48th week of 2008 patent applcation highlights part 24 |
Patent application number | Title | Published |
20080291374 | STRUCTURE OF A DISPLAY PANEL - Residual direct-current charges may be accumulated and distributed non-uniformly on the built-in color filters in a displaying panel such as the liquid-crystal-on-silicon displaying device, and thus results in the non-uniformity of the internal electric field that controls the arrangement of liquid crystal molecules. To reduce residual direct-current charges so as to cause the internal electric field to be substantially uniform, the present invention provides a structure of the display panel including a plurality of shields for respectively enclosing a plurality of color filters, wherein each shield is connected to a corresponding pixel electrode by a conductive wire. | 2008-11-27 |
20080291375 | COLOR DISPLAY APPARATUS - A color display apparatus includes a plurality of color elements, each color element including an electro-optical element in which retardation varies in accordance with a voltage applied to the electro-optical element and a color filter provided on the electro-optical element. The color elements include two or more first color elements in which the color filters transmit light of two of three primary colors, each first color element receiving a voltage that continuously varies the retardation of the electro-optical element in a range in which brightness of the first color element varies and a range which starts from the retardation corresponding to the maximum brightness and in which hue of the first color element varies between the two of the three primary colors. The two or more first color elements function as a unit of color display for the two of the three primary colors. | 2008-11-27 |
20080291376 | Liquid crystal panel having low-resistance common electrode layer - An exemplary liquid crystal panel ( | 2008-11-27 |
20080291377 | Liquid Crystal Display Device and Manufacturing Method Thereof - For attaining a transflective liquid crystal display device of high fineness having a built-in retardation plate in a reflective display area, a retardation plate (layer) disposed to the inner surface of the liquid crystal display device is formed by using a liquid-crystalline acrylate monomer with addition of a photopolymerization initiator having a phosphine oxide structure. | 2008-11-27 |
20080291378 | Transmittance control device and an image display apparatus - A transmittance control device which controls a transmittance factor, include a liquid crystal which is sandwiched with a pixel electrode and a common electrode; a control line which a predetermined control signal inputs; and an optical passive element which controls an electric potential difference on the pixel electrode and the common electrode by connecting with the control line, and the pixel electrode and changing a conduction state of the control line and the pixel electrode according to brightness of an incidence light. | 2008-11-27 |
20080291379 | Liquid crystal display device - A liquid-crystal display device is provided which is improved in image quality by supplying a reference voltage signal to a liquid-crystal display panel through a multiplicity of distributed supply paths. The liquid-crystal display device includes a liquid-crystal display panel and a semiconductor device connected to a part of a periphery of the liquid-crystal display panel. The liquid-crystal display panel has a plurality of signal lines for supplying various signals to address pixels, on one of a pair of substrates arranged oppositely through a liquid crystal. The signal lines include a common bus line for supplying a reference voltage signal. The semiconductor device is structured with a semiconductor chip mounted on a flexible board. The flexible board at least has a line leading to a terminal for supplying a signal to the signal line of the liquid-crystal display panel through the semiconductor chip. The reference voltage signal is to be supplied to the common bus line of the liquid-crystal display panel through at least a common line formed on the flexible board of the semiconductor device. The common line on the flexible board is formed in an area outside a mount area of the semiconductor chip and in an area passing through the mount area of the semiconductor chip. | 2008-11-27 |
20080291380 | Flexible print circuit and liquid crystal display device - A first electrode pad which is connected to a prescribed wiring and is exposed without being covered with a protection film, is formed in a flexible print circuit (FPC). The first electrode pad is set up to be bonded with a second electrode pad which is included in the other FPC. A positioning pattern which is made of the same material as the first electrode pad, and which is used as a marker to position the other flexible print circuit when the first electrode pad and the second electrode pad are bonded together, is extended from the first electrode pad. | 2008-11-27 |
20080291381 | DISPLAY AND TAPE CARRIER PACKAGE STRUCTURE - A display including a display panel, a circuit board and a tape carrier package structure is provided. The circuit board is disposed at the display panel. The tape carrier package structure includes a substrate having an opening, a number of leads, a chip, and a blocking bar. The substrate is between the display panel and the circuit board. A number of leads, each having an inner lead and outer lead, are disposed around the opening on the substrate. A portion of the outer leads is electrically connected to the display panel, and another portion is electrically connected to the circuit board. The chip has a number of contact points, and is disposed at the opening of the substrate. The contact points are electrically connected to the inner leads. Moreover, the blocking bar is disposed on the substrate between the chip and the display panel. | 2008-11-27 |
20080291382 | LIQUID CRYSTAL DISPLAY DEVICE - Structural objects are disposed in a peripheral region in positions opposed to spacers. In this way, a substrate surface of a counter substrate in the peripheral region is gently inclined in a direction away from a liquid crystal layer. In this way, it is possible to prevent unevenness in display attributable to a difference in a cell gap between a display region and the peripheral region. | 2008-11-27 |
20080291383 | Liquid crystal panel with protrusions for narrowing gap between substrates thereof and method for manufacuring same - An exemplary liquid crystal panel includes a first substrate and a second substrate parallel to each other to define a gap therebetween, a sealant disposed around the gap to provide an accommodating space, a liquid crystal layer disposed in the accommodating space, a plurality of signal lines disposed on at least one of the first and second substrates, and a plurality of protrusions at a peripheral side of the liquid crystal layer. The protrusions are configured to narrow the gap thereat. A part of each signal line is disposed between the sealant and the corresponding one of the first and second substrates, and each of the protrusions is arranged between two respective signal lines. A related method for manufacturing a liquid crystal panel is also provided. | 2008-11-27 |
20080291384 | DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME - A display apparatus includes a counter substrate, an array substrate placed opposite the counter substrate, a liquid crystal sandwiched between the counter substrate and the array substrate, and a columnar spacer placed on a surface of the counter substrate facing the array substrate so as to maintain a gap between the counter substrate and the array substrate. A step portion with a height of 0.3 μm or smaller is placed on the part of the array substrate which is opposite the columnar spacer or on the top face of the columnar spacer, and the proportion of a highest level of the step portion to the top face of the columnar spacer is ½ or smaller. | 2008-11-27 |
20080291385 | LIQUID CRYSTAL DISPLAY PANEL AND METHOD FOR MANUFACTURING SAME, AND LIQUID CRYSTAL DISPLAY DEVICE - A liquid crystal display panel includes: a pair of substrates; a cylindrical spacer configured to hold a gap between the pair of substrates, and a liquid crystal which fills the gap. The cylindrical spacer includes a first support portion having a first support surface and a second support portion having a second support surface. The first support portion is provided inside the second support surface so that the first support surface is projected from the second support surface. The second support portion is provided on a major surface of one of the substrates the second support surface from the major surface. | 2008-11-27 |
