Class / Patent application number | Description | Number of patent applications / Date published |
216011000 | FORMING OR TREATING AN ARTICLE WHOSE FINAL CONFIGURATION HAS A PROJECTION | 70 |
20080203052 | METHOD OF FABRICATING A MICRORESONATOR - A method of fabricating a microresonator is disclosed. Initially, silica is deposited on a substrate, and the substrate is etched to form a pillar, the top portion of which supports the silica. The microresonator is then formed from the silica. Next, the pillar is etched to reduce the overall diameter of the top portion of the pillar so that the microresonator can be disengaged from the pillar. | 08-28-2008 |
20080230510 | Method of Processing Substrates - This invention relates to a method of processing substrates including: (a) etching, in a chamber, a generally vertical structure in a substrate using a cyclic process including an etch step using a reactive etch gas and a deposition step for depositing a protective polymer on to the side walls of that part of the structure which has already been etched by a preceding etch step or steps; and (b) cleaning, in the absence of any substrate, the chamber of material deposited thereon by the performance of the deposition step in step (a) characterised in that following the cleaning of the deposition derived material, the chamber is cleaned of material derived from the etchant gas by exposing the chamber to a plasma containing a mixture of O | 09-25-2008 |
20080264897 | Turbine component pattern forming method - A method of forming a pattern comprising a plurality of recesses within a turbine component is disclosed. The method includes simultaneously dissolving a plurality of portions of a selected section of the turbine component, thereby defining the plurality of recesses of the pattern. | 10-30-2008 |
20080296252 | COMPOSITE, NANOSTRUCTURED, SUPER-HYDROPHOBIC MATERIAL - A method of making a hydrophobic, disordered composite material having protrusive surface features includes the following steps: making a disordered composite body comprised of a recessive phase and a protrusive phase, the recessive phase having a higher susceptibility to a preselected etchant than the protrusive phase; treating a surface of the composite body with the preselected etchant so that the protrusive phase protrudes from the surface to form a plurality of protrusive surface features and the recessive phase defines a recessive surface between the surface features; and applying a hydrophobic coating to the protrusive surface features. | 12-04-2008 |
20080308523 | METHOD FOR MANUFACTURING FLEXIBLE MEDICAL DEVICE CONDUIT - A method for manufacturing a flexible medical device conduit includes forming an elongated framework of flexible material (e.g., Nitinol), and creating a sharp head on a distal end of the elongated strip using, for example, an isotropic etching technique, a stamping technique and/or a coining technique. The method also includes the step of jacketing the elongated framework with a flexible tube such that the flexible tube and the elongated framework define at least one conduit therebetween. | 12-18-2008 |
20090001044 | METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE USING A SPACER AS AN ETCH MASK FOR FORMING A FINE PATTERN - A process for manufacturing a semiconductor device using a spacer as an etch mask for forming a fine pattern is described. The process includes forming a hard mask layer over a target layer that is desired to be etched. A sacrificial layer pattern is subsequently formed over the hard mask layer. Spacers are formed on the sidewalls of the sacrificial layer pattern. The protective layer is formed on the hard mask layer portions between the sacrificial patterns formed with the spacer. The sacrificial layer pattern and the protective layer are then later removed, respectively. The hard mask layer is etched using the spacer as an etching mask. After etching, the spacer is removed. Finally, the target layer is etched using the etched hard mask as an etching mask. | 01-01-2009 |
20090078673 | Method of forming a pattern - A pattern forming method is provided, which includes forming, above a substrate, a layer of a diblock copolymer composition containing at least PS and PEO, subjecting the layer to phase separation to obtain a phase-separated layer, thereby forming an easy-to-etch region constituted by PS and having a cylindrical or lamellar configuration extending in a first direction, forming an imprinting resist layer on the phase-separated layer, subjecting the imprinting resist layer to imprinting to form, on the imprinting resist layer, an uneven pattern consisting of projections and recesses extending in a second direction intersecting with the first direction, selectively removing, from the imprinting resist layer, the recesses, thereby leaving only the projections and, at the same time, selectively removing the PS from the phase-separated layer to obtain an etching resistive pattern containing PEO, and etching the substrate using, as a mask, not only the projections but also the etching resistive pattern. | 03-26-2009 |
20090107949 | Micro-oscillating element and method of making the same - A micro-oscillating element includes a frame, a movable functional portion, and a torsional joint for joining the frame and the functional portion. The micro-oscillating element also includes first and second comb-tooth electrodes for generation of the driving force for the oscillating motion of the movable functional portion about the torsional joint. The first comb-tooth electrode includes a plurality of first electrode teeth each having a first conductor, an insulator and a second conductor laminated in the direction of the oscillating motion, where the first conductor and the second conductor are electrically connected with each other. The second comb-tooth electrode includes a plurality of second electrode teeth caused not to face the second conductor but to face the first conductor of the first electrode teeth during non-operation. The second electrode teeth are longer than the first conductor in the direction of the oscillating motion. | 04-30-2009 |
