V TECHNOLOGY CO., LTD. Patent applications |
Patent application number | Title | Published |
20160006518 | OPTICAL INTERCONNECTION DEVICE - Signal transmission crosstalk between substrates is suppressed even when light emitting elements or light receiving elements are densely arranged. Provided is an optical interconnection device | 01-07-2016 |
20160002088 | LASER PROCESSING APPARATUS AND LASER PROCESSING METHOD - A laser processing apparatus that condenses a laser beam into an annular shape to irradiate the condensing position of the laser beam within a thickness range of a substrate, and shifts the condensing position in such a manner that the center of the condensing position that is annular moves in a circular manner, at a stage of shifting the condensing position in a thickness direction of the substrate and a planar direction of the substrate. | 01-07-2016 |
20150357361 | IMAGING DEVICE - When a visible light image and an image of a long-wavelength region with a near-infrared wavelength or longer are acquired using one imaging sensor, a clear image of the long-wavelength region with the near-infrared wavelength or longer is obtained. In an imaging sensor | 12-10-2015 |
20150346443 | SEMICONDUCTOR OPTICAL INTEGRATED CIRCUIT - The semiconductor optical integrated circuit has a semiconductor substrate; a pn junction part formed in the semiconductor substrate so as to continuously extend along a signal transmission route, a light emitting part formed on a part of the pn junction part; and an optical waveguide part formed continuous to the light emitting part on the pn junction part. The light emitting part supplies a drive current to the pn junction part to generate an optical signal from the pn junction part, and the optical waveguide part transmits the optical signal while amplifying the optical signal by an amplification current supplied to the pn junction part. | 12-03-2015 |
20150301279 | OPTICAL INTERCONNECTION DEVICE - An optical interconnection device for transmitting and receiving an optical signal between a plurality of laminated semiconductor substrates. The optical interconnection device has a plurality of light emitting elements or a plurality of light receiving elements that are arranged in one of the semiconductor substrates and have pn junction parts using the semiconductor substrate as a common semiconductor layer. The light emitting element and the light receiving element, which form a pair and which transmit and receive an optical signal between the different semiconductor substrates, emit and receive light at a common wavelength. | 10-22-2015 |
20150290667 | DEPOSITION MASK - The deposition mask includes: a thin plate-shaped magnetic metal member | 10-15-2015 |
20150284839 | DEPOSITION MASK, PRODUCING METHOD THEREFOR AND FORMING METHOD FOR THIN FILM PATTERN - A deposition mask for forming a thin film pattern having a predetermined shape on a substrate by deposition, includes a resin film that transmits visible light and has an opening pattern penetrating through the resin film and having the same shape and dimension as those of the thin film pattern so as to correspond to a preliminarily determined forming region of the thin film pattern on the substrate. | 10-08-2015 |
20150283651 | METHOD FOR PRODUCING DEPOSITION MASK - The invention provides a method for producing a deposition mask that includes forming of an opening pattern | 10-08-2015 |
20150280835 | OPTICAL INTERCONNECTION DEVICE - An optical interconnection device for transmitting and receiving an optical signal between a plurality of laminated semiconductor substrates. The optical interconnection device has a plurality of light emitting elements or a plurality of light receiving elements arranged in one of the semiconductor substrates that have pn junction parts using the semiconductor substrate as a common semiconductor layer. The light emitting element and the light receiving element, which form a pair and which transmit and receive an optical signal between the different semiconductor substrates, emit and receive light at a common wavelength. | 10-01-2015 |
20150259780 | PRODUCTION METHOD FOR DEPOSITION MASK - A production method for a deposition mask is provided. The production method includes the steps of: forming a mask member having a structure in which a thin-board magnetic metal member having a through hole and a resin film contact tightly with each other; forming a mark that has a specified depth by irradiating a part of the film through the through hole of the mask member with laser beams; and forming an opening pattern that penetrates the film by irradiating a predetermined position with laser beams, using the mark as a reference. | 09-17-2015 |
20150246416 | PRODUCTION METHOD FOR DEPOSITION MASK AND DEPOSITION MASK - To provide a production method including: a first step of forming a mask member in which a resin film and a magnetic metal member, which has first through-holes and second through-holes, are brought into close contact; a second step in which a peripheral edge of the magnetic metal member is bonded to one end face of a frame; and a third step in which a portion of the film in each first through-hole is irradiated with laser light to form an opening pattern, and a portion of the film in each second through-hole is irradiated with laser light to form a mask-side alignment mark. | 09-03-2015 |
