MICRO RESIST TECHNOLOGY GESELLSCHAFT FÜR CHEMISCHE MATERIALIEN SPEZIELLER PHOTORESISTSYSTEME MBH
MICRO RESIST TECHNOLOGY GESELLSCHAFT FÜR CHEMISCHE MATERIALIEN SPEZIELLER PHOTORESISTSYSTEME MBH Patent applications | ||
Patent application number | Title | Published |
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20150079351 | COMPOSITION SUITABLE FOR USE AS A RELEASE-OPTIMIZED MATERIAL FOR NANOIMPRINT PROCESSES AND USES THEREOF - The present invention relates to a composition suitable for use as a release-optimized material for nanoimprint processes, process of production and uses thereof. | 03-19-2015 |