20090127224 | METHOD OF PRODUCING A NANO-STRUCTURE AND METHOD OF PRODUCING A MAGNETIC RECORDING MEDIUM - According to an aspect of an embodiment, a manufacturing method for a nano-structure comprises the steps of: arranging nano-particles on a substrate having a surface provided with a projecting pattern and a recessing pattern; forming cavities under the nano-particles; and polishing the surfaces in which the cavities are formed. | 05-21-2009 |
20090166317 | METHOD OF PROCESSING SUBSTRATE BY IMPRINTING - A method of processing a substrate includes applying a resin on the substrate, imprinting a pattern of a mold onto the resin, the pattern including protrusions and recesses, forming a protective layer over the resin, etching the protective layer so that the protrusions of the pattern imprinted in the resin are exposed and the protective layer in the recesses of the pattern in the resin remains, etching the exposed protrusions of the pattern, to expose the substrate, while using the protective layer as a mask to prevent areas covered by the protective layer from being etched, so that a reverse pattern is formed on the protective layer, which has a structure reversed from the pattern imprinted on the resin, and etching the exposed substrate, to etch a pattern in the substrate, while using the reverse pattern as a mask to prevent areas covered by the protective layer from being etched. | 07-02-2009 |
20090173712 | Method of fabricating cantilever type probe and method of fabricating probe card using the same - Disclosed is a method of fabricating a cantilever type probes. According to this method, after forming grooves each in tip portion and dummy tip portion regions of a substrate, the tip portion and dummy tip portion are formed with filling the grooves of the tip portion and dummy tip portion regions. A sacrificial layer is formed to cover the dummy tip portion region including dummy tip portion. A beam portion is formed in connection with the tip portion, extending upward the dummy tip portion including the sacrificial layer. The method includes steps of selectively etching the substrate of the tip portion and floating the tip portion from the substrate. Accordingly, it minimizes physical and chemical damages on the tip portion while fabricating a probe card, providing stability thereto with smaller defects of the tip portion. | 07-09-2009 |
20090200262 | Method for Producing Porous Microneedles and their Use - A method for producing porous microneedles ( | 08-13-2009 |
20090218310 | METHODS OF PATTERNING A CONDUCTOR ON A SUBSTRATE - A method of patterning a conductor on a substrate includes providing an inked elastomeric stamp inked with self-assembled monolayer-forming molecules and having a relief pattern with raised features. Then the raised features of the inked stamp contact a metal-coated visible light transparent substrate. Then the metal is etched to form an electrically conductive micropattern corresponding to the raised features of the inked stamp on the visible light transparent substrate. | 09-03-2009 |
20090277866 | Method of enabling solder deposition on a substrate and electronic package formed thereby - An electronic package includes a substrate ( | 11-12-2009 |
20090301994 | Methods for Wafer Scale Processing of Needle Array Devices - Methods of fabricating needle arrays on a wafer scale include etching a wafer of columns and needles and coating the same with an electrically insulating material and exposing electrically conductive tips. This process can benefit from using a slow spin speed to distribute resist material across the wafer before etching and using a carrier wafer to support singulated arrays to allow full coverage of upper array surfaces with electrically insulating materials. These processes allow for efficient high volume production of high count microelectrode arrays with a high repeatability and accuracy. | 12-10-2009 |
20100006536 | METHODS FOR MAKING MICRO NEEDLES AND APPLICATIONS THEREOF - The invention relates in a general aspect to a method of making vertically protruding elements on a substrate, said elements having a tip comprising at least one inclined surface and an elongated body portion extending between said substrate and said tip. The method comprises an anisotropic, crystal plane dependent etch forming said inclined surface(s); and an anisotropic, non crystal plane dependent etch forming said elongated body portion; combined with suitable patterning processes defining said protruding elements to have a predetermined base geometry. | 01-14-2010 |
20100059475 | METHOD OF NANOSCALE PATTERNING USING BLOCK COPOLYMER PHASE SEPARATED NANOSTRUCTURE TEMPLATES - A method of forming nanostructures using block copolymer nanostructure templates is disclosed herein. The method includes forming a nanostructure template by patterning a block copolymer on a substrate and allowing the block copolymer to phase separate to form the nanostructure template. The nanostructure template can then be loaded with a nanostructure precursor material. The nanostructure template is removed to form the nanostructure. | 03-11-2010 |
20100140212 | PROCESS FOR PREPARING GRATING TOOLS - A process for making a grating tool includes the steps of providing a metal blank having first and second surfaces, defining a first pattern on the first surface having a plurality of exposed areas, etching the first surface in the exposed areas of the first pattern, defining a second pattern on the second surface having a plurality of exposed areas corresponding to exposed areas of the first pattern, etching the second surface in the exposed areas to form openings and blades in the exposed areas of the second pattern corresponding to exposed areas of the first pattern, and stamping the metal blank so that the blades project at an angle above one of the first and second surfaces. The process results in a grating tool having improved blade orientation, blade sharpness and ease of cutting. | 06-10-2010 |
