STANGL SEMICONDUCTOR EQUIPMENT AG Patent applications |
Patent application number | Title | Published |
20100279017 | DEVICE AND METHOD FOR COATING A SURFACE - A device for coating a product includes a provider for providing a liquid containing reagents necessitated for coating. Additionally, the device comprises a transporter for contacting the surface of the product to be coated with the liquid and passing same by the liquid such that the surface to be coated remains in contact with the liquid for a predetermined period of time so as to effect coating thereof. | 11-04-2010 |
20090311431 | APPARATUS AND METHOD FOR SMOOTHLY COATING SUBSTRATES - The surface of a substrate may be smoothly covered with a liquid when the substrate is fixed in a holder which together with forms, together with the surface of the substrate, a process volume into which the liquid may be introduced onto the surface of the substrate by means of a wetter, and when the holder including the substrate is set in a swaying motion by means of a swayer, so that the liquid will smoothly spread on the surface of the substrate. By the swaying motion, concentration of the volume of liquid at a specific location of the substrate surface is prevented, since the direction of motion of the liquid changes constantly. | 12-17-2009 |
20080308125 | Apparatus and Method for Cleaning a Sawn Wafer Block - An apparatus for cleaning a sawn wafer block includes a cleaning basin, a fixture for holding a sawn wafer block in the cleaning basin such that, when cleaning liquid is present in the cleaning basin, at least a portion of the wafer block having sawn gaps is disposed in the cleaning liquid, at least one outlet port in a bottom region of the cleaning basin, and a closer for the outlet port, by means of which the outlet port may be opened and closed. The closer, the outlet port and the bottom region of the cleaning basin are configured such that, by opening the closer the cleaning liquid is drainable so fast from at least the area of the cleaning basin having the wafer block disposed therein that contaminants are removable from the sawn gaps due to a suction effect of the cleaning liquid. | 12-18-2008 |