Class / Patent application number | Description | Number of patent applications / Date published |
430017000 | Nonsilver image | 13 |
20120094222 | PHOTOCURABLE RESIN COMPOSITION, DRY FILM THEREOF, PATTERN FORMING METHOD, AND ELECTRICAL/ELECTRONIC PART PROTECTIVE FILM - A photocurable composition includes:
| 04-19-2012 |
20140147775 | NOVEL INK FORMULATION - The disclosed invention relates to the use of molybdenum (VI) peroxo complex containing an amino acid, such as MoO(O | 05-29-2014 |
20140287349 | THIOSULFATE POLYMER COMPOSITIONS AND ARTICLES - A thiosulfate polymer composition includes an electron-accepting photosensitizer component, either as a separate compound or as an attachment to the thiosulfate polymer. The thiosulfate polymer composition can be applied to various articles, or used to form a predetermined polymeric pattern after photothermal reaction to form crosslinked disulfide bonds, removing non-crosslinked polymer, and reaction with a disulfide-reactive material. Such thiosulfate polymer compositions can also be used to sequester metals in nanoparticulate form, and as a way for shaping human hair in hairdressing operations. | 09-25-2014 |
20150370170 | PATTERN FORMING METHOD, ELECTRON BEAM- OR EXTREME ULTRAVIOLET-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, METHOD OF MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE - According to one aspect of the present invention, there is provided a pattern forming method comprising, in this order:
| 12-24-2015 |
20150378257 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE - According to one example of the present application, there is provided a pattern forming method including: (i) forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a specific resin and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) exposing the film; and (iii) developing the film exposed, by using an organic solvent-containing developer to form a negative pattern. | 12-31-2015 |
20160004163 | LITHOGRAPHICALLY PRODUCED FEATURES - The present invention relates to a method for modifying line edge roughness on a lithographically-produced feature in a material, the method comprising applying a block copolymer to an area on the feature having line edge roughness, the block copolymer comprising a charged hydrophilic polymer block and a non-charged hydrophilic polymer block. | 01-07-2016 |
20160009737 | PHOTOBASE GENERATOR | 01-14-2016 |
20160011517 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD OF MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE | 01-14-2016 |
20160016919 | PHOTO-SENSITIVE RESIN COMPOSITION, CURED FILM, METHOD FOR FORMING A PIXEL, SOLID STATE IMAGE SENSOR, COLOR FILTER AND ULTRAVIOLET ABSORBER - Provided is a photo-sensitive composition capable of yielding pixels having a high translucency and a large refractive index, with a less amount of development residue in the process of formation. The photo-sensitive resin composition contains an ultraviolet absorber represented by Formula (I); a photo-polymerization initiator; and a polymerizable monomer: wherein each of R | 01-21-2016 |
20160024005 | COMPOUND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING SAME, AND ELECTRONIC DEVICE - There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a compound represented by the following formula (1) or (2), and the formula (1) and (2) are defined as herein, | 01-28-2016 |
20160033865 | SILICONE STRUCTURE-BEARING POLYMER, NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM, PATTERNING PROCESS, AND ELECTRIC/ELECTRONIC PART-PROTECTING FILM - A silicone structure-bearing polymer comprising recurring units derived from a bis(4-hydroxy-3-allylphenyl) derivative and having a Mw of 3,000-500,000 is provided. A chemically amplified negative resist composition comprising the polymer overcomes the stripping problem that a coating is stripped from metal wirings of Cu or Al, electrodes, and SiN substrates. | 02-04-2016 |
20160062258 | ELECTROPHOTOGRAPHIC PRINTING - The present disclosure relates to a liquid electrophotographic ink composition comprising clay platelets. Also disclosed herein is a method for electrophotographic printing, and a print substrate. | 03-03-2016 |
20160177099 | Powder, Method For Preventing Bleeding Of Dye, And Method For Improving Dyeing Properties | 06-23-2016 |