20080291386 | Flat panel display wtih external integral heater - A flat panel display has an optically-transparent electrically-conductive layer, especially an indium tin oxide layer, directly formed on an outer front surface of a liquid crystal display (LCD) assembly having a front plate, a rear plate, and a layer of liquid crystal material interposed between said front and rear plates. The optically-transparent electrically-conductive layer is preferably uniform and functions as an integral heater when connected to a direct current power source. | 2008-11-27 |
20080291387 | Method and device for integrating LCD monitor circuitry - A method and a device for integrating LCD monitor circuitry using a single-layered printed circuit board so as to improve the productivity and reduce the cost of manufacturing LCD monitors. | 2008-11-27 |
20080291388 | LIQUID CRYSTAL DISPLAY DEVICE TREATED BY UV IRRADIATION - A liquid crystal display device includes a pair of substrates, a liquid crystal between substrates and alignment layers disposed on the inner surface sides of the substrates. The alignment layer is made from a material including polyamic acid containing a diamine component and polyimide containing a diamine component different from the diamine component of the polyamic acid. The alignment layer is subjected to alignment treatment by irradiation of light. UV light can be irradiated in the oblique direction onto the alignment layer through a mask having openings. A reflecting plate can be arranged between a UV light source and the mask. Also, bank structures having a thickness from 0.1 to 0.15 μm can be provided on the alignment layer of the TFT substrate. | 2008-11-27 |
20080291389 | Elliptically Polarizing Plate and Image Display Apparatus Using the Same - Provided is a very thin elliptically polarizing plate having broadband and wide viewing angle, a simple method of producing the same, and an image display apparatus using the elliptically polarizing plate. An elliptically polarizing plate of the present invention includes a polarizer, a protective layer formed on one side of the polarizer, a first birefringent layer serving as a λ/2 plate, and a second birefringent layer serving as a λ/4 plate in the stated order. In the plate, an absorption axis of the polarizer and a slow axis of the first birefringent layer form an angle α of one of 10° to 20° and −10° to −20°, and the absorption axis of the polarizer and a slow axis of the second birefringent layer form an angle β of one of 65° to 85° and 5° to 25°. | 2008-11-27 |
20080291390 | Color Temperature Conversion Element, Color Temperature Conversion Device and Illuminator - A color temperature conversion element includes a diffractive optical element that includes a polymer and a liquid crystal and diffracts light with a specific wavelength in incident light. | 2008-11-27 |
20080291391 | HYBRID CONTACT LENSES PREPARED WITH EXPANSION CONTROLLED POLYMERIC MATERIALS - A hybrid contact lens includes a substantially rigid center portion and a substantially flexible skirt portion connected to the center portion. The skirt portion is formed using xerogels compatible with diluents comprising at least one selected from polylactic acid, polyglycolic acid, lactide, glycolide, a polyacetal, a cyclic acetal, a polyketal, a cyclic ketal, a polyorthoester, a cyclic orthoester, di-t-butyl-dicarbonate, tris(trimethylsilyl)amine, and 2,2,2-trifluoroacetamide. These diluents are formulated to function as a stand-in for water in the xerogel polymer, allowing the xerogel to form and bond to the rigid center portion in its fully expanded state. Upon hydration of the hybrid lens, substantially little dimensional change, and thus substantially little distortion, is obtained in the skirt portion. The diluents of the present invention further preserve the mechanical integrity of the xerogel, allowing the xerogel to be machined to final shape, improving the dimensional tolerances which can be achieved in the hybrid lens. | 2008-11-27 |
20080291392 | SYSTEM AND METHOD FOR MARKING AN OPHTHALMIC LENS - A system and method for providing a discernable marking within a contact lens including forming a marking section substantially simultaneously with the formation of a bulk section of said lens. The marking section may be formed entirely during formation of the bulk section or may include preformed elements and may be extruded, inlaid, embedded, injected, or dyed within the bulk section. The bulk section may be formed as a rod, a sheet, or as an injection molded lens. The marking section extends substantially from the front to back surfaces of the lens. | 2008-11-27 |
20080291393 | OPHTHALMIC LENSES FOR PREVENTION OF MYOPIA PROGRESSION - The invention provides ophthalmic lenses useful in preventing myopia progression. The lenses of the invention provide substantially constant distance vision power zone in the center of the optic zone surrounded by a zone that provides positive longitudinal spherical aberration. | 2008-11-27 |
20080291394 | Dual-filter ophthalmic lens to reduce risk of macular degeneration - An improved dual-filter lens for protective eyewear that combines a first filter for blocking essentially 100% of UV light, and second filter for filtering blue light. The first filter may comprise a multi-layered dielectric mirror layer | 2008-11-27 |
20080291395 | ACCOMMODATION COMPENSATION SYSTEMS AND METHODS - Methods and systems for obtaining an ocular aberration measurement of an eye of a patient are provided. Exemplary techniques involve obtaining a first induced metric for the eye that corresponds to a first accommodation state of the eye, obtaining a second induced metric for the eye that corresponds to a second accommodation state of the eye, and determining a natural metric of the eye based on the first and second induced metrics. An induced metric may include a pupil size or a spherical aberration. Techniques can also include determining a target metric for the eye base on the natural metric, determining whether an actual metric of the eye meets the target metric, obtaining an ocular aberration measurement of the eye if the actual metric meets the target metric, and determining a treatment for the eye based on the ocular aberration measurement. | 2008-11-27 |
20080291396 | METHOD AND APPARATUS FOR OBTAINING THE DISTANCE FROM AN OPTICAL MEASUREMENT INSTRUMENT TO AN OBJECT UNDER TEST - Systems and methods for measuring a distance from a reference plane of an optical measurement instrument to a reference plane of an optical device under test are disclose. In one embodiment a system for measuring this distance includes an illumination system, an optical system, and optical sensor and a processor. The illumination system is configured or adapted to illuminate the object under test. The optical system is configured or adapted to receive light from the object under test and to produce an aberrated image. The optical sensor is configured or adapted to receive and sense the aberrated image. The processor determines the distance from the reference plane of the optical measurement instrument to the reference plane of the optical device based on an aspect of the aberrated image sensed by the optical sensor. | 2008-11-27 |
20080291397 | Choroid and Retinal Imaging and Treatment System - The invention provides an apparatus, a device, and methods for imaging vasculature in a subject as well as an apparatus, a device and methods for treating abnormal vasculature in a subject. | 2008-11-27 |
20080291398 | BINOCULAR INDIRECT OPHTHALMOSCOPE FIXATION LIGHT - A binocular indirect opthalmoscope assembly and fixation light system is disclosed for easily directing the patient's line of sight in a direction that places the optic nerve and surrounding vessels in the center of the examiner's view. The fixation system includes two fixation light assemblies that may be mounted onto the binocular indirect opthalmoscope assembly and activated by a motion sensor. | 2008-11-27 |
20080291399 | Polarization Converting Element and Projector Provided with Same - A polarization converting element includes: a main body that is made from a transparent member; an incident section that is provided to the main body, and upon which light generated from a light source is incident; an annular reflecting section that is formed on the periphery of the incident section; and a polarization splitting section that is formed opposite to the annular reflecting section on the emission side of light incident upon the incident section. One polarized light component of the incident light passes through the main body and is emitted from the polarization splitting section. Another polarized light component of the incident light is reflected towards the annular reflecting section by the polarization splitting section, and is emitted from the polarization splitting section after having again been reflected by the annular reflecting section and having been converted into light of a same polarization component as the light of the one polarized light component. | 2008-11-27 |
