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51st week of 2008 patent applcation highlights part 24
Patent application numberTitlePublished
20080309853Wide Viewing Angle Transflective Liquid Crystal Displays - Apparatus, methods and systems for a transmissive liquid crystal display including a plurality of pixel circuits, each pixel circuit including a reflective region and a transmissive region. The reflective region includes a polarization dependent reflector for reflecting ambient light. The reflective and transmissive regions include an initially homogeneously aligned liquid crystal layer sandwiched between a first and a second substrate. Each pixel further includes at lease one first transparent electrode as the common electrode and at least one second transparent electrode as the pixel electrode both formed on one of the same first and second substrates, wherein substantial fringe fields with rich horizontal electric fields are generated in the liquid crystal layer when voltage is applied to the pixel electrode, making the liquid crystal molecules rotate mainly in the horizontal direction to achieve wide viewing angle.2008-12-18
20080309854Wide Viewing Angle and Broadband Circular Polarizers for Transflective Liquid Crystal Displays - Apparatus, devices, systems, and methods for wide viewing angle and broadband circular polarizers in transflective displays. A liquid crystal display configuration can include two stacked circular polarizers, each having a linear polarizer, a half-wave plate and a quarter-wave plate wherein two linear polarizers are crossed to each other, two half-wave plates are made of uniaxial A plates with opposite optical birefringence (one positive and one negative type), and two quarter-wave plates are made of uniaxial A plates with opposite optical birefringence (one positive and one negative type). The configurations can generate wide viewing angles and broadband properties and are suitable for display applications that require circular polarizers.2008-12-18
20080309855Liquid crystal display device having optical component for changing state of polarized light - An optical component capable of changing polarization light state and a liquid crystal display (LCD) device using the same are provided. The optical component including a transparent substrate and a wavelength compensator is disposed at any position from the outer side of the LCD device to the outside in an output direction of an output light. The wavelength compensator is directly attached to the surface of the substrate to convert an output light of the LCD device from a linearly polarized light into a circularly polarized light or an elliptically polarized light, thereby effectively reducing eye fatigue. The LCD device is provided with such an optical component such that a linearly polarized light emerging from the LCD device is converted into a circularly polarized light or an elliptically polarized light to lessen the eye fatigue.2008-12-18
20080309856Polarized Light Source - An energy efficient polarized light source system is disclosed. In one embodiment, the system comprises a reflector and a reflecting polarizer. A transparent light source and a wave retarder are placed in between the reflector and reflecting polarizer.2008-12-18
20080309857METHOD OF ADJUSTING PHOTONIC BANDGAP OF PHOTONIC CRYSTAL, METHOD OF MANUFACTURING REFLECTIVE COLOR FILTER USING THE SAME, AND DISPLAY DEVICE INCLUDING THE REFLECTIVE COLOR FILTER - Provided are a method of adjusting a photonic bandgap of a photonic crystal, a method of manufacturing a reflective color filter using the same, and a display device including the reflective color filter. The method of adjusting a photonic bandgap of a photonic crystal includes forming the photonic crystal having a photonic bandgap on a substrate, and changing the photonic bandgap by irradiating light onto the photonic crystal. In addition, the display device includes a backlight, a transflective liquid crystal panel including liquid crystal cells sealed between first and second substrates. Each liquid crystal cell corresponding to a pixel includes a transmissive area and a reflective area. A transmissive color filter is formed on the first substrate, which faces the backlight, and a reflective color filter is formed on each reflective area.2008-12-18
20080309858LIQUID CRYSTAL DISPLAY DEVICE - To reduce an oblique luminance disturbance and color deterioration in a liquid crystal display device of the IPS mode.2008-12-18
20080309859COLOR FILTER SUBSTRATE, METHOD OF MAKING THE COLOR FILTER SUBSTRATE AND DISPLAY DEVICE INCLUDING THE COLOR FILTER SUBSTRATE - A color filter substrate includes: a base substrate; a light-shield layer and a color filter layer provided on the base substrate; a plurality of columnar spacers, which are made of a resin and provided so as to stick out of the base substrate; and an undercoat layer, which is provided between the columnar spacers and the base substrate. The color filter layer includes a first type of color filter, a second type of color filter and a third type of color filter, which transmit light rays in mutually different colors. The undercoat layer is made of the same film as one of the first, second and third types of color filters and the light-shield layer. A portion of the undercoat layer, associated with a first one of the columnar spacers, has a different area and/or shape from another portion of the undercoat layer, associated with a second one of the columnar spacers. The first and second columnar spacers have mutually different heights.2008-12-18
20080309860Optical Film, Optical Compensation Film, Polarizing Plate, Liquid Crystal Display Unit and Self Luminous Display Unit - An optical film which has Re(λ) and Rth(λ) fulfilling the following two formulae:2008-12-18
20080309861LIQUID CRYSTAL DEVICE AND ELECTRONIC APPARATUS - A liquid crystal device including a pair of substrates; 2008-12-18
20080309862ALIGNMENT TREATMENT OF LIQUID CRYSTAL DISPLAY DEVICE - The liquid crystal display device comprising a pair of substrates with alignment layers formed thereon, and a liquid crystal filled between the substrates. Each pixel has pixel display portions CA, CB and non-display portions DA, EA, DB, EB. The pixel display portions are treated for realizing alignment in a different manner from the non-display portions and the alignment of the pixel display portions is controlled by the alignment of the non-display portions. Moreover, the alignment treatment is executed by the irradiation with ultraviolet rays in an inclined direction.2008-12-18
20080309863ALIGNMENT TREATMENT OF LIQUID CRYSTAL DISPLAY DEVICE - The liquid crystal display device comprising a pair of substrates with alignment layers formed thereon, and a liquid crystal filled between the substrates. Each pixel has pixel display portions CA, CB and non-display portions DA, EA, DB, EB. The pixel display portions are treated for realizing alignment in a different manner from the non-display portions and the alignment of the pixel display portions is controlled by the alignment of the non-display portions. Moreover, the alignment treatment is executed by the irradiation with ultraviolet rays in an inclined direction.2008-12-18
20080309864LIQUID CRYSTAL COMPOSITION AND LIQUID CRYSTAL DISPLAY DEVICE HAVING THE SAME - A liquid crystal composition includes a biaxial liquid crystal molecule and has improved response speed.2008-12-18
20080309865Liquid crystal display device - In a liquid crystal display panel, a liquid crystal layer is sandwiched between a TFT substrate and a color filter substrate. An ITO film is formed on a front surface of the color filter substrate. By supplying an electric current to the ITO film at the time of staring an operation of the liquid crystal display panel, a temperature of the liquid crystal layer is elevated to a level which allows the liquid crystal layer to perform a normal operation within a short time. By forming a plating electrode on two sides of the color filter substrate, it is possible to uniformly supply an electric current to the ITO film thus enabling uniform heating of the color filter substrate.2008-12-18
20080309866Display Panel with Photo-Curable Sealant and Manufacture Method Thereof - A display panel and a manufacture method thereof are provided. The display panel includes a first substrate, a second substrate, and a sealant. The first substrate has a top surface which includes a signal transmission module parallel to an edge of the top surface. The sealant is disposed on the top surface and parallel to the signal transmission module, which is disposed between the top surface and sealant. The sealant is made of a photo-curable material and includes an inner isolation wall, which is exposed via the signal transmission module. The second substrate is disposed on the sealant and includes an inner surface. A light-shielding structure is disposed on the inner surface and close to an edge of the inner surface. The sealant at least partially overlaps the light-shielding structure.2008-12-18
