Amikura
Manabu Amikura, Nirasaki-Shi JP
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20100224620 | PLANE HEATER - [Problem to be Solved] To provide a plane heater including a carbon wire heating element which has an arrangement pattern allowing a heating surface to be a substantially uniform heating temperature plane. | 09-09-2010 |
20110283942 | FILM FORMING APPARATUS AND GAS INJECTION MEMBER - A film forming apparatus includes: a chamber for holding a wafer; a susceptor on which the wafer is placed within the chamber; heaters which heat the wafer placed on the susceptor; and a shower plate disposed opposite to the susceptor to inject a film formation processing gas toward the wafer, a main body of the shower plate being made of aluminum or an aluminum alloy. With the apparatus, a film is deposited on the surface of the wafer, the film having a low thermal expansion coefficient, measured at the film deposition temperature, lower by at least about 5×10 | 11-24-2011 |
Manabu Amikura, Nirasaki City JP
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20140130743 | FILM FORMING APPARATUS - A film forming apparatus that includes a mounting table for loading a wafer, a encompassing member surrounding the mounting table and dividing an inside of a process container, an exhaust part that vacuum exhausts the process container, a clamp ring loaded upon an upper space of the encompassing member and lifted from the upper space of the encompassing member while contacting an inner circumference part thereof with an outer circumference of the wafer loaded on the mounting table, and a cylindrical wall extended downward from the clamp ring, formed along a circumference of the clamp ring into a cylinder shape, and positioned between an outer circumference surface of the mounting table and an inner circumference surface of the encompassing member. | 05-15-2014 |
Masaaki Amikura, Kamiina JP
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20080269614 | CAPACITIVE MICROMACHINED ULTRASONIC TRANSDUCER (cMUT) DEVICE AND METHOD OF CONTROLLING THE SAME - A capacitive micromachined ultrasonic transducer (cMUT) device, comprising: a cMUT formed on a semiconductor substrate; a DC high-voltage generation unit that is provided on the semiconductor substrate and that is for generating a DC high-voltage signal to be superposed on a driving signal for the cMUT; a driving signal generation unit that is provided on the semiconductor substrate and that is for generating the driving signal; and a superposition unit that is provided on the semiconductor substrate and that is for branching the DC high-voltage signal output from the DC high-voltage generation unit and for superposing one of the branched DC high-voltage signals on the other of the branched DC high-voltage signals via the driving signal generation unit. | 10-30-2008 |
Norihiko Amikura, Kurokawa-Gun JP
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20120230757 | BOLT-LOCKING APPARATUS, MOUNTING METHOD THEREOF AND MOUNTING JIG - A bolt-locking apparatus includes a plurality of fitting members | 09-13-2012 |
20150206713 | PLASMA PROCESSING APPARATUS - Processing gases respectively supplied from multiple gas supply lines into a processing vessel can be switched at a high speed in a uniform manner. A plasma processing apparatus includes the processing vessel configured to perform therein a plasma process to a target substrate; and a gas inlet member including first gas discharge holes and second gas discharge holes which are alternately arranged to be adjacent to each other and respectively communicate with a first gas supply line and a second gas supply line, which are switchable. Further, the first gas discharge holes and the second gas discharge holes independently and respectively introduce a first processing gas and a second processing gas, which are respectively supplied from the first gas supply line and the second gas supply line and used in the plasma process, into the processing vessel. | 07-23-2015 |
20150233412 | BOLT-LOCKING APPARATUS, MOUNTING METHOD THEREOF AND MOUNTING JIG - A bolt-locking apparatus includes a plurality of fitting members | 08-20-2015 |
Norihiko Amikura, Miyagi JP
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20120305188 | PLASMA PROCESSING APPARATUS AND GAS SUPPLY METHOD THEREFOR - It is possible to prevent processing gases from being mixed when alternately supplying the processing gases while alternately switching the processing gases and to suppressed a transient phenomenon more efficiently as compared to conventional cases. When supplying at least two kinds of processing gases (e.g., a C | 12-06-2012 |
20140203702 | PLASMA PROCESSING APPARATUS - Disclosed is a plasma processing apparatus including a mounting table within a processing container. The mounting table includes a lower electrode. A shower head constituting an upper electrode is provided above the mounting table. A gas inlet tube is provided above the shower head. The shower head includes a plurality of downwardly opened gas ejection holes, and first and second separate gas diffusion chambers on the gas ejection holes. The first gas diffusion chamber extends along a central axis that passes through a center of the mounting table. The second gas diffusion chamber extends circumferentially around the first gas diffusion chamber. The gas inlet tube includes a cylindrical first tube wall and a cylindrical second tube wall provided outside the first tube wall, and defines a first gas inlet path inside the first tube wall, and a second gas inlet path between the first and second tube walls. | 07-24-2014 |