20080291400 | PROJECTION DISPLAY DEVICE - A mirror unit is operable to reflect light from a lens unit for projection in such a manner that, assuming that a light guiding optical system is divided into two areas with respect to a center axis of light combined by a light combining section such as a dichroic prism, a divided area having a smaller width in a direction perpendicular to the center axis is located on the side of a projection plane as a screen. The mirror unit includes e.g. a bending mirror for bending an optical path of light through the lens unit, and a curved mirror for projecting the light reflected on the bending mirror onto the projection plane. | 2008-11-27 |
20080291401 | ILLUMINANT MODULE AND OPTICAL PROJECTION DEVICE - An illuminant module includes a lamp including a lampwick, a reflector and a guide cap, a lamp holder, a blower, and an axial fan. At least one portion of the lampwick is disposed in the reflector. The guide cap having a guide wall, a first air outlet, and a first air inlet is connected to the reflector and covers an opening of the reflector. The lamp holder has a space where the lamp is disposed, a second air inlet corresponding to the first one, a third air inlet adjacent to the second one, a fourth air inlet adjacent to the third one, a second air outlet corresponding to the first one, and a third air outlet adjacent to the second one. The blower outside the space is disposed at the second air inlet. The axial fan outside the space is disposed adjacent to the third and fourth air inlets. | 2008-11-27 |
20080291402 | Image processing system, projector, computer-readable medium, and image processing method - An image processing system and a projector project a calibration image onto a projection target, sense the calibration image to generate sensing information, and generate projection target region information based on the sensing information. The system and projector generate projection area information based on the sensing information, image distortion correction information based on the projection target region information and the projection area information, and correct an image signal based on the image distortion correction information so that image distortion is corrected. The system and projector project an image based on the image signal corrected by the distortion correction section, determine a first height/width ratio that indicates a height/width ratio of the projection target, generate the image distortion correction information to display an image at a first height/width ratio range and display an image at a desired height/width ratio when the first height/width ratio is not within the acceptable range. | 2008-11-27 |
20080291403 | IMAGE PROJECTION APPARATUS AND OPERATION METHOD THEREOF - An image projection apparatus controls to vary at least one of current, voltage and power of a discharge lamp for each color segment by means of at least two control signals. When the discharge lamp reaches the stable state after turned on, the discharge lamp exhibits the constant voltage characteristic and an amount of light emitted from the lamp is varied in accordance with current or voltage applied thereto. The light amount of the lamp is varied to at least 3 stages simultaneously in accordance with an image signal in synchronism with color to be emphasized and weakened in each color (e.g. red, blue, green and white). | 2008-11-27 |
20080291404 | PROJECTOR AND CONTROL METHOD THEREOF - Disclosed herein is a projector that can be loaded with lamps of a plurality of kinds, each of a plurality of the lamps loadable into the projector being given a lamp serial code formed by arranging lamp information on the lamp and a check sum in predetermined order, the projector including: a control circuit for performing a clocking operation of a lamp timer for managing a use time of the lamp loaded in the projector; and a memory for storing information. | 2008-11-27 |
20080291405 | PROJECTOR AND CONTROL METHOD OF PROJECTOR - A projector includes: an operation unit which receives operation by a user; a projection unit which projects light corresponding to an image signal; and a light intensity control unit which controls light intensity of the light projected by the projection unit. The light intensity control unit controls the light intensity in the order of reception of plural operations received by the operation unit from the user. | 2008-11-27 |
20080291406 | Assembly comprising a radiation source, a reflector and a contaminant barrier - An assembly including a radiation reflector and a contaminant barrier is disclosed. The contaminant barrier is arranged to receive radiation from a radiation source and to reflect that radiation towards the radiation reflector, and the radiation reflector is arranged to reflect the radiation, received from the contaminant barrier, back towards the contaminant barrier. | 2008-11-27 |
20080291407 | Lithographic apparatus and device manufacturing method - A lithographic apparatus is disclosed wherein a liquid supply system is configured to at least partly fill a region between a substrate and a projection system of the lithographic apparatus with a liquid and having a liquid confinement structure fixed in a plane substantially perpendicular to an optical axis of the projection system and configured to cooperate with a substrate table configured to hold the substrate in order to restrict the liquid to a region above an upper surface of the substrate table so that a side of the substrate to be exposed is substantially covered in the liquid during exposure. | 2008-11-27 |
20080291408 | Projection optical system, exposing method, exposure apparatus, and device fabricating method - A projection optical system projects an image of a first surface to a second surface through a liquid. The projection optical system comprises an optical element, wherein the first surface side contacts a gas and the second surface side contacts the liquid. The optical element has an incident surface, which is convex toward the first surface, an emergent surface, an outer circumferential surface between an outer circumference of the incident surface and an outer circumference of the emergent surface, and holding parts, which are formed at a circumferential edge part of the outer circumferential surface so that they project toward the second surface. | 2008-11-27 |
20080291409 | IMMERSION EXPOSURE TECHNIQUE - It is an object of this invention to provide an exposure technique which uses immersion method and is highly practical. For example, an exposure apparatus includes a substrate stage which holds and moves a substrate, and a supply unit which has a supply nozzle and supplies a liquid to the surface of the substrate. The opening of the supply nozzle is arranged at a side of a projection optical system so as to oppose the substrate, and the supply unit supplies the liquid in accordance with movement of the substrate by the substrate stage. | 2008-11-27 |
20080291410 | Exposure apparatus and method for manufacturing device - An immersion exposure apparatus includes an optical member, a supply outlet that supplies a liquid to a space between an upper surface of the optical member and a movable object, and an annular member at least a portion of which is arranged around the optical member, the space between the upper surface of the optical member and the object being filled with the liquid. | 2008-11-27 |
20080291411 | DEVICES AND METHODS FOR REDUCING RESIDUAL RETICLE CHUCKING FORCES - Devices and methods are disclosed for holding an object, particularly a planar object. An exemplary device has a chuck and pressure-changing device. The chuck has an object-mounting surface and a deformable membrane coupled to the object-mounting surface such that conformational changes in the membrane produce corresponding changes in the object-mounting surface. The chuck has a first cavity separated by the membrane from the chuck cavity. The pressure-changing device is coupled to the first cavity to change pressure in the first cavity, relative to outside it, sufficiently to produce a conformational change of the membrane and a corresponding change in the object-mounting surface sufficient to reduce the force with which the object is being held to the object-mounting surface. The pressure change can be a pressure increase or decrease. The change in the object-mounting surface can be, for example, a reduction in area of contact of the object-mounting surface with the object, thereby reducing the holding force. | 2008-11-27 |
20080291412 | Lithographic apparatus and method - A lithographic method is provided that includes using an illumination system to provide a beam of radiation having an illumination mode, using a patterning device to impart the radiation beam with a pattern in its cross-section, and projecting the patterned radiation beam onto a substrate. The illumination mode is adjusted after the radiation beam has been projected onto the substrate. The adjustment is arranged to reduce the effect of optical aberrations due to lens heating on the projected pattern during projection of the pattern onto a subsequent substrate. | 2008-11-27 |
