Entries |
Document | Title | Date |
20080251735 | High Energy Crystal Generators And Their Applications - Ferroelectric, pyroelectric and piezoelectric crystals are used to generate spatially localized high energy (up to and exceeding 100 keV) electron and ion beams, which may be used in a wide variety of applications including pulsed neutron generation, therapeutic X-ray/electron devices, elemental analysis, local scanning chemical analysis, high energy scanning microscopy, point source compact transmission electron microscopy, compact ion beam sources, positron sources, micro-thrusters for ion engines, and improved fusion efficiency especially of the Farnsworth type. The high-energy emission can be created by simply heating the material or by application of external coercive electromagnetic and acoustic fields. | 10-16-2008 |
20080258075 | Ionizing Radiation Treatment System on Water-Borne Platform - An ionizing radiation treatment system is provided on a water-borne platform that includes areas for loading, treating, and unloading contaminated materials. | 10-23-2008 |
20090001281 | CATHODE HAVING ELECTRON PRODUCTION AND FOCUSING GROOVES, ION SOURCE AND RELATED METHOD - A cathode having electron production and focusing grooves for an ion source of an ion implanter system, the ion source and a related method are disclosed. In one embodiment, the cathode includes a working surface having a plurality of electron production and focusing grooves positioned therein. A repeller of the ion source may be similarly structured. | 01-01-2009 |
20090001282 | METHODS AND APPARATUS FOR ASSIGNING A BEAM INTENSITY PROFILE TO A GAS CLUSTER ION BEAM USED TO PROCESS WORKPIECES - Embodiments of the invention describe methods and apparatus for assigning a beam intensity profile to a gas cluster ion beam and processing workpieces using a gas cluster ion beam. One embodiment includes generating a gas cluster ion beam in a gas cluster ion beam processing apparatus, collecting parametric data relating to the spatial intensity of the gas cluster ion beam, and generating a beam intensity profile describing the spatial intensity of the gas cluster ion beam by fitting a mathematical functional shape to the parametric data. Another embodiment describes a method for processing a workpiece using a gas cluster ion beam. | 01-01-2009 |
20090008569 | High speed combination multi-mode ionization source for mass spectrometers - The present invention combines ionization modes produced by, for example, electrospray (ESI), atmospheric pressure chemical ionization (APCI), and thermospray for analysis of molecules. Specifically, this invention relates to the creation of a new source apparatus combining APCI and ESI which will interface with existing mass spectrometers, as well as the creation of new mass spectrometers where the present invention would be the ionization source. Furthermore, the present invention relates to an ionization source for a mass spectrometer which features an ion chamber defining an ion path, an electrospray probe for ionizing a sample using electrospray ionization, a corona discharge needle for ionizing a sample using atmospheric pressure chemical ionization, a power supply for applying an electrical potential to one of said electrospray probe and said corona discharge needle, and a solid state switch for directing the electrical potential from the power supply to one of the electrospray probe and said corona discharge needle. | 01-08-2009 |
20090020708 | MODULAR GAS ION SOURCE - A gas field ion source is described. The gas field ion source includes an emitter module. The emitter module includes an emitter holder, an emitter structure, a detachably connectable electrical connection assembly of the emitter module, and a detachably connectable gas supply connection assembly of the emitter module. The gas field ion source further includes a supply module, wherein the supply module includes an electrical conductor for providing voltage and/or current, a gas supply conduit, a thermal conductor, a detachably connectable electrical connection assembly of the supply module, and a detachably connectable gas supply connection assembly of the supply module. The emitter module and the supply module are detachably connectable by the detachably connectable connection assemblies of the emitter module and the detachably connectable connection assemblies of the supply module. | 01-22-2009 |
20090032728 | HYBRID ION SOURCE/MULTIMODE ION SOURCE - A hybrid ion source, comprising a source body configured to create plasma therein, from a first material, wherein the first material comprises one of monatomic gases, small molecule gases, large molecule gases, reactive gases, and solids, a low power plasma generation component operably associated with the source body, a high power plasma generation component operably associated with the source body and an extraction aperture configured to extract ions of the ion plasma from the source body. | 02-05-2009 |
20090095917 | ATMOSPHERIC PRESSURE CHEMICAL IONIZATION ION SOURCE - An ion source for chemical ionization of analytes at atmospheric pressure with a non-radioactive electron source in a vacuum chamber, includes, a reaction chamber at atmospheric pressure, and a window with an electron-permeable and essentially gas-impermeable membrane in between. The window may be a structured window membrane, i.e. a window membrane with a structured form comprising a multitude of structural elements, between the reaction chamber and the vacuum chamber. | 04-16-2009 |
20090166554 | TECHNIQUES FOR PROVIDING A MULTIMODE ION SOURCE - Techniques for providing a multimode ion source are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for ion implantation, the apparatus including an ion source having a hot cathode and a high frequency plasma generator, wherein the ion source has multiple modes of operation. | 07-02-2009 |
20090200485 | Method and Apparatus For Generating Ion Beam - A device for replenishing ionizable material in a field ionization apparatus is disclosed. The device comprises a heatable reservoir containing the ionizable material, a field ionization electrode structure, and a channel being in fluid communication with said heatable reservoir. The heatable reservoir and the channel are designed and constructed such that when the heatable reservoir is heated to an evaporation temperature of the ionizable material, a flux of vaporized ionizable material is directed along the channel to a tip of the field ionization electrode structure. | 08-13-2009 |
20090206275 | ACCELERATOR PARTICLE BEAM APPARATUS AND METHOD FOR LOW CONTAMINATE PROCESSING - A system of introducing a particle beam such as a linear accelerator particle beam for low contaminate processing. The system includes an accelerator apparatus configured to generate a first particle beam including at least a first ionic specie in an energy level of 1 MeV to 5 MeV or greater. Additionally, the system includes a beam filter coupled to the linear accelerator apparatus to receive the first particle beam. The beam filter is in a first chamber and configured to generate a second particle beam with substantially the first ionic specie only. The first chamber is associated with a first pressure. The system further includes an end-station including a second chamber coupled to the first chamber for extracting the second particle beam. The second particle beam is irradiated onto a planar surface of a bulk workpiece loaded in the second chamber for implanting the first ionic specie. The second chamber is associated with a second pressure that is higher than the first pressure. Optional beam scanning can also be added between the beam filter and the end-station. | 08-20-2009 |
20090242793 | Flexible ion source - Liner elements to protect the ion source housing and also increase the power efficiency of the ion source are disclosed. Two liner elements, preferably constructed from tungsten, are inserted into the ion source chamber, one placed against each of the two sidewalls. These inserts are electrically biased so as to induce an electrical field that is perpendicular to the applied magnetic field. Such an arrangement has been unexpectedly found to increase the life of not only the ion chamber housing, but also the indirectly heated cathode (IHC) and the repeller. In addition, the use of these biased liner elements also improved the power efficiency of the ion source; allowing more ions to be generated at a given power level, or an equal number of ions to be generated at a lower power level. | 10-01-2009 |
20090250623 | METHOD FOR GENERATING A PULSED FLUX OF ENERGETIC PARTICLES, AND A PARTICLE SOURCE OPERATING ACCORDINGLY - A method for generating a pulsed flux of energetic particles comprises the following steps: —initiating an ion plasma at a first electrode ( | 10-08-2009 |
20090261268 | IONIC FLUID FLOW ACCELERATOR - An electrohydrodynamic fluid accelerator apparatus includes a corona electrode having an axial shape and configured to receive a first voltage. The electrohydrodynamic fluid accelerator apparatus includes a collector electrode disposed coaxially around the at least one corona electrode and configured to receive a second voltage. Application of the first and second voltages on the corona electrode and the collector electrode, respectively, causes fluid proximate to the corona electrode to ionize and travel in a first direction between the corona electrode and the collector electrode, thereby causing other fluid molecules to travel in a second direction to generate a fluid stream. In at least one embodiment of the invention, the ionized fluid proximate to the emitter electrode travels in a radial direction from the corona electrode to the collector electrode, causing the other fluid molecules to travel in an axial direction to thereby generate the fluid stream. | 10-22-2009 |
