine the pattern that will be produced on the surface. | 09-26-2013 |
20130283217 | METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHY - A method for mask data preparation (MDP) is disclosed, in which a set of shots is determined that will form a pattern on a reticle, where the determination includes calculating the pattern that will be formed on a substrate using an optical lithographic process with a reticle formed using the set of shots. A method for optical proximity correction (OPC) or MDP is also disclosed, in which a preliminary set of charged particle beam shots is generated using a preliminary mask model, and then the shots are modified by calculating both a reticle pattern using a final mask model, and a resulting substrate pattern. A method for OPC is also disclosed, in which an ideal pattern for a photomask is calculated from a desired substrate pattern, where the model used in the calculation includes only optical lithography effects and/or substrate processing effects. | 10-24-2013 |
20130283218 | METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHY - A method for mask data preparation (MDP) is disclosed, in which a set of shots is determined that will form a pattern on a reticle, where the determination includes calculating the pattern that will be formed on a substrate using an optical lithographic process with a reticle formed using the set of shots. A method for optical proximity correction (OPC) or MDP is also disclosed, in which a preliminary set of charged particle beam shots is generated using a preliminary mask model, and then the shots are modified by calculating both a reticle pattern using a final mask model, and a resulting substrate pattern. A method for OPC is also disclosed, in which an ideal pattern for a photomask is calculated from a desired substrate pattern, where the model used in the calculation includes only optical lithography effects and/or substrate processing effects. | 10-24-2013 |
20130283219 | METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHY - A method for mask data preparation (MDP) is disclosed, in which a set of shots is determined that will form a pattern on a reticle, where the determination includes calculating the pattern that will be formed on a substrate using an optical lithographic process with a reticle formed using the set of shots. A method for optical proximity correction (OPC) or MDP is also disclosed, in which a preliminary set of charged particle beam shots is generated using a preliminary mask model, and then the shots are modified by calculating both a reticle pattern using a final mask model, and a resulting substrate pattern. A method for OPC is also disclosed, in which an ideal pattern for a photomask is calculated from a desired substrate pattern, where the model used in the calculation includes only optical lithography effects and/or substrate processing effects. | 10-24-2013 |
20130306884 | Method and System for Forming Non-Manhattan Patterns Using Variable Shaped Beam Lithography - A method and system for fracturing or mask data preparation or proximity effect correction is disclosed in which a series of charged particle beam shots is determined, where the series of shots is capable of forming a continuous non-manhattan track on a surface, such that the non-manhattan track has a line width roughness (LWR) which nearly equals a target LWR. A method and system for fracturing or mask data preparation or proximity effect correction is also disclosed in which at least two series of shots are determined, where each series of shots is capable of forming a continuous non-manhattan track on a surface, and where the space between tracks has space width roughness (SWR) which nearly equals a target SWR. | 11-21-2013 |
20140223393 | Method and System for Forming High Accuracy Patterns Using Charged Particle Beam Lithography - A method and system for optical proximity correction (OPC) is disclosed in which a set of shaped beam shots is determined which, when used in a shaped beam charged particle beam writer, will form a pattern on a reticle, where some of the shots overlap, where the pattern on the reticle is an OPC-corrected version of an input pattern, and where the sensitivity of the pattern on the reticle to manufacturing variation is reduced. A method for fracturing or mask data preparation is also disclosed. | 08-07-2014 |
20150104737 | Method and System for Forming Non-Manhattan Patterns Using Variable Shaped Beam Lithography - A method and system for fracturing or mask data preparation or proximity effect correction is disclosed in which a series of charged particle beam shots is determined, where the series of shots is capable of forming a continuous non-manhattan track on a surface, such that the non-manhattan track has a line width roughness (LWR) which nearly equals a target LWR. A method and system for fracturing or mask data preparation or proximity effect correction is also disclosed in which at least two series of shots are determined, where each series of shots is capable of forming a continuous non-manhattan track on a surface, and where the space between tracks has space width roughness (SWR) which nearly equals a target SWR. | 04-16-2015 |
