Class / Patent application number | Description | Number of patent applications / Date published |
356620000 | Special mark or target on object | 52 |
20090002721 | WAFER AND STAGE ALIGNMENT USING PHOTONIC DEVICES - A position sensing system for an optical metrology system, includes a plurality of photonic devices distributed on a carrier for providing a photonic response when interrogated with a measuring light, wherein a collective photonic response from the plurality indicates the position of the carrier. A method and an optical metrology system are also provided. | 01-01-2009 |
20090027693 | Optical interrogation system and microplate position correction method - An optical interrogation system and method are described herein that are capable of detecting and correcting a positional misalignment of a label independent detection (LID) microplate so that the LID microplate can be properly interrogated after being removed from and then re-inserted back into a microplate holder/XY translation stage. | 01-29-2009 |
20090040536 | MARK FOR ALIGNMENT AND OVERLAY, MASK HAVING THE SAME, AND METHOD OF USING THE SAME - A mark for alignment and overlay, a mask having the same, and a method of using the same are provided. The mark includes a first mark pattern and a second mark pattern. The first mark pattern includes a first pattern and a second pattern, and the second mark pattern includes a third pattern and a fourth pattern. The first pattern includes a plurality of rectangular regions arranged in a first direction, and for each rectangular region, a sideline in a second direction is longer than a sideline in the first direction, wherein the first direction is perpendicular to the second direction. The second pattern is disposed on both sides of the first pattern in the second direction and includes a plurality of rectangular regions arranged in the second direction, and for each rectangular region, the sideline in the first direction is longer than a sideline in the second direction. The third pattern includes two rectangular regions disposed on both sides of the first pattern in the first direction, and the fourth pattern includes two rectangular regions disposed on both sides of the second pattern in the second direction. | 02-12-2009 |
20090051936 | Method for measuring positions of structures on a substrate with a coordinate measuring machine - A method for measuring structures ( | 02-26-2009 |
20090097042 | DETECTION APPARATUS DETECTING PREDETERMINED POSITIONS OF MEMBER - A detection apparatus detecting predetermined positions of a member includes: n (n≧2) sensors one-dimensionally disposed at a sensor pitch equal to or greater than a distance D; and a member to be detected having m (2≦m04-16-2009 | |
20090161122 | Targeted Artifacts and Methods for Evaluating 3-D Coordinate System Measurement Accuracy of Optical 3-D Measuring Systems using Such Targeted Artifacts - A method for evaluating three-dimensional (3-D) coordinate system measurement accuracy of an optical 3-D measuring system using targeted artifacts is provided. In this regard, an exemplary embodiment of a method for evaluating 3-D coordinate system measurement accuracy using targeted artifacts comprises: taking a series of measurements from different positions and orientations using target dots on a targeted artifact with an optical 3-D measuring system; and calculating measurement errors using the series of measurements. An exemplary embodiment of a targeted artifact used with the method includes a base and target dots located on the base. | 06-25-2009 |
20090213390 | DISPLACEMENT DETECTING DEVICE AND OPTICAL INSTRUMENT HAVING THE SAME - A displacement detecting device includes a light source for projecting light to an object to be examined, the light source being movable relative to the object to be examined, a first reflecting element being fixed to the object to be examined and including a reflection portion for reflecting light from the light source and a non-reflection portion, a first light receiving element for receiving light reflected by the first reflecting element, a second reflecting element fixed to the object to be examined and including a reflection portion for reflecting light from the light source and a non-reflection portion, and a second light receiving element for receiving light reflected by the second reflecting element, wherein the second reflecting element is disposed at a light path through which at least a portion of light from the light source and advancing via the first reflecting element is directed to the second light receiving element. | 08-27-2009 |
20090219549 | Three dimensional, position observation method and apparatus - A three-dimensional position observation apparatus provided with a lens system having focusing and diaphragm mechanisms, for forming an image on an imaging plane by light from an observation object includes a beam steering member disposed in a light path extending from the observation object to the imaging plane, for changing a traveling direction of observation light into a plurality of different directions, and an image analyzing unit for analyzing a position of the observation object based on a positional relation between a plurality of images on the imaging plane formed by light passing through the beam steering member. | 09-03-2009 |