20090278054 | METHODS FOR IMPLEMENTING HIGHLY EFFICIENT PLASMA TRAPS - A method for minimizing microwave leakage into processing chamber of a microwave plasma system is provided. The method includes securing plasma traps to a plasma tube assembly, which is a cylindrical structure positioned upstream from the processing chamber and has a plasma-sustaining region. The plasma traps are electrically conductive disks surrounding the cylindrical structure and are positioned upstream from the processing chamber. The plasma traps include at least two electrically conductive disks. Each electrically conductive disk includes corrugated outer surfaces with plurality of corrugated peaks. The corrugated outer surface of the first electrically conductive disk is facing a corrugated outer surface of the second electrically conductive disk in a space-apart relationship to form an interstitial region between the electrically conductive disks. Both electrically conductive disk and the interstitial region form one of a set of upstream plasma traps and a set of downstream plasma traps relative to the plasma-sustaining region. | 11-12-2009 |
20090289197 | GAS DELIVERY SYSTEM FOR AN ION SOURCE - An ion source has an arc chamber with an electron-emitting element and a repeller. A manifold assembly defines a cavity and a gas outlet configured to allow gas flow to the arc chamber. This gas outlet is closer to the repeller than the electron-emitting element. In one embodiment, the ion source has a first crucible and a second crucible. The first crucible and the second crucible are connected to the manifold assembly. In one instance, the crucibles have tamper-resistant features. | 11-26-2009 |
20090314954 | METHOD AND SYSTEM FOR DIRECTIONAL GROWTH USING A GAS CLUSTER ION BEAM - A method for growing material on a substrate is described. The method comprises directionally growing a thin film on one or more surfaces of a substrate using a gas cluster ion beam (GCIB) formed from a source of precursor for the thin film, wherein the growth occurs on surfaces oriented substantially perpendicular to the direction of incidence of the GCIB, and growth is substantially avoided on surfaces oriented substantially parallel to the direction of incidence. | 12-24-2009 |
20100019168 | TWO-ZONE ION BEAM CARBON DEPOSITION - The invention relates an ion source for ion beam deposition comprising multiple anodes, wherein the ion source deposits multiple zones of a source material and thicknesses of at least two of the multiple zones are different. | 01-28-2010 |
20100044580 | Charged Particle Extraction Device and Method of Design There For - The present invention provides a method for extracting a charged particle beam from a charged particle source. A set of electrodes is provided at the output of the source. The potentials applied to the electrodes produce a low-emittance growth beam with substantially zero electric field at the output of the electrodes. | 02-25-2010 |
20100044581 | Ionizer and Static Elimination Method - The ionizer includes a nozzle having a discharge electrode for inducing corona discharge by application of high voltage to eject ions, an emission port for emitting supplied gas together with the ejected ions, and a gas channel for guiding supplied gas to the emission port. Herein, a velocity of flow of the gas immediately after emission from the emission port exceeds a velocity of sound, and a gas pressure at the emission port is not less than an atmospheric pressure. The gas channel has a throat part for narrowing the gas channel such that a channel area gradually decreases, and a ratio of the atmospheric pressure to a gas pressure at a position where the channel area does not vary, the position being located forward of the throat part, is not more than 0.528. | 02-25-2010 |
20100065754 | COMPACT PYROELECTRIC SEALED ELECTRON BEAM - A non-radioactive source for Atmospheric Pressure Ionization is described. The electron-beam sealed tube uses a pyroelectric crystal(s). One end of the crystal is grounded while the other end has a metallic cap with sharp feature to generate an electron beam of a given energy. The rate of heating and/or cooling of the crystal is used to control the current generated from a tube. A heating and/or cooling element such as a Peltier element is useful for controlling the rate of cooling of the crystal. A thin window that is transparent to electrons but impervious to gases is needed in order to prolong the life of the tube and allow the extraction of the electrons. If needed, multiple crystals with independent heaters can be used to provide continuous operation of the device. The energy of the electrons can be determined through the appropriate choice of the radius of curvature of the sharp feature and the gap between the sharp feature and the window, while the opposite side of the crystal is at low voltage. The size of the gap and the radius of curvature of the sharp feature are determined by the filling gas nature and pressure. | 03-18-2010 |
20100065755 | Array-based ion storage system and method therefor - An array-based ion storage system and method are disclosed. The system comprises: an ion generation section; and an ion storage section comprising a first end electrode coupled to the ion generation section and formed as having a plurality of holes, a second end electrode formed as having a plurality of holes, an intermediate electrode formed as having a plurality of holes, a first insulator formed in the shape of a ring and sandwiched between the first end electrode and the intermediate electrode to insulate them from each other, and a second insulator formed in the shape of a ring and sandwiched between the intermediate electrode and the second end electrode to insulate them from each other. With the present invention, the ion storage section can be made thinner to facilitate consistency in ion extraction and reduce the spread of ion mobility spectrum peak. In addition, the first and second insulators each have a big hole, and thus the ions cannot bump onto the insulation material at both sides at the time of ion vibration or thermal movement in the storage space. Therefore, charge transfer and accumulation at the insulator and the subsequent discharge will not occur, suppressing instability of storage and loss of ions. | 03-18-2010 |
20100072393 | SELF-BIASING ACTIVE LOAD CIRCUIT AND RELATED POWER SUPPLY FOR USE IN A CHARGED PARTICLE BEAM PROCESSING SYSTEM - A load circuit device having a self-biasing active load circuit, and a related high voltage power supply configured to bias an optical element in a charged particle beam processing system, such as a gas cluster ion beam (GCIB) processing system. The high voltage power supply comprises a variable voltage supply having a load terminal at a load potential and a reference terminal at a reference potential, and a self-biasing active load circuit connected between the load terminal and the reference terminal, and configured to sustain a variable voltage drop between the load potential and the reference potential while maintaining a substantially constant current. | 03-25-2010 |
20100072394 | PULSED VOLTAGE ELECTROSPRAY ION SOURCE AND METHOD FOR PREVENTING ANALYTE ELECTROLYSIS - An electrospray ion source and method of operation includes the application of pulsed voltage to prevent electrolysis of analytes with a low electrochemical potential. The electrospray ion source can include an emitter, a counter electrode, and a power supply. The emitter can include a liquid conduit, a primary working electrode having a liquid contacting surface, and a spray tip, where the liquid conduit and the working electrode are in liquid communication. The counter electrode can be proximate to, but separated from, the spray tip. The power system can supply voltage to the working electrode in the form of a pulse wave, where the pulse wave oscillates between at least an energized voltage and a relaxation voltage. The relaxation duration of the relaxation voltage can range from 1 millisecond to 35 milliseconds. The pulse duration of the energized voltage can be less than 1 millisecond and the frequency of the pulse wave can range from 30 to 800 Hz. | 03-25-2010 |
20100148088 | TECHNIQUES FOR PROVIDING A MULTIMODE ION SOURCE - Techniques for providing a multimode ion source are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for ion implantation, the apparatus including an ion source having a hot cathode and a high frequency plasma generator, wherein the ion source has multiple modes of operation. | 06-17-2010 |
20100155619 | DIRECTIONAL GAS INJECTION FOR AN ION SOURCE CATHODE ASSEMBLY - In an ion implanter, an inert gas is directed at a cathode assembly near an ion source chamber via a supply tube. The inert gas is provided with a localized directional flow toward the cathode assembly to reduce unwanted concentrations of cleaning or dopant gases introduced into the ion source chamber, thereby reducing the effects of unwanted filament growth in the cathode assembly and extending the manufacturing life of the ion source. | 06-24-2010 |
20100176306 | IMPLANTATION QUALITY IMPROVEMENT BY XENON/HYDROGEN DILUTION GAS - A method comprises supplying a dopant gas in an arc chamber of an ion source. A dilutant is supplied to dilute the dopant gas. The dilutant comprises about 98.5 wt. % xenon and about 1.5 wt. % hydrogen. An ion beam is generated from the diluted dopant gas using the ion source. | 07-15-2010 |