20080309867PROCESS FOR FABRICATING A FLEXIBLE ELECTRONIC DEVICE OF THE SCREEN TYPE, INCLUDING A PLURALITY OF THIN-FILM COMPONENTS - In the fabrication of a thin-film flexible electronic device of the screen type that includes a plurality of thin-film components on a glass support a starting support is prepared, including a rigid bulk substrate and a glass sheet fastened to the rigid bulk substrate by reversible direct bonding so as to obtain a removable interface. The plurality of thin-film components are fabricated on the glass sheet. The glass sheet is separated from the rigid bulk substrate by disassembling the interface and, the glass sheet and the plurality of thin-film components are transferred to a final support.2008-12-18
20080309868Customized glasses - A pair of glasses where a film is attached to the lens or lenses. On the film artwork is printed.2008-12-18
20080309869Ear-propped device with an elastic band - An ear-propped device includes two ear-hung parts, and an elastic band; each ear-propped part includes a hooking portion, which is made to have a curvature according to a curvature of a joint between a person's ear and head; each ear-propped part has a connecting portion to be joined to a corresponding temple of a pair of eyeglasses; the ear-propped parts are formed on two ends of the elastic band; in use, the ear-propped parts are joined to rear ends of temples of a pair of eyeglasses respectively, with the hooking portions thereof being hooked over hinder portions of the ears of a person wearing the eyeglasses, such that the eyeglasses and the elastic band together form a loop, and are tight around the wearer's head; thus, the eyeglasses are firm and prevented from falling off.2008-12-18
20080309870PUPILOMETER FOR PUPIL CENTER DRIFT AND PUPIL SIZE MEASUREMENTS AT DIFFERING VIEWING DISTANCES - The present invention generally provides improved devices, systems, and methods for measuring characteristics of at least one eye, and particularly for measuring the physiological changes in eyes under different viewing conditions. An exemplary embodiment provides a pupilometer which measures any changes in location of a pupil center with changes in viewing distances. As the eye often moves significantly during viewing, the pupil center location will often be measured relative to a convenient reference of the eye such as an outer iris boundary. Pupil size may also be recorded, and the measurements from both eyes of a patient may be taken simultaneously. Exemplary embodiments may be configured so as to allow the vergence angle between the eyes to vary with differing viewing distances, regardless of whether one or both eyes are being measured.2008-12-18
20080309871RESIDUAL ACCOMMODATION THRESHOLD FOR CORRECTION OF PRESBYOPIA AND OTHER PRESBYOPIA CORRECTION USING PATIENT DATA - Methods, devices, and systems establish an optical surface shape that mitigates or treats presbyopia in a particular patient. The combination of distance vision and near vision in a patient can be improved, often based on input patient parameters such as pupil size, residual accommodation, and power need. Iterative optimization may generate a customized corrective optical shape for the patient. Threshold residual accommodation is established for presbyopia treatment.2008-12-18
20080309872Ophthalmologic Instrument - The present invention provides an opthalmologic apparatus that can noninvasively measure the state of the lacrimal layer formed on the cornea surface and that can quantitatively measure the state of the lacrimal layer without utilizing a reflection image from the retina.2008-12-18
20080309873Method and System for Correcting Aberrations of the Eye for an Ophthalmic Instrument - A method for correcting aberrations of the eye applied to an ophthalmic instrument operating with an analysis light beam, including: measurement of aberrations of the eye capable of interfering with the analysis beam, correction of the phase of the wave front of the analysis beam as a function of the measured values of the aberrations, measurement of eye movements carried out independently of the measurement of aberrations, and modification of the correction of the phase of the wave front of the analysis beam as a function of the measurement of eye movements.2008-12-18
20080309874System and Apparatus for object based attention tracking in a virtual environment - A system and operational method that supplies visual stimuli to each subject in the form of a virtual environment in which at least the objects of interest have a three dimensional wire frame or mesh frame of a number of polygons that is surrounded with at least one skin or surface; wherein the visual stimuli is presented in a test session to the subject on a display device including an eye tracking sub-system that can effectively track the subject's gaze direction and focus on the display device throughout the test session; wherein unique colors are assigned to the mesh frame and/or an eye tracking skin of each object of interest whereby the system can evaluate the obtained eye tracking data and assign attention data to specific objects of interest resulting in object specific attention data.2008-12-18
20080309875Instrument for measuring a refractive power - An instrument for measuring a refractive power includes a target, a target projecting unit, a measurement light projecting unit, a light receiving unit, a unit for performing a normal refractive power measurement, a judgment unit, and a unit for performing a high-speed refractive power measurement. The unit for performing a normal refractive power measurement measures a normal refractive power of an examined eye based on received light data. The judgment unit judges reliability of the received light data or the refractive power measurement. The unit for performing a high-speed refractive power measurement measures a refractive power of the examined eye faster than the unit for performing a normal refractive power measurement in response to a judgment result of the judgment unit.2008-12-18
20080309876Method And Apparatus For Imaging An Eye Of A Small Animal - Imaging an eye of an animal can include injecting a ring of light through an outer portion of an entrance pupil of the eye of the animal onto a back interior portion of the eye. Light reflected off of the back interior portion of the eye and through an exit pupil effectively located at the entrance pupil within the ring of light can be collected. A diameter of the exit pupil at the entrance pupil can be less than an inner diameter of the ring of light, and a difference between an outer diameter of the ring and the inner diameter of the ring can be at least twenty percent of a diameter of the eye. The collected light reflected off of the back interior portion of the eye can be focused to thereby form an image of the back interior portion of the eye.2008-12-18
20080309877Instrument for measuring a refractive power - An instrument for measuring a refractive power including an astigmatic axis with retinoscopy is provided, which includes a projector, a light receiving device, a detector, and a notification unit. The projector projects light into a pupil of an examined eye. The light receiving device receives light reflected from the examined eye. The detector detects a tilt angle of the light receiving device with respect to a measurement reference. The notification unit conveys information related to a result of detection performed by the detector.2008-12-18
20080309878NEAR EYE OPTHALMIC DEVICE - The ophthalmic device comprises a memory, display, image data and user input. Image data stored on the memory is used to generate a plurality of visual acuity images. The user input is operable by a user to select selected visual acuity images from the plurality of visual acuity images for display on the display.2008-12-18
20080309879NEAR EYE OPTHALMIC DEVICE - The ophthalmic device comprises a memory, display, image data and user input. Image data stored on the memory is used to generate a plurality of visual acuity images. The user input is operable by a user to select selected visual acuity images from the plurality of visual acuity images for display on the display.2008-12-18
