Patent application number | Description | Published |
20080212059 | MICROLITHOGRAPHY ILLUMINATION SYSTEMS, COMPONENTS AND METHODS - The disclosure relates to microlithography systems, such as EUV microlithography illumination systems, as well as related components, systems and methods. | 09-04-2008 |
20100007866 | METHOD FOR PRODUCING FACET MIRRORS AND PROJECTION EXPOSURE APPARATUS - The disclosure relates to methods for producing mirrors, in particular facet mirrors, and projection exposure apparatuses equipped with the mirrors. | 01-14-2010 |
20100231877 | OPTICAL ELEMENT WITH AT LEAST ONE ELECTRICALLY CONDUCTIVE REGION, AND ILLUMINATION SYSTEM WITH THE OPTICAL ELEMENT - An optical element includes first regions which reflect or transmit the light falling on the optical element. The optical element also includes second regions which are in each instance separated by a distance from a first region and which at least partially surround a first region. The second regions are designed to be at least in part electrically conductive and are electrically insulated from the first regions. The optical element includes a carrier element and at least two first regions in the form of mirror facets which are arranged on the carrier element. The second regions are arranged with a separation from the mirror facets on the carrier element and are electrically insulated against the carrier element as well as against the mirror facet. At least one mirror facet is surrounded by an electrically conductive second region. | 09-16-2010 |
20110063598 | ILLUMINATION OPTICS FOR EUV MICROLITHOGRAPHY AND RELATED SYSTEM AND APPARATUS - An illumination optics for EUV microlithography guides an illumination light bundle from a radiation source to an object field with an extension ratio between a longer field dimension and a shorter field dimension, where the ratio is considerably greater than 1. A field facet mirror has a plurality of field facets that set defined illumination conditions in the object field. A following optics downstream of the field facet mirror transmits the illumination light into the object field. The following optics includes a pupil facet mirror with a plurality of pupil facets. The field facets are in each case individually allocated to the pupil facets so that portions of the illumination light bundle impinging upon in each case one of the field facets are guided on to the object field via the associated pupil facet. The field facet mirror not only includes a plurality of basic illumination field facets which provide a basic illumination of the object field via associated basic illumination pupil facets, but also includes a plurality of correction illumination field facets which provide for a correction of the illumination of the object field via associated correction illumination pupil facets. The result is an illumination optics which allows unwanted variations of illumination parameters, for instance an illumination intensity distribution or an illumination angle distribution, to be corrected across the object field. | 03-17-2011 |
20110181850 | ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - An illumination system of a microlithographic projection exposure apparatus includes a primary light source, a system pupil surface and a mirror array. The mirror array is arranged between the primary light source and the system pupil surface. The mirror array includes a plurality of adaptive mirror elements. Each mirror element includes a mirror support and a reflective coating. Each mirror element is configured to direct light produced by the primary light source towards the system pupil surface. The mirror elements can be tiltably mounted with respect to a support structure. The mirror elements include structures having a different coefficient of thermal expansion and being fixedly attached to one another. A temperature control device is configured to variably modify the temperature distribution within the structures to change the shape of the mirror elements. | 07-28-2011 |
20110235015 | ILLUMINATION OPTICS FOR EUV MICROLITHOGRAPHY - An illumination optics for EUV microlithography illuminates an object field with the aid of an EUV used radiation beam. Preset devices preset illumination parameters. An illumination correction device corrects the intensity distribution and/or the angular distribution of the object field illumination. The latter has an optical component to which the used radiation beam is at least partially applied upstream of the object field and which can be driven in a controlled manner. A detector acquires one of the illumination parameters. An evaluation device evaluates the detector data and converts the latter into control signals. At least one actuator displaces the optical component. During exposures, the actuators are controlled with the aid of the detector signals during the period of a projection exposure. A maximum displacement of below 8 μm is ensured for edges of the object field towards an object to be exposed. The result is an illumination optics that is used to ensure conformance with preset illumination parameters even given the most stringent demands upon precision. | 09-29-2011 |