20150261907 | METHOD AND SYSTEM FOR FORMING PATTERNS WITH CHARGED PARTICLE BEAM LITHOGRAPHY - In a method for fracturing or mask data preparation or mask process correction for charged particle beam lithography, a plurality of shots are determined that will form a pattern on a surface, where shots are determined so as to reduce sensitivity of the resulting pattern to changes in beam blur (β | 09-17-2015 |
20150338737 | Method and System for Design of Enhanced Edge Slope Patterns for Charged Particle Beam Lithography - A method and system for fracturing or mask data preparation are presented in which overlapping shots are generated to increase dosage in selected portions of a pattern, thus improving the fidelity and/or the critical dimension variation of the transferred pattern. In various embodiments, the improvements may affect the ends of paths or lines, or square or nearly-square patterns. Simulation is used to determine the pattern that will be produced on the surface. | 11-26-2015 |
Patent application number | Description | Published |
20090065404 | PROCESS FOR RECLAIMING MULTIPLE DOMAIN FEEDSTOCKS - A process for the separation of a multiple domain solid feedstock such as that derived from ASR, WSR, and/or ESR is disclosed which comprises granulating the feedstock to produce particles each of substantially a single domain, with each type of particle having a different density. The particles are introduced into a suitable aqueous salt solution. Aqueous salt solutions containing cations comprising sodium, calcium and ammonium, and anions comprising nitrate, bromide, and chloride are useful. A dispersion mixer having a high shear and/or turbulent zone is utilized to disperse agglomerated particles and a quiescent hydrogravity tank is utilized to effect binary separation of the mixture of particles into a stream with a higher average specific gravity, and a stream with a lower average specific gravity. A higher degree of product purity can be obtained by subjecting either of the product streams from the first hydrogravity stage to additional stages of hydrogravity separation. Froth flotation may be used to further separate particles of similar specific gravity but different chemical composition. | 03-12-2009 |
20090095660 | NEW APPLICATIONS FOR FROTH FLOTATION PROCESSES - A process is described for the separation of fluorinated plastic particles from a mixture of solid particles of similar specific gravity. The process comprises mixing the particles with water, adding air to create bubbles, and generating two or more product streams, one of which floats and the other which sinks. The floating stream is enriched in fluoropolymer particles. Per pass yield and selectivity of fluorinated plastics are enhanced by the addition of a carboxylic acid to the froth flotation medium. | 04-16-2009 |
20130112727 | PROCESSES FOR RECYCLING CARPET AND PRODUCTS OF SUCH PROCESSES - Methods for the recycling of carpet are disclosed that produce clean face fiber suitable for industrial use. The methods allow the recovery of face fiber material, for example a polyester or a polyamide, from carpets that includes a face fiber material and a backing material, and include the steps of heating the carpet to a temperature lower than the melting point of the face fiber material, but higher than the initial thermal decomposition temperature of the backing material, for a time and at a temperature sufficient to thermally decompose, pyrolyze, or oxidize at least a portion of the backing material, rendering the backing material friable, that is more friable than the untreated backing; and applying mechanical force to the carpet so as to liberate the friable backing material from the face fiber material. | 05-09-2013 |
20150057379 | PROCESSES FOR RECYCLING CARPET AND PRODUCTS OF SUCH PROCESSES - Methods for the recycling of carpet are disclosed that produce clean face fiber suitable for industrial use. The methods allow the recovery of face fiber material, for example a polyester or a polyamide, from carpets that includes a face fiber material and a backing material, and include the steps of heating the carpet to a temperature lower than the melting point of the face fiber material, but higher than the initial thermal decomposition temperature of the backing material, for a time and at a temperature sufficient to thermally decompose, pyrolyze, or oxidize at least a portion of the backing material, rendering the backing material friable, that is more friable than the untreated backing; and applying mechanical force to the carpet so as to liberate the friable backing material from the face fiber material. | 02-26-2015 |
Patent application number | Description | Published |
20110071341 | IMPLANTABLE RESTRICTION SYSTEM WITH RELEASE MECHANISM - An apparatus for regulating the functioning of a patient's organ or duct includes an elongated member having a first end and a second end. A fastener is disposed on the first end of the elongated member. The fastener is configured to engage the second end of the elongated member so that the elongated member forms a loop around the organ or duct. A tension element is disposed for movement within the elongated member. A drive element is associated with and engaging the tension element for causing the tension element to control the tension applied by the elongated member against a patient's body organ or duct. A release mechanism is provided for the tension element. | 03-24-2011 |
