Class / Patent application number | Description | Number of patent applications / Date published |
204298230 | Moving workpiece or target | 33 |
20080302656 | VACUUM COATING INSTALLATION WITH TRANSPORT ROLLERS FOR THE TRANSPORT OF A PLANAR SUBSTRATE - The invention relates to a vacuum coating installation with a transport system for planar substrates which are transported through a vacuum chamber. This transport system comprises several cylinders disposed in parallel. As the driving means for these cylinders one or several motors may be provided, which are located within or outside of the vacuum chamber. The coupling between the motor or the motors and the cylinders in any event takes place via magnet couplings. Since hereby no mechanical coupling established between the driving means and the cylinders, these can readily be separated from one another, which permits providing the cylinders, and with them the sputter cathodes, in a slide-in element which can be moved into and out of the vacuum chamber. If not every cylinder is provided with its own driving means, the cylinders, which are coupled with a driving means, can be connected via V-belts or the like with the other cylinders. | 12-11-2008 |
20110174612 | SPUTTERING APPARATUS WITH ROTATABLE SPUTTERING TARGET - A sputtering apparatus includes a chamber including a first sidewall and defining a number of evenly spaced first through holes on the first sidewall, a number of slide rails radially extending outwards from the first sidewall corresponding to each first through hole, a number of target holders defining at least two sputtering faces and slidably engaged with the slide rails, and a target material mounting on the sputtering faces. The target holder includes a shaft; the sputtering face capable of rotating about the shaft. The target holders are fastened to the first sidewall with one of the sputtering faces facing the first through hole, the sputtering face capable of being replaced by rotating about the shaft. | 07-21-2011 |
20110180402 | Vacuum Processing Apparatus - To provide a vacuum processing apparatus capable of supporting and conveying a substrate by a method suitable for a processing content in each processing step and capable of suppressing various mechanisms provided within a processing chamber from being adversely affected. More particularly, the CVD chamber of the apparatus is configured to be horizontal, and hence the above-mentioned problem can be solved. Further, by configuring a sputtering apparatus as the vertical type processing apparatus, problems with abnormal electrical discharge can be solved. | 07-28-2011 |
20120160674 | SUBSTRATE CONVEYER AND VACUUM PROCESSING APPARATUS - An apparatus includes a chamber configured to form a reduced-pressure space, a carrier which holds a substrate, and a conveyer which conveys the carrier in the chamber. The chamber includes a side wall including an opening portion, and a partition wall arranged in the opening portion, the conveyer includes a permanent magnet provided on the carrier, and a driving magnet arranged outside the partition wall so as to drive the carrier, and the partition wall includes a first portion arranged between the driving magnet and a path through which the carrier passes, and a second portion arranged to connect the first portion to the side wall, the first portion having a smooth surface in a portion in which the first portion faces the path, and the first portion including a plurality of ribs arranged on a surface thereof on a side on which the driving magnet is arranged. | 06-28-2012 |
20130270111 | SPUTTERING DEVICE - A sputtering device, including a chamber providing a reaction space, a sputter unit including a target disposed in the chamber, and a conveying unit including a plurality of rollers for supporting a substrate and for conveying the substrate relative to the target along a first direction, the conveying unit including fixed roller units having a predetermined diameter, and a variable roller unit having a diameter that changes in a second direction at both ends thereof, the second direction being orthogonal to the first direction. | 10-17-2013 |
20150136597 | Glass Coating System - A system for coating a glass board is disclosed. The coating system includes a coating chamber, a conveying unit and a support module. The conveying unit is located at a lower portion of the coating chamber and has two rollers for conveying a sheet of glass to be coated. The support module is located between the rollers and has a seat and an elevator connected to the seat. A distance between the seat and the glass can be adjusted by the elevator. | 05-21-2015 |
204298240 | Indeterminate length moving workpiece | 3 |
20150021176 | SPUTTERING DEVICE - In a sputtering device of the present invention, a long film is guided by a plurality of concave guide rolls. Pressure imposed on the long film from the plurality of concave guide rolls is strong as near as an end and is weak as near as the center. Accordingly, the long film is substantially supported in an end portion of each of the concave guide rolls. Since wrinkles generated on the long film are not subjected to strong pressure from the concave guide rolls when passing through the concave guide rolls, these wrinkles do not turn to folds and pass through as they are. | 01-22-2015 |