20080291413 | Lithographic apparatus having encoder type position sensor system - A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target. | 2008-11-27 |
20080291414 | EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An exposure apparatus includes a stage configured to hold a substrate; a projection optical system configured to project light from an original onto the substrate; a measurement device configured to measure a position of a surface of the substrate in an optical axis direction of the projection optical system; and a controller configured to i) cause the measurement device to measure positions of the surface with respect to a plurality of points on the surface over a plurality of shot areas, ii) obtain a shape of the surface based on the positions of the surface measured with respect to the plurality of points, and iii) cause the stage to be moved based on the obtained shape between an exposure of a first shot area and an exposure of a second shot area, and the measurement device to measure a position of a surface in the second shot area. | 2008-11-27 |
20080291415 | PATTERN FORMATION METHOD AND PATTERN FORMATION APPARATUS, EXPOSURE METHOD AND EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - In a measurement zone that is spaced apart in a Y-axis direction from an exposure zone that is located immediately below a projection unit, a detection area of an alignment system is moved in the Y-axis direction and a plurality of marks are sequentially detected, and therefore a movement distance of wafer stages in the Y-axis direction when performing the mark detection can be decreased compared with the case where only the wafer stages are moved while fixing the alignment system and mark detection is performed as in the conventional cases. Accordingly, a width of the measurement zone in the Y-axis direction can be reduced, which allows the apparatus to be downsized. | 2008-11-27 |
20080291416 | OPTICAL MEMBER-HOLDING APPARATUS, METHOD FOR ADJUSTING POSITION OF OPTICAL MEMBER, AND EXPOSURE APPARATUS - There is provided is an optical member-holding apparatus which can hold a plurality of optical members of two different optical systems, even when the optical members exist in a common barrel in a mixed manner, such that the relative positions between the optical members can be easily adjusted; and which holds a mirror in a projection optical system and a mirror in an illumination optical system and includes a barrel unit, an inner ring holding the mirror, a holding member holding the mirror, a support plate attached to the barrel unit, and a holding-supporting mechanism attached to the support plate and adjusting the relative position of the mirror to the mirror. | 2008-11-27 |
20080291417 | Laser Beam Conditioning System Comprising Multiple Optical Paths Allowing for Dose Control - A radiation beam conditioning system comprising at least three optical paths in which the radiation is conditioned. | 2008-11-27 |
20080291418 | Method and apparatus for maskless photolithography - A method and apparatus to create two dimensional and three dimensional structures using a maskless photolithography system that is semi-automated, directly reconfigurable, and does not require masks, templates or stencils to create each of the planes or layers on a multi layer two-dimensional or three dimensional structure. In an embodiment, the pattern generator comprises a micromirror array wherein the positioning of the mirrors in the micromirror array and the time duration of exposure can be modulated to produce gray scale patterns to photoform layers of continuously variable thickness. The desired pattern can be designed and stored using conventional computer aided drawing techniques and can be used to control the positioning of the individual mirrors in the micromirror array to reflect the corresponding desired pattern. A fixture for mounting of the substrate can be incorporated and can allow the substrate to be moved three dimensions. The fixture can be rotated in one, two, or three directions. | 2008-11-27 |
20080291419 | PROJECTION OBJECTIVE FOR IMMERSION LITHOGRAPHY - In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium. | 2008-11-27 |
20080291420 | METHOD AND DEVICE FOR IMAGE MEASUREMENT, EXPOSURE APPARATUS, SUBSTRATE FOR IMAGE MEASUREMENT, AND DEVICE MANUFACTURING METHOD - An image measurement method is provided for measuring an image of a pattern of a mask projected with a projection optical system. The method includes the steps of detecting light transmitted through an aperture while a substrate is arranged at an image plane of the projection optical system, the substrate having a slit and the aperture having a width larger than a width of the slit; adjusting an alignment angle of the slit on the basis of a signal related to the light detected in the detecting; and measuring the image by detecting light transmitted through the slit while moving the slit, the alignment angle of which has been adjusted in the adjusting, in the image plane of the projection optical system. | 2008-11-27 |
20080291421 | EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE FABRICATION METHOD - The present invention provides an exposure apparatus which exposes a substrate via a liquid, comprising a measurement substrate includes a transmission part configured to transmit a light beam having passed through a projection optical system, a light-receiving unit including a light-receiving surface configured to receive the light beam transmitted through the liquid and the transmission part, and a calculator configured to arithmetically convert a light intensity distribution, on the light-receiving surface, of the light beam received by the light-receiving surface into a light intensity distribution on a pupil plane of the projection optical system, based on information indicating a correlation between a position coordinate on the light-receiving surface and a position coordinate on the pupil of the projection optical system. | 2008-11-27 |
20080291422 | Light Attenuating Filter for Correcting Field Dependent Ellipticity and Uniformity - Ellipticity in an illumination beam may be corrected by measuring an ellipticity of the illumination beam and substantially eliminating the ellipticity using a light attenuating filter at a defocus position of the illumination beam, wherein the light attenuating filter has a two-dimensional pattern that compensates for ellipticity variations in the illumination beam. The light attenuating filter may stand alone, or the filter may be combined with a uniformity correction system, such that it corrects both uniformity and ellipticity. In one embodiment, the light attenuating filter is printed with an assembly of microscopic dots according to the two-dimensional pattern. | 2008-11-27 |
20080291423 | OPTICAL FRINGE GENERATION MEMBER CONTROL APPARATUS AND METHOD THEREFOR - An optical fringe generation member control apparatus includes a detection unit configured to detect an optical fringe, and a control unit configured to control operation of a member on which the optical fringe is generated, based on a detection result by the detection unit. | 2008-11-27 |
20080291424 | HYDROGEL-ACTUATED MICROMIRRORS FOR OPTICAL SENSING - A thin, deformable member may be fixed at one end, while another portion of the member rests on a hydrogel substance whose thickness changes depending on a characteristic of a liquid that permeates the hydrogel. When the hydrogel changes thickness and causes part of the member to tilt, a reflective surface on the member may reflect light in a different direction. Appropriate sensors may detect the change in the direction of the reflected light, allowing determination of the change in thickness, which in turn permits determination of the relevant characteristic of the liquid. | 2008-11-27 |
20080291425 | Removable sorting cuvette and nozzle - A flow cell and flow cytometer in which a nozzle at the end of a flow channel is disposed on a removable substrate held at a registered location on a flow cell. Other elements including illumination optics, light collection optics, and the flow cell may then be positioned at fixed locations and would not require subsequent periodic adjustment. The registered location for positioning the nozzle allows removal and replacement of the nozzle key with the nozzle subsequently positioned in the identical location. | 2008-11-27 |
20080291426 | OPTICAL MEASUREMENT OF SAMPLES - We disclose apparatus that includes: (a) an enclosure including an aperture; (b) a prism mounted in the enclosure so that a surface of the prism is exposed through the aperture; (c) an optical assembly contained within the enclosure, the optical assembly including a radiation source and a radiation detector, the source being configured to direct radiation towards the prism and the detector being configured to detect radiation from the source reflected from the exposed surface of the prism; and (d) an electronic processor contained within the enclosure, the electronic processor being in communication with the detector. The apparatus can be configured so that, during operation, the electronic processor determines information about a sample placed in contact with the exposed surface of the prism based on radiation reflected from the exposed prism surface while it is in contact with the sample. | 2008-11-27 |