20080309880Vision Testing System and Method - A method for testing a person's vision is disclosed. The method includes providing, for display to the person, one or more sequences of test images, each test image including one or more test symbols. For each test image, a target symbol is identified to the person. The person then views each test image in the sequence and activates a control in response to recognising a test symbol that replicates the shape of the target symbol. At the completion of the sequence, a parameter value associated with the activations is processed and correlated with a vision metric. A system for testing a person's vision is also disclosed.2008-12-18
20080309881PATTERN ANALYSIS OF RETINAL MAPS FOR THE DIAGNOSIS OF OPTIC NERVE DISEASES BY OPTICAL COHERENCE TOMOGRAPHY - Methods for analyzing retinal tomography maps to detect patterns of optic nerve diseases such as glaucoma, optic neuritis, anterior ischemic optic neuropathy are disclosed in this invention. The areas of mapping include the macula centered on the fovea, and the region centered on the optic nerve head. The retinal layers that are analyzed include the nerve fiber, ganglion cell, inner plexiform and inner nuclear layers and their combinations. The overall retinal thickness can also be analyzed. Pattern analysis are applied to the maps to create single parameter for diagnosis and progression analysis of glaucoma and optic neuropathy.2008-12-18
20080309882Method for preventing myopia progression through identification and correction of optical aberrations - A method for at least one of preventing myopia and retarding the progression of myopia is provided. The method includes measuring optical aberrations in a human eye and correcting the optical aberrations. Measuring optical aberrations may include measuring wavefront aberrations of parallel light rays entering the eye.2008-12-18
20080309883Method and Apparatus for Inhibiting the Piracy of Motion Pictures - A method and apparatus to inhibit the piracy of motion pictures in theaters by taking advantage of the frame rate discrepancies between film (or digital) display and video camcorders. By alternating specific image display intervals and, shuttering cadences, or with digital video projectors commanding a similar modified display via the digital projector's blanking and display capabilities, so that the projected images occur in a random and/or phase shifted manner, objectionable distortions are produced in an illicitly captured video image, while being invisible to theatrical viewers. In addition, various serrated, slit, multi-quadrant or spotted patterns may be used on mechanical shutters, or simulated on digital displays, to further degrade the quality of illicitly captured video by pirates in theaters.2008-12-18
20080309884Electronic Projection Systems and Methods - Embodiments of the present invention comprise electronic projection systems and methods. One embodiment of the present invention comprises a method of creating composite images with a projection system comprising a first projector and at least a second projector, comprising generating a correspondence map of pixels for images by determining offsets between pixels from at least a second image from the second projector and corresponding pixels from a first image from the first projector, receiving a source image, warping the source image based at least in part on the correspondence map to produce a warped image, and displaying the source image by the first projector and displaying the warped image by the second projector to create a composite image.2008-12-18
20080309885PROJECTION DISPLAY DEVICE - An optical system (light guiding optical system) for guiding G-light and R-light to liquid crystal panels is protruded in an opposite direction from projection optical system with regard to an optical axis of a light source. A space is created between an optical engine and a wall surface, and air stream for suction fan is thus secured. A distance (H2008-12-18
20080309886Controllable Light Monitor Element and Device For Use - The invention relates to a controllable light modulator (M) whose transmission can be controlled by the intensity of electric fields, wherein it is exposed to an intensity-controlled microwave field. Furthermore a device for laser projection is illustrated which is controlled by a light modulator of this kind.2008-12-18
20080309887Micro-scanner and image projection apparatus using the same - A micro-scanner adapted for being miniaturized and an image projection apparatus using the same. The micro-scanner includes a scan mirror for scanning incident light to a screen while swinging about a rotary shaft; and upper and lower supports for rotatably supporting the top and bottom parts of the rotary shaft. The upper and lower supports having a driving unit for supplying driving force for rotating the scan mirror.2008-12-18
20080309888Stage projector structure - A projector structure, such as a stage use projector, is provided for managing light projection and suitable for replacing a “Gobo” device. The projector structure has a digital micromirror device (DMD) and a refraction and/or reflection device for circulating light beams (R) around the digital micromirror device and maintaining the coaxiality between the light source and the projection lenses.2008-12-18
20080309889Speech Prompter Apparatus - A portable and easily used speech prompter apparatus relies upon a standard laptop computer and a coated display screen that is attachable to a table, podium or to a floor stand. The display screen is attached to flexible tubing, which allows the screen to be adjusted easily by the users, and is positioned such that the images displayed on the computer screen are reflected from the screen so that a user may read the images from the display screen. Software is installed on the laptop, but standard software may also be used to display non-scrolling text or other prompts. The speech prompter may be used in a first mode in which images on the computer screen are inverted and reversed and are thus displayed in a normal orientation on the display screen. The speech prompter may also be used in a second mode in which images on the computer screen remain in a normal orientation, are reflected onto a mirror and then onto the display screen where they appear normally oriented. In both modes the text and images on the computer screen may be scrolling or non-scrolling.2008-12-18
20080309890PROJECTION APPARATUS AND LIGHT INTEGRATION ROD THEREOF - A light integration rod having a light input end and a light output end opposite to each other is provided. The light integration rod includes a first reflective plate, a second reflective plate, a third reflective plate and a fourth reflective plate. The second reflective plate is opposite to the first reflective plate. The third reflective plate and the fourth reflective plate connect the first reflective plate and the second reflective plate, and are disposed opposite to each other. A long side of the first reflective plate is not equal to a long side of the second reflective plate. A short side at the light output end of at least one of the first reflective plate and the second reflective plate is separate from a short side of the third reflective plate and a short side of the fourth reflective plate at the light output end.2008-12-18
20080309891APPARATUS AND METHOD FOR IMMERSION LITHOGRAPHY - Immersion lithography apparatus and method using a shield module are provided. An immersion lithography apparatus including a lens module having an imaging lens, a substrate table positioned beneath the lens module and configured for holding a substrate for processing, a fluid module for providing an immersion fluid to a space between the lens module and the substrate on the substrate table, and a shield module for covering an edge of the substrate during processing.2008-12-18
20080309892IN-LINE PARTICLE DETECTION FOR IMMERSION LITHOGRAPHY - An immersion lithography system, comprising a lens unit configured to project a pattern from an end thereof and onto a wafer, a hood unit configured to confine an immersion fluid to a region of the wafer surrounding the end of the lens unit, a wafer stage configured to position the wafer proximate the end of the lens unit, and at least one of an image capturing apparatus and a scattering light detection apparatus, wherein the image capturing apparatus is coupled to the wafer stage and is configured to capture an image of a surface of the hood unit proximate the wafer stage, and wherein the scattering light detection apparatus is proximate the end of the lens unit and the hood unit and is configured to detect particles on a surface of the wafer stage.2008-12-18