20150244146 | SEMICONDUCTOR RING LASER APPARATUS - Provided is a semiconductor ring laser apparatus including an Si semiconductor substrate, a ring resonator configured by an optical waveguide formed in the Si semiconductor substrate, a semiconductor laser part that is provided with a light emitting amplification part at least in a part of the optical waveguide and that generates two beams of laser light traveling around in opposite directions in the ring resonator, and a light detection part formed in the Si semiconductor substrate to extract the two beams of laser light from the ring resonator and detect a frequency difference between the two beams of laser light. The light emitting amplification part includes a pn junction obtained by annealing on a second semiconductor layer, which is obtained by doping a first semiconductor layer in the Si semiconductor substrate with boron at high concentration, the annealing being performed while radiating light onto the second semiconductor layer. | 08-27-2015 |
20150192830 | PHOTO-ALIGNMENT EXPOSURE METHOD AND PHOTO-ALIGNMENT EXPOSURE DEVICE - A photo-alignment exposure method divides each unit image area of a liquid crystal display into a plurality of divided areas and photo-aligns an alignment material film of each of the divided areas in mutually different directions. The method includes a first exposure process that radiates light at an inclined photo-irradiation angle onto an exposed surface of entire the unit image area; and a second exposure process that radiates light onto one area of the divided areas at an inclined photo-irradiation angle different from the photo-irradiation angle in the first exposure process. In the second exposure process, the light is radiated through a mask pattern corresponding to one area of the divided areas, and transmitted light of the mask pattern is condensed by condensing element and radiated onto the area. | 07-09-2015 |
20150174820 | EXPOSURE DEVICE - A method of manufacturing of an alignment material film includes photoaligning the alignment material film by an exposure device to split each of sections of the alignment material film corresponding to picture elements of a liquid crystal display device into two parts in a width direction of the picture elements and exposing the alignment material film from different directions of each other. In the exposure device, each of sections of the alignment material film corresponding to the picture elements of the liquid crystal display device is split into two parts in the width direction of the picture elements and the two parts are exposed from the different directions of each other, whereby the alignment material film is photoaligned. The exposure device includes a first light source and a second light source for outputting exposure light. | 06-25-2015 |
20140347744 | LENS AND LASER PROCESSING APPARATUS EQUIPPED WITH THE LENS - A member having an arbitrary shape having a closed curve can be easily subjected to laser processing within a short time. A lens and a laser processing apparatus equipped with the lens are for cutting a material to be cut into a member having an arbitrary shape having a closed curve and include a convex cylindrical lens which is molded to have a closed path so that a line that connects vertices of a cylindrical surface of the convex cylindrical lens has the same form as the arbitrary shape having the closed curve. | 11-27-2014 |
20140199808 | DEPOSITION MASK, PRODUCING METHOD THEREFOR AND FORMING METHOD FOR THIN FILM PATTERN - A deposition mask for forming a thin film pattern having a predetermined shape on a substrate by deposition, includes a resin film that transmits visible light and has an opening pattern penetrating through the resin film and having the same shape and dimension as those of the thin film pattern so as to correspond to a preliminarily determined forming region of the thin film pattern on the substrate. | 07-17-2014 |
20140168648 | ALIGNMENT DEVICE FOR EXPOSURE DEVICE, AND ALIGNMENT MARK - This alignment device is furnished with an alignment light source for emitting alignment light, and is housed with a camera for example. The alignment light source emits alignment light, doing so, for example, coaxially with respect to the optical axis of light detected by the camera. The alignment light illuminates a substrate and mask, and reflected light is detected by the camera. A microlens array for exposure use is present between a mask alignment mark and a substrate alignment mark, whereby an erect unmagnified image reflected from the substrate alignment mark is formed on the mask. A control device then uses the mask alignment mark and the substrate alignment mark detected by the camera to perform alignment of the substrate and the mask. Alignment of the substrate and the mask can be performed with high accuracy thereby. | 06-19-2014 |
20140168622 | MICROLENS ARRAY AND SCANNING EXPOSURE DEVICE USING SAME - This microlens array comprises hexagonal field diaphragms in inverted-image-forming positions, i.e., microlenses, a plurality of which are arranged in the direction perpendicular to a direction of scanning, and from which rows of microlenses are configured. Further, for three rows of microlenses, microlens rows are arranged with offset by (a length S) in a direction perpendicular to the direction of scanning such that triangular portions of the hexagonal field diaphragms overlap in the direction of scanning. Furthermore, microlens row groups, which are configured from three microlens rows, are arranged with offset in the direction perpendicular to the direction of scanning in increments of a minute amount of shifting F (for example, 2 μm). Thereby, this scanning exposure device using a microlens array is capable of preventing exposure ununiformity even in the direction perpendicular to the direction of scanning. | 06-19-2014 |
20140146299 | ALIGNMENT CORRECTION METHOD FOR SUBSTRATE TO BE EXPOSED, AND EXPOSURE APPARATUS - An alignment correction method includes: the step of detecting coordinates of a first observation point | 05-29-2014 |