20100187436 | HIGH RESOLUTION GAS FIELD ION COLUMN - An ion beam apparatus and a method for providing an energy-filtered primary ion beam are described. Therein, a primary ion beam having an asymmetric first energy distribution is generated by means of an ion source. The primary ion beam is energy filtered using, for example, a retarding lens. | 07-29-2010 |
20100193702 | TANDEM IONIZER ION SOURCE FOR MASS SPECTROMETER AND METHOD OF USE - An ion source a first ionizer comprising: an electrospray needle comprising a tip; and a conduit disposed annularly about the needle and configured to pass an inert gas in proximity of the tip to nebulize a fluid emerging from the tip, the nebulized fluid comprising analytes and a mobile phase. The ion source comprises a capillary in tandem with the first ionizer and configured to receive the droplets; a heater configured to heat the capillary to a temperature at which mobile phase vaporizes; and a second ionizer in tandem with the capillary and configured to receive the vaporized mobile phase and the analytes. A method is also described. | 08-05-2010 |
20100200768 | TECHNIQUES FOR IMPROVING EXTRACTED ION BEAM QUALITY USING HIGH-TRANSPARENCY ELECTRODES - Techniques for improving extracted ion beam quality using high-transparency electrodes are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for ion implantation. The apparatus may comprise an ion source for generating an ion beam, wherein the ion source comprises a faceplate with an aperture for the ion beam to travel therethrough. The apparatus may also comprise a set of extraction electrodes comprising at least a suppression electrode and a high-transparency ground electrode, wherein the set of extraction electrodes may extract the ion beam from the ion source via the faceplate, and wherein the high-transparency ground electrode may be configured to optimize gas conductance between the suppression electrode and the high-transparency ground electrode for improved extracted ion beam quality. | 08-12-2010 |
20100264328 | CONJUGATED ICP AND ECR PLASMA SOURCES FOR WIDE RIBBON ION BEAM GENERATION AND CONTROL - An ion source, capable of generating high-density wide ribbon ion beam, utilizing one or more plasma sources is disclosed. In addition to the plasma source(s), the ion source also includes a diffusion chamber. The diffusion chamber has an extraction aperture oriented along the same axis as the dielectric cylinder of the plasma source. In one embodiment, dual plasma sources, located on opposing ends of the diffusion chamber are used to create a more uniform extracted ion beam. In a further embodiment, a multicusp magnetic field is used to further improve the uniformity of the extracted ion beam. | 10-21-2010 |
20100327181 | ION IMPLANTATION APPARATUS - A hydrogen ion implanter for the exfoliation of silicon from silicon wafers uses a large scan wheel carrying 50+ wafers around its periphery and rotating about an axis. In one embodiment, the axis of rotation of the wheel is fixed and the wheel is formed with tensioned spokes supporting a rim carrying the wafer supports. The spokes may be used for carrying cooling fluid to and from the wafer supports. In one embodiment, a ribbon beam of hydrogen ions is directed down on a peripheral edge of the wheel. The ribbon beam extends over the full radial width of wafers on the wheel. | 12-30-2010 |
20110089336 | CHARGED PARTICLE BEAM APPARATUS, AND METHOD OF CONTROLLING THE SAME - Provided is a charged particle beam apparatus, which can emit a stable electron beam, having high brightness and a narrow energy width. The charged particle beam apparatus comprises a field emission electron source, electrodes for applying an electric field to the field emission electron source, and a vaccume exhaust unit for keeping the pressure around the field emission electron source at 1 10−8 Pa or less. The apparatus is so constituted as to use such one of the electron beams emitted as has an electron-beam-center radiation angle of 1 10−2 str or less, and to use the electric current thereof, the second order differentiation of which is negative or zero with respect to the time, and which reduces at a rate of 10% or less per hour. The charged particle beam apparatus further comprises a heating unit for the field emission electron source, and a detection unit for the electric current of the electron beam. The field emission electron source is repeatedly heated to keep the electric current of the electron beam to be emitted, at a predetermined value or higher. | 04-21-2011 |
20110095200 | Covering wide areas with ionized gas streams - Ion delivery manifolds with a gas transport channel, for receiving an ionized gas stream, and plural outlets that divide the gas stream into plural neutralization gas streams that are directed toward respective plural target regions are disclosed. At least generally equal ion distribution across the target regions is achieved by using different ion flow rates through the plural outlets. Methods of delivering plural neutralization streams to respective plural target regions include steps for receiving an ionized gas stream, for dividing the ionized gas stream into plural neutralization streams, and for directing the neutralization streams toward respective target regions. At least generally equal ion distribution across the target regions is achieved by differing the ion flow rates of the neutralization streams. | 04-28-2011 |
20110101238 | Cold Field Emitter - A stable cold field electron emitter is produced by forming a coating on an emitter base material. The coating protects the emitter from the adsorption of residual gases and from the impact of ions, so that the cold field emitter exhibits short term and long term stability at relatively high pressures and reasonable angular electron emission. | 05-05-2011 |
20110155923 | METHOD AND IONIZER FOR BIPOLAR ION GENERATION - An ionizer includes a high voltage AC generator, and a planar ion emitter mounted on an insulating substrate and having an array of planar needles that protrude from an edge of the substrate. The high voltage AC generator may be actuated by a switch having a pair of mutually insulated planar contacts located near an edge of the insulating substrate and configured to be contacted by an electrically conductive coil spring. The coil spring is supported by a slider that is moveable toward the ion emitter from an initial position wherein the planar contacts are shorted by the spring so as to actuate the high voltage AC generator. Continued movement of the spring collects dust in its coils while breaking the switch contacts and de-energizing the high voltage AC generator. | 06-30-2011 |
20110186749 | ION SOURCE - An ion source includes an arc chamber having an extraction aperture, and a plasma sheath modulator positioned in the arc chamber. The plasma sheath modulator is configured to control a shape of a boundary between a plasma and a plasma sheath proximate the extraction aperture, wherein the plasma sheath modulator includes a semiconductor. A well focused ion beam having a high current density can be generated by the ion source. A high current density ion beam can improve the throughput of an associated process. The emittance of the ion beam can also be controlled. | 08-04-2011 |
20110220811 | Electrical ionizer for aerosol charge conditioning and measurement - A method and apparatus are disclosed for exposing particles in a gas in order to cause the charge on the particles to change, the apparatus comprising a chamber with an inlet for the gas to enter and an outlet for the gas to exit. The chamber is surrounded by an enclosure with a conductive wall, the wall being held at a ground potential. An electrode with an exposed tip is in contact with the gas in the chamber, the electrode being held at a different potential from the ground potential. The electrode is connected to a source of voltage sufficient to cause a corona discharge to occur forming ions in the chamber, and creating a region of space with a high electric field intensity and another region of space in which the electric field intensity is lower. The inlet and outlet define a gas flow path from the inlet to the outlet such that the gas flow path passes mainly through the region with the lower electric field intensity. | 09-15-2011 |
20110240877 | TEMPERATURE CONTROLLED ION SOURCE - An ion source is provided that utilizes a cooling plate and a gap interface to control the temperature of an ion source chamber. The gap interface is defined between the cooling plate and a wall of the chamber. A coolant gas is supplied to the interface at a given pressure where the pressure determines thermal conductivity from the cooling plate to the chamber to control the temperature of the interior of the chamber. | 10-06-2011 |
20110240878 | TEMPERATURE CONTROLLED ION SOURCE - An ion source is provided that utilizes the same dopant gas supplied to the chamber to generate the desired process plasma to also provide temperature control of the chamber walls during high throughput operations. The ion source includes a chamber having a wall that defines an interior surface. A liner is disposed within the chamber and has at least one orifice to supply the dopant gas to an inside of the chamber. A gap is defined between at least a portion of the interior surface of the chamber wall and the liner. A first conduit is configured to supply dopant gas to the gap where the dopant gas has a flow rate within the gap. A second conduit is configured to remove the dopant gas from the gap, wherein the flow rate of the dopant gas within the gap acts as a heat transfer media to regulate the temperature of the interior of the chamber. | 10-06-2011 |