20150330631 | METHOD FOR PREVENTING EXPLOSION OF EXHAUST GAS IN DECOMPRESSION PROCESSING APPARATUS - Disclosed is a plasma processing apparatus in which a main control unit is capable of managing the processing situation of an exhaust gas in an exhaust gas processing unit through a dilution controller. The exhaust gas processing unit includes a detoxifying device connected to the outlet of a vacuum pump through an exhaust pipe, a dilution gas source connected to the exhaust pipe near the outlet of the vacuum pump through a dilution gas supply pipe, an MFC and an opening/closing valve installed at the middle of the dilution gas supply pipe, a gas sensor attached to the exhaust pipe on the downstream side of an end (node N) of the dilution gas supply pipe, and a dilution controller configured to control the MFC. | 11-19-2015 |
Norihiko Amikura, Tokyo JP
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20120247673 | ELECTRODE HAVING GAS DISCHARGE FUNCTION AND PLASMA PROCESSING APPARATUS - An electrode having a gas discharge function, where the degree of freedom related to a maximum gas flow rate is abundant, an electrode cover member may be thinned, and a change of a gas behavior according to time is difficult to be generated in a processing chamber during gas introduction. The electrode includes: a base material having a plurality of gas holes; and an electrode cover member having a plurality of gas holes respectively corresponding to the plurality of gas holes of the base material in a one-to-one manner, fixed to the base material, and disposed facing a processing space in which the object is plasma-processed, wherein a gas hole diameter of the electrode cover member is larger than a gas hole diameter of the base material. | 10-04-2012 |
Norihiko Amikura, Nirasaki-Shi JP
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20080286491 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - A substrate processing method capable of controlling the internal pressure of a processing chamber to a high pressure and exhausting gases within the processing chamber at a high rate. The substrate processing method is for use in a substrate processing apparatus having a processing chamber, a supply unit supplying a processing gas into the processing chamber, a first pipe connected to the processing chamber at one end thereof, a turbo molecular pump disposed in the first pipe, a first shutoff valve disposed between the processing chamber and the turbo molecular pump in the first pipe, a second pipe connected to the processing chamber at one end thereof, a pressure control valve disposed in the second pipe, and a dry pump connected to the other end of the first pipe and to the other end of the second pipe. The substrate processing method comprises a pressure control step of controlling the internal pressure of the processing chamber using the pressure control valve after closing the first shutoff valve when performing a treatment on a substrate housed in the processing chamber; a first exhaust step of exhausting gases within the processing chamber through the second pipe using the dry pump by opening the pressure control valve after performing the treatment on the substrate; and a second exhaust step of exhausting gases within the processing chamber through the first pipe using the turbo molecular pump by closing the pressure control valve and opening the first shutoff valve after the first exhaust step. | 11-20-2008 |
Norihiko Amikura, Nirasaki City JP
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20120031266 | EXHAUSTING METHOD AND GAS PROCESSING APPARATUS - An exhausting method includes determining an exhaust flow rate of a process gas to be a predetermined value that is less than or equal to a gas flow rate corresponding to a maximum process capability of a purification system when the process gas is diluted to a lower explosive limit; calculating a pressure drop amount per unit time to maintain the determined exhaust flow rate of the process gas, based on a relation between the exhaust flow rate and the pressure drop amount per unit time; and evacuating an inside of the chamber to maintain the determined exhaust flow rate, while controlling the pressure through an automatic pressure control valve by setting a target pressure value to be updated as a control value of the automatic pressure control valve at every predetermined time interval so as to achieve a calculated pressure drop amount per unit time. | 02-09-2012 |
Norihiko Amikura US
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20150233412 | BOLT-LOCKING APPARATUS, MOUNTING METHOD THEREOF AND MOUNTING JIG - A bolt-locking apparatus includes a plurality of fitting members | 08-20-2015 |
Ryo Amikura, Setagaya JP
