Gigaphoton Inc. Patent applications |
Patent application number | Title | Published |
20160135276 | EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - An extreme ultraviolet light generation apparatus may include: a chamber; a target generation unit configured to output a target to a predetermined region inside the chamber; a focusing optical system configured to concentrate a pulse laser beam to the predetermined region; and a plurality of scattered light detectors each configured to detect scattered light from the target irradiated with the pulse laser beam. The extreme ultraviolet light generation apparatus may further include: an optical path changer configured to change an optical path of the pulse laser beam; and an optical path controller configured to control the optical path changer on a basis of results of detection by the plurality of scattered light detectors. | 05-12-2016 |
20160128172 | SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT - A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light. | 05-05-2016 |
20160087389 | LASER SYSTEM, EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM, AND METHOD OF CONTROLLING LASER APPARATUS - A laser system capable of appropriately controlling the energy of a laser beam pulse is provided. An exemplary laser system of the present disclosure may control an optical isolator to switch from a closed state to an open state and then to return to the closed state for each of the laser beam pulses repeatedly outputted from a master oscillator. The laser system may control the optical attenuator to set an optical transmittance of the optical attenuator for each of the laser beam pulses repeatedly outputted from the master oscillator. | 03-24-2016 |
20160076944 | LIGHT BEAM MEASUREMENT DEVICE, LASER APPARATUS, AND LIGHT BEAM SEPARATOR - A light beam measurement device includes: a polarization measurement unit including a first measurement beam splitter provided on an optical path of a laser beam and configured to measure a polarization state of the laser beam having been partially reflected by the first measurement beam splitter; a beam profile measurement unit including a second measurement beam splitter provided on the optical path of the laser beam and configured to measure a beam profile of the laser beam having been partially reflected by the second measurement beam splitter; and a laser beam-directional stability measurement unit configured to measure a stability in a traveling direction of the laser beam, while the first measurement beam splitter and the second measurement beam splitter are made of a material containing CaF | 03-17-2016 |
20160073487 | EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - An extreme ultraviolet light generation system includes a chamber; a target generation unit configured to output a target toward a plasma generation region in the chamber; a laser system configured to generate a first pre-pulse laser beam, a second pre-pulse laser beam, and a main pulse laser beam so that the target is irradiated with the first pre-pulse laser beam, the second pre-pulse laser beam, and the main pulse laser beam in this order; and a controller configured to control the laser system so that a fluence of the second pre-pulse laser beam is equal to or higher than 1 J/cm | 03-10-2016 |
20160066401 | EXTREME ULTRAVIOLET LIGHT GENERATING SYSTEM - There is provided an extreme ultraviolet light generating system. The extreme ultraviolet light generating system may include: a laser apparatus configured to provide pulsed laser light inside a chamber in which EUV light is generated; an optical shutter disposed on an optical path of the pulsed laser light; and a controller configured to open or close the optical shutter, based on a generation signal supplied from an external unit, the generation signal instructing generation of the EUV light. | 03-03-2016 |
20160044773 | TARGET GENERATION DEVICE AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - A target supply device may include a reservoir configured to hold a target material in its interior in liquid form, a vibrating element configured to apply vibrations to the reservoir, a target sensor configured to detect droplets of the target material outputted from the reservoir, a control unit configured to set parameters based on a result of the detection performed by the target sensor, a function generator configured to generate an electrical signal having a waveform based on the parameters, and a power source configured to apply a driving voltage to the vibrating element in accordance with the electrical signal. | 02-11-2016 |
20160037616 | EXTREME UV LIGHT GENERATION APPARATUS - An extreme ultraviolet light generation apparatus includes a target supplier configured to output a target into a chamber as a droplet, the target generating extreme ultraviolet light when being irradiated with a laser beam in the chamber; a droplet measurement unit configured to measure a parameter for a state of the droplet outputted into the chamber; a pressure regulator configured to regulate a pressure in the target supplier in which the target is accommodated; and a target generation controller configured to control the pressure regulator, based on the parameter measured by the droplet measurement unit. | 02-04-2016 |