20110253902 | MOLECULAR ION GENERATION - An apparatus that generates molecular ions and methods to generate molecular ions are disclosed. At least a first species is ionized in an ion source. The first species ions and/or first species combine to form molecular ions. These molecular ions may be transported to a second chamber, which may be an arc chamber or diffusion chamber, and are extracted. The molecular ions may have a larger atomic mass than the first species or first species ions. A second species also may be ionized with the first species to form molecular ions. In one instance, the first and second species are both molecules. | 10-20-2011 |
20110315891 | SELF-REGENERATING PARTICULATE TRAP SYSTEMS FOR EMISSIONS AND METHODS THEREOF - A method and system for treating emissions includes charging particles in an exhaust stream, producing one or more radicals, and oxidizing at least a portion of the charged particles with at least a portion of the produced radicals. At least a portion of the charged particles in the exhaust stream are then attracted on at least one attraction surface which is one of oppositely charged from the charged particles and grounded. The attracted particles are oxidized with another portion of the one or more produced radicals to self regenerate the at least one attraction surface. Downstream from where the attracted particles are oxidized, at least a portion of one or more first compounds in the exhaust stream are converted to one or more second compounds downstream from the attracting. Additionally, at least a portion of any remaining charged particles are oxidized into one or more gases. | 12-29-2011 |
20120043473 | ELECTROSPRAY ION SOURCE WITH REDUCED ANALYTE ELECTROCHEMISTRY - An electrospray ion (ESI) source and method capable of ionizing an analyte molecule without oxidizing or reducing the analyte of interest. The ESI source can include an emitter having a liquid conduit, a working electrode having a liquid contacting surface, a spray tip, a secondary working electrode, and a charge storage coating covering partially or fully the liquid contacting surface of the working electrode. The liquid conduit, the working electrode and the secondary working electrode can be in liquid communication. The electrospray ion source can also include a counter electrode proximate to, but separated from, said spray tip. The electrospray ion source can also include a power system for applying a voltage difference between the working electrodes and a counter-electrode. The power system can deliver pulsed voltage changes to the working electrodes during operation of said electrospray ion source to minimize the surface potential of the charge storage coating. | 02-23-2012 |
20120056101 | ION DOPING APPARATUS AND ION DOPING METHOD - When hydrogen is introduced into a plasma chamber which includes the dielectric plate as part of an exterior wall, and surface waves are generated on the dielectric plate using microwaves, a region where negative hydrogen ions are easily generated is formed in the plasma chamber. Since only hydrogen negative ions each with a molecular weight of 1 are generated, only ions with the same mass can be added to an object by application of an electric field, without mass separation. | 03-08-2012 |
20120085921 | ION GENERATION METHOD, ION GENERATION APPARATUS, AND ELECTRIC EQUIPMENT USING THE SAME - An air cleaner includes a negative ion generation portion generating negative ions, a positive ion generation portion generating positive ions, a drive portion adjusting a distance between the ion generation portions, a wind velocity sensor detecting wind velocity at positions where the ion generation portions are installed, and a microcomputer controlling the drive portion based on a detection result of the wind velocity sensor and setting distance D between the ion generation portions to an optimal value. Therefore, since the distance between the ion generation portions is set to the optimal value, a large amount of ion generation can be obtained. | 04-12-2012 |
20120104273 | Ion Source and a Method of Generating an Ion Beam Using an Ion Source - Multiple control electrodes are provided asymmetrically within the plasma chamber of an ion source at respective positions along the length of the plasma chamber. Biasing the control electrodes selectively can selectively enhance the ion extraction current at adjacent positions along the length of the extraction slit. A method of generating an ion beam is disclosed in which the strengths of the transverse electric fields at different locations along the length of the plasma chamber are controlled to modify the ion beam linear current density profile along the length of the slit. The method is used for controlling the uniformity of a ribbon beam. | 05-03-2012 |
20120104274 | ION BEAM GENERATING APPARATUS, SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING ELECTRONIC DEVICE - There is provided an ion beam generating apparatus capable of reducing power consumption and obtain highly-accurate uniformity in a substrate process without providing a mechanism to rotate a substrate. Each of ion beam generating apparatuses | 05-03-2012 |
20120126139 | MULTI-DIMENSIONAL ION MOBILITY SPECTROMETRY METHODS AND APPARATUS - Various embodiments of a multi-dimensional ion mobility analyzer are disclosed that have more than one drift chamber and can acquire multi-dimensional ion mobility profiles of substances. The drift chambers of this device can, for example, be operated under independent operational conditions to separate charged particles based on their distinguishable chemical/physical properties. The first dimension drift chamber of this device can be used either as a storage device, a reaction chamber, and/or a drift chamber according to the operational mode of the analyzer. Also presented are various methods of operating an ion mobility spectrometer including, but not limited to, a continuous first dimension ionization methods that can enable ionization of all chemical components in the sample regardless their charge affinity. | 05-24-2012 |
20120138815 | VARIABLE ENERGY CHARGED PARTICLE SYSTEMS - Charged particle system are disclosed and include a first voltage source, a second voltage source electrically isolated from the first voltage source, a charged particle source electrically connected to the first voltage source, and an extractor electrically connected to the second voltage source. Methods relating to the charged particle systems are also disclosed. | 06-07-2012 |
20120145918 | METHOD OF IONIZATION - A plasma is formed from one or more gases in a plasma chamber using at least a first power and a second power. A first ion species is generated at said first power and a second ion species is generated at said second power. In one embodiment, the first ion species and second ion species are implanted into a workpiece at two different energies using at least a first bias voltage and a second bias voltage. This may enable implantation to two different depths. These on species may be atomic ions or molecular ions. The molecular ions may be larger than the gases used to form the plasma. | 06-14-2012 |
20120145919 | CHARGED PARTICLE SOURCE FROM A PHOTOIONIZED COLD ATOM BEAM - A system for producing a charged particle beam from a photoionized cold atom beam. A vapor of neutral atoms is generated. From these atoms, an atom beam having axial and transverse velocity distributions controlled by the application of laser light is produced. The produced atom beam is spatially compressed along each transverse axis, thus reducing the cross-sectional area of the produced beam and reducing a velocity spread of the produced beam along directions transverse to the beam's direction of propagation. Laser light is directed onto at least a portion of the neutral atoms in the atom beam, thereby producing ions and electrons. An electric field is generated at the location of the produced ions and electrons, thereby producing a beam of ions traveling in a first direction and electrons traveling in substantially the opposite direction. A vacuum chamber contains the atom beam, the ion beam and the electron beam. | 06-14-2012 |
20120235057 | APPARATUS AND METHOD FOR FORMING A SOLID IMMERSION LENS USING A BINARY BITMAP MILLING PATTERN - A method for forming a solid immersion lens (SIL) includes generating a focused ion beam, and projecting the focused ion beam onto an optical medium at locations defined by a binary bitmap milling pattern, wherein the locations at which the focused ion beam impact a surface of the optical medium are randomized over successive raster scans of the surface of the optical medium to form at least a portion of a hemispherical structure in the optical medium. | 09-20-2012 |
20120235058 | METHOD FOR EXTENDING LIFETIME OF AN ION SOURCE - This invention relates in part to a method for preventing or reducing the formation and/or accumulation of deposits in an ion source component of an ion implanter used in semiconductor and microelectronic manufacturing. The ion source component includes an ionization chamber and one or more components contained within the ionization chamber. The method involves introducing into the ionization chamber a dopant gas, wherein the dopant gas has a composition sufficient to prevent or reduce the formation of fluorine ions/radicals during ionization. The dopant gas is then ionized under conditions sufficient to prevent or reduce the formation and/or accumulation of deposits on the interior of the ionization chamber and/or on the one or more components contained within the ionization chamber. The deposits adversely impact the normal operation of the ion implanter causing frequent down time and reducing tool utilization. | 09-20-2012 |
20120241642 | LASER DESORPTION IONIZATION ION SOURCE WITH CHARGE INJECTION - An innovative ion source is disclosed that in some embodiments provides an injected independent ion beam to increase the ionization efficiency of the ion source. | 09-27-2012 |