20150136598 | Glass Coating System - A system for coating a sheet of glass is disclosed. The system includes a first coating chamber, a second coating chamber, an intermediary chamber and three conveying units. The intermediary chamber is sandwiched between the first and second chambers and has a gap plate and an elevator connected to the gap plate. The three conveying units are separately disposed in lower portions of the first costing chamber, the second coating chamber and the intermediary chamber for conveying a sheet of glass to be coated. The gap plate is located above one of the conveying units, and the elevator is capable of adjusting a distance between the gap plate and the conveying unit. | 05-21-2015 |
20160071699 | DEPOSITION DEVICE - Provided is a deposition device which can secure work space without vertical overlap of the deposition unit and the units upstream and downstream thereof. This deposition device is provided with a deposition unit ( | 03-10-2016 |
204298250 | Multi-chamber (e.g., including air lock, load/unload chamber, etc.) | 8 |
20090139864 | Vertical Substrate Transfer Apparatus and Film-Forming Apparatus - To provide a vertical substrate transfer apparatus and a film-forming apparatus capable of, regardless of a carrying position of a substrate, subjecting either surface thereof to film-formation, and capable of supporting and carrying the substrate without interfering with a non-film-forming surface. | 06-04-2009 |
20090218219 | Manufacturing Apparatus - A manufacturing apparatus in which an organic thin film such as a light emitting layer is formed with high material use efficiency or high operating efficiency and a light emitting device is manufactured, is provided. The manufacturing apparatus includes a load chamber, a common chamber connected to the load chamber, a plurality of treatment chambers connected to the common chamber, and a laser light source, in which deposition is selectively performed on a first substrate by forming a material layer on a second substrate in the treatment chamber in advance; aligning the second substrate and the first substrate in the common chamber; and then scanning the second substrate with laser light. In the manufacturing apparatus, selective deposition is performed on the first substrate more than once in the common chamber. | 09-03-2009 |
20110056830 | SPUTTERING DEPOSITION APPARATUS - A sputtering type deposition apparatus includes a chamber device and a target. The chamber device defines an access chamber, a first entrance from exterior to the access chamber, a depositing chamber, and a second entrance from the access chamber to the depositing chamber. The chamber device includes an access door, a separating door, and a carrier. The access door is disposed at the first entrance and configured to open or close the first entrance. The separating door is disposed at the second entrance and configured to open or close the second entrance. The carrier is disposed in the access chamber and configured to carry a substrate from the access chamber to the depositing chamber. The target is received in the depositing chamber. | 03-10-2011 |
20110073472 | COATING APPARATUS - A coating apparatus includes a housing, a sputter mechanism, an evaporation mechanism, and a workpiece transport assembly. The housing defines a receiving space. The workpiece transport assembly includes a fixing plate, a first transport member, and a first shaft. The fixing plate is secured to the housing via the receiving space and divides the receiving space into a sputter chamber and an evaporation chamber. The sputter mechanism is mounted in the sputter chamber, and the evaporation mechanism is mounted in the evaporation chamber. The fixing plate defines a through hole. The sputter chamber communicates with the evaporation chamber via the through hole. The first transport member is configured to transport at least one workpiece. The first shaft is secured to the first transport member and rotatably mounted to the housing. | 03-31-2011 |
20120090992 | SYSTEM AND METHOD FOR COMMERCIAL FABRICATION OF PATTERNED MEDIA - A system is provided for etching patterned media disks for hard drive. The modular system may be tailored to perform specific processes sequences so that a patterned media disk is fabricated without removing the disk from vacuum environment. In some sequence the magnetic stack is etched while in other the etch is performed prior to forming the magnetic stack. In a further sequence ion implantation is used without etching steps. For etching a movable non-contact electrode is utilized to perform sputter etch. The cathode moves to near contact distance to, but not contacting, the substrate so as to couple RF energy to the disk. The substrate is held vertically in a carrier and both sides are etched serially. That is, one side is etched in one chamber and then in the next chamber the second side is etched. | 04-19-2012 |
