20150027552 | FLUID SUPPLY SYSTEM, WAFER PROCESSING SYSTEM, AND METHOD OF SUPPLYING FLUID TO WAFER PROCESSING EQUIPMENT - A fluid supply system includes a pressure tank configured to contain a pressurized gas and a fluid, a delivery point configured to be connected to a point of use, a recirculation piping connecting the pressure tank to the delivery point, and a return pump connected to the recirculation piping. The recirculation piping defines a circulation path for the fluid from the pressure tank through the delivery point and back to the pressure tank. The return pump is downstream of the delivery point and upstream of the pressure tank in the circulation path. | 01-29-2015 |