20100053638 | Image-Forming Device - An image-forming device includes an image-forming unit, a sensor, a screening unit, an excluding unit, and a determining unit. The image-forming unit forms a plurality of marks on an object. The sensor detects a light reflected on the object, the reflected light including a plurality of waveforms. The screening unit screens the plurality of waveforms into a plurality of mark waveforms corresponding to the plurality of marks respectively and a plurality of noise waveforms other than the plurality of mark waveforms. The excluding unit excludes a mark waveform adjacent to the noise waveform from the plurality of mark waveforms. The determining unit determines a position of each mark based on the plurality of mark waveforms from which the mark waveform adjacent to the noise waveform is excluded. | 03-04-2010 |
20100053639 | RETRO-REFLECTOR FOR IMAGE-GUIDED OPERATION SYSTEMS - A retro-reflector for image-guided operation systems, comprising eight cube corners, wherein the tips of the cube corners are adjacent to each other and each cube corner is formed from three reflective faces, comprising a protection against contamination which prevents dirt from being deposited in the cube corners. | 03-04-2010 |
20100231928 | ALIGNMENT APPARATUS, SUBSTRATES STACKING APPARATUS, STACKED SUBSTRATES MANUFACTURING APPARATUS, EXPOSURE APPARATUS AND ALIGNMENT METHOD - The throughput of the alignment in an alignment apparatus is improved. There is provided an alignment apparatus for aligning a substrate having an alignment mark, including a first aligner that aligns the substrate to a first reference position, a second aligner that aligns a substrate holder to a second reference position before the substrate holder holds the substrate, and a position detector that detects a position of the alignment mark of the substrate after the substrate holder holds the substrate. | 09-16-2010 |
20100245848 | POSITION DETECTION APPARATUS, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE - A position detection apparatus includes an imaging system, an illumination system including a rotary table having first and second aperture stops, both of which can be positioned on the pupil plane of the illumination system, a first image sensor that detects the image of the mark formed by the imaging system, a second image sensor that senses an image of the aperture stop for the imaging system and that of the first aperture stop, and a controller. The controller corrects the first aperture stop so as to reduce the adverse influence of a displacement of the first aperture stop, based on sensed images of the aperture stop for the imaging system and the first aperture stop. Based on the detected position of the image of the mark, the apparatus detects the position of an object to be detected using the illumination light having passed through the corrected first aperture stop. | 09-30-2010 |
20100302554 | HYBRID SENSOR - A sensor system for analyzing a feature in a sensing volume. The sensor system includes a laser source and a sensor. The first laser source projects a laser line into the sensing volume and onto the feature forming a laser stripe on the feature. The sensor images the laser stripe where the laser line intersects with the feature. The relationship between the sensor and the first laser source is precalibrated. The sensor uses the laser stripe to determine the position and/or orientation of the feature. | 12-02-2010 |
20100302555 | Metrology system and method for monitoring and correcting system generated errors - A metrology system ( | 12-02-2010 |
20100309486 | PATTERN TRANSFER APPARATUS AND METHOD OF MANUFACTURING DEVICE - An apparatus performs an alignment measurement for a mark of each of at least two shots selected from a plurality of shots on a substrate, and positions the substrate based on the alignment measurements to transfer a pattern to each the plurality of shots. The apparatus comprises a detector configured to detect the mark and a controller configured to control the alignment measurements. The controller is configured to cause the detector to detect two of the mark, and decide whether the alignment measurements include an erroneous measurement based on whether a distance between the two of the mark detected by the detector is outside a tolerance. | 12-09-2010 |
20100309487 | ANALYZING APPARATUS - An analyzing device | 12-09-2010 |