20100155363 | METHOD FOR MANUFACTURING A MAGNETIC WRITE HEAD HAVING A WRITE POLE WITH A TRAILING EDGE TAPER USING A RIEABLE HARD MASK - A method for manufacturing a magnetic write head having a write pole with a tapered, stepped trailing edge. The method includes depositing a magnetic write pole material over a substrate, and then forming a magnetic step structure over the magnetic write pole material. A mask structure is then formed, which includes a multilayer hard mask formed over the magnetic write pole material and the magnetic step structure. An ion milling process is then performed to remove a portion of the write pole material to define a write pole. A non-magnetic material can be deposited and ion milling performed to form non-magnetic side gap layer at the sides of the write pole. A multi-step reactive ion milling process can then be performed to remove the remaining hard mask from over the write pole. | 06-24-2010 |
20100155364 | MAGNETIC WRITE HEAD HAVING A STEPPED TRAILING SHIELD AND WRITE POLE WITH A SLOPED TRAILING EDGE - A method for manufacturing a magnetic write head having a write pole a tapered trailing edge and a trailing, wrap-around magnetic shield with a slanted bump structure that steps away from the magnetic write pole. The method involves first forming a write pole and non-magnetic side gap layers, and then depositing a non-magnetic RIEable material. A mask is formed on the RIEable material and a reactive ion etching (RIE) is performed to form the RIEable material layer into a nonmagnetic bump with a tapered front edge. | 06-24-2010 |
20100163517 | METHOD TO FORM A RECESS FOR A MICROFLUIDIC DEVICE - A method includes forming a recess in a first surface of a substrate, the recess having a width, depth, and height selected to correspond to a width, depth, and height of a fluid chamber, forming a sacrificial material in the recess, forming a first heater element, forming a metal layer overlying the first heater element, and forming a nozzle opening in the metal layer to expose the sacrificial material. The method also includes forming a path from a second surface of the substrate to expose the sacrificial material and removing the sacrificial material from the recess to expose the chamber with the selected width, depth, and height, the chamber in fluid communication with the path, the nozzle opening, and a surrounding environment. | 07-01-2010 |
20100163518 | Method For Fabricating Probe Tip - Disclosed is a method for fabricating a probe tip, capable of preventing a rapid increase of a surface size of a front end of the probe tip as the probe tip is worn out by a frequent contact with a wafer chip and, also, capable of improving the precision of the front end of the probe tip. The method for fabricating a probe tip includes forming a front end of the probe tip on a silicon wafer; forming a first protective layer which is patterned to expose a part of the front end of the probe tip; and forming a body of the probe tip in a portion opened by the pattern of the first protective layer. | 07-01-2010 |
20100213161 | Capillary-Channel Probes For Liquid Pickup, Transportation And Dispense Using Stressy Metal - Fluidic conduits, which can be used in microarraying systems, dip pen nanolithography systems, fluidic circuits, and microfluidic systems, are disclosed that use channel spring probes that include at least one capillary channel. Formed from spring beams (e.g., stressy metal beams) that curve away from the substrate when released, channels can either be integrated into the spring beams or formed on the spring beams. Capillary forces produced by the narrow channels allow liquid to be gathered, held, and dispensed by the channel spring probes. Because the channel spring beams can be produced using conventional semiconductor processes, significant design flexibility and cost efficiencies can be achieved. | 08-26-2010 |
20100252525 | MANUFACTURING METHOD OF 3D SHAPE STRUCTURE HAVING HYDROPHOBIC EXTERNAL SURFACE - The present invention relates to a three-dimensional structure manufacturing method for performing surface treatment processes, and a replication step to provide hydrophobicity on an external surface of the three-dimensional structure. In the manufacturing method, the hydrophobicity may be provided to the external surface of the three-dimensional structure, a high cost device required in the conventional MEMS process is not used, the manufacturing cost is reduced, and the manufacturing process is simplified. In addition, it has been difficult to provide the hydrophobicity on an external surface of a three-dimensional structure having a large surface due to a spatial limitation, but in the exemplary embodiment of the present invention, the hydrophobicity may be provided to the external surface of the three-dimensional structure having a large surface, such as a torpedo, a submarine, a ship, and a vehicle, without the spatial limitation. | 10-07-2010 |
20100258523 | METHOD FOR MANUFACTURING STAMPER - According to one embodiment, an injection-molded recess and protrusion pattern surface of a resin stamper is subjected to a dry etching process for surface treatment. | 10-14-2010 |
20100308008 | NANOIMPRINT RESIST, NANOIMPRINT MOLD AND NANOIMPRINT LITHOGRAPHY - A nanoimprint resist includes a hyperbranched polyurethane oligomer (HP), a perfluoropolyether (PFPE), a methylmethacrylate (MMA), and a diluent solvent. A method of a nanoimprint lithography is also provided. | 12-09-2010 |
20100308009 | NANOIMPRINT RESIST, NANOIMPRINT MOLD AND NANOIMPRINT LITHOGRAPHY - A nanoimprint resist that includes a hyperbranched polyurethane oligomer (HP), a perfluoropolyether (PFPE), a methylmethacrylate (MMA), a diluent solvent and a photo initiator. A method of a nanoimprint lithography is also provided. | 12-09-2010 |