20080309893Contamination prevention system, lithographic apparatus, radiation source, and method for manufacturing a device - A contamination prevention system is constructed and arranged to prevent material from propagating with radiation into a lithographic apparatus. The contamination prevention system includes a rotatable carrier provided with a plurality of generally radially outwardly extending blades. The blades are constructed and arranged to absorb or deflect the material. The system also includes a stationary shaft, and a bearing constructed and arranged to rotate the rotatable carrier and the blades around the shaft. The rotatable carrier is provided with a space for at least partially receiving a portion of the shaft.2008-12-18
20080309894MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS - A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.2008-12-18
20080309895Dynamic fluid control system for immersion lithography - An apparatus includes a stage that supports a substrate, an optical system having a last optical element, that projects an image onto the substrate that is positioned spaced apart from the last optical element by a gap at least partly filled with an immersion liquid, and a pressure control system having an actuator, that controls pressure of the immersion liquid in the gap using the actuator.2008-12-18
20080309896Exposure method, exposure apparatus, and method for producing device - An exposure method forms an immersion area in at least a part of a substrate including a projection area of a projection optical system and projects an image of a mask pattern onto the substrate through liquid between the projection optical system and the substrate. Distribution of the mask pattern is measured and adjustment is made so that a desired image of the pattern is projected onto the substrate according to distribution of the exposure light incident into the liquid between the projection optical system and the substrate when exposing the substrate. It is possible to expose the substrate with the pattern accurately regardless of the distribution of the mask pattern.2008-12-18
20080309897MULTIVARIABLE SOLVER FOR OPTICAL PROXIMITY CORRECTION - The method of the invention tracks how the collective movement of edge segments in a mask layout alters the resist image values at control points in the layout and simultaneously determines a correction amount for each edge segment in the layout. A multisolver matrix that represents the collective effect of movements of each edge segment in the mask layout is used to simultaneously determine the correction amount for each edge segment in the mask layout.2008-12-18
20080309898Lithographic Apparatus and Device Manufacturing Method Using Pupil Filling By Telecentricity Control - A method of measuring aberration present in a lithographic apparatus comprising the following steps. Modulating a radiation beam using a reflective patterning device. Projecting the radiation beam using a projection system. Detecting the projected radiation using a sensor. Measuring aberration via interference in the detected radiation beam. The radiation beam is tilted away from the optical axis of the projection system prior to entering the projection system.2008-12-18
20080309899Lithographic Apparatus and Method - Systems and methods are provided for measuring aberration in a lithographic apparatus. A radiation beam is modulated using an array of individually controllable elements, and the modulated beam is projected using a projection system. A pattern is provided on the array of individually controllable elements to modulate the radiation beam, and the pattern comprises a repeating structure that is formed from a plurality of features that are dimensioned such that first order diffraction of the radiation beam substantially fills the pupil of the projection system. A sensor detects the projected radiation and measures interference in the radiation projected by the projection system. Aberration in the detected radiation beam is then measured.2008-12-18
20080309900Method of making patterning device, patterning device for making patterned structure, and method of making patterned structure - A method and apparatus to fabricate a patterned structure using a template supported on a carrier. The method includes patterning a material to conform to the patterned structure. The patterned material is cured while remaining on the template. The carrier is removable during the curing process. The template is later removed from the patterned material to obtain the patterned structure. A patterning device is also provided, which is formed by a template and a carrier releasably attached to each other. The template and the carrier can be separated from each other when the patterning device is subjected to curing of the patterned structure.2008-12-18
20080309901Lithographic apparatus and pivotable structure assembly - A mirror assembly to interact with a beam of radiation of a lithographic apparatus is disclosed. The mirror assembly includes a mirror, a piezo electric actuator, and a mover structure, the mover structure connected to the mirror, an assembly of the mirror and the mover structure being pivotable about a pivot point, the piezo electric actuator having a contacting surface to establish a slip-stick contact with the mover structure.2008-12-18
20080309902Printing a Mask with Maximum Possible Process Window Through Adjustment of the Source Distribution - Disclosed is a method for illuminating a lithographic mask with light from different directions, in such a way that the intensities of the various incident beams provide the largest possible integrated process window. The process window is defined in terms of allowable ranges for printed shapes. For example, boundaries of the process window may be defined by shape limits corresponding to underexposed and overexposed conditions. Intensity parameters for representing the maximum possible intensities that can be permitted for overexposed tolerance positions are imposed through application of various constraints. Another set of intensity parameters for representing the minimum possible intensities that can be permitted for underexposed tolerance positions are imposed through application of various constraints. One parameter of each kind is defined for each of a number of different focal ranges. The optimum source intensities are determined from a linear program involving these and other constraints. The determined source intensities maximize the integrated range of dose and focal variations that can be tolerated without causing the printed shapes to depart from the allowed range of shapes.2008-12-18
20080309903EXPOSURE APPARATUS, METHOD OF MANUFACTURING DEVICE, METHOD APPLIED TO EXPOSURE APPARATUS AND COMPUTER-READABLE MEDIUM - An exposure apparatus comprises: a controller configured to control a position of a stage and operation of a detector; and a computer terminal connected to the controller; wherein the controller is configured to: (i) cause the detector to perform position detection of alignment marks under each of a plurality of position detection conditions, and calculate an index of accuracy of the position detection based on an output from the detector associated with the position detection, with respect to each of the plurality of position detection conditions; and (ii) cause the computer terminal to provide a display concerning the index calculated with respect to each of the plurality of position detection conditions, and receive a instruction for selecting a plurality of candidate conditions from among the plurality of displayed position detection conditions via the computer terminal.2008-12-18
20080309904OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - An optical system of a microlithographic projection exposure apparatus contains a module, which can be fitted in the optical system and removed from it as a unit. The module contains a cavity which can be completely filled with a liquid and hermetically sealed, and a concavely curved optical surface which bounds the cavity at the top during operation of the projection exposure apparatus. This makes it possible to fill the module outside the optical system. The module can be tilted there so that no air bubble, which prevents complete filling, can form below the concavely curved optical surface.2008-12-18
20080309905METHOD OF PROCESSING AN OPTICAL ELEMENT AND AN OPTICAL ELEMENT, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - A method of processing an optical element which has a substrate (2008-12-18
20080309906Illumination of a Patterning Device Based on Interference for Use in a Maskless Lithography System - A lithographic apparatus in which beams of radiation are projected onto an array of individually controllable elements, such that the beams interfere. Radiation that is further modulated by the array of individually controllable elements is projected onto a substrate.2008-12-18
