Alexy
George Newman Alexy, San Jose, CA US
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20140097241 | Payment Card Storage Apparatus and Tab Management System - A system for managing bar or restaurant tabs includes a payment card storage apparatus, such as a carousel, to receive and store payment cards under computer control, and a payment card reader to read identifying information from the payment cards that are to be stored in the payment card storage apparatus. The system permits a server to conveniently receive and store a payment card to secure a patron's tab, and then return it to the patron at the time the tab is closed and paid out. An associated point-of-sale system displays tab information and a list of names of those patrons having open tabs. A particular patron's card can be returned from the payment card storage apparatus by selecting the patron's tab from the list. The system may further be applied in any situation in which a debt or obligation can be secured by the possession of a personally-identifiable token that has, holds or permits access to value. | 04-10-2014 |
John Alexy, West Linn, OR US
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20110236594 | In-Situ Deposition of Film Stacks - Methods and hardware for depositing film stacks in a process tool in-situ (i.e., without a vacuum break or air exposure) are described. In one example, a method for depositing, on a substrate, a film stack including films of different compositions in-situ in a process station using a plasma is described, the method including, in a first plasma-activated film deposition phase, depositing a first layer of film having a first film composition on the substrate; in a second plasma-activated deposition phase, depositing a second layer of film having a second film composition on the first layer of film; and sustaining the plasma while transitioning a composition of the plasma from the first plasma-activated film deposition phase to the second plasma-activated film deposition phase. | 09-29-2011 |
20130171834 | IN-SITU DEPOSITION OF FILM STACKS - Disclosed herein are methods of forming a film stack which may include the plasma accelerated deposition of a silicon nitride film formed from the reaction of nitrogen containing precursor with silicon containing precursor, the plasma accelerated substantial elimination of silicon containing precursor from the processing chamber, the plasma accelerated deposition of a silicon oxide film atop the silicon nitride film formed from the reaction of silicon containing precursor with oxidant, and the plasma accelerated substantial elimination of oxidant from the processing chamber. Also disclosed herein are process station apparatuses for forming a film stack of silicon nitride and silicon oxide films which may include a processing chamber, one or more gas delivery lines, one or more RF generators, and a system controller having machine-readable media with instructions for operating the one or more gas delivery lines, and the one or more RF generators. | 07-04-2013 |
John B. Alexy, West Linn, OR US
Patent application number | Description | Published |
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20150013607 | IN-SITU DEPOSITION OF FILM STACKS - An apparatus for depositing film stacks in-situ (i.e., without a vacuum break or air exposure) are described. In one example, a plasma-enhanced chemical vapor deposition apparatus configured to deposit a plurality of film layers on a substrate without exposing the substrate to a vacuum break between film deposition phases, is provided. The apparatus includes a process chamber, a plasma source and a controller configured to control the plasma source to generate reactant radicals using a particular reactant gas mixture during the particular deposition phase, and sustain the plasma during a transition from the particular reactant gas mixture supplied during the particular deposition phase to a different reactant gas mixture supplied during a different deposition phase. | 01-15-2015 |