Class / Patent application number | Description | Number of patent applications / Date published |
250309000 | Positive ion probe or microscope type | 20 |
20080277582 | Closed loop controller and method for fast scanning probe microscopy - A method of operating a metrology instrument includes generating relative motion between a probe and a sample at a scan frequency using an actuator. The method also includes detecting motion of the actuator using a position sensor that exhibits noise in the detected motion, and controlling the position of the actuator using a feedback loop and a feed forward algorithm. In this embodiment, the controlling step attenuates noise in the actuator position compared to noise exhibited by the position sensor over the scan bandwidth. Scan frequencies up to a third of the first scanner resonance frequency or greater than 300 Hz are possible. | 11-13-2008 |
20080296497 | METHOD AND APPARATUS FOR SPECIMEN FABRICATION - A system for analyzing a semiconductor device, including: a first ion beam apparatus including: a sample stage to mount a sample substrate; a vacuum chamber in which the sample stage is placed; an ion beam irradiating optical system to irradiate the sample substrate; a specimen holder that accommodates a plurality of specimens separated from the sample substrate by the irradiation of the ion beam; and a probe to extract the separated specimen from the sample substrate, and to transfer the separated specimen to the specimen holder; a second ion beam apparatus that carries out a finishing process to the specimen; and an analyzer to analyze the finished specimen, wherein the first ion beam apparatus separates the specimen and the probe in a vacuum condition. | 12-04-2008 |
20080308730 | Real-Time, 3D, Non-Linear Microscope Measuring System and Method for Application of the Same - A real-time, 3D, non-linear microscope measuring system and method for examining a set of microscopic image points in different image planes. The system comprises a pulsed laser or parametric oscillator light source generating an examining optical signal, and is applicable to measure and/or photochemically stimulate pre-selected points within a short time interval. The system further comprises a bundle of fibers composed of optical fibers or other waveguides, a rapidly working optical switch, a imaging system, a light source and an optical system. The examining optical signal is a fluorescent or other optical signal imaged on the required spot. | 12-18-2008 |
20090039260 | CHARGED PARTICLE BEAM APPARATUS - When a sample includes repeated cells, a scale pattern corresponding to the repeated cells is generated. Next, the scale pattern generated is superimposed on the image of the repeated cells of the sample, thereby identifying a destination cell. Moreover, disposition of the repeated cells of the sample is determined based on positions of at least three ends of the repeated cells. Then, the position of the destination cell is identified from this disposition of the repeated cells. Furthermore, a zoom image is generated by a combination of a zoom based on beam deflection function and a zoom based on software. Then, the image shift is performed by software without displacing a sample stage. | 02-12-2009 |
20090078867 | METHOD AND SYSTEM FOR GENERATING AND REVIEWING A THIN SAMPLE - A system and method for generating a thin sample, the method includes: milling an intermediate section of a thin sample such as to enable an upper portion of the thin sample to tilt in relation to a lower portion of the thin sample; wherein the lower portion is connected to a wafer from which the thin sample was formed. A system and method for inspecting a thin sample, the method includes: A method for inspecting a thin sample, the method comprising: illuminating, by a charged particle beam, a tilted upper portion of a thin sample that is connected, via a milled intermediate section, to a lower portion of the thin sample; wherein the lower portion is connected to a wafer from which the thin sample was formed; and collecting particles and photons resulting from the illumination. | 03-26-2009 |
20090314939 | SAMPLE DECONTAMINATION - Disclosed herein are methods that include: (a) exposing a sample in a chamber to a first gas, where the first gas reacts with surface contaminants on the sample to form a second gas; (b) removing at least a portion of the second gas from the chamber; and (c) exposing the sample to a charged particle beam to cause a plurality of particles to leave the sample and detecting at least some of the plurality of particles. The charged particle beam can include particles having a molecular weight of 40 atomic mass units or less. | 12-24-2009 |