20100315653 | OPTICAL SENSOR FOR POSITIONING TASKS - The invention relates to a method for length and/or velocity measurement, in particular for positioning tasks, in which an optical sensor carries out a length and/or velocity measurement on a measurement object in a contactless manner, wherein the optical sensor carries out the length and/or velocity measurement via an image processing method, via a spatial frequency filter method and/or by way of a laser Doppler method and reference markings are recognized by the optical sensor, and to a corresponding apparatus. The object of providing a simple method and a simple apparatus for length and/or velocity measurement which offers a higher degree of measurement reliability with the result that it can also be used in safety-relevant areas of application is achieved by evaluation means carrying out reference marking recognition operations and by a plausibility test being carried out, in which a signal is generated as a function of the result of the plausibility test. | 12-16-2010 |
20100321705 | Semiconductor device and method of manufacturing the same - A semiconductor device includes an alignment mark. A probe beam is scanned on the alignment mark so as to detect a position coordinate of the alignment mark, and the alignment mark comprises a plurality of bar marks which are arranged in a first predetermined interval along a first direction of scanning the detection beam. Each of the plurality of bar marks comprises a plurality of interconnection marks which are arranged along a second direction orthogonal to the first direction, and a first space between adjacent two of the plurality of interconnection marks is shorter than a wavelength of the detection beam within a range of a design constraint. | 12-23-2010 |
20100328682 | THREE-DIMENSIONAL MEASUREMENT APPARATUS, MEASUREMENT METHOD THEREFOR, AND COMPUTER-READABLE STORAGE MEDIUM - A three-dimensional measurement apparatus comprises: a model holding unit configured to hold a three-dimensional shape model of a measurement object; a determination unit configured to determine a distance measurement region on the measurement object based on information indicating a three-dimensional shape of the measurement object; an illumination unit configured to irradiate the measurement object with a predetermined illumination pattern; an image sensing unit configured to sense an image of the measurement object while the illumination unit irradiates the measurement object; a distance calculation unit configured to calculate distance information indicating a distance from the image sensing unit to the measurement object based on region corresponding to the distance measurement region within the sensed image; and a position and orientation calculation unit configured to calculate a position and orientation of the measurement object based on the distance information and the three-dimensional shape model. | 12-30-2010 |
20110007325 | EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - When a liquid immersion area (liquid) formed on a wafer stage is moved onto another wafer stage, a fine movement stage position measuring system measures positional information of the wafer stage, interferometers of a coarse movement stage position measuring system measure positional information of the another wafer stage, and different interferometers measure positional information of the wafer stage. Based on these measurement results, the wafer stage and the another wafer stage are made to be in proximity to each other and are driven while the scrum state is maintained, and thereby the liquid immersion area (liquid) formed on the wafer stage can be moved onto the another wafer stage. | 01-13-2011 |
20110007326 | METHOD FOR THE DETERMINATION OF THE 3D COORDINATES OF AN OBJECT - A method serves for the determination of the 3D coordinates of an object ( | 01-13-2011 |
20110051150 | UNIQUE MARK AND METHOD TO DETERMINE CRITICAL DIMENSION UNIFORMITY AND REGISTRATION OF RETICLES COMBINED WITH WAFER OVERLAY CAPABILITY - A combined metrology mark, a system, and a method for calculating alignment on a semiconductor circuit are disclosed. The combined metrology mark may include a mask misregistration structure and a wafer overlay mark structure. | 03-03-2011 |
20110051151 | Optical Targets For Machine Vision Vehicle Service System - An optical target for temporary application in non-determined placement on a surface of an object such as a vehicle wheel assembly within the field of view of an imaging sensor of a machine vision vehicle service system. The optical target consists of a flexible body which is relatively thin and generally flat, capable of conforming to the contours of a surface onto which it is secured in releasable manner by a means of adhesion. A set of visible optical elements are disposed on a front face of the target body for observation and imaging by the imaging sensors. | 03-03-2011 |
20110085182 | IMAGE FORMING APPARATUS - An image forming apparatus includes: a functional element substrate to which a pixel is formed in a predetermined cycle; an opposed substrate formed on the functional element substrate; and an optical device arranged on the opposed substrate, which includes a transparent layer and an optical absorption layer arranged in a cycle of 1/n (n is an integer number) of the cycle of arranging the pixel, and restricts spread of transmitted light. | 04-14-2011 |
