Bayha
Boris Bayha, Dresden DE
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20100327368 | ENHANCING SELECTIVITY DURING FORMATION OF A CHANNEL SEMICONDUCTOR ALLOY BY A WET OXIDATION PROCESS - High-k metal gate electrode structures are formed on the basis of a threshold adjusting semiconductor alloy formed in the channel region of one type of transistor, which may be accomplished on the basis of selective epitaxial growth techniques using an oxide hard mask growth mask. The hard mask may be provided with superior thickness uniformity on the basis of a wet oxidation process. Consequently, this may allow re-working substrates prior to the selective epitaxial growth process, for instance in view of queue time violations, while also providing superior transistor characteristics in the transistors that do not require the threshold adjusting semiconductor alloy. | 12-30-2010 |
20100327373 | UNIFORM HIGH-K METAL GATE STACKS BY ADJUSTING THRESHOLD VOLTAGE FOR SOPHISTICATED TRANSISTORS BY DIFFUSING A METAL SPECIES PRIOR TO GATE PATTERNING - Sophisticated gate electrode structures for N-channel transistors and P-channel transistors are patterned on the basis of substantially the same configuration while, nevertheless, the work function adjustment may be accomplished in an early manufacturing stage. For this purpose, diffusion layer and cap layer materials are removed after incorporating the desired work function metal species into the high-k dielectric material and subsequently a common gate layer stack is deposited and subsequently patterned. | 12-30-2010 |
20130189821 | METHODS FOR FABRICATING SEMICONDUCTOR DEVICES WITH REDUCED DAMAGE TO SHALLOW TRENCH ISOLATION (STI) REGIONS - Methods for fabricating semiconductor devices are provided. In an embodiment, a method of fabricating a semiconductor device on a semiconductor substrate includes selectively implanting dopant ions to form implants in the semiconductor substrate. Trenches are formed in the semiconductor substrate and the trenches are filled with an isolation material. An upper surface of the isolation material is established substantially coplanar with the semiconductor substrate. In the method, the implants and the isolation material are then simultaneously annealed. | 07-25-2013 |
20130288435 | CET AND GATE CURRENT LEAKAGE REDUCTION IN HIGH-K METAL GATE ELECTRODE STRUCTURES BY HEAT TREATMENT AFTER DIFFUSION LAYER REMOVAL - When forming high-k metal gate electrode structures by providing the gate dielectric material in an early manufacturing stage, the heat treatment or anneal process may be applied after incorporating work function metal species and prior to capping the gate dielectric material with a metal-containing electrode material. In this manner, the CET for a given physical thickness for the gate dielectric layer may be significantly reduced. | 10-31-2013 |
20140065808 | METHOD OF FORMING A MATERIAL LAYER IN A SEMICONDUCTOR STRUCTURE - A method comprises depositing a first portion of a first material layer on a semiconductor structure. A first run of a post-treatment process is performed for modifying at least the first portion of the first material layer. After the first run of the post-treatment process, a second portion of the first material layer is deposited. The second portion is formed of substantially the same material as the first portion. After the deposition of the second portion of the first material layer, a second run of the post-treatment process is performed for modifying at least the second portion of the first material layer. | 03-06-2014 |
Heiner Bayha, Vaihingen A. D. E. DE
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20140354997 | OPTICAL MEASURING APPARATUS FOR A VEHICLE, DRIVER ASSISTANCE DEVICE HAVING SUCH A MEASURING APPARATUS, AND VEHICLE HAVING A CORRESPONDING MEASURING APPARATUS - The invention relates to an optical measuring apparatus ( | 12-04-2014 |
Heiner Bayha, Satow DE
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20140029075 | DEFLECTION MIRROR ARRANGEMENT FOR AN OPTICAL MEASUREMENT APPARATUS AND CORRESPONDING OPTICAL MEASUREMENT APPARATUS - The invention relates to a deflection mirror arrangement ( | 01-30-2014 |
20140326859 | OPTICAL MEASURING APPARATUS FOR A VEHICLE, DRIVER ASSISTANCE DEVICE HAVING SUCH A MEASURING APPARATUS, AND VEHICLE HAVING A CORRESPONDING MEASURING APPARATUS - The invention relates to an optical measuring apparatus ( | 11-06-2014 |
Heiner Bayha, Satow Ot Clausdorf DE
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20140320845 | OPTICAL MEASURING DEVICE AND A METHOD FOR PRODUCING A COVER DISC FOR A HOUSING OF AN OPTICAL MEASURING DEVICE - The invention relates to an optical measuring device ( | 10-30-2014 |
20140332676 | OPTICAL MEASURING DEVICE - The invention relates to an optical measuring device ( | 11-13-2014 |
Thomas Bayha, Markgroningen DE
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20090288287 | Workpiece Processing Plant - A workpiece processing plant comprises several machine tools which are arranged in opposite rows. The rows define a free space between each other. A loading and unloading device is provided which comprises a girder above the machine tools and above the free space. Rails are provided on the upper side of the girder. A loading and unloading unit configured as a multiple-axis robot is displaceable along the rails, the loading and unloading unit comprising several arms which are articulated to one another. | 11-26-2009 |
20130152374 | MACHINE TOOL AND METHOD FOR MACHINING A WORKPIECE - A machine tool including a tool spindle, to which a tool can be detachably fixed and by means of which the tool can be rotated, and a workpiece support is provided, the tool spindle and the workpiece support being displaceable relative to one another, characterized in that the tool spindle includes a loading device, which acts on a linearly movable rod of a tool fixed to the tool spindle. The tool spindle includes a motor device coupled to the loading device, which drives linear displacement of the rod. The machine tool includes a set of tools by means of which different machining operations can be conducted on a workpiece, wherein the tools can each be fixed to the tool spindle and the tools each have a rod on which the loading device of the tool spindle acts when a tool is fixed to the tool spindle. | 06-20-2013 |
Thomas Bayha, Markgroeningen DE
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20130147130 | SPINDLE/TOOL COMBINATION FOR A MACHINE TOOL - A spindle/tool combination for a machine tool is provided, including a tool, a spindle, on which the tool can be releasably fixed and by means of which the tool can be rotated, wherein the tool has at least one linearly movable rod and the spindle comprises a loading device, which acts on the at least one linearly movable rod of the tool, and a pull/push coupling device, by means of which the at least one rod of the tool can be coupled to the loading device, the at least one rod being actuable by means of the loading device by pushing and pulling when coupled, wherein the pull/push coupling device comprises a clamping jaw and the clamping jaw is arranged in the tool. | 06-13-2013 |
Thomas D. Bayha, Waxhaw, NC US
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20120076686 | HIGH STRENGTH ALPHA/BETA TITANIUM ALLOY - An alpha/beta titanium alloy comprising, in percent by weight based on total alloy weight: 3.9 to 4.5 aluminum; 2.2 to 3.0 vanadium; 1.2 to 1.8 iron; 0.24 to 0.30 oxygen; up to 0.08 carbon; up to 0.05 nitrogen; up to 0.015 hydrogen ; titanium; and up to a total of 0.30 of other elements. A non-limiting embodiment of the alpha/beta titanium alloy comprises an aluminum equivalent value in the range of 6.4 to 7.2, exhibits a yield strength in the range of 120 ksi (827.4 MPa) to 155 ksi (1,069 MPa), exhibits an ultimate tensile strength in the range of 130 ksi (896.3 MPa) to 165 ksi (1,138 MPa), and exhibits a ductility in the range of 12 to 30 percent elongation. | 03-29-2012 |