20100012839 | INCREASING CURRENT IN CHARGED PARTICLE SOURCES AND SYSTEMS - Disclosed are charged particle systems that include a tip, at least one gas inlet configured to supply gas particles to the tip, and a element having a curved surface positioned to adsorb un-ionized gas particles, and to direct desorbing gas particles to propagate toward the tip. The charged particle systems can include a field shunt connected to the tip, and configured to adjust an electric field at an apex of the tip. | 01-21-2010 |
20100038536 | NANOTIP REPAIR AND CHARACTERIZATION USING FIELD ION MICROSCOPY | 02-18-2010 |
20100140473 | NANOROBOT MODULE, AUTOMATION AND EXCHANGE - A nanorobot module with a measurement device for the measurement of spatial surface properties with a measurement range in the centimetre range and a resolution in the nanometre range, that can be arranged in a vacuum chamber, for example the vacuum chamber of a microscope. Along with this integration of the nanorobot module into a vacuum chamber, the disclosure further relates to the automation of the module in the chamber system, in particular the connection of the controller of the nanorobot system and the chamber system by the provision of an interface between both systems. Finally, the disclosure relates to a mechatronic exchange adapter for the flexible securing of nanorobot modules within a vacuum chamber, in particular the disclosure relates to an exchange adapter, which preferably in one process electrically connects a nanorobot module and mechanically secures it so that it is guided with high precision and without play. | 06-10-2010 |
20100224780 | BEAM DEVICE SYSTEM COMPRISING A PARTICLE BEAM DEVICE AND AN OPTICAL MICROSCOPE - A beam device, in particular a particle beam device, for analyzing an object is provided, as well as a system comprising a particle beam device and an optical microscope for optically analyzing an object. The beam device simplifies the exchange and reduces the time of the exchange of objects to be examined. The beam device includes at least one beam generator that generates a beam, at least one objective lens that focuses the beam on an object arranged in a holding element. The objective lens comprises at least one connecting element. The holding element may be connected to the connecting element so that the holding element is removable from the connecting element for modification of the object. Alternatively, the holding element may be mounted to a beam column. | 09-09-2010 |
20100237242 | DEVICE AND METHOD FOR CRYSTAL ORIENTATION MEASUREMENT BY MEANS OF AN ION BLOCKING PATTERN AND A FOCUSED ION PROBE - The invention relates to a device for crystal orientation measurement, comprising an ion source ( | 09-23-2010 |
20100288926 | ATOM PROBE DATA AND ASSOCIATED SYSTEMS AND METHODS - The present invention relates to atom probe data and associated systems and methods. Aspects of the invention are directed toward a computing system configured to predict a characteristic associated with an atom probe specimen that includes a data set receiving component configured to receive a three-dimensional data set associated with a portion of the specimen. The system further includes a predicting/calculating component configured to predict the characteristic associated with the specimen based on the data set. Other aspects of the invention are directed toward a method for evaluating a manufacturing process using atom probe data that includes receiving a three-dimensional data set associated with a portion of a microelectronic assembly produced by a manufacturing process. The method further includes determining a variation between the data set and a configuration expected to result from the manufacturing process. | 11-18-2010 |
20110133081 | Spectrophotometer Using Medium Energy Ion - Provided is a spectrophotometer using medium energy ion. The spectrophotometer using medium energy ion is configured to include: an ion source | 06-09-2011 |
20120074320 | PARTICLE BEAM DEVICE HAVING A SAMPLE HOLDER - A particle beam device and a sample receptacle apparatus, which has a sample holder, are disclosed. The sample holder is arranged in a movable fashion along at least a first axis and along at least a second axis. Furthermore, the sample holder is arranged in a rotatable fashion about a first axis of rotation and about a second axis of rotation. A first sample holding device is arranged relative to the sample holder in a rotatable fashion about a third axis of rotation, in which the third axis of rotation and the second axis of rotation are at least in part arranged laterally offset with respect to one another. Furthermore, a control apparatus is provided, in which the first sample holding device is rotatable about the third axis of rotation into an analysis position and/or treating position using the control apparatus. | 03-29-2012 |