20110011827 | METHOD OF MANUFACTURING HOLLOW MICRONEEDLE STRUCTURES - Provided is a method of manufacturing a hollow microneedle structure. The method includes forming an injection mold having a through hole, filling the injection mold with a photoresist formed of a viscous material, and extruding the photoresist from the injection mold through the through hole, solidifying the extruded photoresist to form a needle-type photoresist structure, forming a seed layer on the surface of the photoresist structure, forming a metal plated layer on the seed layer, inclining an end tip of the photoresist structure having the metal plated layer, and removing the photoresist from the metal plated layer to form a hollow. Thus, the hollow microneedle structure can be manufactured to have such diameter, length, hardness, and inclination angle as to minimize pain. The hollow microneedle structure can be combined with an apparatus for detecting a biomaterial or injecting cosmetic substances or medicines, and variously applied. | 01-20-2011 |
20110042345 | METHODS FOR MANUFACTURING CHUCKING SYSTEMS - Methods for manufacturing chucking systems are described. Generally, a plurality of flow holes may be provided in an optical flat. A surface of the optical flat may be masked and patterned to provide a desired feature (e.g., pins or grooves). The surface may etched to produce the desired feature on the surface of the optical flat. | 02-24-2011 |
20110062110 | Method for Fabricating a Micromirror with Self-Aligned Actuators - A method of fabricating a micromirror is disclosed. Initially, a set of coarse features is formed in a low-temperature oxide (LTO) layer deposited on a front side of a wafer. A set of fine features is then formed in a photosensitive material layer deposited on top of the LTO layer, and the fine features are constrained laterally within the coarse features. Next, a portion of the LTO layer is removed to align the width of the coarse features with the width of the fine features. The first silicon dioxide layer and the first and second silicon device layers are subsequently etched to form stator comb fingers and rotor comb fingers. Finally, a rotatable mirror is formed by removing a portion of the substrate on a back side of the wafer, and the silicon dioxide layers from the front and back sides of the wafer. | 03-17-2011 |
20110073560 | Microneedle Structure And Production Method Therefor - A method for processing a wafer to form a plurality of hollow microneedles projecting from a substrate includes forming, by use of a dry etching process, a number of groups of recessed features, each including at least one slot deployed to form an open shape having an included area and at least one hole located within the included area. The internal surfaces of the holes and the slots are then coated with a protective layer. An anisotropic wet etching process is then performed in such a manner as to remove material from outside the included areas while leaving a projecting feature within each of the included areas. The protective layer is then removed to reveal the microneedles. | 03-31-2011 |
20110186541 | MOLD FOR UV ASSISTED NANOIMPRINT LITHOGRAPHY AND METHODS FOR MAKING SUCH A MOLD - A mold for nanoimprint lithography assisted by a determined wavelength is disclosed. According to some aspects, a layer made from a first material including, on a first face, a layer made from a second rigid material in which n structured zones with micrometric or nanometric patterns (n≧1) are made, and, on the face opposite said first face, a layer made from a third rigid material in which n recesses are formed, opposite the n structured zones. The n recesses are filled with a fourth material to form n portions. The transmittance at the determined wavelength of the layer of third material is lower than the transmittance of any one of the n portions; and the transmittance of the layers of first, second, and third materials at the determined wavelength λ | 08-04-2011 |
20110204018 | METHOD OF MANUFACTURING FILTER FOR PRINTHEAD - A method of manufacturing a membrane filter includes providing a first substrate including a first surface and a second surface; providing a material layer over the first surface of the first substrate; depositing and patterning a first mask layer on a surface of the material layer; etching the material layer exposed through the patterned first mask layer to form a plurality of pore groups, each of the pore groups including a plurality of pores; depositing and patterning a second mask layer on the second surface of the first substrate; and etching the first substrate exposed through the patterned second mask layer to create a plurality of rib structures in the first substrate with a rib structure being located between consecutive pore groups. | 08-25-2011 |
20110215067 | ACCELERATION SENSOR WITH PROTRUSIONS FACING STOPPERS - An integrally micromachined acceleration sensor has a mass with a surface facing a stopper. At least one protrusion projects from this surface toward the stopper. In the absence of acceleration, the protrusion is spaced apart from the stopper, but by limiting motion of the mass toward the stopper, the protrusion improves the shock resistance of the acceleration sensor. The protrusion also prevents the mass from sticking to the stopper during the fabrication process. The stopper may have a pattern of holes surrounding the protrusion, so that the protrusion is produced naturally during the wet etching process that separates the mass from the stopper. The holes also shorten the wet etching time. | 09-08-2011 |
20110297640 | METHOD FOR PRODUCING MOLD AND ELECTRODE STRUCTURE USED THEREFOR - A motheye mold fabrication method of an embodiment of the present invention includes: (a) anodizing a surface of an aluminum film or aluminum base via an electrode that is in contact with the surface, thereby forming a porous alumina layer which has a plurality of very small recessed portions; (b) after step (a), allowing the porous alumina layer to be in contact with an etchant, thereby enlarging the plurality of very small recessed portions of the porous alumina layer; and (c) after step (b), further anodizing the surface via the electrode to grow the plurality of very small recessed portions. In at least one example embodiment, step (b) is performed in such a controlled state that part of the electrode which is in contact with the surface in the etchant would not be exposed to the etchant. Thus, production of a defect due to nonuniform corrosion can be prevented. | 12-08-2011 |