20110116103 | METHOD FOR DETECTING ALIGNMENT OF A DOOR SURROUND STRUCTURE - A method for detecting alignment of a door surround structure. The method comprising the steps of mounting a light source to one side of the door surround structure; mounting a target to an opposite side of the door surround structure, the target comprising a marking and configured to receive a light beam from the light source; and determining a distance between the marking and the light beam on the target; wherein an alignment is detected based on the distance between the marking and the light beam on the target. | 05-19-2011 |
20110188055 | Optical Position-Measuring Device - An optical position-measuring device for detecting the position of two objects movable relative to each other in at least one measuring direction includes a measuring standard which is joined to one of the two objects and possesses an incremental graduation extending in the measuring direction, as well as at least one reference marking at a reference position. The reference marking includes two reference-marking subfields disposed in mirror symmetry with respect to a reference-marking axis of symmetry, each of the subfields being made up of a structure extending in the measuring direction and having a locally changeable graduation period. In addition, the position-measuring device has a scanning unit which is joined to the other of the two objects and to which a scanning device is assigned that is used to generate at least one reference signal at the reference position. The scanning device includes at least one light source emitting divergently in the direction of the measuring standard, as well as a detector system having elements which are disposed along the measuring direction such that, starting from a central detector-system axis of symmetry in the measuring direction, the center-to-center distances between adjacent elements in the same direction change like the graduation periods of the structures in the reference-marking subfields starting from the reference-marking axis of symmetry. | 08-04-2011 |
20110222074 | Pattern generators, calibration systems and methods for patterning workpieces - A pattern generator includes: a writing tool and a calibration system. The writing tool is configured to generate a pattern on a workpiece arranged on a stage. The calibration system is configured to determine a correlation between a coordinate system of the writing tool and a coordinate system of a calibration plate on one of the stage and the workpiece. The calibration system is also configured to determine the correlation at least partly based on an optical correlation signal, or pattern, in a form of at least one optical beam being reflected from at least one reflective pattern on the surface of the calibration plate. | 09-15-2011 |
20110235054 | ARTICLE RECOGNITION APPARATUS AND ARTICLE PROCESSING APPARATUS USING THE SAME - An article recognition apparatus includes a marker having four or more unit pattern marks which are provided at a predetermined positional relationship on an article to be recognized and which are formed in such a way that a density pattern sequentially changes from a center position to a periphery of the pattern marker. The article recognition apparatus also includes an imaging tool that is disposed opposite the article to be recognized and that captures an image of the marker; a supporting mechanism that supports the imaging tool so as to enable setting of the imaging tool at least at a non-face-up measurement position; and a layout information recognition block that recognizes layout information about a position and an attitude of the article to be recognized. | 09-29-2011 |
20110273726 | DEVICE AND METHOD FOR PRINTING CONTAINERS AND CAPTURING THE ROTARY POSITION OF AT LEAST ONE ROTARY DEVICE PROVIDED FOR RECEIVING THE CONTAINERS - The invention relates to a device for capturing the rotary position (D) of at least one rotary device ( | 11-10-2011 |
20110310401 | HYBRID SENSOR - A sensor system and method for analyzing a feature in a sensing volume. The system projecting a pattern onto the feature and imaging the pattern where the pattern intersects with the feature, where the pattern is a series of lines that are encoded to identify at least one line of the series of lines. | 12-22-2011 |