20120119086 | GAS FIELD ION SOURCE, CHARGED PARTICLE MICROSCOPE, AND APPARATUS - A gas field ion source that can simultaneously increase a conductance during rough vacuuming and reduce an extraction electrode aperture diameter from the viewpoint of the increase of ion current. The gas field ion source has a mechanism to change a conductance in vacuuming a gas molecule ionization chamber. That is, the conductance in vacuuming a gas molecule ionization chamber is changed in accordance with whether or not an ion beam is extracted from the gas molecule ionization chamber. By forming lids as parts of the members constituting the mechanism to change the conductance with a bimetal alloy, the conductance can be changed in accordance with the temperature of the gas molecule ionization chamber, for example the conductance is changed to a relatively small conductance at a relatively low temperature and to a relatively large conductance at a relatively high temperature. | 05-17-2012 |
20120193532 | SEMICONDUCTOR STRUCTURE AND FAULT LOCATION DETECTING SYSTEM - A semiconductor structure includes a grounding unit, a P-type substrate, a P-type well area, an NMOS structure, a P-type well contact area, a shallow trench isolation structure, and a charge guiding groove. The P-type substrate is formed above the grounding unit. The P-type well area is formed on the P-type substrate. The NMOS structure is formed on the P-type well area, and the NMOS structure includes at least one exposed N-type source area, at least one exposed N-type drain area, and at least one exposed N-type gate area. The P-type well contact area is formed on the P-type well area. The shallow trench isolation structure is disposed between the NMOS structure and the P-type well contact area. The charge guiding groove passes through the P-type well contact area and one part of the P-type well area and is electrically connected with the grounding unit. | 08-02-2012 |
20120286159 | PARTICLE BEAM DEVICE HAVING A DETECTOR ARRANGEMENT - A particle beam device has a first column with a first beam axis, the first column having a first particle beam generator and a first objective lens for focusing the first particle beam on an object. A second column with a second beam axis is provided, the second column having a second particle beam generator and a second objective lens for focusing the second particle beam on the object. A detector, having a detection axis, detects interacting particles and/or radiation. The first beam axis and the second beam axis define a first angle, different from 0° and from 180°. The first and second beam axes are situated in a first plane. The detection axis of the detector and the first beam axis are situated in a second plane. The first plane and the second plane define a second angle having an absolute value in the range of 65° to 80°. | 11-15-2012 |
20130032715 | X-RAY COMPTON SCATTER IMAGING ON VOLUMETRIC CT SYSTEMS - Briefly described, in an exemplary form, the present invention discloses a system, method and apparatus for X-ray Compton scatter imaging. In one exemplary embodiment, the present invention uses two detectors in a volumetric CT system. A first detector is positioned generally in-line with the angle of attack of the incoming energy, or, generally in-line of path x, where x is the path of the incoming energy. The first, or primary, detector detects various forms of radiation emanating from an object undergoing testing. In some embodiments, the present invention further comprises a Compton scattering system positioned generally normal to path x. In some embodiments, the Compton scattering subsystem comprises a second detector and a pin-hole collimator. The second detector detects Compton scattering energy from the object being tested. | 02-07-2013 |
20130248709 | DEFECT INSPECTING APPARATUS - A semiconductor wafer | 09-26-2013 |
20140191128 | EMITTER, GAS FIELD ION SOURCE, AND ION BEAM DEVICE - Provided is an ion source emitter that does not cause significant extraction voltage changes even when an apex portion of the emitter is repeatedly regenerated. The emitter has a shape of a triangular pyramid with the single atom at the apex. An apex portion of the emitter is substantially shaped like a hexagon when viewed from the apex side. | 07-10-2014 |