20080291427 | Optical Imaging Device Suitable for Forming Images of Fingerprints - An optical imaging device for forming optical images of fingerprints of a finger, the device comprising: an optical plate having a portion at one end of a main face that is provided for illuminating the finger through the plate, the reflected light beam propagating with multiple reflections inside the plate to the other end thereof, which end presents an inclined end face; a focusing lens facing the end face with the lens having its axis situated in the midplane of the plate; and a mirror for directing the light beam leaving the end face onto the axis of the lens. | 2008-11-27 |
20080291428 | FULL SPECTRUM ADAPTIVE FILTERING (FSAF) FOR LOW OPEN AREA ENDPOINT DETECTION - A method for precise endpoint detection during etch processing of a substrate based on adaptive filtering of the optical emission spectrum (OES) data, even in low open area etching, is provided. Endpoint detection performed in this manner offers the benefits of increased signal-to-noise ratio and decreased computation costs and delay when compared to conventional endpoint detection techniques. | 2008-11-27 |
20080291429 | AUTOMATED PROCESS CONTROL USING PARAMETERS DETERMINED FROM A PHOTOMASK COVERED BY A PELLICLE - Provided is a method of controlling a photolithography cluster or a subsequent fabrication cluster using optical metrology to determine profile parameters of a photomask structure covered with a pellicle. An optical metrology model of the pellicle is developed and integrated with the optical metrology model of the photomask structure. The optical metrology model of the photomask taking into account the optical effects on the illumination and detection beams transmitted through the pellicle and diffracted by the photomask structure. One or more profile parameters of the photomask structure is determined and used to adjust one or more process parameters or equipment settings of a photolithography cluster using the photomask or a subsequent fabrication cluster. | 2008-11-27 |
20080291430 | DISPLAY DEVICE AND DETECTION METHOD - A display device includes display pixels that display an image on a display screen. First and second optical sensors correspond to one or more of the display pixels and detect the amount of incident light. An optical member allows light coming from a first direction to enter the first optical sensors and light coming from a second direction to enter the second optical sensors. A memory circuit stores a first detection result that is detected in a first time period by means of the first optical sensors and stores a second detection result that is detected in the first time period by means of the second optical sensors. A comparison circuit compares sequential detection results to permit a judgment circuit to determine whether the display screen has been touched with a detection target medium. | 2008-11-27 |
20080291431 | APPARATUS FOR MONITORING OPTICAL OBSTRUCTIONS IN AN OPTICAL SPLIT NETWORK AND METHOD THEREOF - An apparatus and method for monitoring optical fiber obstructions in an optical split network is described. The monitoring apparatus comprises a broadband-monitoring light source module, an optical circulator, an optical spectral analyzer, a high-density multi-wavelength ODTR, a controlling computer, a wavelength division multiplexer, a specific wavelength optical filter, a monitoring-waveband reflector, and an optical channel selector. The monitoring apparatus utilizes the specific wavelength optical filter and the monitoring-waveband reflector to collectively construct an optical split network optical fiber obstruction monitoring apparatus for the passive optical network having multiple split routes by filtering, reflecting, and transmitting coming lights, so as to achieve the purposes of locating the obstructed split routes and obstruction locations at the same time. | 2008-11-27 |
20080291432 | SYSTEM AND METHOD FOR MONITORING THE COUPLING EFFICIENCY OF A FIBER-OPTIC SURGICAL SYSTEM - Embodiments of the present invention provide a system and method for allowing a user to monitor the coupling efficiency of a fiber-optic surgical system. An embodiment of the present invention can include: an energy source to produce a beam of light, a fiber in optical communication with the energy source and a set of light sensors positioned to detect scattered light from the beam of light scattered proximate to the entrance of the fiber. | 2008-11-27 |
20080291433 | Lens Meter - The present invention has an object to provides a lens meter which readily enables alignment of a progressive lens even by an inexperienced examiner. A lens meter of the present invention comprises a lens meter for measuring optical characteristics of a target lens to be measured, comprising: a measurement optical system including a light source which projects a measurement light beam to the target lens and a light receiving sensor which receives the measurement light beam having passed through the target lens; an arithmetic part which obtains the optical characteristics of the target lens based on a received result by the light receiving snsor; mode selecting means which selects between a single focal lens measurement mode and a progressive lens measurement mode; detecting means which detects a direction and a degree of displacement of a current measurement position from a near vision portion of a progressive lens which is the target lens based on the optical characteristics obtained at a plurality of positions when the progressive lens measurement mode is selected and alignment is made to bring the measurement position into the near vision portion; a display which displays an alignment screen; and a display control part which causes the display, based on a detection result by the detection means, to display a guide mark indicatin a direction in which and an amount by which the lens must be moved to bring the measurement position into the near vision portion. | 2008-11-27 |
20080291434 | Optoelectric Angle-Measuring Device - An optoelectric angle-measuring device according to the invention has a code carrier having a position code (C | 2008-11-27 |
20080291435 | POSITION DETECTOR, POSITION DETECTING METHOD AND ANALYZER - A position detector is for detecting a position of liquid held in a vessel. The position detector includes a sound wave generator disposed in contact with the vessel and having a plurality of sound generating elements for generating a sound wave by electrical energy; and a measuring unit that measures electrical characteristics of each of the sound generating elements based on the electrical energy reflected from each of the sound generating elements. The position detector also includes a determining unit that determines the presence or absence of the liquid at a position of each of the sound generating elements based on difference in the electrical characteristics measured at the measuring unit. | 2008-11-27 |
20080291436 | Defect inspection system - A defect inspection system can suppress an effect of light from a sample rough surface or a regular circuit pattern and increasing a gain of light from a defect such as a foreign material to detect the defect on the sample surface with high sensitivity. When a lens with a large NA value is used, the outer diameter of the lens is | 2008-11-27 |
20080291437 | METHOD OF INSPECTING A SEMICONDUCTOR DEVICE AND AN APPARATUS THEREOF - A method and apparatus of inspecting a sample, in which the sample is inspected under a plurality of inspection conditions, and inspection data obtained by inspecting the sample under each of the plurality of inspection conditions and position information on the sample of the inspection date in correspondence with the respective inspection conditions, are stored. The inspection data for each of the plurality of inspection conditions is against each other by the use of the position information on the sample to determine a position to be inspected in detail, and an image of the sample at a position to be inspected in detail is obtained. The obtained image is classified, the inspection condition of the sample by the use of information of classification of the image is determined. | 2008-11-27 |