20080309907ADJUSTING DEVICE FOR A MICROLITHOGRAPHY PROJECTION EXPOSURE INSTALLATION, AND RELATED ILLUMINATION SYSTEM AND PROJECTION EXPOSURE INSTALLATION - An adjusting device used to align two components of a microlithography projection exposure installation relative to each other. The adjusting device has an autocollimating device with a light source and a reflector. The light source and the reflector are each rigidly connected to one of the optical components. In one embodiment, the adjusting device has a laser light source which is different from the radiation source. A beam-splitter is downstream from the laser light source and carries useful adjustment light along a first optical path. A reflector can be rigidly connected to a reference component of an illuminating optics system or to a radiation source so that when an actual position of the reference component relative to the radiation source coincides with a desired position, the useful adjustment light is reflected back on itself. A bundle-sensitive component is sensitive to the direction and position of useful adjustment light in the optical path between bundle-sensitive component and reflector. The bundle-sensitive component can be rigidly mounted relative to the radiation source or the reflector. A light sensor is downstream from the beam-splitter in a second optical path for the useful adjustment light which is reflected back by the reflector. This results in an adjusting device which makes it possible to achieve high adjustment accuracy with relatively low construction expense.2008-12-18
20080309908System and Method for Providing Modified Illumination Intensity - A lithography system including a polarized illumination source, a birefringence-controllable optical element, a birefringence inducer, a pattern generator, a linear polarizer, and a projection system. The polarized illumination source is configured to provide polarized light. The birefringence-controllable optical element is optically coupled to the polarized illumination source. The birefringence inducer is coupled to the birefringence-controllable optical element and configured to induce birefringence on the birefringence-controllable optical element to provide polarization-retarded polarized light. The pattern generator is optically coupled to the birefringence-controllable optical element. The linear polarizer is optically coupled to the pattern generator and configured (i) to receive the polarization-retarded polarized light and (ii) modify intensity distribution of the polarization-retarded polarized light to provide modified polarization-retarded polarized light. The projection system is configured to project the modified polarization-retarded polarized light.2008-12-18
20080309909HOLDING APPARATUS, EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD - A holding apparatus is provided with a holding member that has a holding surface that holds a substrate on which a pattern is to be formed, a plurality of first electrode members that are provided on the holding member and that generate electrostatic force in accordance with supplied voltage in order to attract the substrate to the holding surface, and a power supply device that is able to supply voltage to the first electrode members. The first electrode members are positioned in accordance with pattern information.2008-12-18
20080309910Vibration isolating apparatus, control method for vibration isolating apparatus, and exposure apparatus - An active vibration isolating apparatus can perform vibration isolation with high precision and fast response speed using a gas damper. A vibration isolating apparatus comprises an air damper that uses air supplied from a compressed air source to support a structure on an installation surface; a servo valve that controls the flow rate of the air that is supplied from the compressed air source to the air damper; a position sensor that measures a position provided to the structure by the air damper; and a vibration isolating block control system that controls the flow rate of the air at the servo valve based on the measurement value of the position sensor.2008-12-18
20080309911Stage system and lithographic apparatus comprising such a stage system - A stage system for a lithographic apparatus includes a stage, an over-determined number of actuators arranged to act on the stage, and an electric power supply configured to provide a current to the actuators, wherein the current is supplied to a coil associated with a first actuator of the actuators and to a coil associated with a second actuator of the actuators.2008-12-18
20080309912Lithographic apparatus and device manufacturing method - A lithographic apparatus includes a movable table constructed and arranged to transport an object to a position in a beam path in a vacuum chamber, a first capacitor electrode and a second capacitor electrode attached to the table, a first inductor assembly coupled to the capacitor electrodes, and configured to apply a voltage between the first capacitor electrode and the second capacitor electrode, and a second inductor assembly mounted at a position that remains fixed when the table is moved. The second inductor assembly is configured to generate a magnetic field. The presence of the object on the table is detected by applying a voltage on the second inductor assembly which will result in a magnetic field which when picked up by the first inductor assembly will create a magnetic field response in the first inductor assembly dependent on the capacitance of the capacitor electrodes.2008-12-18
20080309913SYSTEMS AND METHODS FOR LASER RADAR IMAGING FOR THE BLIND AND VISUALLY IMPAIRED - A 3D imaging ladar system comprises a solid state laser and geiger-mode avalanche photodiodes utilizing a scanning imaging system in conjunction with a user interface to provide 3D spatial object information for vision augmentation for the blind. Depth and located object information is presented acoustically by: 1) generating an audio acoustic field to present depth as amplitude and the audio image as a 2D location. 2) holographic acoustical imaging for a 3D sweep of the acoustic field. 3) a 2D acoustic sweep combined with acoustic frequency information to create a 3D presentation.2008-12-18
20080309914METHOD FOR DETECTING OBJECTS WITH VISIBLE LIGHT - A method for detecting an object using visible light comprises providing a visible-light source having a function of illuminating an environment. The visible-light source is driven to emit visible light in a predetermined mode, with visible light in the predetermined mode being emitted such that the light source maintains said function of illuminating an environment. A reflection/backscatter of the emitted visible light is received from an object. The reflection/backscatter is filtered over a selected wavelength range as a function of a desired range of detection from the light source to obtain a light input. The presence or position of the object is identified with the desired range of detection as a function of the light input and of the predetermined mode.2008-12-18
20080309915METHOD FOR CORRECTING DISTURBANCES IN A LEVEL SENSOR LIGHT PATH - The invention relates to a level sensor for determining a height of a substrate. The level sensor generates one or more measurement beam and directs the measurement beam to a measurement spot on the substrate and produces a reflected measurement beam. The level sensor also generates one or more reference beams. A detector detects both the reflected measurement beam and the reference beam, respectively, and produces a measurement signal and a reference signal, respectively, the measurement signal being indicative for the height at the measurement spot. A processor that receives these signals and corrects the measurement signal based on the reference signal. The level sensor has an optical arrangement in a predetermined area close to where the substrate is to be located. The measurement beam and the reference beam propagate along substantially equal optical paths of propagation in the predetermined area. The optical arrangement deviates the reference beam from the substantially equal optical paths of propagation in the predetermined area such that the at least one reference beam does not hit the substrate.2008-12-18
