KABUSHIKI KAISHA WATANABE SHOKO Patent applications |
Patent application number | Title | Published |
20150284845 | FILM-FORMING APPARATUS - A film forming apparatus, in which vaporized gas of liquid raw material not adequately vaporized in a vaporizer is completely vaporized passing through a pipe for feeding vaporized gas of liquid raw material arranged between the vaporizer and an film forming chamber, and applies in the film forming chamber, is provided. The apparatus includes a supplying system of liquid raw material for film forming; a vaporizer, which vaporizes the liquid raw material by mixing with carrier gas; a film forming chamber, which flows the vaporized gas of liquid raw material from the vaporizer on a base plate, and forms film; and a pipe feeding vaporized gas of liquid raw material, which supplies gas from the vaporizer to the film forming chamber. The pipe for feeding vaporized gas of liquid raw material has a spiral shape, and the axis as the spiral shape is arranged vertical direction to a floor plane. | 10-08-2015 |
20140050852 | VAPORIZER, CENTER ROD USED THEREIN, AND METHOD FOR VAPORIZING MATERIAL CARRIED BY CARRIER GAS - To obtain a vaporizer in which thin film-forming raw material solutions are stably and reliably carried by a carrier gas while being reliably separated within the dispersion unit body and the plurality of thin film-forming raw material solutions are stably vaporized in the subsequent vaporization unit, a center rod used in the vaporizer, and a method for vaporizing raw materials entrained by a carrier gas. A carrier gas introduction bore is formed in the center axis direction of the dispersion unit body. A center rod is inserted in the carrier gas introduction bore. The interspace between the inner wall of the bore and the outer wall of the rod forms a gas passage. Multiple thin film-forming material supply units are situated midway of the gas passage of the dispersion unit body, supplying thin film-forming materials. The center rod has sealing members in the longitudinal direction of the center rod. | 02-20-2014 |
20100173073 | VAPORIZING APPARATUS AND FILM FORMING APPARATUS PROVIDED WITH VAPORIZING APPARATUS - Because an evaporating apparatus for use in an MOCVD film deposition system has a structure in which a plurality of gas passages brings in a gas from the upper direction, the apparatus has a difficulty to position a jet nozzle, and the apparatus is incapable of accurately controlling the pressure and flow rate of a carrier gas mixed with a raw material solution to be issued into an evaporating unit, and it is thus difficult to highly accurately control the composition of MOCVD films. A plurality of gas passages is arranged on a flat, disk-shaped plate. With this configuration, the accurate positioning of the jet nozzle can be made easier, and the composition of MOCVD films can be controlled highly accurately. | 07-08-2010 |