20160035603 | LASER ANNEALING APPARATUS - Provided is a laser annealing apparatus that may include: a laser light source section configured to output pulsed laser light to be applied to a thin film formed on a workpiece; a pulse width varying section configured to vary a pulse width of the pulsed laser light; a melt state measuring section configured to detect that the thin film irradiated with the pulsed laser light is in a melt state; and a controlling section configured to determine, based on a result of detection by the melt state measuring section, a duration of time during which the thin film is in the melt state, and to control the pulse width varying section to allow the duration of time to be of a predetermined length. | 02-04-2016 |
20160029470 | EUV LIGHT SOURCE APPARATUS - A target supply apparatus includes a tank for storing a liquid target material, a nozzle for outputting the liquid target material in the tank, and a gas supply source for supplying gas into the tank, and controls a gas pressure inside the tank with a pressure of the gas supplied from the gas supply source which is provided with a pressure regulator. The target supply apparatus also includes a pressure-decrease gas passage of which one end is connected to the tank and the other end forms an exhaust port, a pressure-decrease valve provided on the pressure-decrease gas passage, and a controller for controlling open/close of the pressure-decrease valve. The controller, when the target material is caused not to output from the nozzle, opens the pressure-decrease valve and decreases the pressure inside the tank. | 01-28-2016 |
20150380893 | LASER DEVICE, AND METHOD OF CONTROLLING ACTUATOR - A laser device ( | 12-31-2015 |
20150371850 | METHOD OF FORMING SEMICONDUCTOR THIN FILM - Provided is a method of forming a semiconductor thin film. The method may include forming, on a substrate, a thin film that contains one of Ge, Si, and a SiGe mixture, and Sn in a content of 0.1 atomic % or more to 20 atomic % or less, and applying pulsed laser light to the thin film. | 12-24-2015 |
20150351211 | EXTREME ULTRAVIOLET LIGHT GENERATING APPARATUS, METHOD OF GENERATING EXTREME ULTRAVIOLET LIGHT, CONCENTRATED PULSED LASER LIGHT BEAM MEASURING APPARATUS, AND METHOD OF MEASURING CONCENTRATED PULSED LASER LIGHT BEAM - Provided is an extreme ultraviolet light generating apparatus that may include: a chamber containing one or more kinds of gases; a light concentration optical system provided in an optical path of pulsed laser light outputted from a laser unit, and configured to concentrate the pulsed laser light into a concentrated beam; and an image pickup section provided at a position out of the optical path of the pulsed laser light, and configured to pick up a plasma emission image that is an image of plasma emission in the chamber. The plasma emission is caused by application of the concentrated beam to the one or more kinds of gases in the chamber. | 12-03-2015 |
20150351209 | SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT - A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light. | 12-03-2015 |
20150346457 | MIRROR UNIT - A mirror unit may include a mirror, a first holding member holding the mirror, a second holding member holding the first holding member to allow the first holding member to pivot on a first pivot shaft, an actuator provided on the second holding member and configured to allow the first holding member to pivot, and a counter weight provided on the first holding member to allow a centroid of a structure to be substantially coincident with a center of a reflection surface of the mirror. The structure includes the mirror and is pivotable on the first pivot shaft. | 12-03-2015 |
20150340837 | METHOD OF CONTROLLING WAVELENGTH OF LASER BEAM AND LASER APPARATUS - There is provided a method of controlling the wavelength of a laser beam. The method includes measuring an absolute wavelength of the laser beam; calculating a difference between a reference wavelength and the absolute wavelength of the laser beam; and adjusting the reference wavelength of the laser beam based on the difference between the reference wavelength and the absolute wavelength of the laser beam, at an interval shorter than an interval for which the absolute wavelength of the laser beam is measured. | 11-26-2015 |
20150264793 | EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - An apparatus used with a laser apparatus may include a chamber, a target supply for supplying a target material to a region inside the chamber, a laser beam focusing optical system for focusing a laser beam from the laser apparatus in the region, and an optical system for controlling a beam intensity distribution of the laser beam. | 09-17-2015 |
20150249312 | LASER CHAMBER AND DISCHARGE EXCITATION GAS LASER APPARATUS - There is provided a laser chamber housing a pair of discharge electrodes and a gas circulation fun, the laser chamber including: a magnetic bearing configured to support a shaft of the gas circulation fan, with the shaft being in non-contact with the magnetic bearing; and a touchdown bearing configured to operate as a bearing when the magnetic bearing is uncontrollable, the touchdown bearing being provided with solid lubricant configured of one or more of an Au plating layer, a Ni-containing plating layer, and a Cu plating layer. | 09-03-2015 |
20150246848 | LASER PROCESSING APPARATUS AND LASER PROCESSING METHOD - Included are a laser light source ( | 09-03-2015 |