20120267547 | Method for generating an ion current in a hair shaping or care appliance - A method is used to generate an ion current in a hair shaping or care appliance which comprises an ionization apparatus ( | 10-25-2012 |
20120267548 | IONIZER FOR VAPOR ANALYSIS DECOUPLING THE IONIZATION REGION FROM THE ANALYZER - A method and apparatus are described to increase the efficiency with which a sample vapor is ionized prior to being introduced into an analyzer. Excellent contact between the vapor and the charging agent is achieved in the ionization chamber by separating it from the analyzer by means of a perforated impaction plate. As a result, some desired fraction of the gas going into the analyzer or coming out of the analyzer can be controlled independently from the flow of sample through the ionization chamber. Furthermore, penetration into said ionization chamber of said desired fraction of the gas going into or out of the analyzer is minimized by controlling the dimensions of said perforated impaction plate. Ions formed in the ionization chamber are driven partly by electric fields through said hole in said perforated impaction plate into the inlet to the analyzer. As a result, most of the gas sampled into the analyzer carries ionized vapors, even when the sample flow of vapor is very small, and even when the analyzer uses counterflow gas. | 10-25-2012 |
20120280140 | METHOD AND SYSTEM FOR CONTROLLING CRITICAL DIMENSION AND ROUGHNESS IN RESIST FEATURES - A method of treating a photoresist relief feature having an initial line roughness and an initial critical dimension. The method may include directing ions toward the photoresist in a first exposure at a first angular range and first dose rate and a that is configured to reduce the initial line roughness to a second line roughness. The method may also include directing ions toward the photoresist relief feature in a second exposure at a second ion dose rate greater than the first dose rate, wherein the second ion dose rate is configured to swell the photoresist relief feature. | 11-08-2012 |
20120280141 | Method and Apparatus for Multiple Electrospray Emitters in Mass Spectrometry - An electrospray ion source apparatus comprises: a plurality of emitter capillaries, each comprising an internal bore for transporting a portion of a liquid sample from a source, an electrode portion for providing a first applied electric potential and an emitter tip for emitting a cloud of charged particles generated from the liquid sample portion; a counter electrode for providing a second applied electric potential different from the first applied electric potential; and at least one shield electrode disposed at least partially between the counter electrode and the emitter tip of at least one of the emitter capillaries for providing a third applied electric potential intermediate to the first and second applied electric potentials, wherein the at least one shield electrode is configured such that provision of the third applied electric potential to the at least one shield electrode minimizes electric field interference effects between the plurality of emitter capillaries. | 11-08-2012 |
20120313005 | ION GENERATING APPARATUS AND ION PRESENCE DETERMINING METHOD - It is expected to provide an ion generating apparatus and an ion presence determination method that can prevent the lower accuracy of the ion presence determination caused by the humidity effect. The ion generators are switched ON at the different timing, the electrical potential of the collecting electrode is measured to determine that the ion is present (or not present) when the voltage difference is larger (or smaller) than the threshold. A humidity detecting unit is arranged in a duct. The set threshold for the determination is based on the humidity of the humidity detecting unit, and the ion presence determination is not performed when the humidity is equal to or more than a predetermined humidity. When the determination representing no ion is obtained predetermined times, the warning is output for the users with a LED of a display, a buzzer of a controller or the like. | 12-13-2012 |
20130043404 | ION GENERATION DEVICE AND ION DETECTION METHOD IN THE DEVICE - An ion generation device includes an ion generator that generates ions, an ion detector that detects generated ions, a blower that blows the generated ions to outside through a draft air duct, and a control unit that performs drive control of the ion generator and the blower. When the control unit detects absence of generation of ions at a time of starting operation or the like, the control unit stops driving of the ion generator for a short time while keeping the blower driving, and purges staying ions, after which, the control unit carries out ion detection by the ion detector, and determines presence or absence of ion generation. When the control unit determines that ion generation is absent, the control unit continuously performs determination of ion generation a plurality of times, and if ion generation is absent in all the determinations, finally determines generation of ions as absent. | 02-21-2013 |
20130068963 | SHIELDED CAPACITIVE ELECTRODE - A device is described, which is sensitive to electric fields, but is insensitive to stray electrons/ions and unlike a bare, exposed conductor, it measures capacitively coupled current while rejecting currents due to charged particle collected or emitted. A charged particle beam establishes an electric field inside the beam pipe. A grounded metallic box with an aperture is placed in a drift region near the beam tube radius. The produced electric field that crosses the aperture generates a fringe field that terminates in the back surface of the front of the box and induces an image charge. An electrode is placed inside the grounded box and near the aperture, where the fringe fields terminate, in order to couple with the beam. The electrode is negatively biased to suppress collection of electrons and is protected behind the front of the box, so the beam halo cannot directly hit the electrode and produce electrons. The measured signal shows the net potential (positive ion beam plus negative electrons) variation with time, as it shall be observed from the beam pipe wall. | 03-21-2013 |
20130112892 | IN-LINE CORONA-BASED GAS FLOW IONIZER - Self-balancing, corona discharge for the stable production of electrically balanced and ultra-clean ionized gas streams is disclosed. This result is achieved by promoting the electronic conversion of free electrons into negative ions without adding oxygen or another electronegative gas to the gas stream. The invention may be used with electronegative and/or electropositive or noble gas streams and may include the use of a closed loop corona discharge control system. | 05-09-2013 |
20130146782 | Spatial Segregation of Plasma Components - A closed plasma channel (“CPC”) superconductor which, in a first embodiment, is comprised of an elongated, close-ended vacuum conduit comprising a cylindrical wall having a longitudinal axis and defining a transmission space for containing an ionized gas of vapor plasma (hereinafter “plasma components”), the plasma components being substantially separated into regionalized channels parallel to the longitudinal axis in response to a static magnetic field produced within the transmission space. Each channel is established along the entire length of the transmission space. At least one channel is established comprised primarily of free-electrons which provide a path of least resistance for the transmission of energy therethrough. Ionization is established and maintained by the photoelectric effect of a light source of suitable wavelength to produce the most conductive electrical transmission medium. Various embodiments of the subject method and apparatus are described including a hybrid system for the transmission of alternating current or, alternatively, multi-pole EM fields through the cylindrical wall and direct current or charged particles through the stratified channels. | 06-13-2013 |
20130234036 | ION SOURCE, HEAVY PARTICLE BEAM IRRADIATION APPARATUS, ION SOURCE DRIVING METHOD, AND HEAVY PARTICLE BEAM IRRADIATION METHOD - A laser-ablation plasma generator generates laser-ablation plasma from a target in a vacuum vessel. An ion beam extractor generates an ion beam by extracting ions included in the laser-ablation plasma from the vacuum vessel. An ion detector detects unintended ions other than intended ions, which are obtained by ionizing the elements in the target, out of ions in the vacuum vessel and outputs a detection signal representing a value which is a number of the unintended ions or a mixing ratio of the unintended ions to the intended ions as a detection result. The ion source using the laser beam makes it possible to normally monitor unintended ions other than intended ions out of ions in the vacuum vessel. | 09-12-2013 |
20130270454 | SYSTEM AND METHOD OF ION BEAM SOURCE FOR SEMICONDUCTOR ION IMPLANTATION - An apparatus comprises an ionization chamber for providing ions during a process of ion implantation, and an electron beam source device inside the ionization chamber. The electron beam source device comprises a field emission array having a plurality of emitters for generating electrons in vacuum under an electric field. | 10-17-2013 |