20110317173 | POSITION MEASURING DEVICE - A position measuring device includes a plurality of concave marks, a light source portion, a light receiving portion, and a concave portion measuring portion. The concave marks are formed on an external wall of an object to be a measuring target. Each of the plurality of the concave marks includes a plurality of concave portions disposed on a concentric circle with a preset concave mark central position to be a center of the concentric circle. The concave portions are provided so that densities of the concave portions become lower as distances from the concave mark central position become longer in each of the concave marks. The light source portion irradiates the object with an irradiating light. The light receiving portion receives a reflected light from the object, the refracted light being originated from the irradiating light. The concave portion measuring portion measures each three-dimensional position of the concave marks. | 12-29-2011 |
20120062906 | DEVICE AND METHOD FOR VEHICLE MEASUREMENT - A marker device is described for vehicle measurement and has at least one mark that is optically detectable by a measurement camera, and it also has at least one level gauge connected to the mark. The level gauge is configured so that it enables a determination of the spatial orientation of the mark. | 03-15-2012 |
20120081712 | Method for Determining the Position of a Structure Within an Image and Position Measuring Device for Carrying Out the Method - A method is provided for determining the position of a structure within an image relative to a reference point, in which the structure has a center of symmetry, the method comprising: providing an image which comprises the structure and which has a reference point, carrying out at least one symmetry operation of the image with respect to the reference point, by means of which at least one mirror image is obtained which has a mirrored structure congruent relative to the structure, determining at least one displacement vector between a structure and a mirrored structure or two mirrored structures, and calculating the position of the structure as a position of the center of symmetry of the structure relative to the reference point from the at least one displacement vector. Furthermore, a position measuring device is provided for determining the position of a structure within an image relative to a reference point | 04-05-2012 |
20120099119 | LASER-BASED COORDINATE MEASURING DEVICE AND LASER-BASED METHOD FOR MEASURING COORDINATES - A laser based coordinate measuring device measures a position of a remote target. The laser based coordinate measuring device includes a stationary portion, a rotatable portion, and at least a first optical fiber. The stationary portion has at least a first laser radiation source and at least a first optical detector, and the rotatable portion is rotatable with respect to the stationary portion. The first optical fiber system, which optically interconnects the first laser radiation source and the first optical detector with an emission end of the first optical fiber system, has the emission end disposed on the rotatable portion. The emission end emits laser radiation to the remote target and receives laser radiation reflected from the remote target with the emission direction of the laser radiation being controlled according to the rotation of the rotatable portion. | 04-26-2012 |
20120140247 | METHODS AND APPARATUS FOR DETERMINING DEFLECTION OF AN EQUIPMENT FOUNDATION - Methods and apparatus for determining deflection of an equipment foundation, for example, a steam turbine foundation, are disclosed. The apparatus includes a laser beam source positioned to direct a laser beam above a surface of the foundation to be monitored, a plurality of targets positioned above the surface of the foundation, a detector adapted to detect a position of each if the targets relative to a position of the laser beam; and a device for comparing the detected position of each of the targets with a predetermined position to determine changes in the position to determine deflection of the foundation. Methods and various targets for implementing the invention are also disclosed. | 06-07-2012 |
20120154823 | POSITION DETECTION APPARATUS, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE - A position detection apparatus includes an imaging system, an illumination system including a rotary table having first and second aperture stops, both of which can be positioned on the pupil plane of the illumination system, a first image sensor that detects the image of the mark formed by the imaging system, a second image sensor that senses an image of the aperture stop for the imaging system and that of the first aperture stop, and a controller. The controller corrects the first aperture stop so as to reduce the adverse influence of a displacement of the first aperture stop, based on sensed images of the aperture stop for the imaging system and the first aperture stop. Based on the detected position of the image of the mark, the apparatus detects the position of an object to be detected using the illumination light having passed through the corrected first aperture stop. | 06-21-2012 |