20150194781 | LASER APPARATUS - A laser apparatus according to embodiments may include a laser chamber including a laser gain medium; a power source; a first electrode to which a voltage is applied from the power source and a second electrode that is grounded, the first and second electrodes being disposed in the laser chamber; and a connector connected to the power source, and supporting the first electrode in a way that allows the first electrode to move toward a side where the second electrode is disposed. | 07-09-2015 |
20150188274 | METHOD OF CONTROLLING LASER APPARATUS AND LASER APPARATUS - A method of controlling a laser apparatus may include: exchanging a gain medium in a chamber configured to output a laser beam by exciting the gain medium; first measuring, after the exchanging, pulse energy of a laser beam which is oscillated in the chamber under a specific gas pressure and a specific charge voltage; calculating an approximate expression indicating a relationship between the pulse energy of the laser beam and the gas pressure in the chamber and the charge voltage, or a table representing a correlationship between the pulse energy, the gas pressure and the charge voltage, based on the specific pressure, the specific charge voltage and the pulse energy in the first measuring; storing the approximate expression or the table; second measuring, after the first measuring, pulse energy Er of a laser beam oscillated in the chamber; calculating pulse energy Eec which is supposed to be obtained directly after the exchanging under the gas pressure and the charge voltage in the second measuring based on the approximate expression or the table; calculating a reduction amount ΔEd of pulse energy based on the pulse energy Eec and the pulse energy Er using ΔEd=Eec−Er; and calculating a partial gas exchange amount Q for partial gas exchange in the chamber based on the reduction amount ΔEd of pulse energy. | 07-02-2015 |
20150180192 | LASER APPARATUS AND METHOD OF CONTROLLING LASER APPARATUS - A laser apparatus may comprise: a laser chamber configured to include a laser gain medium; a pair of electrodes disposed in the laser chamber; an energy detector configured to measure pulse energy of laser beams outputted by discharging between the pair of the electrodes; an optical element disposed on a light path of the laser beams; and a controller configured to calculate an integration value of absorption energy at the optical element, and determine whether the integration value exceeds a lifetime integration value of the optical element based on the pulse energy of the laser beams. | 06-25-2015 |
20150139258 | LASER APPARATUS AND METHOD OF CONTROLLING LASER APPARATUS - A laser apparatus according to embodiment may include: a laser chamber filled with a laser gain medium; a pair of electrodes disposed in the laser chamber; a charger configured to apply a charge voltage for causing a discharge to occur between the pair of the electrodes; a pulse power module configured to covert the charge voltage applied by the charger into a short pulsed voltage, and apply the short pulsed voltage between the pair of the electrodes; and a controller configured to calculate input energies Ein applied to the pair of the electrodes based on the charge voltage, calculate an integration value Einsum of the input energies Ein by integrating the calculated input energies Ein, and determine whether the integration value Einsum exceeds an integration lifetime value Einsumlife of input energy or not. | 05-21-2015 |
20150055672 | DISCHARGE-PUMPED GAS LASER DEVICE - A discharge-pumped gas laser device may include a laser chamber, a pair of discharge electrodes provided in the laser chamber, a fan with a magnetic bearing being provided in the laser chamber and configured to be capable of circulating a gas in the laser chamber, a housing configured to contain the laser chamber, and a magnetic bearing controller connected to the magnetic bearing electrically, being capable of controlling the magnetic bearing, and provided in the housing separately from the laser chamber. | 02-26-2015 |
20140369373 | TWO-STAGE LASER SYSTEM FOR ALIGNERS - The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser ( | 12-18-2014 |
20140353528 | EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND CONTROL METHOD FOR LASER APPARATUS IN EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - An extreme ultraviolet light generation apparatus may include a chamber containing a plasma generation region irradiated by a pulse laser beam from a laser apparatus, a target supply device configured to supply a plurality of targets consecutively to the plasma generation region in the chamber, a target detection unit configured to detect a target outputted from the target supply device, and a laser controller configured to control the laser apparatus; the laser controller generating a light emission trigger instructing a laser device included in the laser apparatus to emit a pulse laser beam, and outputting the generated light emission trigger to the laser apparatus, in accordance with a detection signal from the target detection unit; and the laser controller adjusting generation of the light emission trigger outputted consecutively to the laser apparatus so that a time interval of the light emission trigger is within a predetermined range. | 12-04-2014 |
20140348189 | LASER APPARATUS - A laser apparatus may include a master oscillator configured to output a laser beam, at least one amplifier provided in a beam path of the laser beam, at least one saturable absorber gas cell provided downstream from the at least one amplifier and configured to contain a saturable absorber gas for absorbing a part of the laser beam, the part having a beam intensity equal to or lower than a predetermined beam intensity, and a cooling unit for cooling the saturable absorber gas. | 11-27-2014 |
