Class / Patent application number | Description | Number of patent applications / Date published |
378034000 | Lithography | 16 |
20080285713 | EXPOSURE APPARATUS - An EUV exposure apparatus is configured to maintain the reflective index of the optical element as high as possible and to minimize the maintenance frequency of the optical element by restraining attachments of released gas particles by degasifying to the optical element. An exposure apparatus is configured to expose a pattern of an original on a substrate by using extreme ultraviolet light. The exposure apparatus includes an optical element configured to receive the extreme ultraviolet light, a barrel configured to support the optical element, a chamber configured to store the barrel, and a partition wall configured outside and around an optical path of the extreme ultraviolet light in the barrel. | 11-20-2008 |
20080298542 | Image Producing Methods and Image Producing Devices - The invention relates to microlithography and can be used, for instance for producing integrated circuits or structures having a sub-micron resolution. An image is produced with the aid of the stepped displacement, including continuous displacement of the radiator matrix(es) and/or a material sensitive to a used radiation at a step which is less than d. The diameter of the radiation flux at the output of each radiator is less than 100 nm. The sizes of the radiator matrixes can be equal to or greater than an image size. The displacements are carried out at distances which are equal or less than a maximum center-to-center distance of two adjacent radiators. A matrix of waveguides which are connected to at least one radiation source and made of fibre-optic waveguides having thinned ends or embodied in the form of microcones made of a material which is transparent for the used radiation is used as the radiator matrix. An emissive emitter matrix can also be used in the form of said radiator matrix. Said invention makes it possible to radically simplify a technological process for producing high-resolution images and used equipment | 12-04-2008 |
20090041182 | ILLUMINATION SYSTEM FOR EUV LITHOGRAPHY - The disclosure relates to an illumination system for EUV lithography, as well as related elements, systems and methods. In some embodiments, an illumination system includes a first optical element and a second optical element. The first optical element can include a plurality of first facet elements configured so that, when impinged by respective partial beams of radiation, the plurality of first facet elements produce secondary light sources. The second optical element can include a second optical element including a plurality of second facet elements. Each of the plurality of second facet elements can be assigned to at least one of the plurality of first facet elements. The plurality of second facet elements can be configured to be impinged by the radiation via the first optical element. | 02-12-2009 |
20090154642 | System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus - A gas flow management system may comprise a first and second enclosing walls at least partially surrounding first and second respective spaces; a system generating plasma in the first space, the plasma emitting extreme ultraviolet light; an elongated body restricting flow from the first space to the second space, the body at least partially surrounding a passageway and having a first open end allowing EUV light to enter the passageway from the first space and a second open end allowing EUV light to exit the passageway into the second space, the body shaped to establish a location having a reduced cross-sectional area relative to the first and second ends; and a flow of gas exiting an aperture, the aperture positioned to introduce gas into the passageway at a position between the first end of the body and the location having a reduced cross-sectional area. | 06-18-2009 |
20100091941 | MULTI-REFLECTION OPTICAL SYSTEMS AND THEIR FABRICATION - A reflective optical system, in which radiation from a radiation source is directed to an image focus or intermediate focus, including one or more mirrors (symmetric about the optical axis). Each mirror has at least first and second reflective surfaces, whereby radiation from the source undergoes successive grazing incidence reflections in an optical path at first and second reflective surfaces. The first and second reflective surfaces are formed such that the angles of incidence of the successive grazing incidence reflections at the first and second reflective surfaces are substantially equal. Each mirror may be formed as an electroformed monolithic component, wherein the first and second reflective surfaces are each provided on a respective one of two contiguous sections of the mirror. The reflective optical system may be embodied in a collector optical system for EUV lithography, or in an EUV or X-ray telescope or imaging optical system. | 04-15-2010 |
20100284511 | Zone-optimized mirrors and optical systems using same - A zone-optimized mirror (MZ) for reflecting extreme ultraviolet (EUV) or X-ray radiation ( | 11-11-2010 |