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20160070375 | String-Attached Input And Portable Electronic Device - A string-attached input pen including an input pen for a portable electronic device, and a string structural body, in which the string structural body has a first string section and a second string section, the first string section has a string-like member whose one end is coupled to the input pen and a ring member attached to the other end of the string-like member, and the second string section includes an annular belt, and the ring member is loosely inserted into the annular belt. | 03-10-2016 |
Tomoya Amikura, Tokyo JP
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20140201759 | INFORMATION PROCESSING SYSTEM, INFORMATION PROCESSING APPARATUS, AND PROCESS EXECUTION METHOD - An information processing system includes a managing unit that sorts a process execution request based on a type of process of the process execution request; a storing unit that stores the sorted process execution request according to the type of process of the process execution request; and a plurality of executing units that are configured to execute a process corresponding to the process execution request stored in the storing unit. At least one executing unit of the plurality of executing units is configured to split the process corresponding to the process execution request stored in the storing unit into a plurality of processes to be executed by at least two other executing units of the plurality of executing units and store in the storing unit a split process execution request including the split processes for prompting the other executing units to cooperatively execute the split processes. | 07-17-2014 |
20140223004 | NETWORK SYSTEM AND INFORMATION REPORTING METHOD - A network system including one or more information processing devices includes plural information processing program executing units to execute different processes, and an execution control unit to cause, when receiving via a predefined interface, designation of one or more of the different processes and a reporting destination of a completion report indicating that the different processes have been executed from an application installed on an external device connected to the network system via a network, the information processing program executing units to execute the different processes based on the designation, and to transmit to the reporting destination, when the different processes executed by the information processing program executing units have been completed, a completion report indicating that the different processes have been completed. | 08-07-2014 |
20140223150 | INFORMATION PROCESSING APPARATUS, INFORMATION PROCESSING SYSTEM, AND STOP METHOD - An information processing apparatus includes a first preservation unit configured to preserve execution request information for information processing; an execution unit configured to execute one or more types of the information processing; an execution control unit configured to have the execution unit being capable of executing one of the types of the information processing execute the information processing of the execution request information preserved by the first preservation unit; and a second preservation unit configured to preserve a stop command of the execution unit. If the execution unit does not execute the information processing, the execution control unit checks the second preservation unit if the second preservation unit preserves the stop command to have the execution unit execute a stop procedure. | 08-07-2014 |
20150156340 | INFORMATION PROCESSING SYSTEM, INFORMATION PROCESSING APPARATUS, AND PROGRAM - An information processing system including at least one information processing apparatus includes a holding unit holding a processing request waiting for a processing; processing units monitoring the holding unit, acquiring the processing request and performing the processing corresponding to the processing request; and a memory unit storing information of a state of the processing request, wherein each processing unit includes a state acquiring unit acquiring information indicative of the state of the acquired processing request from the memory unit, and a state controlling unit checking the information indicative of the state of the acquired processing request, and controlling whether the processing corresponding to the acquired processing request is preformed based on a result of checking the information indicative of the state of the acquired processing request. | 06-04-2015 |
Toshiya Amikura, Kanagawa JP
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20120067444 | LEVELING VALVE - A contracted portion having an axial length is formed in the spool hole and a large diameter portion having an axial length is formed in the spool within the spool such that an annular gap is formed there-between. A valve body closes an opening portion of the spool hole. When the valve body is lifted, one of an air pressure source and a drain is connected to an air spring passage via the annular gap. When the spool retreats from the valve body, the other of the air pressure source and the drain is connected to the air spring passage via the annular gap. By setting the lengths at different values, different flow rate characteristics are realized when supplying compressed air to an air spring and discharging air from the air spring. | 03-22-2012 |