20140341239 | LASER SYSTEM AND LASER LIGHT GENERATION METHOD - A laser system may include: a master oscillator configured to output pulsed laser light; an amplification device for amplifying the pulsed laser light from the master oscillator; a first timing detector configured to detect a first timing at which the master oscillator outputs the pulsed laser light; a second timing detector configured to detect a second timing at which the amplification device discharges; and a controller configured to, based on results of detection by the first timing detector and the second timing detector, control at least one of the first timing and the second timing so that the amplification device discharges when the pulsed laser light passes through a discharge space of the amplification device. | 11-20-2014 |
20140319388 | LASER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - A laser apparatus may include a master oscillator configured to output a pulse laser beam, an amplifier disposed in a light path of the pulse laser beam, a wavelength selection element disposed in the light path of the pulse laser beam and configured to transmit light of a selection wavelength at higher transmittance than transmittance of light of other wavelengths, and a controller configured to change the selection wavelength of the wavelength selection element. | 10-30-2014 |
20140286366 | OPTICAL DEVICE, AND LASER CHAMBER AND GAS LASER APPARATUS USING THE SAME - An optical device includes a plate-like optical element made of a calcium fluoride crystal, a holding member to sandwich and hold the optical element, a seal member provided between the holding member and one surface of the optical element in close contact therewith, and a cushioning member provided between the holding member and the other surface of the optical element in contact therewith. The cushioning member is made of one of a 304 stainless steel, a 303 stainless steel, a 316 stainless steel, a Hastelloy™ alloy, a carbon steel for machine construction S45C, and Inconel™. | 09-25-2014 |
20140284502 | TARGET GENERATION DEVICE AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - A target supply device may include a reservoir configured to hold a target material in its interior in liquid form, a vibrating element configured to apply vibrations to the reservoir, a target sensor configured to detect droplets of the target material outputted from the reservoir, a control unit configured to set parameters based on a result of the detection performed by the target sensor, a function generator configured to generate an electrical signal having a waveform based on the parameters, and a power source configured to apply a driving voltage to the vibrating element in accordance with the electrical signal. | 09-25-2014 |
20140253716 | CHAMBER FOR EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - A chamber for an extreme ultraviolet light generation apparatus is a chamber into which droplets are sequentially outputted, and may include an image capturing unit configured to repeatedly capture images of the droplets during an image capturing time set so that images of two adjacent droplets that have been outputted do not overlap. | 09-11-2014 |
20140246187 | DEVICE FOR CONTROLLING TEMPERATURE OF COOLING WATER - A cooling water temperature controlling device includes a heat exchanger for heat-exchanging between primary cooling water and secondary cooling water, a tank for storing the secondary cooling water, an injection pipe connecting the tank and a secondary cooling water supply unit, a valve for controlling a flow rate of the secondary cooling water from the secondary cooling water supply unit to the tank, a fluid level detection unit for detecting a level of the secondary cooling water in the tank, a first circulation pipe connecting the tank and the heat exchanger, a second circulation pipe connecting the heat exchanger and a temperature-control target, a third circulation pipe connecting the tank and the temperature-control target, a pump for circulating the secondary cooling water through the first to third circulation pipes, and a controller for controlling the valve and the pump based on the detected fluid level. | 09-04-2014 |
20140239203 | TARGET SUPPLY DEVICE AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - A target supply device | 08-28-2014 |
20140217311 | CHAMBER AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - A chamber used in an extreme ultraviolet light generation apparatus that generates extreme ultraviolet light by irradiating a target material with a laser beam may include a chamber receptacle, a heat shield that is disposed within the chamber receptacle between a predetermined region where the target material turns into plasma and the chamber receptacle and that is configured to absorb heat produced at the predetermined region when the target material turns into plasma, and a support portion configured to attach the heat shield to the chamber receptacle, and further, the support portion may include an absorbing portion configured to absorb stress produced in the heat shield deforming due to the heat, by expanding/contracting in response to the thermal deformation of the heat shield. | 08-07-2014 |