20120268750 | Toner-Density Calculating Method, Reflective Optical Sensor, Reflective Optical Sensor Device, and Image Forming Apparatus - A toner density is calculated from outputs of light-receiving elements based on a difference between a reflection property of a supporting member and a reflection property of a toner pattern. Light-emitting elements aligned in one direction that is inclined to a sub-direction emit a detection light in such a manner that a distance between adjacent spots falling on the supporting member in a second direction is equal to or smaller than a width of the toner pattern in the second direction. The light-receiving elements receive a reflected light reflected from the supporting member and/or the toner pattern. The light-receiving elements are aligned, opposed to the supporting member, in a one direction corresponding to the light-emitting elements. | 10-25-2012 |
20130201491 | Apparatus and Method for Calibrating Laser Projection System - In an embodiment of the disclosure, there is provided an apparatus for calibrating a laser projection system. The apparatus has a structural frame assembly extending along three mutually orthogonal axes. The apparatus further has a plurality of non-movable reflective targets disposed on the structural frame assembly. The apparatus further has at least three positioning stages coupled to the structural frame assembly respectively about each of the three mutually orthogonal axes. At least one movable reflective target is disposed on each positioning stage. The non-movable reflective targets and the at least one movable reflective target are each configured to reflect a laser beam from a laser projection system. | 08-08-2013 |
20130265589 | PATTERN GENERATORS, CALIBRATION SYSTEMS AND METHODS FOR PATTERNING WORKPIECES - A pattern generator includes: a writing tool and a calibration system. The writing tool is configured to generate a pattern on a workpiece arranged on a stage. The calibration system is configured to determine a correlation between a coordinate system of the writing tool and a coordinate system of a calibration plate on one of the stage and the workpiece. The calibration system is also configured to determine the correlation at least partly based on an optical correlation signal, or pattern, in a form of at least one optical beam being reflected from at least one reflective pattern on the surface of the calibration plate. | 10-10-2013 |
20130278942 | DARK FIELD DIFFRACTION BASED OVERLAY - A dark field diffraction based overlay metrology device illuminates an overlay target that has at least three pads for an axis, the three pads having different programmed offsets. The overlay target may be illuminated using two obliquely incident beams of light from opposite azimuth angles or using normally incident light. Two dark field images of the overlay target are collected using ±1 | 10-24-2013 |
20140071461 | Precise Interpolation Method on Optical Encoder - We propose a high precision positional system that uses optical encoder and photo sensor to provide coarse position. We add a camera, secured to photo sensor, and set the magnification to view a few dozen marks on the encoder. With vision processing we can obtain precise interpolation with respect to pitch. | 03-13-2014 |
20150022826 | TARGET APPARATUS AND METHOD - A target is provided having a retroreflector. A body is provided having a spherical exterior portion, the body containing a cavity. The cavity is sized to hold the retroreflector, the cavity open to the exterior of the body and having at least one surface opposite the opening, the retroreflector at least partially disposed in the cavity, wherein the retroreflector and at least one surface define a space therebetween. A transmitter is configured to emit an electromagnetic signal. A first actuator is configured to initiate emission of the electromagnetic signal, wherein the transmitter and the first actuator are affixed to the body. | 01-22-2015 |
20150070712 | TARGET APPARATUS AND METHOD - A target includes a contact element having a region of spherical curvature, a retroreflector rigidly connected to the contact element, a transmitter configured to emit an electromagnetic signal, a temperature sensor disposed on the target, configured to measure an air temperature, and configured to send the measured air temperature to the transmitter. | 03-12-2015 |
20150077764 | MULTIPLE CHANNEL LOCATING - Methods, systems, and apparatuses are provided for estimating a location on an object in a three-dimensional scene. Multiple radiation patterns are produced by spatially modulating each of multiple first radiations with a distinct combination of one or more modulating structures, each first radiation having at least one of a distinct radiation path, a distinct source, a distinct source spectrum, or a distinct source polarization with respect to the other first radiations. The location on the object is illuminated with a portion of each of two or more of the radiation patterns, the location producing multiple object radiations, each object radiation produced in response to one of the multiple radiation patterns. Multiple measured values are produced by detecting the object radiations from the location on the object due to each pattern separately using one or more detector elements. The location on the object is estimated based on the multiple measured values. | 03-19-2015 |