20110071557 | SYMMETRICAL DRIVE SYSTEM FOR AN IMPLANTABLE RESTRICTION DEVICE - An apparatus for regulating the functioning of a patient's organ or duct includes an elongated member having a first end and a second end. A fastener is disposed on the first end of the elongated member. The fastener is configured to engage the second end of the elongated member so that the elongated member forms a loop around the organ or duct. A tension element is disposed for movement within the elongated member. A symmetrical drive system including a drive element associated with and engaging the tension element for causing the tension element to control the tension applied by the elongated member against a patient's body organ or duct is further provided. In accordance with an alternate embodiment an apparatus for regulating the functioning of a patient's organ or duct including an elongated member having a first end and a second end. A fastener is disposed on the first end of the elongated member. The fastener is configured to engage the second end of the elongated member so that the elongated member forms a loop around the organ or duct. A tension element is disposed for movement within the elongated member. The tension element is composed of a flexible first member and a flexible second member, wherein the flexible first member is movable relative to the flexible second member. A drive element is associated with and engages the tension element for causing the tension element to control the tension applied by the elongated member against a patient's body organ or duct. | 03-24-2011 |
20110071558 | IMPLANTABLE RESTRICTION SYSTEM TENSION RELEASE MECHANISM - An apparatus for regulating the functioning of a patient's organ or duct includes an elongated member having a first end and a second end. A fastener is disposed on the first end of the elongated member. The fastener is configured to engage the second end of the elongated member so that the elongated member forms a loop around the organ or duct. A tension element is disposed for movement within the elongated member. A drive element is associated with and engages the tension element for causing the tension element to control the tension applied by the elongated member against a patient's body organ or duct. A tension release mechanism is associated with the tension element. | 03-24-2011 |
20120150356 | Flow Rate Accuracy of a Fluidic Delivery System - Improving the accuracy of the flow rate of a valve in a fiuidic delivery device in which a desired flow rate may be achieved by varying the duty cycle of the valve. The flow rate of fluid delivery from the valve over its lifetime is stabilized by minimizing the voltage OPENING time of the valve to account for valve and piezoelectric actuator drift. Also, the valve OPENING time of one or more fiuidic parameters that impact on the flow rate delivery by the valve and differ among fiuidic delivery devices is compensated to optimize the flow rate accuracy. | 06-14-2012 |
20120165794 | Pill Catchers - Devices and related methods are provided for the controlled delivery of a therapeutic to a targeted location within a body. More particularly, methods and devices are provided for controlling the rate of passage of an orally administered pill through a body, as well as for controlling the delivery of a therapeutic within the pill at a specific location within the body. Various types of devices, generally referred to herein as “catchers,” are provided that can actively catch a pill as it passes through a body. The catcher can hold the pill at a specific location within the body until a predetermined event occurs, such as partial or complete administration of a therapeutic within the pill. The catcher can then release the pill upon command and/or upon the occurrence of the predetermined event to allow the pill to pass out of the body. In other embodiments, various types of pills are provided that can actively engage a catcher and remain engaged with the catcher until a predetermined event occurs. | 06-28-2012 |
20120283703 | Flow Rate Accuracy of a Fluidic Delivery System - Improving the accuracy of the flow rate of a valve in a fluidic delivery device in which a desired flow rate may be achieved by varying the duty cycle of the valve. The flow rate of fluid delivery from the valve over its lifetime is stabilized by minimizing the voltage OPENING time of the valve to account for valve and piezoelectric actuator drift. Also, the valve OPENING time of one or more fluidic parameters that impact on the flow rate delivery by the valve and differ among fluidic delivery devices is compensated to optimize the flow rate accuracy. | 11-08-2012 |
20150045850 | DEVICES AND METHODS FOR THE TREATMENT OF METABOLIC DISORDERS - An implantable system for stimulating the release of satiety hormone in a subject comprises a stimulus device ( | 02-12-2015 |