20140217310 | TARGET SUPPLY DEVICE - A target supply device according to an aspect of the present disclosure may include a target generator having a holding space and a first through-hole that communicates with the holding space, a porous filter having a thermal expansion coefficient that is substantially the same as a thermal expansion coefficient of the target generator, and a holder portion having a thermal expansion coefficient that is substantially the same as the thermal expansion coefficient of the target generator, that is configured to hold the porous filter and that is provided so as to form a seal against an inner surface of the target generator. | 08-07-2014 |
20140216576 | GAS LOCK DEVICE AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - A gas lock device may include a chamber having a passage section and a connection hole that connects a surface to the passage section, an optical element that is attached to the chamber and seals the passage section, a gas supply apparatus, and a pipe that is attached at one end to the gas supply apparatus and attached at the other end to the chamber, and may define a flow channel communicating with the connection hole. | 08-07-2014 |
20140209819 | TARGET SUPPLY DEVICE AND EUV LIGHT GENERATION CHAMBER - A target supply device may include a tank including a nozzle, a first electrode disposed within the tank, a first potential setting unit configured to set a potential at the first electrode to a first potential, a second electrode provided with a first through-hole and disposed so that a center axis of the nozzle is positioned within the first through-hole, a second potential setting unit configured to set a potential at the second electrode to a second potential that is different from the first potential, and a charge neutralization unit configured to neutralize a charge of the target material that passes through a first region located between the second electrode and the plasma generation region. | 07-31-2014 |
20140203194 | SYSTEM AND METHOD FOR GENERATING EXTREME ULTRA VIOLET LIGHT - A system for generating extreme ultraviolet light, in which a target material inside a chamber is irradiated with a laser beam to be turned into plasma, includes a first laser apparatus configured to output a first laser beam, a second laser apparatus configured to output a pedestal and a second laser beam, and a controller connected to the first and second laser apparatuses and configured to cause the first laser beam to be outputted first, the pedestal to be outputted after the first laser beam, and the second laser beam having higher energy than the pedestal to be outputted after the pedestal. | 07-24-2014 |
20140191108 | ALIGNMENT SYSTEM AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - An alignment system for a laser apparatus includes a guide laser device outputting a guide laser beam, an adjusting mechanism adjusting travel directions of the guide laser beam and a laser beam from the laser apparatus, a beam path combiner controlling travel directions of the laser beam and the guide laser beam to substantially coincide with each other, a first optical detection unit provided from the beam path combiner detecting the laser and guide laser beams, a first controller controlling the adjusting mechanism based on a first optical detection unit detection result, a beam steering unit downstream from the beam path combiner controlling travel directions of the laser and guide laser beams, a second optical detection unit downstream from the beam steering unit detecting the guide laser beam, and a second controller controlling the beam steering unit based on a second optical detection unit detection result. | 07-10-2014 |
20140183379 | SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT - A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light. | 07-03-2014 |
20140166046 | METHOD AND APPARATUS FOR CLEANING COLLECTOR MIRROR IN EUV LIGHT GENERATOR - A method for cleaning collector mirrors in an EUV light generator in which a target is made into a plasma state and EUV light generated is collected by a collector mirror, the method being adopted to the EUV light generator for cleaning contaminants adhering thereto, the method comprising: preparing at least two collector mirrors; locating one of the mirrors at an EUV light condensing position while locating the other mirror at a cleaning position; determining whether the mirror at the cleaning position is cleaned while determining whether the mirror at the light condensing position requires cleaning; and once determined that the mirror at the cleaning position is cleaned and the mirror at the light condensing position requires cleaning, conveying the mirror at the light condensing position and requiring cleaning to the cleaning position while conveying the mirror at the cleaning position and having been cleaned to the light condensing position. | 06-19-2014 |
20140138561 | TARGET SUPPLY DEVICE - A target supply device may include a tank having a nozzle, a first electrode provided with a first through-hole, a second electrode provided with a second through-hole, a third electrode disposed within the tank, an anchoring portion configured to anchor the first electrode and the second electrode to the tank so that insulation among the nozzle, the first electrode, and the second electrode is maintained, and so that a center axis of the nozzle is positioned within the first through-hole and the second through-hole, a first projecting portion that is an integrated part of at least one of the first electrode and the second electrode and that is configured to project toward the nozzle, and a second projecting portion that is an integrated part of at least the second electrode and that is configured to project so as to be positioned between the first electrode and the second electrode. | 05-22-2014 |