20080291438 | Apparatus and Method for Checking of Containers - A method for detecting one or more foreign substances in one or more containers filled with liquid, comprising of: transporting the containers filled with liquid in a substantially straight line at relatively high speed in a production environment; —illuminating each container with content with one or more fixedly disposed light sources; and —inspecting the container with content from preferably two or more different orientations using two or more cameras, wherein cameras and lighting are disposed substantially fixedly relative to each other, while the cameras and light sources are mutually connected such that in a short time two or more images of a container filled with liquid can be recorded with mutually differing illumination and/or angle of incidence; —comparing the foreign substances in the two or more images; and —wherein a container filled with liquid is rejected on the basis of the probability distribution obtained from the comparisons, wherein above a determined probability it is concluded that the foreign substance is a glass particle or other undesirable particle. | 2008-11-27 |
20080291439 | APPARATUS AND METHODS FOR CONTAINER INSPECTION - Apparatus, systems, and methods to recognize features on bottom surfaces of metal containers on a metal container production line, detect defects in the metal containers, and correlate the defects to specific production equipment of the metal container production line, based in part on the recognized features. The system includes imaging apparatus, programmable processing devices, and controllers. The methods include imaging techniques and estimation techniques. | 2008-11-27 |
20080291440 | APPARATUS AND METHODS FOR CONTAINER INSPECTION - Apparatus, systems, and methods to recognize features on bottom surfaces of containers on a container production line, detect defects in the containers, and correlate the defects to specific production equipment of the container production line, based in part on the recognized features. The system includes imaging apparatus, programmable processing devices, and controllers. The methods include imaging techniques and estimation techniques. | 2008-11-27 |
20080291441 | Spectroscopic Support - A porous sample support provides a matrix into the pores or interstitial spaces of which a sample to be subjected to a spectroscopic analysis can be introduced. 2 D infrared spectroscopy can then be carried out on the sample at higher concentrations with minimized background. | 2008-11-27 |
20080291442 | Chemical and biological sensing using metallic particles in amplifying and absorbing media - A film for surface enhanced raman scattering may be utilized for chemical and biological sensing. The film includes a polymeric layer, and a metallic nanoparticle having a cross-section, the metallic nanoparticle being embedded in the polymeric layer. The polymeric layer has a thickness less than a largest straight line through the cross-section of said metallic nanoparticle. The polymeric layer is selected from a group of absorbing media and amplifying media, and the metallic nanoparticle may be gold. The metallic nanoparticle may also be a shape selected from a group of spheroids and rods. | 2008-11-27 |
20080291443 | Cars microscopy and spectroscopy using ultrafast chirped pulses - Linear chirped pulses in a Raman excitation scheme provide selective excitation of only one target transition (single mode) in a molecule without disturbing any other transitions or molecules. Selectivity is guaranteed by the adiabaticity of the pulse excitation, which allows manipulation by only a resonant mode while leaving all of the other modes unperturbed. This in turn allows for enhanced imaging or spectroscopic analysis of a sample that contains one or more of the molecules. | 2008-11-27 |
20080291444 | Method of Spectroscopy - A method of multidimensional spectroscopy has a controllable excitation source parameter and comprises controlling said controllable parameter to excite a vibrational mode of the sample, generating a homodyne reflected signal from the sample and obtaining a spectrum of the sample from the reflected signal. | 2008-11-27 |
20080291445 | Spectroscopic instrument, image producing device, spectroscopic method, and image producing method - The spectroscopic instrument includes a plurality of first lenses arranged one-dimensionally or two-dimensionally; an aperture opening provided near a focal plane of each of the plurality of first lenses; a spectroscopic unit that spectrally distribute the light that has passed through the aperture opening; and a light receiving unit that receives the light spectrally distributed by the spectroscopic unit. The image producing device includes: the spectroscopic instrument; an imaging unit that captures an image formed by an imaging optical system; and an image processing unit that acquires a lighting condition from a result of spectroscopy by the spectroscopic instrument and performs color conversion processing depending on the lighting condition on an image captured by the imaging unit. | 2008-11-27 |
20080291446 | OPTICAL SENSING DEVICE - An optical sensing system and method are disclosed. The optical sensing system includes one or more bus waveguides. A first bus waveguide includes an input port that is in optical communication with a light source. The system further includes a microresonator optically coupled to the bus waveguides and an optical scattering center configured for alteration of a strength of optical coupling between the optical scattering center and the microresonator. In addition, the system includes a detector in optical communication one of the bus waveguides or the microresonator. | 2008-11-27 |
20080291447 | Optical Chromatic Aberration Correction and Calibration in Digital Cameras - Methods and the corresponding device are presented for the correction of lateral chromatic aberration within a digital camera or other imaging device, using calibration approaches that do not require previously acquired lens data to effect the correction. An in-camera auto-calibration procedure is performed on the attached lens, such as when a lens is exchanged, and extracts parameters required for chromatic aberration correction, respecting zoom and focus, from one or more captured images. Based on image data extracted as a plurality of channels of a chromatic decomposition of the image, the chromatic aberration information for the lens is extracted. From the chromatic aberration information, the correction factors for the lens are determined. | 2008-11-27 |
20080291448 | METHODS AND APPARATUS FOR FINDING A SUBSTRATE NOTCH CENTER - Methods and apparatus are provided for locating a notch and/or a center of the notch of a substrate. An exemplary method includes rotating a substrate; illuminating an edge of the substrate with a light beam as the substrate rotates; detecting a change in light intensity of the light beam as the substrate rotates; determining a rough location of a notch in the edge of the substrate based on a position of the substrate when the change in light intensity of the light beam is detected; and reversing a rotational direction of the substrate to determine a fine location of the notch in the edge of the substrate. Numerous other aspects are provided. | 2008-11-27 |
20080291449 | System for color match and digital color display - The present invention is directed to a system for digital displaying images of various colors and appearances of an article and the use thereof. The invention is particularly directed to a system for displaying images for selecting one or more matching formulas to match color and appearance of an article. The invention is even further directed to a system for displaying images for selecting one or more matching formulas to match color and appearance of a target coating of a vehicle. | 2008-11-27 |
20080291450 | Wavelength Monitoring Method and Apparatus and Method of Making Same - A wavelength of an optical source is monitored by first and second adjacent detectors on a common base. A bulk reflective component has first and second partially reflective surfaces that respectively direct first and second portions of energy from the source to the first and second detectors. A wavelength discriminator is positioned between the first detector and first surface. An optical isolator downstream of the reflective component prevents radiation from the source and exiting the component from being coupled to the detectors and back to the source. | 2008-11-27 |
20080291451 | Composite Sheet Material Selection Method for Use in Ultra-Fast Laser Patterning - The present invention is a method of selecting composite sheet materials for use in ultra-fast laser patterning of layers of organic thin film material such as OLEDs. The material is selected to accomplish patterning of upper layers without damaging underlying layers by using an ultra-fast laser programmed with the appropriate laser processing parameters. These parameters are derived by examining each layer's absorption spectra, thermal, and chemical characteristics. The method of the present invention includes measuring each layer's absorption spectrum, examining each layer's thermal and chemical characteristics, determining if the layer is ablatable, determining the laser setup, patterning the layer through laser ablation processing, and determining if more layers need to be ablated. Further, the method includes a sub-method of selecting an alternate material if a layer's material characteristics are not favorable for ablation without damaging underlying layers. | 2008-11-27 |