20100303199 | GRAZING INCIDENCE COLLECTOR FOR LASER PRODUCED PLASMA SOURCES - Grazing incidence collectors (GICs) for extreme ultraviolet (EUV) and X-ray radiation sources, such as laser produced plasma (LPP) sources, are disclosed. Source-collector systems comprising GICs and LPP sources are also disclosed. A laser beam is directed along the collector axis to a fuel target to form the LPP source, and the collector is arranged to collect the radiation and reflect it to an intermediate focus. The collector may include one or more grazing-incidence mirrors, and these mirrors may be electroformed. lithography systems that employ the source-collector systems as disclosed herein. | 12-02-2010 |
20100322378 | X-RAY ABLATION OF HYALURONAN HYDROGELS - Disclosed is a method for ablating hyaluronan-based hydrogels with X-rays, the method comprising the steps of: (a) preparing hyaluronan-based hydrogels; and (b) performing X-ray irradiation to the hyaluronan-based hydrogels to induce a degradation of the hyaluronan-based hydrogels by a gel-to-sol transition during the X-ray irradiation. Disclosed is also a method for fabricating three-dimensional microchannels of hyaluronan hydrogels with a finely tunable X-ray ablation technique. | 12-23-2010 |
20110033025 | APPARATUS FOR MEASURING AERIAL IMAGE OF EUV MASK - An apparatus for measuring an image of a pattern to be formed on a semiconductor by scanning the pattern using a scanner, the apparatus including an EUV mask including the pattern, a zoneplate lens on a first side of the EUV mask and adapted to focus EUV light on a portion of the EUV mask at a same angle as an angle at which the scanner will be disposed with respect to a normal line of the EUV mask, and a detector arranged on another side of the EUV mask and adapted to sense energy of the EUV light from the EUV mask, wherein NA | 02-10-2011 |
20110044425 | SPECTRAL PURITY FILTERS FOR USE IN A LITHOGRAPHIC APPARATUS - A spectral purity filter includes a plurality of apertures extending through a member. The apertures are arranged to suppress a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation. The apertures extend though the member in different directions in order to be substantially in alignment with radiation constituting a non-parallel beam of radiation. | 02-24-2011 |
20160054244 | FILM-FORMING AND ANALYSIS COMPOSITE APPARATUS, METHOD FOR CONTROLLING FILM-FORMING AND ANALYSIS COMPOSITE APPARATUS, AND VACUUM CHAMBER - A vacuum chamber is provided with a film-forming apparatus which film-forms an oxide semiconductor thin film by sputtering, an analysis apparatus which performs spectroscopic analysis with respect to a surface of the film-formed oxide semiconductor thin film, and a valve which splits an inner space of the vacuum chamber into a first space where the analysis apparatus is arranged and a second space where the film-forming apparatus is arranged and permits communication between the split first space and second space. | 02-25-2016 |
378035000 | Pattern mask | 5 |
20100067653 | OPTICAL ELEMENT FOR RADIATION IN THE EUV AND/OR SOFT X-RAY REGION AND AN OPTICAL SYSTEM WITH AT LEAST ONE OPTICAL ELEMENT - An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element. | 03-18-2010 |
20120155608 | Lithography Masks, Systems, and Manufacturing Methods - Lithography masks, lithography systems, methods of manufacturing lithography masks, methods of altering material layers of semiconductor devices, and methods of manufacturing semiconductor devices are disclosed. In one embodiment, a lithography mask includes a first pattern for at least one material layer of at least one die, the first pattern being oriented in a first position. The lithography mask includes a second pattern for at least one material layer of the at least one die, the second pattern being oriented in a second position. The second position is different than the first position. | 06-21-2012 |
20140177789 | GRATING-BASED DIFFERENTIAL PHASE CONTRAST IMAGING SYSTEM WITH ADJUSTABLE CAPTURE TECHNIQUE FOR MEDICAL RADIOGRAPHIC IMAGING - Embodiments of methods and apparatus are disclosed for obtaining a phase-contrast digital radiographic imaging system and methods for same that can include an x-ray source for radiographic imaging; a beam shaping assembly including a collimator and a source grating, an x-ray grating interferometer including a phase grating, and an analyzer grating; and an x-ray detector, where the phase-contrast digital radiographic imaging system and methods are adjustable for different mean energies of the x-ray source. | 06-26-2014 |
20150085974 | X-RAY MASK STRUCTURE AND METHOD FOR PREPARING THE SAME - An X-ray mask structure includes a unibody support substrate having at least one thinned portion surrounded by a wall portion, a top layer disposed on the at least one thinned portion of the support substrate, and a plurality of X-ray absorber patterns disposed on the top layer over the at least one thinned portion. The top layer and the at least one thinned portion form a laminated membrane, wherein the at least one thinned portion and the wall portion provide mechanical support for the top layer, and the laminated membrane provides mechanical support for the plurality of X-ray absorber patterns. | 03-26-2015 |
20160169816 | Method and System for EUV Mask Blank Buried Defect Analysis | 06-16-2016 |