20090277780 | SPUTTERING DEVICE - The present invention relates to a sputtering cathode of the magnetron type and a control method for such a device for, in a vacuum process, depositing very thin films on substrates for a wide variety of commercial and scientific purposes including production of circular optical discs such as CD- or DVD-discs. In particular, the sputtering device comprises a magnet system disposed behind the target and comprising at least three permanent magnets connected to each other by means of a yoke, each of the permanent magnets having a different polarity, wherein the permanent magnets is adapted to interact with each other so as to form a magnetic flux line plateau having magnetic flux lines being substantially parallel with the sputtering surface of the target. | 11-12-2009 |