20110303634 | METHOD AND SYSTEM FOR MANUFACTURING NANOSTRUCTURES - A method and a system for manufacturing two-dimensional and three-dimensional nanostructures and nanodevices are described, wherein the formation of the nanostructure (of the nanodevice) on a target substrate is made, at a millimetric or super-millimetric distance from the substrate, by the deposition of material emitted in the form of an atomic/molecular beam having a selected pattern corresponding, at an enlarged scale, to the desired pattern of the nanostructure (nanodevice). The projection of the patterned beam through a diaphragm, associated with the substrate at a micrometric or sub-micrometric distance and having at least one shaped aperture of nanometric size, brings about the formation of a nanostructure pattern which is a convolution of the patterned beam with the diaphragm aperture. | 12-15-2011 |
20120043297 | Mold And Manufacturing Method Therefor - A mold of the present invention includes: a flexible polymer film; a curable resin layer provided on a surface of the polymer film; and a porous alumina layer provided on the curable resin layer, the porous alumina layer having an inverted moth-eye structure in its surface, the inverted moth-eye structure having a plurality of recessed portions whose two-dimensional size viewed in a direction normal to the surface is not less than 10 nm and less than 500 nm. According to the present invention, a method for easily forming a flexible moth-eye mold which can be deformed into the form of a roll is provided. | 02-23-2012 |
20120043298 | METHODS FOR DISCRETIZED PROCESSING AND PROCESS SEQUENCE INTEGRATION OF REGIONS OF A SUBSTRATE - The present invention provides methods and systems for discretized, combinatorial processing of regions of a substrate such as for the discovery, implementation, optimization, and qualification of new materials, processes, and process sequence integration schemes used in integrated circuit fabrication. A substrate having an array of differentially processed regions thereon is processed by delivering materials to or modifying regions of the substrate. | 02-23-2012 |
20120085729 | METHOD FOR MANUFACTURING SOLAR CELL AND SOLAR CELL MANUFACTURED BY THE SAME MEHTOD - Disclosed are a method for manufacturing a solar cell by processing a surface of a silicon substrate for a solar cell, a solar cell manufactured by the method, and a substrate processing system for performing the method. The method for manufacturing a solar cell comprises protrusion forming step including wet-etching process and for forming a plurality of minute protrusions on a light receiving surface of a crystalline silicon substrate, and planarization step of planarizing the bottom surface, the opposite surface to the light receiving surface of the substrate during or after the protrusion forming step. | 04-12-2012 |
20120091094 | METHOD FOR FORMING NANOSTRUCTURE - The present invention provides a method for forming a nanostructure. The method includes the steps of providing a substrate; forming a plurality of nanoparticles on the substrate; forming a film on the substrate and between every two adjacent nanoparticles of the nanoparticles; removing the nanoparticles; forming a resist layer on the film; performing a wet etching for removing the film and a portion of the substrate under the film to form a plurality of protruding portions; and removing the resist layer to expose the plurality of the protruding portions. The method of the present invention is performed without vacuum environment and photolithography, such that the method of the present invention is simple when compared with the prior art. | 04-19-2012 |
20120125880 | Tools and Methods for Forming Semi-Transparent Patterning Masks - Means, apparatus, systems, and/or methods are described for forming improved rigid or flexible semi-transparent imprinting templates. These templates can be used to produce patterning masks having improved resolution that do not require plasma etching for residue removal. The methods and apparatus are compatible with roll-to-roll manufacturing processes and enable roll-to-roll formation of a wide range of metal patterned films. | 05-24-2012 |
20120132613 | WAFER-SCALE NEEDLE ARRAY - Methods for wafer-scale fabrication of needle arrays can include mechanically modifying a wafer to produce a plurality of vertically-extending columns. The columns are etched to round and reshape the columns into substantially uniformly shaped needles. Needle arrays having needle width non-uniformity of less than about 3% and length non-uniformity of less than about 2% can be produced. | 05-31-2012 |
20120152887 | Method Of Manufacturing Nanoimprint Stamp - Methods of manufacturing a nanoimprint stamp are provided. The method may include forming a pattern on a surface of a master substrate, depositing an etch barrier layer on a surface of a stamp substrate, coating a photoresist on one of the surfaces of the master substrate and the stamp substrate on which an etch barrier layer is formed, forming a photoresist pattern by pressing the master substrate against the stamp substrate, forming a hard mask by etching the etch barrier layer using the photoresist pattern, and etching the stamp substrate using the hard mask as an etch mask. | 06-21-2012 |
20120152888 | METHOD FOR MANUFACTURING A MASTER MOLD WHICH IS USED TO FORM A MICROPATTERNED FILM APPLIED TO AN EXTERIOR OF A HOUSEHOLD APPLIANCE AND MANUFACTURING APPARATUS AND METHOD OF THE FILM USING THE MASTER MOLD - An apparatus and a method of manufacturing a micropatterned film are disclosed. More particularly, a method for manufacturing a master mold capable of forming a micropattern on a film applied to an exterior of a household appliance, an apparatus and a method for production of a micropatterned film using the above master mold, and appliances having such micropatterned films attached thereto are disclosed. The method for manufacturing a master mold used for forming a micropatterned film applied to an exterior of a household appliance includes, applying photoresist ( | 06-21-2012 |