20080309916Auto Aim Reticle For Laser range Finder Scope - A laser range finder scope for measuring the distance between a target and the scope based on the time-of-flight of laser impulses is disclosed as including means for transmitting laser impulses toward the target and generating a first time signal corresponding to the transmission; means for receiving laser impulses reflected from the target and generating a second time signal corresponding to the reception; means for delaying said first time signal to provide a third time signal; means for calculating the time-of-flight by comparing said second time signal and third time signal; and a scope with a reticle with a plurality of indicia selectively lightable to each indicate the appropriate reticle scale to aim at the target.2008-12-18
20080309917Optical Short-Range Sensor - In an optical short-range sensor, a plurality of sequentially actuatable transmission elements (2008-12-18
20080309918INTEGRATED CHEMICAL SEPARATION LIGHT SCATTERING DEVICE - An integrated chemical separation device includes a single device body, a chemical separation unit configured to separate a chemical from a fluid, a Raman sensor substrate comprising one or more surfaces configured to be adsorbed by molecules of the chemical from the fluid, and a Raman scattering spectrometer unit that can emit a laser beam to illuminate the Raman sensor substrate and to detect the chemical from the light scattered from the Raman sensor substrate. The chemical separation unit, the Raman sensor substrate, and the Raman scattering spectrometer unit are held in or mounted to the single device body.2008-12-18
20080309919METHOD AND APPARATUS FOR SORTING AND ANALYZING PARTICLES IN AN AEROSOL WITH REDUNDANT PARTICLE ANALYSIS - A method and apparatus for sorting and performing redundant analysis of particles in an aerosol is disclosed. Redundant analysis reduces the possibility of false positive analyses, which is advantageous in the art. The apparatus may comprise an aerosol concentrator, an optical particle analyzer, an electrosprayer and a charged particle analyzer. A method according to the invention may comprise delivering a concentrated aerosol stream to an optical particle analyzer; analyzing each particle of interest and selectively triggering an electrosprayer to electrospray each particle of interest; adding a charge to the particle, which is then moved by electrostatic forces to a charged particle analyzer; and performing a second, redundant analysis of each charged particle collected on the charged particle analyzer to confirm the identity of the particle of interest. The apparatus and method may also be adapted to perform redundant analysis of disguised particles that are coated to disguise their payload.2008-12-18
20080309920Method and System for Optoelectronic Detection and Location of Objects - Disclosed are methods and systems for optoelectronic detection and location of moving objects. The disclosed methods and systems capture one-dimensional images of a field of view through which objects may be moving, make measurements in those images, select from among those measurements those that are likely to correspond to objects in the field of view, make decisions responsive to various characteristics of the objects, and produce signals that indicate those decisions. The disclosed methods and systems provide excellent object discrimination, electronic setting of a reference point, no latency, high repeatability, and other advantages that will be apparent to one of ordinary skill in the art.2008-12-18
20080309921Spectrophotometer - Embodiments of a spectrophotometer and methods of use a spectrophotometer are disclosed.2008-12-18
20080309922ATTENUATED TOTAL REFLECTION SENSOR - An attenuated total reflection (“ATR”) sensor (2008-12-18
20080309923COMPACT CHEMICAL SENSOR - A differential calorimeter device for detection of one or more predefined chemicals. An example device includes an integrating device having an absorbing layer. Optical sources send beams of differing color light at the absorbing layer. An optical detector detects intensity of light reflected off of the absorbing layer and a processor detects presence of the predefined chemicals based on the detected intensity of light associated with the optical sources. The absorbing layer changes color in response to one of said one or more predefined chemicals. One of the optical sources has a color corresponding to the color change in the absorbing layer and another one of the optical sources does not have a color corresponding to the color change in the absorbing layer.2008-12-18
20080309924Apparatus and method for measuring optical characteristics of teeth - Optical characteristic measuring systems and methods such as for determining the color or other optical characteristics of teeth are disclosed. Perimeter receiver fiber optics are spaced apart from a source fiber optic and receive light from the surface of the object/tooth being measured. Light from the perimeter fiber optics pass to a variety of filters. The system utilizes the perimeter receiver fiber optics to determine information regarding the height and angle of the probe with respect to the object/tooth being measured. Under processor control, the optical characteristics measurement may be made at a predetermined height and angle. Various color spectral photometer arrangements are disclosed. Translucency, fluorescence, gloss and/or surface texture data also may be obtained. Audio feedback may be provided to guide operator use of the system. The probe may have a removable or shielded tip for contamination prevention. A method of producing dental prostheses based on measured data also is disclosed. Measured data also may be stored and/or organized as part of a patient data base.2008-12-18
20080309925System and Method for Monitoring an Optical Communication System - A monitoring system and method may be used to monitor an optical communication system. A monitoring system and method may be used to derive loop gain data sets from optical time domain reflectometry (OTDR) or coherent optical time domain reflectometry (COTDR) data. A monitoring system and method may also use differential monitoring techniques to obtain data representing gain tilt in the transmission system and to locate an anomalous loss or gain in the transmission system.2008-12-18
20080309926SYSTEMS AND METHODS FOR REDUCING DETECTED INTENSITY NON UNIFORMITY IN A LASER BEAM - A method of increasing the spatial uniformity of the detected intensity of a beam of light from a laser in a system including the laser and a light detector. In one embodiment the method includes the steps of generating a beam of light with the laser; and moving the beam of light and the light detector relative to each other, such that the detector averages the spatial intensity of the beam of light over time. In another embodiment the invention relates to a system for increasing the detected spatial uniformity of the intensity of a beam of light. In one embodiment the system comprises a light detector; a laser source for generating the beam of light; and a means for moving the beam of light and the detector relative to one another such that the detector averages the intensity of the light beam over time.2008-12-18
20080309927WAFER INSPECTION SYSTEM AND METHOD - A wafer inspection system and method is disclosed. On embodiment includes an edge defect detection unit, an optical inspection unit and a processor unit. The edge defect detection unit is configured to detect defects occurring in an edge area of the wafer and to record edge defect positions. The optical inspection unit is configured to capture images of functional devices in a functional area of the wafer surrounded by the edge area and to record device defect positions related to the functional devices. The processor unit is configured to output a data set relating the edge and device defect positions to the same coordinate system.2008-12-18
20080309928Automatic Optical Inspection Device, Chip Sorting Apparatus and Method - An automatic optical inspection device for inspecting the surface defects of integrated circuits is disclosed in this invention. The automatic optical inspection device includes a tray transporting device which transports a tray carrying at least one integrated circuit and having at least one clip area, a press mechanism for fixing the tray to the tray transporting device by clamping the clip area of the tray, and an image capture device for capturing an image of one surface of the integrated circuit. The surface defects of the integrated circuit can be found by analyzing the image. Chip sorting apparatus and method are also disclosed in this invention. The chip sorting apparatus includes a pick-and-place head which picks a chip on a wafer and places the chip on a tray; and an image capture device which is disposed for examining the chip surface of the chip so as to find the surface defects of the chip. The method includes transferring a chip on a wafer to a tray by a pick-and-place head; and examining the chip surface of the chip by an image capture device.2008-12-18
