MEDIA LARIO S.R.L. Patent applications |
Patent application number | Title | Published |
20160007435 | SYSTEMS AND METHODS FOR SYNCHRONOUS OPERATION OF DEBRIS-MITIGATION DEVICES - Systems and methods for synchronous operation of debris-mitigation devices (DMDs) in an EUV radiation source that emits EUV radiation and debris particles are disclosed. The methods include establishing a select relative angular orientation between the first and second DMDs that provides a maximum amount of transmission of EUV radiation between respective first and second rotatable vanes of the first and second DMDs. The methods also include rotating the first and second sets of vanes to capture at least some of the debris particles while substantially maintaining the select relative angular orientation. The systems employ DMD drive units, and an optical-based encoder disc in one of the DMD drive units measures and controls the rotational speed of the rotatable DMD vanes. Systems and methods for optimally aligning the DMDs are also disclosed. | 01-07-2016 |
20140326904 | Sn vapor EUV LLP source system for EUV lithography - A Sn vapor EUV LLP source system for EUV lithography is disclosed. The system generates a Sn vapor column from a supply of Sn liquid. The Sn column has a Sn-atom density of <10 | 11-06-2014 |
20140043595 | EUV collector system with enhanced EUV radiation collection - A collector system for extreme ultraviolet (EUV) radiation includes a collector mirror and a radiation-collection enhancement device (RCED) arranged adjacent an aperture member of an illuminator. The collector mirror directs EUV radiation from an EUV radiation source towards the aperture member. The RCED redirects a portion of the EUV radiation that would not otherwise pass through the aperture of the aperture member or that would not have an optimum angular distribution, to pass through the aperture and to have an improved angular distribution better suited to input specifications of an illuminator. This provides the illuminator with greater amount of useable EUV radiation than would otherwise be available from the collector mirror alone, thereby enhancing the performing of an EUV lithography system that uses such a collector system with a RCED. | 02-13-2014 |
20130207004 | Source-collector modules for EUV lithography employing a GIC mirror and a LPP source - Source-collector modules for use with EUV lithography systems are disclosed, wherein the source-collector modules employ a laser-produced plasma EUV radiation source and a grazing-incidence collector. The EUV radiation source is generated by first forming an under-dense plasma, and then irradiating the under-dense plasma with infrared radiation of sufficient intensity to create a final EUV-emitting plasma. The grazing incidence collector can include a grating configured to prevent infrared radiation from reaching the intermediate focus. Use of debris mitigation devices preserves the longevity of operation of the source-collector modules. | 08-15-2013 |
20100303199 | GRAZING INCIDENCE COLLECTOR FOR LASER PRODUCED PLASMA SOURCES - Grazing incidence collectors (GICs) for extreme ultraviolet (EUV) and X-ray radiation sources, such as laser produced plasma (LPP) sources, are disclosed. Source-collector systems comprising GICs and LPP sources are also disclosed. A laser beam is directed along the collector axis to a fuel target to form the LPP source, and the collector is arranged to collect the radiation and reflect it to an intermediate focus. The collector may include one or more grazing-incidence mirrors, and these mirrors may be electroformed. lithography systems that employ the source-collector systems as disclosed herein. | 12-02-2010 |
20100033702 | Coated mirrors and their fabrication | 02-11-2010 |