Micro Lithography, Inc.
Micro Lithography, Inc. Patent applications | ||
Patent application number | Title | Published |
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20140255827 | PELLICLES WITH REDUCED PARTICULATES - Pellicles for photomasks used in photolithographic manufacturing are described. A frame of a pellicle may include a recess formed in a side member and a locking member dimensioned to secure a membrane to the frame when the membrane is disposed between the recess and the locking member. A pellicle may be secured to a photomask using non-adhesive attachment members that contact a side surface of the photomask. | 09-11-2014 |