20080291452 | Optical Switching Device - Optical switching device comprising a substrate on which a magnesium transition metal layer such as a magnesium nickel metal layer is provided. At supplying of hydrogen the magnesium transition metal layer is, starting from the substrate, converted to a magnesium transition metal hydride layer. This has optical properties different from the magnesium transition metal layer. The change in optical properties viewed from the transparent substrate side can change from reflective to transparent wherein a black phase is in between. To obtain and maintain this black phase is relatively critical. However, there are many applications in which such a black phase could be very useful. In order to be able to obtain a stable black phase according to the invention it is proposed to have a relatively thin magnesium metal layer for example of 50 nm at the maximum and to provide an auxiliary layer on top of the magnesium transition metal layer. | 2008-11-27 |
20080291453 | Surface Plasmon Resonance Phenomenon Measuring Equipment - The present invention discloses surface plasmon resonance phenomenon measuring equipment comprising:
| 2008-11-27 |
20080291454 | Inspection Systems and Methods for Extending the Detection Range of an Inspection System by Forcing the Photodetector into the Non-Linear Range - An inspection system and method is provided herein for increasing the detection range of the inspection system. According to one embodiment, the inspection system may include a photodetector having a plurality of stages, which are adapted to convert light scattered from a specimen into an output signal, and a voltage divider network coupled for extending the detection range of the photodetector (and thus, the detection range of the inspection system) by saturating at least one of the stages. This forces the photodetector to operate in a non-linear manner. However, measurement inaccuracies are avoided by calibrating the photodetector output to remove any non-linear effects that may be created by intentionally saturating the at least one of the stages. In one example, a table of values may be generated during a calibration phase to convert the photodetector output into an actual amount of scattered light. | 2008-11-27 |
20080291455 | Active Light Sensor - An apparatus is described for assessing plant status remotely sensed by the invention thereby allowing selective monitoring or treatment of individual plants. Additionally, the apparatus may be utilized for measuring the reflectance characteristics of soil or of objects in general. The apparatus utilizes a solid state light source to illuminate a plant canopy or object under investigation. An array of spectrally sensitive photosensors are incorporated into the apparatus to detect light reflected from a plant or object resulting from the integral light source. The instrument may be mounted to a vehicle, mounted to a tripod or held in the hand of an operator for use. A controller can be used in conjunction with the invention to analyze measured reflectance signals and can respond by activating a device to take some action with respect to the plant and/or object or store the analyzed signals with corresponding DGPS position in the controller's memory for later analysis. | 2008-11-27 |
20080291456 | Sensor apparatus and method using optical interferometry - A sensor apparatus and method includes a sensor head with at least two surfaces separated by a gap. One surface is mechanically fixed, a second surface is free to move and deflections of the second surface relative to the first surface are monitored by optical interferometry. In one embodiment, an optical fiber is used to direct light from a light source to the sensor and collect light reflected by the sensor. In alternate embodiments the sensor apparatus includes integrated optical elements, free-space optics, and direct laser-diode sensing. In operation, interaction of molecules or other objects in the sample with the second surface is detected as a change in amplitude and/or phase of deflection the second surface in response to an applied driving signal. A layer of binding molecules may be immobilized on the second surface and this surface exposed to a sample. The invention includes a method for detecting an analyte in a sample, including detecting the presence of analyte, the amount of analyte or the rate of association and/or dissociation of the analyte with a binding partner. | 2008-11-27 |
20080291457 | Optical Displacement Sensor - An optical displacement sensor for sensing an environmental stimulus is disclosed. The optical displacement sensor exhibits an optical design that has suppressed back reflection and improved alignment tolerance between its optical components. The sensor is based on an optically resonant cavity whose cavity length is affected by the environmental stimulus. An embodiment of the present invention utilizes a lens to redirect a first light signal toward an optically resonant cavity such that the light is incident on the cavity at a non-normal angle of incidence. | 2008-11-27 |
20080291458 | Holographic interferometry for non-destructive testing of power sources - The present invention is connected with the holographic interferometry method and device that provides, to a very high precision, the reconstructing the original waveform of light emitted or reflected by an object. This method allows image resolution close to that of the wavelength of the light being used. The non-destructive method of holographic interferometry coupled with impulse heating of the test article to allow observation of its dynamic response to operating conditions, as described herein, is one of the most effective non-contact automated quality control methods available. | 2008-11-27 |
20080291459 | Fiber optic gyroscope with integrated light source - An integrated module for a fiber optic gyroscope system includes a fiber optic sensing coil arranged to sense rotations about a sensing axis via the Sagnac effect comprises a substrate, an optical waveguide formed on the substrate, a light source comprising a doped waveguide formed on the substrate. The light source and the optical waveguide are arranged to produce counterpropagating light waves in the fiber optic sensing coil. The light source may be formed as a rare earth doped polymer waveguide or as a rare earth doped glass waveguide. | 2008-11-27 |
20080291460 | Opto-Electronic System and Method for Detecting Perturbations - A method for detecting and measuring physical perturbations sensed by a multi-mode waveguide, through which a number of modes of a coherent electromagnetic wave propagates through and exit from. The method comprises irradiating the exiting electromagnetic wave on one or more two-dimensional sensing arrays comprising a plurality of sensing elements that are sensitive to the irradiated electromagnetic wave; determining, simultaneously, in a parallel manner, absolute values of sensed changes across different zones of the two-dimensional sensing arrays, each zone comprising one or more sensing elements; and summing the absolute values of different groups of different zones to obtain a representation of the perturbations. | 2008-11-27 |
20080291461 | METHOD AND APPARATUS FOR SUPPRESSION OF CROSSTALK AND NOISE IN TIME-DIVISION MULTIPLEXED INTERFEROMETRIC SENSOR SYSTEMS - Unwanted signal components in time-division multiplexed (TDM) systems may lead to crosstalk and noise if these pulses overlap with signal pulses from an interrogated sensor. The crosstalk and noise are dominated by interference between the signal pulses from the interrogated sensor and the unwanted signal components and can be greatly reduced by suppressing this interference signal. The unwanted signal components may include overlapping pulses originating from different sets of interrogation pulses (repetition periods). Modulating the phase or frequency between the repetition periods so that the unwanted interference signal does not appear at frequencies from which the phase of the interrogated sensor is demodulated suppresses this interference. Other unwanted signal components include leakage light during dark periods of the duty cycle of an interrogation signal. Modulating the phase difference between the interrogation signal and the leakage light suppresses the interference between the leakage light and the interrogation signal. | 2008-11-27 |