20120273349 | Glass Substrate Trolley Handling System - A glass substrate trolley handling system is disclosed. The glass substrate trolley handling system comprises an equipment outlet module, a cassette module, a bridging module, and an abnormal trolley returning module. The abnormal trolley returning module comprises a first operating mechanism for receiving an abnormal trolley from the equipment outlet module and a second operating mechanism for transferring the abnormal trolley to the bridging module. The bridging module comprises a third operating mechanism for receiving the abnormal trolley from the abnormal trolley returning module and a fourth operating mechanism for transferring the abnormal trolley to the cassette module. In this way, the cost of handling the empty trolley and the production capacity loss can be reduced to zero. | 11-01-2012 |
20130098761 | SYSTEM AND METHOD FOR COMMERCIAL FABRICATION OF PATTERNED MEDIA - A system is provided for etching patterned media disks for hard drive. The modular system may be tailored to perform specific processes sequences so that a patterned media disk is fabricated without removing the disk from vacuum environment. In some sequence the magnetic stack is etched while in other the etch is performed prior to forming the magnetic stack. In a further sequence ion implantation is used without etching steps. For etching a movable non-contact electrode is utilized to perform sputter etch. The cathode moves to near contact distance to, but not contacting, the substrate so as to couple RF energy to the disk. The substrate is held vertically in a carrier and both sides are etched serially. That is, one side is etched in one chamber and then in the next chamber the second side is etched. | 04-25-2013 |
20130168243 | Vacuum Processing Apparatus - Provided is a low-cost vacuum processing apparatus which enables the miniaturization of the apparatus and achieves good productivity. An elongated sheet base material is transported through a vacuum processing chamber, and predetermined processing is performed on the sheet base material in this vacuum processing chamber. The vacuum processing chamber is provided with a single processing unit, and has an auxiliary vacuum chamber provided in continuation with the vacuum processing chamber. The auxiliary vacuum chamber is provided with a feed roller and a take-up roller. The vacuum processing apparatus includes a pair of first roller units provided on opposite sides across the processing unit in the vacuum processing chamber. Each of the first roller units has multiple rollers disposed at regular distances. The rollers are deviated from each other in the axial direction and arranged in such a staggered manner that the sheet base material is helically wound around the rollers. | 07-04-2013 |
204298260 | Plural diverse treatment stations, zones, or coating material source within single chamber | 3 |
20100116654 | FILM COATING APPARATUS - An exemplary film coating holder includes a main body, a holding member, a first target electrode, a second target electrode and a driving module. The main body defines a chamber therein. The holding member receives in the chamber and has a plurality of through holes. The through holes being configured for receiving workpieces to be coated. The first target electrode and the second target electrode disposed on the main body and configured for supporting a first target material and a second target material respectively. The driving member is disposed on the main body and mechanically coupled with the holding member, and configured for driving the holding member to rotate about a horizontally oriented axis, thus the first targeted material and the second targeted material can be respectively deposit on opposite sides of each of the workpieces. | 05-13-2010 |
20100181193 | In-Line Metallizer Assemblies and Part-Coating Conveyor Systems Incorporating the Same - In-line metallizer assemblies can include an external rotating actuator exchange that can be operable to exchange one or more parts between a conveyor system and a vacuum chamber, and an internal rotating actuator exchange within the vacuum chamber that can be operable to receive the one or more parts from the external rotating actuator exchange, transition the one or more parts to a sputter coater integrated with the vacuum chamber for metallizing, and return metallized one or more parts to the external rotating actuator exchange such that the external rotating actuator exchange can return the metallized one or more parts to the conveyor system. | 07-22-2010 |