20140126591 | PULSED LASER OSCILLATOR AND METHOD FOR CONTROLLING PULSED LASER OSCILLATION - A pulsed laser oscillator includes at least one first electrooptical element that polarizes light according to an applied voltage and a voltage control unit that applies a voltage to the first electrooptical element and controls the voltage. The voltage control unit changes over time a voltage value applied to the first electrooptical element, to control a pulse width of laser light. | 05-08-2014 |
20140063808 | LASER LIGHTING DEVICE - In a laser lighting device, a fly's eye lens and a condenser lens are disposed in an optical path of pulsed laser light emitted from a light source, and an electro-optical crystal element for continuously changing the deflection direction of the pulsed laser light with respect to the incident light and allowing the deflected light to pass therethrough is disposed in a position between the light source and the fly's eye lens or between the fly's eye lens and the condenser lens. The electro-optical crystal element is formed, for example, of a pair of electrodes and an optical crystal material disposed between the electrodes, and a voltage is applied between the electrodes to produce an electric field that changes the refractive index of the electro-optical crystal element. As a result, non-uniform illumination due to interference fringes produced by light having passed through the fly's eye lens can be reduced. | 03-06-2014 |
20130342820 | LIGHT-EXPOSURE DEVICE - A light-exposure device is provided with a microlens array on which is arranged with a prescribed regularity a plurality of microlenses on which exposure light transmitted through a light source and a mask is introduced to resolve an upright equal-magnification image on a substrate. Upon reaching a prescribed position, the substrate is irradiated with pulsed laser light from the light source, and the substrate is successively exposed, and after the entire area of the exposure region of the substrate is exposed, a relative positional relationship between the microlens array and the mask is successively switched in a vertical direction by an amount of a horizontal pitch of the microlenses, and a subsequent exposure is performed. Exposure with high precision and high resolution can thereby be performed with a short exposure cycle time. | 12-26-2013 |
20130284708 | LASER PROCESSING APPARATUS - The present invention relates to a laser processing apparatus for irradiating a printed wiring board | 10-31-2013 |
20130242281 | EXPOSURE APPARATUS - An exposure apparatus includes a pattern generator with light switches arrayed on a plane parallel to a surface of an object to be exposed. Each of the light switches has a switching element that is a rectangular pillar of an electro-optic crystal, and a pair of polarizers arranged on respective sides in the long axis direction of the switching element. The exposure apparatus drives the light switches individually to generate an exposure pattern having a certain bright and dark form and irradiate the object to be exposed with the pattern. Furthermore, the exposure apparatus has a plurality of microlenses provided on the light-output side of the pattern generator so that the optical axes of the microlenses are aligned to the longitudinal center axes of the switching elements, so as to project images of light-output ends of the switching elements at reduced size onto the object to be exposed. | 09-19-2013 |
20130235362 | EXPOSURE APPARATUS - An exposure apparatus includes a first mark-forming unit further upstream than an irradiation region for exposure light in a direction of conveyance of a member to be exposed. A mark for meandering detection is detected, and a detection unit detects the mark for meandering detection in a direction intersecting a direction of movement of the member to be exposed. A second mark-forming unit is moved so as to negate an amount of meandering by the member to be exposed, computed on the basis thereof, and an alignment mark is formed rectilinearly in a relative fashion with respect to the member to be exposed. This enables highly accurate, stable exposure whereby, even in a case where the member is supplied continuously, an alignment mark for mask position adjustment can be changed in accordance with the meandering of the member to be exposed and the position of the mask with respect to the member to be exposed can be accurately adjusted. | 09-12-2013 |
20130208255 | SCANNING EXPOSURE APPARATUS USING MICROLENS ARRAY - A microlens array is a stacked body of four unit microlens arrays, and the optical axis of a portion of the unit microlens arrays can be shifted from the optical axis of the other unit microlens arrays. In a scanning exposure apparatus, a CCD line camera detects an image on a substrate, and using a first-layer pattern on the substrate as a reference pattern, in a case in which a mask exposure pattern does not match the reference pattern, shifts the optical axis of the microlenses to adjust the magnification of a projection pattern using the microlens array. This makes it possible to adjust the exposure position using the microlens array so that even when the exposure pattern deviates from the reference pattern, the deviation can be detected during exposure and an exposure pattern misregistration can be prevented, enabling the precision of the exposure pattern to be enhanced in an overlay exposure. | 08-15-2013 |
