Class / Patent application number | Description | Number of patent applications / Date published |
204192160 | Wear or abrasion resistant | 10 |
20090078565 | Method and apparatus for depositing a coating onto a substrate - The present invention relates to a method for depositing a coating onto a substrate. The method comprises depositing by arc evaporation; depositing by dual magnetron sputtering; said depositing being performed in sequence or simultaneously. | 03-26-2009 |
20090321249 | Method of Hard Coating a Blade - A sputtering apparatus includes a chamber for containing a feed gas. An anode is positioned inside the chamber. A cathode assembly comprising target material is positioned adjacent to an anode inside the chamber. A magnet is positioned adjacent to cathode assembly. A platen that supports a substrate is positioned adjacent to the cathode assembly. An output of the power supply is electrically connected to the cathode assembly. The power supply generates a plurality of voltage pulse trains comprising at least a first and a second voltage pulse train. The first voltage pulse train generates a first discharge from the feed gas that causes sputtering of a first layer of target material having properties that are determined by at least one of a peak amplitude, a rise time, and a duration of pulses in the first voltage pulse train. The second voltage pulse train generates a second discharge from the feed gas that causes sputtering of a second layer of target material having properties that are determined by at least one of a peak amplitude, a rise time, and a duration of pulses in the second voltage pulse train. | 12-31-2009 |
20100012483 | MULTILAYER HARD COATING FOR TOOLS - A multilayer hard coating for tools for machining applications with a multilayer structure for improving the wear resistance of workpieces includes at least one (Al | 01-21-2010 |
20100078314 | METHOD FOR COATING FUEL SYSTEM COMPONENTS - The present disclosure includes a method of producing a fuel system component. The method includes providing a substrate and a coating, wherein the substrate comprises steel and the coating comprises a metal nitride. The method also includes applying the coating to at least part of the substrate using a magnetron sputtering deposition process substantially conducted at a temperature less than about 200° C. | 04-01-2010 |
20100276276 | Thin Film Mainly Comprising Titanium Oxide, Sintered Sputtering Target Suitable for Producing Thin Film Mainly Comprising Titanium Oxide, and Method of Producing Thin Film Mainly Comprising Titanium Oxide - Provided is a thin film mainly comprising titanium oxide, wherein the thin film comprises components of Ti, Ag and O and contains 29.6 at % or more and 34.0 at % or less of Ti, 0.003 at % or more and 7.4 at % or less of Ag, and oxygen as the remainder thereof, and O/(2Ti+0.5Ag) as a ratio of oxygen to metals is 0.97 or more. This invention aims to provide a thin film mainly comprising titanium oxide having a high refractive index and a low extinction coefficient, a sintered sputtering target mainly comprising titanium oxide suitable for producing the thin film, and a method of producing a thin film mainly comprising titanium oxide. This invention also aims to provide a thin film that has superior transmittance, minimally deteriorates in reflectance, and is useful as an interference film or a protective film for an optical information recording medium. It is also possible to apply this film to a glass substrate; that is, which can be used as a heat reflective film, an antireflective film, and an interference filter. | 11-04-2010 |
20110209988 | THIN FILM COATING OF BLADES - The present invention relates to a process for forming a razor blade. The process includes the steps of: a) providing a substrate, b) forming a wedge-shaped sharpened edge on the substrate that has an included angle of less than thirty degrees and a tip radius of less than 1,000 angstroms, c) placing the substrate in a vacuum chamber, d) placing a first solid target in the vacuum chamber, e) providing a gas to be ionized in the vacuum chamber, and f) generating ions from the first solid target by applying a negative voltage to the first solid target in pulses, the ions forming a thin film coating on the wedge-shaped sharpened edge on the substrate. | 09-01-2011 |
20130146443 | APPARATUS AND METHOD FOR DEPOSITING HYDROGEN-FREE TA-C LAYERS ON WORKPIECES AND WORKPIECE - An apparatus for the manufacture of at least substantially hydrogen-free ta-C layers on substrates, which includes a vacuum chamber, which is connectable to an inert gas source and a vacuum pump, a support device in the vacuum chamber, at least one graphite cathode having an associated magnet arrangement forming a magnetron that serves as a source of carbon material, a bias power supply for applying a negative bias voltage to the substrates on the support device, at least one cathode power supply for the cathode, which is connectable to the at least one graphite cathode and to an associated anode and which is designed to transmit high power pulse sequences spaced at intervals of time, with each high power pulse sequence comprising a series of high frequency DC pulses adapted to be supplied, optionally after a build-up phase, to the at least one graphite cathode. | 06-13-2013 |
20130334033 | METHOD FOR MANUFACTURING RAZOR BLADE EDGE AND RAZOR BLADE FOR RAZOR - The present invention relates to a method for manufacturing a razor blade edge and a razor blade for a razor, and more specifically, to a method for manufacturing razor blade edge of a razor blade provided with a light complex thin film having metallic and ceramic properties for improving durability and hardness. According to the present invention, the method comprises: a first step of heat-treating stainless steel; a second step of forming the razor blade edge by polishing the heat-treated stainless steel; and a third step of depositing a plurality of coating materials on the razor blade edge that is formed, wherein a sputtering device is used in the third step, the sputtering device being provided with a sputter target, and the sputtering target comprising a first ingredient and a second ingredient which are deposited on the razor blade edge and on the razor blade. | 12-19-2013 |
20160148787 | PLASMA ETCHING APPARATUS - A plasma etching apparatus is for etching a substrate and includes at least one chamber, a substrate support positioned within the at least one chamber, and a plasma production device for producing a plasma for use in etching the substrate. The plasma production device comprises an electrically conductive coil which is positioned within the at least one chamber, and the coil is formed from a metallic material which can be sputtered onto an interior surface of the at least one chamber. | 05-26-2016 |
20160379807 | PLASMA ETCHING APPARATUS - An ICP plasma etching apparatus for etching a substrate includes at least one chamber, a substrate support positioned within the chamber, a plasma production device for producing a plasma for use in etching the substrate, and a protective structure which surrounds the substrate support so that, in use, a peripheral portion of the substrate is protected from unwanted deposition of material. The protective structure is arranged to be electrically biased and is formed from a metallic material so that metallic material can be sputtered from the protective structure onto an interior surface of the chamber to adhere particulate material to the interior surface. | 12-29-2016 |