Class / Patent application number | Description | Number of patent applications / Date published |
250429000 | With temperature control | 14 |
20080210884 | Device for Irradiating Liquids with Uv Radiation in a Throughflow - The invention relates to a device for irradiating an absorbing liquid, for example waste water to be disinfected, in a throughflow. Said device comprises at least two radiator units having one cylindrical UV radiation source and three concentric sheaths. A cooling medium for carrying off heat from the UV radiation source flows in a hollow space between the inner and the center sheath. The inventive device allows to use high-performance UV radiation sources and to evenly irradiate the zones of irradiation and prevents floating particles from settling down on the radiator units. | 09-04-2008 |
20090057567 | Gas management system for a laser-produced-plasma EUV light source - Devices and corresponding methods of use are described herein which may comprise an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path. | 03-05-2009 |
20110147610 | SYSTEM FOR CONTINUOUS MODE PROCESSING OF THE CONTENTS OF MULTIPLE REACTION RECEPTACLES IN A REAL-TIME AMPLIFICATION ASSAY - An automated analyzer for performing multiple diagnostic assays simultaneously includes multiple stations in which discrete aspects of the assay are performed on fluid samples contained in sample vessels. The analyzer includes stations for automatically preparing a sample, incubating the sample, preforming an analyte isolation procedure, ascertaining the presence of a target analyte, and analyzing the amount of a target analyte. An automated receptacle transporting system moves the sample vessels from one station to the next. A method for performing an automated diagnostic assay includes an automated process for isolating and amplifying a target analyte, and, in one embodiment, a method for real-time monitoring of the amplification process. | 06-23-2011 |
20110260076 | Thermal Management technology for polarizing xenon - A polarizing apparatus has a thermally conductive partitioning system in a polarizing cell. In the polarizing region, this thermally conductive partitioning system serves to prevent the elevation of the temperature of the polarizing cell where laser light is maximally absorbed to perform the polarizing process. By employing this partitioning system, increases in laser power of factors of ten or more can be beneficially utilized to polarize xenon. Accordingly, the polarizing apparatus and the method of polarizing | 10-27-2011 |
20120161031 | METHOD AND APPARATUS FOR TREATING MATERIALS USING ELECTRODELESS LAMPS - The output wavelengths of an electrodeless lamp are controlled by passing a fluid over the surface of the lamp to control its temperature. The stabilized temperature prevents thermal runaway of the lamp and stabilizes the output wavelengths of the lamp. When the fluid passing over the lamp is water, the lamp can be used for sanitary treatment of the water. The treatment can be enhanced by shaping the electrodeless lamp to provide maximally effective water treatment. | 06-28-2012 |
20130264493 | METHOD AND SYSTEM FOR PROVIDING A DUAL CURTAIN GAS TO A MASS SPECTROMETRY SYSTEM - A system and method for mass spectrometry including a curtain gas chamber defined by a curtain plate having an aperture for receiving ions from an ion source and an orifice plate having an inlet into a mass spectrometer. At least one barrier separates the curtain chamber into a first curtain gas chamber region and a second curtain gas chamber region. At least one gas source provides a gas inflow into the second curtain gas chamber region and a gas outflow into the first curtain gas chamber region, a portion of the gas outflow directed out of the aperture. A heating element heats the gas inflow, a portion of the heated gas inflow directed into the inlet of the mass spectrometer wherein the portion of the heated gas inflow can be at a substantially higher temperature than the portion of the gas outflow. | 10-10-2013 |
20130327955 | RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A radiation source is configured to produce extreme ultraviolet radiation. The radiation source includes a chamber in which, in use, a plasma is generated, and an evaporation surface configured to evaporate a material formed as a by-product from the plasma and that is emitted to the evaporation surface. A method for removing a by-product material in or from a plasma radiation source of a lithographic apparatus includes evaporating a material which, in use, is emitted to that surface from the plasma. | 12-12-2013 |