20130188161 | SCANNING EXPOSURE APPARATUS USING MICROLENS ARRAY - A scanning exposure apparatus uses a plurality of microlens arrays to project a mask exposure pattern onto a substrate. A CCD line camera detects an image on the substrate at this time, and using a first-layer pattern on the substrate as a reference pattern, detects whether or not the mask exposure pattern matches the reference pattern. In a case in which the patterns do not match, the microlens array is tilted from a direction that is parallel to the substrate, and the mask exposure pattern is made to match the reference pattern by using the microlens array to adjust the exposure area on the substrate. When the exposure pattern deviates from the reference pattern, it is thereby possible to detect the deviation during exposure and to prevent an exposure pattern misregistration, thereby enhancing the precision of the exposure pattern in an overlay exposure. | 07-25-2013 |
20130169917 | EXPOSURE DEVICE - In an exposure device, picture elements or pixels of a liquid crystal display device are split into two parts in the width direction, and exposed from different directions, whereby an alignment material film is photoaligned. The exposure device causes two beams of exposure light outputted by two light sources (a first light source and a second light source) to be transmitted through respectively different light transmission regions in a predetermined pattern of a mask, to irradiate regions of an alignment material film formed on a member for exposure, which regions correspond to split regions of pixels or picture elements. The exposure device causes the two beams of exposure light to mutually intersect on the optical path between the first and second light sources and the alignment material film. | 07-04-2013 |
20130141704 | MICROLENS EXPOSURE SYSTEM - A microlens exposure system includes a microlenses array and a mask fixed in place a predetermined space apart, wherein the gap between the microlens array and an exposure substrate can easily be adjusted with high precision to an aligned focal point position of the microlenses. Laser light for exposure is irradiated onto a resist film by microlenses of a microlens array. Light from a microscope passes through a hole in a Cr film of a mask, and the light is transmitted through a microlens and radiated onto the resist film. Whether or not the light transmitted through the microlens has an aligned focal point on the resist film is observed through the microscope, whereby the aligned focal point of exposure light made to converge by the microlenses on the resist film can be distinguished. | 06-06-2013 |
20130135602 | SCANNING EXPOSURE APPARATUS USING MICROLENS ARRAYS - A scanning exposure apparatus using microlens arrays, includes a plurality of microlens arrays is arrayed in a direction perpendicular to a scanning direction above a substrate to be exposed, and the microlens arrays are supported on a support substrate. The microlens arrays can be supported on a support substrate so as to be capable of being inclined from a direction parallel to the exposure substrate, relative to the direction in which the microlens arrays are arranged. The inclination angles of these microlens arrays are configured so as to gradually increase or decrease along the arrangement direction. | 05-30-2013 |
20130128253 | EXPOSURE APPARATUS USING MICROLENS ARRAY AND OPTICAL MEMBER - An exposure apparatus and an optical member wherein impurities can be prevented from infiltrating between microlens arrays and a substrate, and microlenses can be prevented from being scratched by the impurities and by getting abnormally close to the substrate. Microlens arrays in which pluralities of microlenses are formed are arranged above a transparent substrate, and the microlens arrays are bonded and the end surfaces to a mask. Alignment mark supports are bonded to the mask at both sides of the microlens arrays, and alignment marks are formed in the surfaces of the alignment mark supports that face the substrate. The spaces between the alignment mark supports and the substrate are smaller than the spaces between the microlens arrays and the substrate. | 05-23-2013 |
20130100431 | Method and apparatus for alignment processing - A method for alignment processing including making a substrate | 04-25-2013 |
20120249993 | EXPOSURE METHOD AND EXPOSURE APPARATUS - An exposure method includes a step of moving a photomask by a predetermined distance and switching a first mask pattern group to a second mask pattern group when an exposure to a first exposure area on an object to be exposed by the first mask pattern group of the photomask formed by arranging the first and the second mask pattern groups corresponding to an exposure patterns at predetermined intervals in a conveying direction of the object to be exposed is completed, and a step of performing an exposure on the second exposure area on the object to be exposed by the second mask pattern group, in which a moving speed of the photomask is controlled so that a moving distance of the object to be exposed is longer than a moving distance of the photomask in a period of time when switching the first and the second mask pattern groups. | 10-04-2012 |
20120212717 | EXPOSURE APPARATUS AND PHOTO MASK - The present invention provides an exposure apparatus in which a photo mask having a plurality of openings, each having a predetermined shape, formed in a light shielding film mounted on one surface of a transparent substrate | 08-23-2012 |
20120058627 | COMPOUND SEMICONDUCTOR DEPOSITION METHOD AND APPARATUS - Provided is a compound semiconductor deposition method of adjusting the luminous wavelength of a compound semiconductor of a ternary or higher system in a nanometer order in depositing the compound semiconductor on a substrate. In the compound semiconductor deposition method of depositing a compound semiconductor of a ternary or higher system on a substrate, propagation light of a smaller energy than a desired ideal excitation energy for the compound semiconductor is irradiated onto the substrate | 03-08-2012 |