20120298617 | APPARATUS FOR NANO STRUCTURE FABRICATION - One or more techniques for nano structure fabrication are provided. In an embodiment, an apparatus for manufacturing a nano structure is disclosed. The apparatus includes a stamp having a line pattern on a surface thereof that comprises a plurality of protrusions, a die configured to hold a substrate thereon, and a mechanical processing unit configured to press the plurality of protrusions of the stamp against the substrate with a predetermined pressure so as to form at least one channel pore therebetween. | 11-29-2012 |
20130020278 | BLOCK COPOLYMER FOR MANUFACTURING NANOWIRE AND METHOD FOR MANUFACTURING THEREOF - A block copolymer for manufacturing a nanowire and a method of manufacturing the same are disclosed. The block copolymer and the method of manufacturing a nanowire using the same are used to fabricate a nanowire having a diameter of less than or equal to 30 nm and a porous nanowire having a diameter within the same range and pores with a diameter of less than or equal to 10 nm. | 01-24-2013 |
20130056437 | ELECTRONIC DEVICE, AND METHOD FOR MANUFACTURING SYMBOL ON EXTERIOR OF ELECTRONIC DEVICE - A method for manufacturing a symbol on an exterior of an electronic device is provided. The method includes preparing a support layer, preparing a nanograting layer on the support layer, the nanograting layer including a first nanograting area corresponding to a preset symbol and a second nanograting area corresponding to an area other than the preset symbol, wherein each of the first nanograting area and the second nanograting area includes three-dimensional (3D) nanostructures and a pitch between the 3D nanostructures arranged in the first nanograting area is different from a pitch between the 3D nanostructures arranged in the second nanograting area. | 03-07-2013 |
20130087526 | METHOD FOR MAKING THREE-DIMENSIONAL NANO-STRUCTURE ARRAY - A method for making three-dimensional nano-structure array is provided. The method includes following steps. A base is provided. A mask layer is located on the base. The mask layer is patterned, and a number of bar-shaped protruding structures is formed on a surface of the mask layer, a lot is defined between each of two adjacent protruding structures of the number of protruding structures to expose a portion of the base. The exposed portion of the base is etched through the slot so that the each of two adjacent protruding structures begin to slant face to face until they are contacting each other to form a protruding pair. The mask layer is removed. | 04-11-2013 |
20130105435 | MOLD FOR FORMING 3-DIMENSIONAL PATTERN AND METHOD OF MANUFACTURING EXTERIOR MATERIAL FOR HOME APPLIANCE USING THE SAME | 05-02-2013 |
20130140267 | METHOD OF MANUFACTURING MICRONEEDLE - The invention discloses a method of manufacturing a microneedle including the steps of forming an island etching mask having thickness distribution on a substrate, and processing the substrate into a needle by taking advantage of a difference in etching rates between the etching mask and the substrate. The invention enables to readily control a point angle and height of the manufactured needle. | 06-06-2013 |
20130140268 | Heat Assisted Narrow Pole Design with Trailing Shield - A TAMR (Thermally Assisted Magnetic Recording) write head is formed with a narrow pole tip, a trailing edge magnetic shield and, optionally, a plasmon shield. The narrow pole tipped write head uses the energy of laser generated edge plasmons, formed in a plasmon generating layer, to locally heat a PMR magnetic recording medium slightly below its Curie temperature, Tc. When combined with the effects of the narrow tip, this local heating to a temperature below Tc is sufficient to create good transitions and narrow track widths in the magnetic medium. The write head is capable of writing effectively on state-of-the-art PMR recording media having Hk of 20 kOe or more. | 06-06-2013 |
20130193103 | METHOD OF SELF-ALIGNED FULLY INTEGRATED STCK FABRICATION - The embodiments disclose a method of self-aligned fully integrated stack fabrication that includes writing fully integrated self-aligned data and servo two dimensional low-frequency guiding patterns that include encoded servo-information to create various types of self-assembly low-frequency guiding structures, guiding high density self-assembly processes using the low-frequency guiding structures to create high density data and servo fields and etching the high density data and servo fields and low-frequency encoded servo-information into a template substrate to create fully integrated stack master templates to use in the fabrication of stacks such as bit patterned media. | 08-01-2013 |
20130248482 | METHODS OF PATTERNING LAYERED-MATERIAL AND FORMING IMPRINTING MOLD - Disclosed is a method of patterning a layered material. A layered material is provided, and a photoresist layer is formed thereon. The photoresist layer is patterned by a focused laser beam to expose a part of the layered material. The exposed layered material is etched to pattern the layered material. | 09-26-2013 |
20130248483 | METHOD FOR FABRICATING EMITTER - A method for fabricating a sharpened needle-like emitter, the method including: electrolytically polishing an end portion of an electrically conductive emitter material so as to be tapered toward a tip portion thereof; performing a first etching in which the electrolytically polished part of the emitter material is irradiated with a charged-particle beam to form a pyramid-like sharpened part having a vertex including the tip portion; performing a second etching in which the tip portion is further sharpened through field-assisted gas etching, while observing a crystal structure at the tip portion by a field ion microscope and keeping the number of atoms at a leading edge of the tip portion at a predetermined number or less; and heating the emitter material to arrange the atoms at the leading edge of the tip portion of the sharpened part in a pyramid shape. | 09-26-2013 |