20110255067 | MICROLITHOGRAPHY ILLUMINATION SYSTEMS, COMPONENTS AND METHODS - The disclosure relates to microlithography systems, such as EUV micro-lithography illumination systems, as well as related components, systems and methods. | 10-20-2011 |
20120081663 | Simulator for use in ophthalmological measurements - A simulator to be used in ophthalmological measurements includes a display apparatus and a control device. The control device is adapted to control the display apparatus in such a manner that the display apparatus displays an image that is adapted to simulate the arrangement of a pupillary midpoint relative to a reference structure. | 04-05-2012 |
20120083771 | Apparatus and method for processing material with focused electromagnetic radiation - An apparatus for processing material with focused electromagnetic radiation, comprises: a source emitting electromagnetic radiation, means for directing the radiation onto the material, means for focusing the radiation on or in the material, a unit for generating a pattern in the optical path of the electromagnetic radiation, an at least partially reflective surface in the optical path before the focus of the focused radiation, said pattern being imaged onto said at least partially reflective surface through at least part of said directing means and said focusing means, at least one detector onto which an image of the pattern is reflected by said surface and which generates electrical signals corresponding to said image, said image containing information on the position of the focus, a computer receiving said electrical signals and programmed to process said image so as to generate an electrical signal depending on the focal position, and a divergence adjustment element arranged in said optical path and adapted to receive said electrical signal of the computer so as to change a divergence of the electromagnetic radiation depending on said signal. | 04-05-2012 |
20120274917 | IMAGING OPTICS - An imaging optics is provided for lithographic projection exposure for guiding a bundle of imaging light with a wavelength shorter than 193 nm via a plurality of mirrors for beam-splitter-free imaging of a reflective object in an object field in an object plane into an image field in an image plane. An object field point has a central ray angle which is smaller than 3°. At least one of the mirrors is a near-field mirror. The imaging optics which can allow for high-quality imaging of a reflective object. | 11-01-2012 |
20130100426 | METHOD FOR PRODUCING FACET MIRRORS AND PROJECTION EXPOSURE APPARATUS - The disclosure relates to methods for producing mirrors, in particular facet mirrors, and projection exposure apparatuses equipped with the mirrors. | 04-25-2013 |
20130342811 | APPARATUS FOR MEASURING OPTICAL PROPERTIES OF AN OBJECT - An apparatus for measuring optical properties of an object—such as, in particular, an eye—comprises a wavefront sensor for surveying wavefront aberrations generated by the object and an optical coherence tomograph, so that both wavefront aberrations and structures of the object can be surveyed. For this purpose a broadband laser radiation-source is provided for the OCT. A reference beam is generated with a retroreflector, and a beam-splitter serves as optical component both for the wavefront determination and for the OCT. | 12-26-2013 |
20140307239 | ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS HAVING A TEMPERATURE CONTROL DEVICE - An illumination system of a microlithographic projection exposure apparatus includes a primary light source, a system pupil surface and a mirror array. The mirror array is arranged between the primary light source and the system pupil surface. The mirror array includes a plurality of adaptive mirror elements. Each mirror element includes a mirror support and a reflective coating. Each mirror element is configured to direct light produced by the primary light source towards the system pupil surface. The mirror elements can be tiltably mounted with respect to a support structure. The mirror elements include structures having a different coefficient of thermal expansion and being fixedly attached to one another. A temperature control device is configured to variably modify the temperature distribution within the structures to change the shape of the mirror elements. | 10-16-2014 |
20150036899 | IMAGE PROCESSING METHOD FOR DETERMINING FOCUS DEPTH OF A REFRACTIVE LASER - The present invention relates to a laser apparatus, system, and method for determining a depth of a focus point of a laser beam. An interface device is coupleable to the laser apparatus and has an applanation element comprising a front surface and a back surface. A laser beam having a predefined shape is focussed through the applanation element at a focus point. A superimposed image of a spurious reflection, which is reflected from the front surface of the applanation element, with a standard reflection, which is reflected from the back surface of the applanation element, is detected. The spurious reflection is then filtered out of the superimposed image. Based on the remaining standard reflection, the depth of the focus point of the laser beam can be determined. | 02-05-2015 |