20140138560 | TARGET SUPPLY DEVICE - A target supply device may include a tank including a nozzle, a first electrode provided with a first through-hole and disposed so that a center axis of the nozzle is positioned within the first through-hole, a second electrode that includes a main body portion provided with a second through-hole and a collection portion formed in a cylindrical shape extending in a direction from a circumferential edge of the second through-hole toward the nozzle and that is disposed so that the center axis of the nozzle is positioned within the second through-hole, a third electrode disposed within the tank, and a heating unit configured to heat the second electrode. | 05-22-2014 |
20140131587 | EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An extreme ultraviolet light source apparatus for supplying extreme ultraviolet light to a processing unit for performing processing by using the extreme ultraviolet light. The extreme ultraviolet light source apparatus includes: a chamber in which the extreme ultraviolet light to be supplied to the processing unit is generated; a collector mirror for collecting the extreme ultraviolet light generated in the chamber to output the extreme ultraviolet light to the processing unit; and an optical path connection module for defining a route of the extreme ultraviolet light between the chamber and the processing unit and isolating the route of the extreme ultraviolet light from outside. | 05-15-2014 |
20140124685 | SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT, AND LASER APPARATUS - An extreme ultraviolet light generation system used with a laser apparatus may be provided, and the extreme ultraviolet light generation system may include: a chamber including at least one window for at least one laser beam and a target supply unit for supplying a target material into the chamber; and at least one polarization control unit, provided on a laser beam path, for controlling a polarization state of the at least one laser beam. | 05-08-2014 |
20140111635 | EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - In an extreme ultraviolet light generation apparatus, a target detection section may include a light source, a transfer optical system, an image sensor configured to output image data of an image that has been formed by irradiating a target outputted from a target supply device with light outputted from the light source on a light-receiving unit of the image sensor by the transfer optical system, and a processing unit, connected to the image sensor, configured to receive the image data, obtain a first optical intensity distribution along a first line that intersects with a trajectory of the target and a second optical intensity distribution along a second line that intersects with the trajectory, calculate a center of gravity position in the first optical intensity distribution and a center of gravity position in the second optical intensity distribution, and calculate an actual path of the target based on the calculated positions. | 04-24-2014 |
20140105238 | DISCHARGE-PUMPED GAS LASER DEVICE - A discharge-pumped gas laser device may include a laser chamber, a pair of discharge electrodes provided in the laser chamber, a fan with a magnetic bearing being provided in the laser chamber and configured to be capable of circulating a gas in the laser chamber, a housing configured to contain the laser chamber, and a magnetic bearing controller connected to the magnetic bearing electrically, being capable of controlling the magnetic bearing, and provided in the housing separately from the laser chamber. | 04-17-2014 |
20140098830 | EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - An extreme ultraviolet light generation system may include an optical device configured to cause an optical path of a pulse laser beam to approximately match one of a first optical path in which the pulse laser beam is focused at a plasma generation region and a second optical path in which the pulse laser beam passes outside the plasma generation region, and a control unit configured to output a control signal to the optical device so that the optical device sets the optical path of the pulse laser beam to the second optical path from when a predetermined time starts to when the number of pulses contained in a timing signal reaches a predetermined value and sets the optical path of the pulse laser beam to the first optical path from when the number of pulses reaches the predetermined value to when the predetermined time ends. | 04-10-2014 |
20140084183 | EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - An apparatus used with a laser apparatus may include a chamber, a target supply for supplying a target material to a region inside the chamber, a laser beam focusing optical system for focusing a laser beam from the laser apparatus in the region, and an optical system for controlling a beam intensity distribution of the laser beam. | 03-27-2014 |
20140077099 | SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT - A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light. | 03-20-2014 |