20130277570 | METHOD AND DEVICE FOR GAS-PHASE ION FRAGMENTATION - The invention relates to a device for performing electron capture dissociation on multiply charged cations. Provided is an electron emitter which, upon triggering, emits a plurality of low energy electrons suitable for efficient electron capture reactions to occur. Further, the device contains a particle emitter being located proximate to the electron emitter and being capable, upon triggering, to emit a plurality of high energy charged particles substantially in a direction towards the electron emitter in order that the electron emitter receives a portion of the emitted plurality of high energy charged particles and emission of the plurality of low energy electrons is triggered. A volume capable of containing a plurality of multiply charged cations is located in opposing relation to the electron emitter such that the volume receives the plurality of low energy electrons upon emission as to allow electron capture dissociation to occur. | 10-24-2013 |
20140042336 | Laser Sustained Plasma Bulb Including Water - A wafer inspection system includes a laser sustained plasma (LSP) light source that generates light with sufficient radiance to enable bright field inspection. Reliability of the LSP light source is improved by introducing an amount of water into the bulb containing the gas mixture that generates the plasma. Radiation generated by the plasma includes substantial radiance in a wavelength range below approximately 190 nanometers that causes damage to the materials used to construct the bulb. The water vapor acts as an absorber of radiation generated by the plasma in the wavelength range that causes damage. In some examples, a predetermined amount of water is introduced into the bulb to provide sufficient absorption. In some other examples, the temperature of a portion of the bulb containing an amount of condensed water is regulate to produce the desired partial pressure of water in the bulb. | 02-13-2014 |
20140042337 | INDUCTIVELY COUPLED PLASMA ION SOURCE WITH MULTIPLE ANTENNAS FOR WIDE ION BEAM - A wide ion beam source includes a plurality of RF windows arranged in a predetermined relationship, a single plasma chamber disposed on a first side of the plurality of RF windows, a plurality of RF antennas, each RF antenna of the plurality of RF antennas disposed on a second side of a respective RF window of the plurality of RF windows, the second side being opposite the first side, and a plurality of RF sources, each RF source coupled to a respective RF antenna of the plurality of RF antennas, wherein a difference in frequency of a first RF signal produced by a first RF source coupled to a first RF antenna from that of a second RF signal produced by a second RF source coupled to an RF antenna adjacent to the first RF antenna is greater than 10 kHz. | 02-13-2014 |
20140054470 | ACTIVE IONIZATION CONTROL WITH INTERLEAVED SAMPLING AND NEUTRALIZATION - A method for optimizing performance of a static neutralizing power supply coupled to a controller and configured to provide an output to at least one ionizer includes, (a) during a first time period, sensing a current flow to the at least one ionizer, and (b) comparing, in the controller, an expected current flow to the sensed current flow. A difference between the expected and sensed current flows is proportional to a charge on an object to be neutralized proximate the at least one ionizer. The method further includes (c) adjusting, by the controller and based on the comparison, one or more properties of the output to the at least one ionizer to neutralize the charge on the object during a second time period following the first time period, and (d) periodically repeating steps (a)-(c) for successive first and second time periods. | 02-27-2014 |
20140054471 | DEVICE FOR SHAPING AN ELECTRON BEAM OF A MACHINE FOR INTRAOPERATIVE RADIATION THERAPY - The present invention concerns a device for shaping an electron beam of a machine for intraoperative radiation therapy (IORT—Intra Operative Radiation Therapy) using a tubular applicator ( | 02-27-2014 |
20140061500 | ATMOSPHERIC PRESSURE ION SOURCE WITH EXHAUST SYSTEM - An atmospheric pressure ion source, employing the principle of electrospray ionization, chemical ionization, or photo-ionization, comprises a spray probe for spraying a liquid into an ionization chamber and has an exhaust port through which residual spray mist and waste gas, such as evaporated solvent, are extracted. The ion source further comprises an exhaust system comprising a conduit which is connected to the exhaust port. The conduit has a transition from a first cross-section to a second cross section at a point downstream of the exhaust port wherein the second cross section is reduced in relation to the first cross section. Gas is injected via a gas injector into the conduit in a region of the transition to create a low pressure region that removes unwanted material from the chamber. | 03-06-2014 |
20140061501 | SILICON-CONTAINING DOPANT COMPOSITIONS, SYSTEMS AND METHODS OF USE THEREOF FOR IMPROVING ION BEAM CURRENT AND PERFORMANCE DURING SILICON ION IMPLANTATION - A novel composition, system and method thereof for improving beam current during silicon ion implantation are provided. The silicon ion implant process involves utilizing a first silicon-based co-species and a second species. The second species is selected to have an ionization cross-section higher than that of the first silicon-based species at an operating arc voltage of an ion source utilized during generation and implantation of active silicon ions species. The active silicon ions produce an improved beam current characterized by maintaining or increasing the beam current level without incurring degradation of the ion source when compared to a beam current generated solely from SiF4. | 03-06-2014 |
20140110598 | ION SOURCE DEVICE AND METHOD FOR PROVIDING ION SOURCE - Various embodiments provide an ion source device and a method for providing the ion source. An exemplary ion source device can include an arc chamber, a filament, a reflector, a slit outlet, a source gas inlet, and/or a cleaning gas inlet. The filament can be configured to generate thermo-electrons in the arc chamber. The reflector can be configured to reflect the thermo-electrons back to the arc chamber. The slit outlet can be configured to exit a gaseous material out of the arc chamber. The source gas inlet and the cleaning gas inlet can be located on a same sidewall of the arc chamber configured to respectively introduce an ion source gas and an inert cleaning gas into the arc chamber. | 04-24-2014 |
20140151573 | MULTI-ENERGY ION IMPLANTATION - In a multi-energy ion implantation process, an ion implanting system having an ion source, an extraction assembly, and an electrode assembly is used to implant ions into a target. An ion beam having a first energy may be generated using the ion source and the extraction assembly. A first voltage may be applied across the electrode assembly. The ion beam may enter the electrode assembly at the first energy, exit the electrode assembly at a second energy, and implant ions into the target at the second energy. A second voltage may be applied across the electrode assembly. The ion beam may enter the electrode assembly at the first energy, exit the electrode assembly at a third energy, and implants ions into the target at the third energy. The third energy may be different from the second energy. | 06-05-2014 |
20140183376 | ION SOURCE USING HEATED CATHODE AND ELECTROMAGNETIC CONFINEMENT - An ion source for use in a radiation generator tube includes a back passive cathode electrode, a passive anode electrode downstream of the back passive cathode electrode, a magnet adjacent the passive anode electrode, and a front passive cathode electrode downstream of the passive anode electrode. The front passive cathode electrode and the back passive cathode electrode define an ionization region therebetween. At least one ohmically heated cathode is configured to emit electrons into the ionization region. The back passive cathode electrode and the passive anode electrode, and the front passive cathode electrode and the passive anode electrode, have respective voltage differences therebetween, and the magnet generating a magnetic field, such that a Penning-type trap is produced to confine the electrons to the ionization region. At least some of the electrons in the ionization region interact with an ionizable gas to create ions. | 07-03-2014 |
20140197333 | MASS ANALYSER INTERFACE - A mass analyzer includes a desolvation chamber into which an upstream gas is injected to provide a counter-flow to said downstream flow in the chamber. The counter-flow may slow the downstream flow of solvated ionized particles in the chamber, while allowing lighter desolvated ions to travel toward an outlet aperture of the desolvation chamber. | 07-17-2014 |
20140231669 | MICROWAVE ION SOURCE AND METHOD FOR STARTING SAME - A microwave ion source includes a plasma chamber, a magnetic field generator that generates a magnetic field in the plasma chamber, and a control unit that controls the magnetic field generator to apply an initial magnetic field for plasma ignition to the plasma chamber and change the initial magnetic field to a normal magnetic field after the plasma ignition. The plasma chamber may have a vacuum window that receives a microwave, and an ion extraction opening. The initial magnetic field may have a flat magnetic field distribution from the vacuum window to the ion extraction opening. | 08-21-2014 |