20130284690 | PROCESS FOR PRODUCING HIGHLY ORDERED NANOPILLAR OR NANOHOLE STRUCTURES ON LARGE AREAS - The present invention relates to an improved process for producing highly ordered nanopillar or nanohole structures, in particular on large areas, which can be used as masters in NIL, hot embossing or injection molding processes. The process involves decorating a surface with an ordered array of metal nanoparticles produced by means of a micellar block- copolymer nano-lithography process; etching the primary substrate to a depth of 50 to 500 nm, where the nanoparticles act as a mask and an ordered array of nanopillars or nanocones corresponding to the positions of the nanoparticles is thus produced; using the nanostructured master or stamp in a structuring processes. Also the finished nanostructured substrate surface can be used as a sacrificial master which is coated with a continuous metal layer and the master is then etched away to leave a metal stamp having an ordered array of nanoholes which is a negative of the original array of nanopillars or nanocones. | 10-31-2013 |
20140001146 | METHODS AND SYSTEMS FOR USING ACTUATED SURFACE-ATTACHED POSTS FOR BIOFLUID RHEOLOGY | 01-02-2014 |
20140116980 | METHOD FOR PROVIDING A TEMPLATE FOR A SELF-ASSEMBLABLE POLYMER FOR USE IN DEVICE LITHOGRAPHY - Methods are disclosed for depositing a template for directed self-assembly of a self-assemblable block polymer on a surface of a substrate. The method involves providing a chemical epitaxy pattern of alternating first and second regions having differing chemical affinities for first and second blocks of the polymer on the surface by photolithography, and providing spaced graphoepitaxy features on the surface by photolithography. The chemical epitaxy pattern is aligned with and located between pairs of spaced graphoepitaxy features. The spaced graphoepitaxy features and chemical epitaxy pattern are arranged to act together to direct self-assembly of the self-assemblable block copolymer. The resulting template may be used to direct self-assembly of a suitable self-assemblable polymer and the resulting aligned and oriented self-assembled polymer may itself be used as a resist for lithography of the substrate. | 05-01-2014 |
20140158662 | NANOIMPRINT STAMP HAVING ALIGNMENT MARK AND METHOD OF FABRICATING THE SAME - A nanoimprint stamp having an alignment mark includes a transparent substrate having a plurality of convex portions, and a semitransparent layer on each of the plurality of convex portions. The semitransparent layer has a transmittance of about 20% to about 80% with respect to ultraviolet rays. | 06-12-2014 |
20140175045 | METHOD FOR MAKING GRATING - A method for making grating is provided. The method includes following steps. A substrate is provided. A mask layer is located on the substrate. The mask layer is patterned, and a number of bar-shaped protruding structures are formed on a surface of the mask layer, a slot is defined between each of two adjacent protruding structures of the number of protruding structures to expose a portion of the substrate. The protruding structures are etched so that each of two adjacent protruding structures begin to slant face to face until they are contacting each other. The exposed portion of the substrate is etched through the slot. The mask layer is removed. | 06-26-2014 |
20140202984 | SURFACE NANOFABRICATION METHODS USING SELF-ASSEMBLED POLYMER NANOMASKS - Methods for fabricating a nanopillared substrate surface include applying a polymer solution containing an amphiphilic block copolymer and a hydrophilic homopolymer to a substrate surface. The amphiphilic block copolymer and the hydrophilic homopolymer in the polymer solution self-assemble on the substrate surface to form a self-assembled polymer layer having hydrophobic domains adjacent to the substrate surface and hydrophilic domains extending into the self-assembled polymer layer. At least a portion of the hydrophilic domains may be removed to form a plurality of pores in the exposed surface of the self-assembled polymer layer. A protective layer may be deposited on the exposed surface as a mask for etching through the plurality of pores to form through-holes. A nanopillar-forming material may be deposited onto the substrate surface via the through-holes. Then, the remaining portion of the self-assembled polymer layer may be removed to expose a nanopillared substrate surface. | 07-24-2014 |
20140231379 | METHOD OF FABRICATING NANOTIPS WITH CONTROLLED PROFILE - A nanotip, is fabricated by modifying a precursor nanotip having an apex and a shank by applying an electric field in the presence of a reactive gas to perform field-assisted etching wherein atoms are preferentially removed from the shank by chemical interaction with the reactive gas, and controlling the reactive gas pressure and/or tip voltage to vary the electric field so as to promote field evaporation of apex atoms during fabrication of the nanotip and thereby control the overall profile of the resulting nano-tip. The method permits shaping of the overall tip profile. | 08-21-2014 |
20140246397 | METHOD FOR FABRICATING EMITTER - A method for fabricating a sharpened needle-like emitter, the method including: electrolytically polishing an end portion of an electrically conductive emitter material so as to be tapered toward a tip portion thereof; performing a first etching in which the electrolytically polished part of the emitter material is irradiated with a charged-particle beam to form a pyramid-like sharpened part having a vertex including the tip portion; performing a second etching in which the tip portion is further sharpened through field-assisted gas etching, while observing a crystal structure at the tip portion by a field ion microscope and keeping the number of atoms at a leading edge of the tip portion at a predetermined number or less; and heating the emitter material to arrange the atoms at the leading edge of the tip portion of the sharpened part in a pyramid shape. | 09-04-2014 |