20150323470 | DETECTION DEVICE AND METHOD - A detection device and a detection method are disclosed in the embodiments. The detection device comprises a light source, a first image information acquisition unit, a first charge coupled device (CCD), a first light splitter, and a first analyzer. The first image information acquisition unit is configured to receive a first light signal from the light source and transmit the first light signal onto a substrate, and to acquire a first image light signal generated by transmitting the first light signal onto both an edge of a first ID figure on the substrate and an edge of the substrate, and transmit the first image light signal to the first light splitter; the first light splitter is configured to transmit the first image light signal to the first CCD so that the first CCD outputs a first electrical signal; and the first analyzer is configured to receive the first electrical signal outputted from the first CCD and analyze wave crests of the first electrical signal, thereby obtaining a distance between the edge of the first ID figure on the substrate and the edge of the substrate. The detection part and detection method are used for substrate detection. | 11-12-2015 |
20150338206 | MEASURING SYSTEM AND MEASURING METHOD - Measuring systems and methods using the same may be provided. For example, the measuring system including a first reference member located at one of a first target member and a second target member, the first and second target members being configured to make a relative movement with respect to each other and the first reference member having a first length, a second reference member located at the other of the first target member and the second target member and having a second length, and a measuring unit located at a distance from the first reference member and the second reference member, the measuring unit configured to measure a relative location of one of the first reference member and the second reference member with respect to the other may be provided. | 11-26-2015 |
20160025893 | METHOD AND APPARATUS FOR CALIBRATING SENSORS THAT DETECT WAFER PROTRUSION FROM A WAFER CASSETTE - A calibration gauge, an apparatus and a method for calibrating sensors that detect wafer protrusion from a wafer cassette using the calibration gauge. The calibration gauge includes a disk having a first region which is a circular sector of central angle A | 01-28-2016 |
20160061589 | METROLOGY METHOD, TARGET AND SUBSTRATE - A diffraction measurement target that has at least a first sub-target and at least a second sub-target, and wherein (1) the first and second sub-targets each include a pair of periodic structures and the first sub-target has a different design than the second sub-target, the different design including the first sub-target periodic structures having a different pitch, feature width, space width, and/or segmentation than the second sub-target periodic structure or (2) the first and second sub-targets respectively include a first and second periodic structure in a first layer, and a third periodic structure is located at least partly underneath the first periodic structure in a second layer under the first layer and there being no periodic structure underneath the second periodic structure in the second layer, and a fourth periodic structure is located at least partly underneath the second periodic structure in a third layer under the second layer. | 03-03-2016 |
20160146740 | METROLOGY METHOD AND APPARATUS - A method to determine an overlay error between a first structure and a second structure, wherein the first structure and second structures are on different layers on a substrate and are imaged onto the substrate by a lithographic process, the method comprising: obtaining an apparent overlay error; obtaining a systematic error caused by a factor other than misalignment of the first and second structures; and determining the overlay error by removing the systematic error from the apparent overlay error. The method may alternatively comprise obtaining apparent characteristics of diffraction orders of diffraction by an overlapping portion of the first and second structures; obtaining corrected characteristics of the diffraction orders; determining the overlay error from the corrected characteristics; and adjusting a characteristic of the lithographic process based on the overlay error. | 05-26-2016 |
20160195387 | Method For Determining The Registration Of A Structure On A Photomask And Apparatus To Perform The Method | 07-07-2016 |
20190146089 | RETROREFLECTOR ACQUISITION IN A COORDINATE MEASURING DEVICE | 05-16-2019 |
20190146364 | DUAL-LAYER ALIGNMENT DEVICE AND METHOD | 05-16-2019 |