20120247953 | FILM-COATING SYSTEM - The invention relates to a film coating system. The system includes serially arranged working zones including a rough vacuum feeding section, a high vacuum feeding section, an optical layer coating zone, a pretreatment zone, a transparent conductive layer coating zone and a pressure balanced exhausting zone. The system further includes a conveyor device for carrying a substrate which has been provided on its periphery with an ink frame layer and for delivering the substrate to the respective working zones, and a controlling device that controls the times for the substrate to be retained in the respective working zones based upon a time interval between the entry of two successive conveyor devices into the rough vacuum feeding section. The invention ensures a smooth operation of the production line, and the transparent conductive film coated thereby does not easily exfoliate and exhibits the advantageous properties of high optical performance and low surface resistance. | 10-04-2012 |
204298280 | Rotational movement | 13 |
20080202925 | Single, Right-Angled End-Block - A single, right-angled end-block is claimed for rotatably carrying a target in a sputtering apparatus. The end-block comprises all necessary means to drive, energise, bear and seal (coolant and gas) the target in the sputtering apparatus from the outside through a single opening in a wall or door. The right-angled end-block rotates the target around an axis of rotation that is parallel to the wall on which the target is mounted. By preference the end-block is situated below the target in order to allow easy drainage of the coolant. | 08-28-2008 |
20080264786 | ALTERNATING CURRENT ROTATABLE SPUTTER CATHODE - The present invention is an alternating current rotary sputter cathode in a vacuum chamber. The apparatus includes a housing containing a vacuum and a cathode disposed therein. A drive shaft is rotatably mounted in the bearing housing. A rotary vacuum seal is located in the bearing housing for sealing the drive shaft to the housing. An at least one electrical contact is disposed between a power source and the cathode for transmittal of an oscillating or fluctuating current to the cathode. The electrical contact between the power source and the cathode is disposed inside of the vacuum chamber, greatly reducing, and almost eliminating, the current induced heating of various bearing, seals, and other parts of the rotatably sputter cathode assembly. | 10-30-2008 |
20090139865 | DOUBLE-LAYER SHUTTER CONTROL METHOD OF MULTI-SPUTTERING SYSTEM - A double-layer shutter control method of a multi-sputtering system provided with three targets in a single chamber and a double-layer rotating shutter mechanism having shutter plates which independently rotate and have holes formed therein, comprising selecting a target by a combination of holes of a first shutter plate and a second shutter plate and uses the selected target for a pre-sputtering step and a main sputtering step with continuous discharge so as to deposit a film on a substrate, whereby it is possible to prevent cross-contamination between targets due to target substances etc. deposited on the shutter plates. | 06-04-2009 |
20100101948 | ROTATABLE SPUTTER TARGET BASE, ROTATABLE SPUTTER TARGET, COATING INSTALLATION, METHOD OF PRODUCING A ROTATABLE SPUTTER TARGET, TARGET BASE CONNECTION MEANS, AND METHOD OF CONNECTING A ROTATABLE TARGET BASE DEVICE FOR SPUTTERING INSTALLATIONS TO A TARGET BASE SUPPORT - A rotatable target base device for sputtering installations is provided, wherein the target base device is adapted for receiving thereon a solid target cylinder, the rotatable target base device comprising a target base cylinder having a lateral surface, a middle part, a first end region and a second end region opposite to the first end region, wherein at least one of the first and the second end regions has a maximum outer diameter substantially equal to or less than the outer diameter of the middle part. | 04-29-2010 |
20100101949 | ROTATABLE SPUTTER TARGET BACKING CYLINDER, ROTATABLE SPUTTER TARGET, METHOD OF PRODUCING A ROTATABLE SPUTTER TARGET, AND COATING INSTALLATION - A rotatable target device for sputtering installations, the rotatable target device including: a rotatable target base adapted for holding a solid target cylinder, the solid target cylinder having an inner axial face, an outer axial face and at least one front face connecting the inner axial face with the outer axial face; wherein the rotatable target base comprises a flexible element, a first face adapted to the shape of the inner axial face of the solid target cylinder and a second face adapted to hold the flexible element outside of the solid target cylinder. | 04-29-2010 |
20110036711 | SPUTTERING DEVICE - A sputtering device is provided. The sputtering device comprises a housing defining a chamber, and a carrier arranged within the housing. The carrier comprises a base, a plurality of supporting members, a plurality of spacing members, and a cap. The supporting members are spaced from each other and rotatably connected to the base. Each supporting member defines at least one cavity to receive at least one workpiece. The spacing members are fixed to the base, each of which is arranged between two adjacent supporting members. The cap is arranged above the plurality of supporting members and the plurality of spacing members to form a substantially enclosed space. The driving device is used to drive the carrier to rotate and to drive the plurality of supporting members to rotate with respect to the base. | 02-17-2011 |