20140239191 | Method for Uninterrupted Production of a Polyatomic Boron Molecular Ion Beam with Self-Cleaning - The uninterrupted production of an ion beam with self-cleaning of a discharge chamber and extractor system, including extraction aperture(s), of an ion implantation device. The method increases the time of continuous operation of the ion implantation device, and therefore, increases total implantation time without reducing intensity. As a result, the time integrated output of the ion implantation device is increased. The method includes feeding a working molecule comprising at least two boron atoms and a strong oxidizer into an ion implantation device and removing gaseous compounds from the ion implantation device, wherein said working molecule provides upon fragmentation a polyatomic boron-containing ion, and the strong oxidizer which reacts with solid products of decomposition of the working molecule to form said gaseous compounds. A working molecule including at least two boron atoms and at least one strong oxidizer is also disclosed. Examples of the working molecule include C | 08-28-2014 |
20140291545 | SPATIAL SEGREGATION OF PLASMA COMPONENTS - A closed plasma channel (“CPC”) superconductor which, in a first embodiment, is comprised of an elongated, close-ended vacuum conduit comprising a cylindrical wall having a longitudinal axis and defining a transmission space for containing an ionized gas of vapor plasma (hereinafter “plasma components”), the plasma components being substantially separated into regionalized channels parallel to the longitudinal axis in response to a static magnetic field produced within the transmission space. Each channel is established along the entire length of the transmission space. At least one channel is established comprised primarily of free-electrons which provide a path of least resistance for the transmission of energy therethrough. Ionization is established and maintained by the photoelectric effect of a light source of suitable wavelength to produce the most conductive electrical transmission medium. Various embodiments of the subject method and apparatus are described including a hybrid system for the transmission of alternating current or, alternatively, multi-pole EM fields through the cylindrical wall and direct current or charged particles through the stratified channels. | 10-02-2014 |
20140306121 | ION SOURCES, SYSTEMS AND METHODS - Ion sources, systems and methods are disclosed. | 10-16-2014 |
20140312245 | MULTI-SOURCE PLASMA FOCUSED ION BEAM SYSTEM - The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam. | 10-23-2014 |
20140319369 | Ion source and a method for in-situ cleaning thereof - An ion source and method of cleaning are disclosed. One or more heating units are placed in close proximity to the inner volume of the ion source, so as to affect the temperature within the ion source. In one embodiment, one or more walls of the ion source have recesses into which heating units are inserted. In another embodiment, one or more walls of the ion source are constructed of a conducting circuit and an insulating layer. By utilizing heating units near the ion source, it is possible to develop new methods of cleaning the ion source. Cleaning gas is flowed into the ion source, where it is ionized, either by the cathode, as in normal operating mode, or by the heat generated by the heating units. The cleaning gas is able to remove residue from the walls of the ion source more effectively due to the elevated temperature. | 10-30-2014 |
20140326896 | METHOD AND APPARATUS FOR ENHANCED LIFETIME AND PERFORMANCE OF ION SOURCE IN AN ION IMPLANTATION SYSTEM - An ion implantation system and process, in which the performance and lifetime of the ion source of the ion implantation system are enhanced, by utilizing isotopically enriched dopant materials, or by utilizing dopant materials with supplemental gas(es) effective to provide such enhancement. | 11-06-2014 |
20140353518 | INSULATION STRUCTURE AND INSULATION METHOD - An insulation structure provided among a plurality of electrodes for extraction of an ion beam from a plasma generating section is provided. The insulation structure includes an insulation member including a first part connected to a first electrode and a second part connected to a second electrode and configured to support the first electrode to the second electrode, a first cover surrounding at least a part of the first part to protect the first part from contamination particles, and a second cover surrounding at least a part of the second part to protect the second part from contamination particles. At least one of the first part and the second part is made of a machinable ceramic or a porous ceramic. | 12-04-2014 |
20150008333 | Charged Particle Beam System and Method of Operating a Charged Particle Beam System - The disclosure relates to a method of operating a gas field ion beam system in which the gas field ion beam system comprises an external housing, an internal housing, arranged within the external housing, an electrically conductive tip arranged within the internal housing, a gas supply for supplying one or more gases to the internal housing, the gas supply having a tube terminating within the internal housing, and an extractor electrode having a hole to permit ions generated in the neighborhood of the tip to pass through the hole into the external housing. The method comprises the step of regularly heating the external housing, the internal housing, the electrically conductive tip, the tube and the extractor electrode to a temperature of above 100° C. | 01-08-2015 |
20150008334 | CHARGED PARTICLE BEAM SYSTEM AND METHOD OF OPERATING A CHARGED PARTICLE BEAM SYSTEM - The present disclosure relates to a gas field ion source comprising a housing, an electrically conductive tip arranged within the housing, a gas supply for supplying one or more gases to the housing, wherein the one or more gases comprise neon or a noble gas with atoms having a mass larger than neon, and an extractor electrode having a hole to permit ions generated in the neighborhood of the tip to pass through the hole. A surface of the extractor electrode facing the tip can be made of a material having a negative secondary ion sputter rate of less than 10 | 01-08-2015 |
20150028221 | METHODS OF ION SOURCE FABRICATION - A method of ion source fabrication for a mass spectrometer includes simultaneously forming aligned component portions of an ion source using direct metal laser fusing of sequential layers. The method can further include forming the component portions on a base plate made from a ceramic material by applying fused powder to the base plate to build the component portions thereon. | 01-29-2015 |
20150028222 | PLASMA-BASED PHOTON SOURCE, ION SOURCE, AND RELATED SYSTEMS AND METHODS - A photon source includes a plasma source for generating plasma and a photon guide through which the plasma travels. The photon guide includes an inner surface configured for reflecting photons emitted from the plasma. As the plasma travels through the photon guide, plasma electrons and ions recombine at the inner surface, whereby the predominant species emitted from an outlet of the photon guide are the photons and neutral particles, with few or no plasma electrons and ions being emitted. | 01-29-2015 |
20150034837 | LIFETIME ION SOURCE - An ion source includes an ion source chamber, a gas source to provide a fluorine-containing gas species to the ion source chamber and a cathode disposed in the ion source chamber configured to emit electrons to generate a plasma within the ion source chamber. The ion source chamber and cathode are comprised of a refractory metal. A phosphide insert is disposed within the ion source chamber and presents an exposed surface area that is configured to generate gas phase phosphorous species when the plasma is present in the ion source chamber, wherein the phosphide component is one of boron phosphide, tungsten phosphide, aluminum phosphide, nickel phosphide, calcium phosphide and indium phosphide. | 02-05-2015 |
20150048255 | Ion Source for Mass Spectrometer and Method of Producing Analyte Ion Stream - An ion source for a mass spectrometer and a method of ionizing a sample are disclosed. A droplet generator is configured to emit a stream of analyte droplets, which are ionized upon impact with a target, thus forming an ion stream. Preferably, the droplets have a diameter that is greater than a preset value to increase the kinetic energy of the droplets. Additionally, the droplet generator can be configured to create a gas flow that increases the kinetic energy of the droplets. In one embodiment, the target is positioned upstream of an inlet of a mass spectrometer so that the ion stream enters the inlet. In another preferred embodiment, the target is positioned downstream of the inlet so that the stream of droplets passes through the inlet of the mass spectrometer, and the inlet is provided with a pressure drop that increases the kinetic energy of the droplets. | 02-19-2015 |
20150102232 | IONIZATION METHOD, IONIZATION APPARATUS, AND MASS ANALYSIS SYSTEM - In order to achieve an ionization method of high robustness with a small carry-over or less crosstalk, an ionization method is disclosed. A method includes the steps of: joining an ionization unit to a tube; sucking the sample from a sample container into a sample holder of the ionization unit to hold the sample; moving the ionization unit holding the sample to near the ionization unit using an ionization unit drive unit; and applying a voltage to the ionization unit using a power supply to ionize the sample by electrostatically spraying the sample from the holding unit. | 04-16-2015 |
20150102233 | MEDIUM CURRENT RIBBON BEAM FOR ION IMPLANTATION - A method of setting up a medium current ribbon beam for ion implantation is provided. It includes providing an ion source fed with a process gas and a support gas. The process ion beam is separated from the support gas beam with a mass analyzing magnet, and the intensity of the process ion beam is controlled by varying the ratio of process gas to support gas in the ion source gas feed. Process beam intensity may also be controlled with one or more mechanical current limiting devices located downstream of the ion source. An ion beam system is also provided. This method may control the total ribbon beam intensity at the target between approximately 3 uA to about 3 mA. | 04-16-2015 |