20080291462 | APPARATUS AND METHOD FOR USING A COUNTER-PROPAGATING SIGNAL METHOD FOR LOCATING EVENTS - An apparatus and method for using a counter-propagating signal method for locating events is disclosed. The apparatus and method uses a Mach Zehnder interferometer through which counter-propagating signals can be launched. If the sensing zone of the Mach Zehnder interferometer is disturbed, modified counter-propagating signals are produced, and the time difference between receipt of those signals is used to determine the location of the event. Polarisation controllers receive feedback signals so that the polarisation states of the counter-propagating signals can be controlled to match the amplitude and/or phase of the signals. Detectors are provided for detecting the modified signals. | 2008-11-27 |
20080291463 | POLARIZATION-SENSITIVE SPECTRAL INTERFEROMETRY - A polarization sensitive spectral interferometer apparatus and method for analyzing a sample. The polarization sensitive spectral interferometer apparatus and method determines polarization properties of the sample. | 2008-11-27 |
20080291464 | INTERFEROMETRIC POSITION-MEASURING DEVICES AND METHODS - Process tools and methods are disclosed that involve interferometric and other measurements of movements and positions relative to a process position, such as movements and positions of a stage relative to a lithographic optical system. An exemplary apparatus includes a stage that places a workpiece relative to the tool, and that is movable in at least one direction relative to the tool. At least one first interferometer system is situated relative to the stage to determine stage position in a movement direction relative to the process position. A movement-measuring device determines displacement of the tool from the process position. Using data from the interferometer system and movement-measuring device a processor determines a position of the stage relative to the tool. The processor also corrects the determined position for displacement of the tool. | 2008-11-27 |
20080291465 | NON-DESTRUCTIVE INSPECTION USING LASER-ULTRASOUND AND INFRARED THERMOGRAPHY - An inspection system is provided to examine internal structures of a target material. This inspection system includes a generation laser, an ultrasonic detection system, a thermal imaging system, and a processor/control module. The generation laser produces a pulsed laser beam that is operable to induce ultrasonic displacements and thermal transients at the target material. The ultrasonic detection system detects ultrasonic surface displacements at the target material. The thermal imaging system detects thermal transients at the target material. The processor analyzes both detected ultrasonic displacements and thermal imagery of the target material to yield information about the target material's internal structure. | 2008-11-27 |
20080291466 | METHOD AND DEVICE FOR NON-CONTACT OSCILLATION MEASUREMENTS - A method and a device to measure oscillations of an object. The method includes the processing steps: Determining at least one point of the object to be measured, moving at least one laser interferometer fastened on a carrier into a measuring position for measuring the measuring point on the object, emitting at least one measuring beam of the laser interferometer to at least one measuring point on the object, detecting the measuring beam reflected by the object, determining the oscillation data from the emitted and reflected measuring beam, allocating the oscillation data to the measuring point, as well as evaluating the oscillation data and displaying the oscillation data of the measuring point, with at least one comparison of a position of the laser interferometer being performed using at least one position of a known freely predetermined point on the object and a transformation rule being prepared to determine the position of the laser interferometer in reference to the object for arbitrary measuring positions based on the comparison. The device for measuring oscillations includes at least one laser interferometer with a measuring beam emitter and a detector for the measuring beam reflected by the object, a movably arranged carrier on which the laser interferometer is mounted, a control unit to control the carrier arranged in a mobile fashion, as well as a data collection and processing device to record and process oscillation data cooperating with the emitter and detector and with the carrier. A device is provided to calculate measuring positions of the laser interferometer, with the calculation of the measuring positions comprising a direct or indirect comparison of the position of a known point on the object to the position of the laser interferometer. | 2008-11-27 |
20080291467 | DETERMINING ONE OR MORE PROFILE PARAMETERS OF A PHOTOMASK COVERED BY A PELLICLE - Provided is a method of determining one or more profile parameters of a photomask covered with a pellicle, the method comprising developing an optical metrology model of a pellicle covering a photomask, developing an optical metrology model of the photomask, the photomask separated from the pellicle by a medium and having a structure, the structure having profile parameters, the optical metrology model of the photomask taking into account the optical effects on the illumination beam transmitted through the pellicle and diffracted by the photomask structure. The optical metrology model of the pellicle and the optical metrology model of the photomask structure are integrated and optimized. At least one profile parameters of the photomask structure is determined using the optimized integrated optical metrology model. | 2008-11-27 |
20080291468 | Apparatus and method for measuring height of protuberances - The height of protuberances present on the surface of a product, typically a bump wafer, can be measured with a high accuracy irrespective of the state of the upper surfaces of the protuberances. In the signal processor of a bump height measuring apparatus, a bump height measurement area setting section set a bump height measurement area by the bump layout information, a statistical application section averages the height data in an statistical calculation within the measurement area, a contour line calculating section calculates a contour line of a section of the bump, and a bump height determining section determines a peak value in the contour line as the height of the bump. | 2008-11-27 |
20080291469 | Optoelectronic Device and Resilient Member Therefor - The present invention relates to an optoelectronic device for determining relative movements or relative positions of two objects, comprising a first object fixed relative to a frame of the device; a second object mounted in spaced relation to the first object and adapted for movement relative thereto; and at least one measuring cell for determining movement or displacement of the second object relative to the first object. The present invention provides a resilient member arranged between the first object and the second object for dampening relative movements, wherein the resilient member substantially surrounds the at least one measuring cell. | 2008-11-27 |
20080291470 | SYSTEM ARCHITECTURE FOR SENSING AN ABSOLUTE POSITION USING A TARGET PATTERN - A location system and a location system on a chip (LCoS) and method are described. | 2008-11-27 |
20080291471 | Dynamic advertisement allocation - Methods, apparatuses and systems for providing one or more advertisements on a printout of a print job are provided. The advertisements are selected based on dynamic selection criteria. | 2008-11-27 |
20080291472 | Line Head and Image Forming Apparatus Incorporating the Same - In a line head, a plurality of element arrays arranged in a first direction. Each array includes a plurality of light emission elements arrayed in a second direction which is perpendicularly to the first direction, The light emission elements emit light for forming an electrostatic latent image on a photosensitive surface of an image carrier. A switcher activates the light emission elements in at least one of the element arrays while deactivating the others. A developer develops the latent image as a visible image with toner. | 2008-11-27 |
20080291473 | IMAGE DATA GENERATING METHOD, PRINTING METHOD, IMAGE DATA GENERATING APPARATUS, AND PRINTER - A head in a printer has an outlet row including a plurality of outlets arranged in a width direction perpendicular to a scan direction. A threshold matrix is stored in a main body control part, and sleep elements representing sleep of ejection of ink are arranged in the threshold matrix at a regular interval in each element row which is a plurality of elements arranged in a row direction corresponding to the width direction. The threshold matrix is compared with a grayscale original image to generate data of a halftone image where during printing, the number of outlets included in each outlet group not brought into sleep state continuously in the width direction is made equal to or larger than 1 and equal to or smaller than a predetermined number. Thus, it is possible to easily suppress occurrence of unevenness in a printed image, caused by cross talk between outlets. | 2008-11-27 |