20080309929METHOD AND SYSTEM FOR STANDARDIZING MICROSCOPE INSTRUMENTS - Methods and apparatus for standardizing quantitative measurements from a microscope system. The process includes a calibration procedure whereby an image of a calibration slide is obtained through the optics of the microscope system. The calibration slide produces a standard response, which can be used to determine a machine intrinsic factor for the particular system. The machine intrinsic factor can be stored for later reference. In use, images are acquired of a target sample and of the excitation light source. The excitation light source sample is obtained using a calibration instrument configured to sample intensity. The calibration instrument has an associated correction factor to compensate its performance to a universally standardized calibration instrument. The machine intrinsic factor, sampled intensity, and calibration instrument correction factor are usable to compensate a quantitative measurement of the target sample in order to normalize the results for comparison with other microscope systems.2008-12-18
20080309930Calibration for Spectroscopic Analysis - The present invention provides an optical analysis system for determining an amplitude of a principal component of an optical signal. The principle component is indicative of the concentration of a particular compound of various compounds of a substance that is subject to spectroscopic analysis. The optical signal is subject to a wavelength selective weighting. Spectral weighting is preferably performed by means of spatial light manipulation means in combination with a dispersive optical element. The inventive calibration mechanism and method effectively allows for an accurate positioning of the spatial light manipulation means. Calibration is based on a calibration segment on the spatial light manipulation means in combination with a reference light source and a detector.2008-12-18
20080309931Coherently Controlled Nonlinear Raman Spectroscopy - A method and system (2008-12-18
20080309933SCANNING SPECTROPHOTOMETER FOR HIGH THROUGHPUT FLUORESCENCE DETECTION - A fluorescence spectrophotometer having an excitation double monochromator, a coaxial excitation/emission light transfer module, and an emission double monochromator. Each monochromator includes a pair of holographic concave gratings mounted to precisely select a desired band of wavelengths from incoming broadband light without using other optical elements, such as mirrors. Selected excitation light is directed into a sample well by a light transfer module that includes a coaxial excitation mirror positioned to direct excitation light directly to the bottom of a well of a multi-well plate. Fluorescence emission light that exits the well opening is collected by a relatively large coaxial emission mirror. The collected emission light is wavelength selected by the emission double monochromator. Selected emission light is detected by a photodetector module.2008-12-18
20080309934SCANNING SPECTROPHOTOMETER FOR HIGH THROUGHPUT FLUORESCENCE DETECTION - A fluorescence spectrophotometer having an excitation double monochromator, a coaxial excitation/emission light transfer module, and an emission double monochromator. Each monochromator includes a pair of holographic concave gratings mounted to precisely select a desired band of wavelengths from incoming broadband light without using other optical elements, such as mirrors. Selected excitation light is directed into a sample well by a light transfer module that includes a coaxial excitation mirror positioned to direct excitation light directly to the bottom of a well of a multi-well plate. Fluorescence emission light that exits the well opening is collected by a relatively large coaxial emission mirror. The collected emission light is wavelength selected by the emission double monochromator. Selected emission light is detected by a photodetector module.2008-12-18
20080309935Method for Methane Spectral Absorbance Calculation Using Sunlight - A method and a system are provided for calculating the spectral absorbance using sunlight. With this method, methane (CH2008-12-18
20080309936Spectrometer with multiple gratings - A spectrometric measurement apparatus comprises a collimator (2008-12-18
20080309937Method and System for Identification of Changes in Fluids - Method and system for identification of a changed state of a fluid with respect to a reference state of the same fluid, the fluid having an optical parameter changing with the change of the state of the fluid. The method comprises: a) providing an optical arrangement including a transparent enclosure with a portion of the fluid, and an object observable through the optical arrangement, the arrangement being designed such that an image of the object in the changed state of the fluid is optically distinctive from an image of the object in the reference state of the fluid due to change of the optical parameter, at least one of the images being predetermined; b) illuminating the object with diffuse light; c) observing a current image of the object though the optical arrangement along an optical axis; and d) comparing the current image to the predetermined image to identify the changed state of the fluid. The comparison and the identification may be performed by eye or by a sensor with a logical circuit.2008-12-18
20080309938Apparatus And Method Of Non-Sampling-Based Q-Factor Measuring - A non-sampling-based Q-factor measuring apparatus and method use a power conversion module to transform the power variation of inputted optical signals in time domain into the variation in other domains, such as optical wavelength, optical polarization and different output ports of optical elements. Taking optical wavelength as an example, different levels of power variation respond different outputs of wavelength variation through the use of a power-to-wavelength conversion module. An optical filter then separates the inputted optical signals with different wavelengths. The power average of a wavelength for its corresponding optical signals is further calculated by a photo detector. Thereby, the information of the power variation for the inputted optical signals at levels 1 and 0 can be obtained, and the Q-factor for the inputted optical signals is easily measured.2008-12-18
20080309939BODY FLUID CONSTITUENTS MEASUREMENT DEVICE - A body fluid constituents measurement device, which performs measurement under a setting where light intensity of the light-emitting element is suitably stabilized, is provided. The present invention is a body fluid constituents measurement device which comprises: a light-emitting element that emits light onto a test paper onto which body fluid is spotted, a light receiving element which receives reflected light of the light emitted by said light-emitting element, a temperature measurement unit which measures the ambient temperature in the vicinity of said light-emitting element, a determination unit which determines conditions of light emission based on said temperature measured at said temperature measurement unit in order to stabilize light intensity of said light-emitting element, and a driving control unit which controls driving of said light-emitting element based on the conditions of light emission; and is characterized in that it starts measurement of body fluid constituents after the light intensity of light emitted by said light-emitting element has been stabilized.2008-12-18
20080309940Method of, System For, and Medical Image Acquisition System For Imaging an Interior of a Turbid Medium Taking Into Account the Geometry of the Turbid Medium - The invention relates to a method of imaging an interior of a turbid medium (2008-12-18
20080309941Method of, System for, and Medical Image Acquisition System for Imaging an Interior of a Turbid Medium Taking Into Account the Geometry of the Turbid Medium - The invention relates to a method of imaging an interior of a turbid medium (2008-12-18
20080309942Method and Apparatus for Establishing Reflection Properties of a Surface - A method for establishing light reflection properties of a specific surface, by measuring, for a plurality of comparison surfaces, the r-tables in accordance with CIE standard recommendations, measuring, for the same plurality of comparison surfaces, a light reflection parameter for selected angles (γ) of incident light and angles (90°—α) and (β) of reflected light, using a ‘portable’ measuring apparatus, measuring in situ, on multiple measuring points of said specific surface, said parameter for said angles (γ), (α) and (β), using said ‘portable’ apparatus, comparing the angular distribution of said parameter for the specific surface with that for said comparison surfaces, to select the comparison surface showing the best distribution fit, optionally taking into account a resealing factor on luminance coefficient Q2008-12-18