20110247931 | SPUTTERING BRACKET AND SPUTTERING APPARATUS HAVING SAME - A sputtering bracket includes a curved plate body, a plurality of frames, and a plurality of fastening members. The body defines a plurality of through holes and has an inner concave side. The frames are pivotally connected with the curved plate body and received in the respective through holes. Each frame is rotatable relative to the curved plate body such that either one of opposite sides thereof can be exposed at the inner concave side. The fastening members are mounted on the curved plate body, and are spring-loaded for resilient engagement with the respective frames. | 10-13-2011 |
20110266147 | SPUTTERING DEVICE WITH ROTATABLE TARGETS - A sputtering apparatus includes a housing having an enclosure and a plurality of gas-introduction holes defined in the sidewalls of the enclosure, a substrate holder for holding substrates, a plurality of targets surrounding the substrate holder, the targets and the substrate holder are accommodated in the housing, and a driving member for rotating the targets such that the targets can be selectively oriented to face the substrate holder or the gas-introduction holes. | 11-03-2011 |
20110266148 | TARGET BASE AND SPUTTERING APPARATUS USING SAME - A target base includes a fixed carrier, a rotatable carrier, a number of target housings, and a number of target supports. The rotatable carrier is rotatably mounted on the fixed carrier. The target housings are mounted on the fixed carrier around the rotatable carrier, and define receiving spaces adjacent to the rotatable carrier. The target supports are rotatably mounted on the target housings correspondingly. Each target support is able to rotate to be received in the receiving space of a corresponding one of the target housings or to move out of the receiving space. | 11-03-2011 |
20120037503 | ROTATABLE SPUTTER TARGET BASE, ROTATABLE SPUTTER TARGET, COATING INSTALLATION, METHOD OF PRODUCING A ROTATABLE SPUTTER TARGET, TARGET BASE CONNECTION MEANS, AND METHOD OF CONNECTING A ROTATABLE TARGET BASE DEVICE FOR SPUTTERING INSTALLATIONS TO A TARGET BASE SUPPORT - A rotatable target base device for sputtering installations is provided, wherein the target base device is adapted for receiving thereon a solid target cylinder, the rotatable target base device comprising a target base cylinder ( | 02-16-2012 |
20120160675 | LOADING DEVICE AND SPUTTERING DEVICE USING SAME - A sputtering device includes a main body and a loading device received in the main body. The main body includes a top portion, a bottom portion, and a sidewall connected between the top portion and the bottom portion, an upper bearing mounted on the top portion, and a lower bearing mounted on the bottom portion. The loading device includes an outer frame, an inner frame received in the outer frame, and a gear device arranged between the outer frame and the in inner frame. The outer frame is rotatably connected to the upper bearing and includes a plurality of first rods arranged in a first circle. The inner frame is rotatably connected to the lower bearing and includes a plurality of second rods arranged in a second circle. The gear device is configured for bringing the outer frame and the inner frame to rotate in opposite directions. | 06-28-2012 |
20120222957 | COATING DEVICE - A coating device includes a rotatable base, a board for holding workpieces, a positioning shaft positioned on the rotatable base, two eccentric wheels, a rack, and two reciprocating shafts. The two eccentric wheels are fixed on the positioning shaft and extend from the positioning shaft along two opposite directions. The two eccentric wheels are parallel to and spaced from each other. The rack is rotatably connected to the rotatable base. The rack is capable of rotating around the positioning shaft. Each reciprocating shaft is positioned on the rack. Each reciprocating shaft includes a hinge portion rotatably connected to an end of the board and a sliding portion slidably connected to the edge of a corresponding eccentric wheel. The two eccentric wheels are capable of driving the two reciprocating shafts to move alternately toward and away from the positioning shaft along radial directions of the positioning shaft. | 09-06-2012 |
20150021177 | SPUTTERING DEVICE - A sputtering device includes a vacuum chamber; a film depositing roll; at least one target material; a gas supply mechanism; three drive rolls (downstream conveying rolls); and three temperature control mechanisms for maintaining a temperatures of the drive rolls substantially constant in a range where the temperature is 80° C. or less and is higher than a minimum temperature in the vacuum chamber so that a long film substrate that is detached from the film depositing roll and is conveyed to the downstream conveying rolls is not deformed by rapid cooling. | 01-22-2015 |