20140048719 | Water Treatment Methods and Apparatus - Methods and apparatus may permit the generation of consistent output synthesis gas from highly variable input feedstock solids carbonaceous materials. A stoichiometric objectivistic chemic environment may be established to stoichiometrically control carbon content in a solid carbonaceous materials gasifier system. Processing of carbonaceous materials may include dominative pyrolytic decomposition and multiple coil carbonaceous reformation. Dynamically adjustable process determinative parameters may be utilized to refine processing, including process utilization of negatively electrostatically enhanced water species, process utilization of flue gas, and adjustment of process flow rate characteristics. Recycling may be employed for internal reuse of process materials, including recycled negatively electrostatically enhanced water species, recycled flue gas, and recycled contaminants. Synthesis gas generation may involve predetermining a desired synthesis gas for output and creating high yields of such a predetermined desired synthesis gas. | 02-20-2014 |
20140084179 | EXPOSURE CHAMBER AND A SYSTEM FOR REDUCTION OF PATHOGENS IN A BIOLOGICAL FLUID USING ULTRAVIOLET IRRADIATION BY LIGHT EMITTING DIODES - An exposure chamber for reducing pathogens in a biological fluid such as whole blood or blood-derived products includes a serpentine-shaped UV-transparent flow path and closely positioned ultraviolet light emitting diodes configured for emanating UV irradiation towards the biological fluid at peak wavelength of 250 nm to 270 nm. The control system is provided to energize UV LEDs using various novel modes of modulating pulse width and current amplitude for LEDs so as to deliver higher UV intensity to the biological fluid but without overheating thereof or the LEDs. | 03-27-2014 |
20140197334 | IR SPECTROMETRY CELL WITH TEMPERATURE CONTROL MEANS - A sample cell for IR spectrophotometric analysis of a liquid sample is provided. The sample cell comprises two substantially parallel transparent plates enclosing a cavity for holding the liquid sample, and a temperature control loop for controlling a temperature of the liquid sample in the cavity. The temperature control loop comprises at least one temperature sensor for measuring a temperature in or close to the cavity, at least one heating element for increasing a temperature of the liquid sample, and control means, coupled to the temperature sensor and the heating element for controlling the heating element in dependence of the temperature in or close to the cavity. The heating element comprises at least one heating foil which is attached to or thermally coupled to a first one of the transparent plates in such a way to allow an IR light beam to pass through the transparent plates and the cavity without being hindered by the heating foil. | 07-17-2014 |
20150108365 | ARRANGEMENT AND METHOD FOR COOLING A PLASMA-BASED RADIATION SOURCE - An arrangements and methods for cooling a plasma-based radiation source having a revolving element which is to be cooled, particularly for application in EUV radiation sources, is disclosed. The revolving element is immersed in the metal coolant in a first vessel of a primary cooling circuit, and a secondary cooling circuit with a cooling liquid evaporating at the desired operating temperature of the metal coolant has a control unit for controlling at least one atomizing arrangement in a differentiated manner and for selectively controlling a heater in case the determined temperature falls below a minimum operating temperature of the metal coolant. The at least one atomizing arrangement in a cooling section selectively sprays individual wall regions of the first vessel with the cooling liquid depending on the determined temperature of the metal coolant. | 04-23-2015 |
20150115170 | Method and apparatus for optimizing germicidal lamp performance in a disinfection device - This invention controls the temperature of the critical spot of the UV lamps and on the critical spots having a deposit of mercury or amalgam containing mercury by directing a uniform flow of air on and around the critical spots having amalgam or be other means to remove heat from the critical spots | 04-30-2015 |
20160163516 | Open Plasma Lamp for Forming a Light-Sustained Plasma - An open plasma lamp includes a cavity section. A gas input and gas output of the cavity section are arranged to flow gas through the cavity section. The plasma lamp also includes a gas supply assembly fluidically coupled to the gas input of the cavity section and configured to supply gas to an internal volume of the cavity section. The plasma lamp also includes a nozzle assembly fluidically coupled to the gas output of the cavity section. The nozzle assembly and cavity section are arranged such that a volume of the gas receives pumping illumination from a pump source, where a sustained plasma emits broadband radiation. The nozzle assembly is configured to establish a convective gas flow from within the cavity section to a region external to the cavity section such that a portion of the sustained plasma is removed from the cavity section by the gas flow. | 06-09-2016 |
20160172164 | REMOTE DELIVERY OF CHEMICAL REAGENTS | 06-16-2016 |