20080309943MODULATED REFLECTANCE MEASUREMENT SYSTEM WITH MULTIPLE WAVELENGTHS - A modulated reflectance measurement system includes three monochromatic diode-based lasers. Each laser can operate as a probe beam or as a pump beam source. The laser outputs are redirected using a series of mirrors and beam splitters to reach an objective lens. The objective lens focuses the laser outputs on a sample. Reflected energy returns through objective and is redirected by a beam splitter to a detector. A lock-in amplifier converts the output of the detector to produce quadrature (Q) and in-phase (I) signals for analysis. A Processor uses the Q and/or I signals to analyze the sample. By changing the number of lasers used as pump or probe beam sources, the measurement system can be optimized to measure a range of different samples types.2008-12-18
20080309944Quantitative phase-contrast digital holography method for the numerical reconstruction of images, and relevant apparatus - The invention concerns a quantitative phase-contrast digital holography method for the numerical reconstruction of images, comprising the following steps: A. acquiring a digital hologram of an investigated object; B. reconstructing the digital hologram in a reconstruction plane; C. reconstructing the complex field for the digital hologram; D. obtaining the phase map starting from the complex field; the method being characterised in that it further comprises the following steps: 2008-12-18
20080309945Physical Quantity Measuring Apparatus - A physical quantity measuring system according to the present invention comprises: an optical fiber having fiber Bragg gratings; a light source connected to the optical fiber; an arrayed waveguide grating connected between the light source and the optical fiber via an optical branching filter, and having output channels of which central wavelengths of at least three output channels are included in a one-tenth loss band of a reflected light by the fiber Bragg grating; light receiving devices for receiving light output from the output channels on a one-to-one basis; and a central reflected wavelength change detecting unit connected to the light receiving devices for estimating a change in a central reflected wavelength based on a physical quantity, by calculating first and second group signals from light receiving signals corresponding to the at least three output channels, and by calculating a differential signal between the first and the second group signals.2008-12-18
20080309946Differential-phase interferometric system - A differential-phase interferometric system includes a polarized heterodyne interferometer for generating reference and signal beam that travel along reference and signal channels, respectively. The signal beam is directed to a specimen and contains measured information of the specimen. The interferometer further generates a first electrical signal output corresponding to first linear polarized waves of the reference and signal beams, and a second electrical signal output corresponding to second linear polarized waves of the reference and signal beams. A differential amplifier receives the first and second electrical signal outputs, and generates a differential signal output therefrom. A data acquisition unit is used to measure amplitudes of the first and second electrical signal outputs and the differential signal output. A computing unit computes the amplitudes measured by the data acquisition unit to determine a phase difference between the electrical signal outputs, which corresponds to the measured information of the specimen.2008-12-18
20080309947MEASUREMENT METHOD AND APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - A measurement method for measuring a wavefront aberration of a target optical system using an interference pattern formed by a light from a first image side slit, and a light from a second image side slit, the first and second image side slits being located at an image side of the target optical system, the first image side slit having, in a shorter direction, a width equal to or smaller than a diffraction limit of the target optical system, and the second image side slit having, in a shorter direction, a width greater than the diffraction limit of the target optical system includes the steps of obtaining three or more primary wavefronts of the target optical system from different measurement directions, and calculating a wavefront aberration of the target optical system based on the three or more primary wavefronts obtained by the obtaining step.2008-12-18
20080309948PROCESS AND DEVICE FOR CONTROLLING A FILLING LEVEL OF SILOS CONTAINING LOOSE MATERIALS - The process comprises a stage of highlighting a plurality of light points of a free surface of the material contained in the silo, of detecting a position of each of the light points and obtaining electrical signals which are proportional to the detected position of each point, and processing the signals to obtain a virtual reproduction of the free surface of the material which when processed provide desired data. The device for realising the process comprises lasers, which project a laser beam towards the free surface of the material contained in the silo, an optical sensor which detects the position of the light points defined by each laser beam on the free surface, and a data processing system which processes the data relating to the position of the lasers, the inclination of the laser beams, and the detected positions of the light points in such a way as to construct a virtual free surface of the material.2008-12-18
20080309949LASER METROLOGY SYSTEM AND METHOD - A laser metrology system for determining a location of a target utilizes a laser projector having a laser source for projecting a laser beam. A rotating head directs the laser beam in a lateral direction. A sensor associated with the laser projector is capable of sensing the laser beam. A reflective target is configured to reflect the laser beam projector from the laser source toward the sensor in a manner indicative of the angle of the rotating head and the pulse of the laser beam to determine location of the target.2008-12-18
20080309950Calibrating A Lithographic Apparatus - The X, Y and Rz positions of a mask stage are measured using two optical encoder-reading heads measuring displacements of respective grid gratings mounted on the mask stage. The grid gratings are preferably provided on cut-away portions of the mask table so as to be coplanar with the pattern on the mask itself. Measurements of the table position in the other degrees of freedom can be measured with capacitive or optical height sensors.2008-12-18
20080309951IMAGE PROCESSING SYSTEM AND IMAGE FORMING APPARATUS INCORPORATING SAME - A novel image processing system includes a pixel position indicator and a pixel inserting unit. The pixel position indicator is configured to indicate insertion positions in the image data. The pixel inserting unit is configured to enlarge a size of the image data by inserting an additional pixel at each of the insertion positions and accordingly shifting the original pixels in a given direction. The additional pixel has a value lower than a given threshold. Each insertion position is at an approximate center of an area formed of pixels having values higher than the given threshold. A novel image forming apparatus incorporates such an image processing system and an electrophotographic system. The electrophotographic system is configured to form an image by irradiating a photoconductive surface with a laser beam according to the processed image data.2008-12-18
20080309952Multilevel print masking method - A method of computing swath data in response to a digital image having a plurality of rows and columns of pixels, each pixel having a multitone code vaule, the swath data suitable for commanding an inkjet printer containing at least one printed having plurality of nozzles, wherein the inkjet printer is capable of ejecting ink drops in response to the swath data. 2008-12-18
20080309953METHOD FOR REDUCING IMAGE ARTIFACTS ON ELECTRONIC PAPER DISPLAYS - A method and apparatus for reducing image artifacts on displays (e.g., electronic paper, etc.) are described. In one embodiment, the method comprises generating pixels of an image for a bistable display using halftoning based on data of one or more previously displayed images.2008-12-18
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