20150123009 | DEVICE FOR GENERATING HEAVY-ION BEAM AND METHOD THEREOF - There is provided a device for generating a heavy-ion beam. The device includes a laser beam generating unit configured to generate a laser beam; a target configured to generate a heavy-ion beam by the laser beam; a laser optical system configured to focus the laser beam on the front of the target; and a plasma treating unit disposed at a rear surface of the target and configured to remove impurities within the target by plasma surface treatment that is performed by radiating cationic plasma onto the rear surface of the target. | 05-07-2015 |
20150123010 | Bright and Durable Field Emission Source Derived from Refractory Taylor Cones - A method of producing field emitters having improved brightness and durability relying on the creation of a liquid Taylor cone from electrically conductive materials having high melting points. The method calls for melting the end of a wire substrate with a focused laser beam, while imposing a high positive potential on the material. The resulting molten Taylor cone is subsequently rapidly quenched by cessation of the laser power. Rapid quenching is facilitated in large part by radiative cooling, resulting in structures having characteristics closely matching that of the original liquid Taylor cone. Frozen Taylor cones thus obtained yield desirable tip end forms for field emission sources in electron beam applications. Regeneration of the frozen Taylor cones in-situ is readily accomplished by repeating the initial formation procedures. The high temperature liquid Taylor cones can also be employed as bright ion sources with chemical elements previously considered impractical to implement. | 05-07-2015 |
20150129775 | ION GENERATOR AND ION GENERATING METHOD - An ion generator is provided with: an arc chamber that is at least partially made up of a material containing carbon; a thermal electron emitter that emits thermal electrons into the arc chamber; and a gas introducer that introduces a source gas and a compound gas into the arc chamber. The source gas to be introduced into the arc chamber contains a halide gas, and the compound gas to be introduced into the arc chamber contains a compound having carbon atoms and hydrogen atoms. | 05-14-2015 |
20150338384 | IONIZATION OF ANALYTE MOLECULES COMPRISED IN A FLOW OF GAS - An apparatus for ionizing analyte molecules comprised in a flow of a first gas. The apparatus includes an inlet tube through which the first gas may be discharged into an ionization region. The apparatus also includes a nozzle electrode disposed around the inlet tube to define a substantially annular space between the exterior of the inlet tube and the interior of the nozzle electrode. The sheath tube includes an inlet for introducing a fluid into the substantially annular space and an outlet through which the fluid may be discharged into the ionization region. The apparatus is configured to ionize the analyte molecules optionally via electrospray or chemical ionization. | 11-26-2015 |
20150364302 | Optimizing Drag Field Voltages in a Collision Cell for Multiple Reaction Monitoring (MRM) Tandem Mass Spectrometry - A collision cell has a plurality of rod electrodes arranged in opposed pairs around an axial centerline and a plurality of drag vanes arranged in the interstitial spaces between the rod electrodes. Operating the collision cell includes, applying a rod offset voltage to the rod electrodes, and varying an offset voltage applied to the drag vanes to identify a vane offset voltage with a maximum intensity for the transition. The method further includes varying a drag field by adjusting the voltages applied to drag vane terminals in opposite directions to identify a drag field value with a cross talk below a cross talk threshold, varying the vane offset voltage by adjusting the voltages applied to the drag vane terminals to maximize the intensity of the transition while preserving the drag field, and operating the collision cell at the vane offset voltage and drag field to monitor the transition. | 12-17-2015 |
20150364311 | COMPOSITIONS AND METHODS FOR MASS SPECTOMETRY - The invention provides ionizing matrix compounds. These compounds are useful for mass spectrometry and ion mobility spectrometry as ionizing matrices facilitating transfer of diverse classes of analyte compounds from solid or solution states to gas-phase ions. | 12-17-2015 |
20160104598 | Charged Particle Beam System and Method of Operating a Charged Particle Beam System - The present disclosure relates to a gas field ion source comprising a housing, an electrically conductive tip arranged within the housing, a gas supply for supplying one or more gases to the housing, wherein the one or more gases comprise neon or a noble gas with atoms having a mass larger than neon, and an extractor electrode having a hole to permit ions generated in the neighborhood of the tip to pass through the hole. A surface of the extractor electrode facing the tip can be made of a material having a negative secondary ion sputter rate of less than 10 | 04-14-2016 |
20160111243 | Charged Particle Beam System and Method of Operating a Charged Particle Beam System - The disclosure relates to a method of operating a gas field ion beam system in which the gas field ion beam system comprises an external housing, an internal housing, arranged within the external housing, an electrically conductive tip arranged within the internal housing, a gas supply for supplying one or more gases to the internal housing, the gas supply having a tube terminating within the internal housing, and an extractor electrode having a hole to permit ions generated in the neighborhood of the tip to pass through the hole into the external housing. The method comprises the step of regularly heating the external housing, the internal housing, the electrically conductive tip, the tube and the extractor electrode to a temperature of above 100° C. | 04-21-2016 |
20160111245 | ELECTRODE ASSEMBLY HAVING PIERCE ELECTRODES FOR CONTROLLING SPACE CHARGE EFFECTS - An electrode assembly for accelerating or decelerating an ion beam is provided. In one example, the electrode assembly may include a pair of exit electrodes adjacent to an exit opening of the electrode assembly. The pair of exit electrodes may be positioned on opposite sides of a first plane aligned with a first dimension of the exit opening. A pair of pierce electrodes may be adjacent to the pair of exit electrodes. The pair of pierce electrodes may be positioned on opposite sides of a second plane aligned with a second dimension of the exit opening. The second dimension of the exit opening may be perpendicular to the first dimension of the exit opening. Each pierce electrode may include an angled surface positioned such that a dimension of the angled surface forms an angle of between 40 and 80 degrees with respect to the second plane. | 04-21-2016 |
20160126052 | System For Fast Ions Generation And A Method Thereof - The present invention discloses a system and method tot generating a beam of fast ions. The system comprising: a target substrate having patterned surface, a pattern comprising nanoscale pattern features oriented substantially uniformly along a common axis; and; a beam unit adapted for receiving a high power coherent electromagnetic radiation beam and providing an electromagnetic radiation beam having a main pulse and a pre-pulse and focusing it onto said patterned surface of the target substrate to cause interaction between said radiation beam and said substrate enabling creation of fast ions. | 05-05-2016 |
20160133427 | BORON-CONTAINING DOPANT COMPOSITIONS, SYSTEMS AND METHODS OF USE THEREOF FOR IMPROVING ION BEAM CURRENT AND PERFORMANCE DURING BORON ION IMPLANTATION - A novel composition, system and method for improving beam current during boron ion implantation are provided. In a preferred aspect, the boron ion implant process involves utilizing B2H6, 11BF3 and H2 at specific ranges of concentrations. The B2H6 is selected to have an ionization cross-section higher than that of the BF3 at an operating arc voltage of an ion source utilized during generation and implantation of active hydrogen ions species. The hydrogen allows higher levels of B2H6 to be introduced into the BF3 without reduction in F ion scavenging. The active boron ions produce an improved beam current characterized by maintaining or increasing the beam current level without incurring degradation of the ion source when compared to a beam current generated from conventional boron precursor materials. | 05-12-2016 |
20160148775 | ANODE LAYER SLIT ION SOURCE - A linear anode layer ion source is provided that includes a top pole having a linear ion emitting slit. An anode under the top pole has a slit aligned with the top pole ion emitting slit. At least one magnet creates a magnetic field that passes through the anode slit. Wherein the width of the anode slit is 3 mm or less. A process of generating an accelerated ion beam is also provided that includes flowing a gas into proximity to said anode. By energizing a power supply electron flow is induced to the anode and the gas is ionized. Accelerating the ions from the anode through the linear ion emitting slit generates an accelerated ion beam by a process superior to that using a racetrack-shaped slit. | 05-26-2016 |
20160181078 | Bubble Removal from Liquid Flow into a Mass Spectrometer Source | 06-23-2016 |
20160181082 | Enhanced Spray Formation for Liquid Samples | 06-23-2016 |
20170232131 | FLEXIBLE ION GENERATION DEVICE | 08-17-2017 |