20140346137 | METHOD FOR MAKING THREE-DIMENSIONAL NANO-STRUCTURE ARRAY - A method for making three-dimensional nano-structure array is provided. The method includes following steps. A base is provided. A mask layer is located on the base. The mask layer is patterned, and a number of bar-shaped protruding structures is formed on a surface of the mask layer, a lot is defined between each of two adjacent bar-shaped protruding structures of the number of protruding structures to expose a portion of the base. The exposed portion of the base is etched through the slot so that the each of two adjacent bar-shaped protruding structures begin to slant face to face until they are contacting each other to form a protruding pair. The mask layer is removed. | 11-27-2014 |
20150008211 | METHOD FOR DEVELOPING RESIST, METHOD FOR FORMING A RESIST PATTERN, METHOD FOR PRODUCING A MOLD, AND DEVELOPING FLUID UTILIZED IN THESE METHODS - A method for developing a non chemically amplified resist employs a developing fluid having a carboxylic acid compound, which is a carboxylic acid ester having branched chain alkyl groups and a total carbon number of 8 or greater, as a main component. It is particularly preferable for the carboxylic acid compound to be at least one of isobutyl butyrate, butyl isobutyrate, isobutyl isobutyrate, isoamyl isobutyrate, and 2-methylbutyrate 2-methylbutyl. It is also preferable for the non chemically amplified resist to be a resist having a copolymer of an α-chloroacrylate ester compound and an α-methylstyrene compound as a main component. | 01-08-2015 |
20150060392 | THREE-DIMENSIONAL NANOSTRUCTURES AND METHOD FOR FABRICATING THE SAME - A three-dimensional nanostructures and a method for fabricating the same, and more particularly to three-dimensional structures of various shapes having high aspect ratio and uniformity in large area and a method of fabricating the same by attaching a target material to the outer surface of patterned polymer structures using an ion bombardment phenomenon occurring during a physical ion etching process to form target material-polymer composite structures, and then removing the polymer from the target material-polymer structures. A three-dimensional nanostructures with high aspect ratio and uniformity can be fabricated by a simple process at low cost by using the ion bombardment phenomenon occurring during physical ion etching. Also, nanostructures of various shapes can be easily fabricated by controlling the pattern and shape of polymer structures. In addition, uniform fine nanostructures having a thickness of 10 nm or less can be formed in a large area. | 03-05-2015 |
20150102006 | ISOLATION OF MAGNETIC LAYERS DURING ETCH IN A MAGNETORESISTIVE DEVICE - Isolation of magnetic layers in the magnetoresistive stack is achieved by passivation of sidewalls of the magnetic layers or deposition of a thin film of non-magnetic dielectric material on the sidewalls prior to subsequent etching steps. Etching the magnetic layers using a non-reactive gas further prevents degradation of the sidewalls. | 04-16-2015 |
20150368093 | METHOD FOR MANUFACTURING SLANTED COPPER NANORODS - The present invention provides a method for fabricating slanted copper nanorods. The method includes manufacturing a workpiece configured to include an etch stop layer on a wafer, placing the workpiece in a slanted position, and etching the slanted workpiece, forming a copper (Cu) layer on the slanted workpiece by plating, removing an over-plated portion from the copper layer, and removing a polysilicon (poly Si) excluding copper from the surface of the workpiece. According to the invention, copper nanorod structures having a uniform array can be fabricated in a large area at a high process yield compared to conventional methods. In addition, the angle and diameter of copper nanorods can be controlled as desired so that the applicability thereof can be greatly increased. Moreover, the present invention can be applied to processes for fabricating various devices, including semiconductor devices, MEMSs (microelectromechanical systems), optical devices, gas sensors, display devices, etc. | 12-24-2015 |
20160064019 | SLIDER FOR MAGNETIC RECORDING APPARATUS WITH PROJECTION COMPRISING OPTICAL TURNING ELEMENT AND METHODS OF FABRICATION THEREOF - An apparatus includes a slider, a light source disposed upon an outer surface of the slider and a projection extending above the outer surface of the slider. The light source comprises a resonant cavity aligned with the outer surface of the slider. The projection comprises an optical turning element that is optically coupled to the light source. Also included are methods of fabrication thereof. | 03-03-2016 |
20160129232 | Microneedle Manufacturing Process with Hats - Out-of-plane microneedle manufacturing process comprising the simultaneous creation of a network of microneedles and the creation of a polygonal shaped hat ( | 05-12-2016 |
20160186333 | METHOD AND DEVICE FOR PRODUCING NANOTIPS - A method for producing a nanotip from a tip material provides a substrate which consists of the tip material or has the material in the form of a coating, produces a mask from a mask material selected so that, in a predefined reactive ion etching process, the mask material is removed at a lower etching rate than the tip material, and carries out the reactive ion etching process in an etching chamber. The mask material is additionally selected so that a gaseous component is released therefrom during the reactive ion etching process, the gaseous component not being released from the tip material. The method further comprises detecting the gaseous component while the ion etching process is being carried out, repeatedly determining whether an amount of the gaseous component in the etching chamber reaches a predefined lower threshold, and stopping the reactive ion etching process when the lower threshold is reached. | 06-30-2016 |