20140070021 | CONTROL METHOD FOR TARGET SUPPLY DEVICE, AND TARGET SUPPLY DEVICE - A control method for a target supply device may employ a target supply device, provided in an EUV light generation apparatus including an image sensor, that includes a target generator having a nozzle and configured to hold a target material and a pressure control unit configured to control a pressure within the target generator, and the method may include outputting the target material in the target generator from a nozzle hole in the nozzle by pressurizing the interior of the target generator using the pressure control unit, determining whether or not a difference between an output direction of the target material outputted from the nozzle hole that is detected by the image sensor and a set direction is within a predetermined range, and holding the pressure in the target generator using the pressure control unit until the difference falls within the predetermined range. | 03-13-2014 |
20140061512 | TARGET SUPPLY DEVICE AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - A target supply device may include a receptacle for holding a liquid target material, a first electrode disposed within the receptacle, a nozzle portion provided in the receptacle, a second electrode provided with a first path and disposed facing the nozzle portion, a third electrode provided with a second path that, along with the first path, defines a trajectory of the liquid target material released from the nozzle portion, a first power source that applies a first potential that is higher than a common potential to the first electrode, a second power source that applies a second potential that is lower than the common potential to the third electrode, and a third power source that applies a third potential that is no greater than the first potential and is no less than the second potential to the second electrode. | 03-06-2014 |
20140050239 | POLARIZATION PURITY CONTROL DEVICE AND GAS LASER APPARATUS PROVIDED WITH THE SAME - A degree of polarization control device includes:
| 02-20-2014 |
20140042653 | CONTROL METHOD FOR TARGET SUPPLY DEVICE, AND TARGET SUPPLY DEVICE - A control method for a target supply device includes melting a target material by heating the target material within a target generator using a heating unit, pushing out the target material from a nozzle hole in a nozzle by pressurizing the interior of the target generator using a pressure control unit, determining whether or not the size of an adhering area of the target material that forms when the target material is pushed out from the nozzle hole and adheres to a leading end of the nozzle has reached a set size that covers the entire nozzle hole, stopping the pressurization of the interior of the target generator by the pressure control unit when the size of the adhering area has reached the set size, and hardening the target material in the target generator and the adhering area by stopping the heating of the target material by the heating unit. | 02-13-2014 |
20140034852 | EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - An extreme ultraviolet light generation apparatus may include: a laser apparatus; a chamber provided with an inlet for introducing a laser beam outputted from the laser apparatus to the inside thereof; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a collector mirror disposed in the chamber for collecting extreme ultraviolet light generated when the target material is irradiated with the laser beam in the chamber; an extreme ultraviolet light detection unit for detecting energy of the extreme ultraviolet light; and an energy control unit for controlling energy of the extreme ultraviolet light. | 02-06-2014 |
20140034759 | TARGET SUPPLY DEVICE AND TARGET SUPPLY METHOD - A target supply method uses a target supply device that includes a target generation unit having a nozzle, a pressure control unit having a pressure sensor and an actuator, an electrode, a potential application unit, and a timer; further, the method include raising the pressure inside the target generation unit to a setting pressure by the actuator, applying different potentials to the electrode and a target material from each other by the potential application unit in the case where it is detected that the pressure inside the target generation unit is halfway raised to the setting pressure, and applying a constant first potential to the target material and a first pulse voltage to the electrode by the potential application unit to extract the target material with electrostatic force in the case where it is detected that the pressure inside the target generation unit has been raised to the setting pressure. | 02-06-2014 |
20140034684 | TARGET SUPPLY APPARATUS, CONTROL SYSTEM, CONTROL APPARATUS AND CONTROL CIRCUIT THEREOF - A target supply apparatus includes a tank for storing a liquid target material, a nozzle for outputting the liquid target material in the tank, and a gas supply source for supplying gas into the tank, and controls a gas pressure inside the tank with a pressure of the gas supplied from the gas supply source which is provided with a pressure regulator. The target supply apparatus also includes a pressure-decrease gas passage of which one end is connected to the tank and the other end forms an exhaust port, a pressure-decrease valve provided on the pressure-decrease gas passage, and a controller for controlling open/close of the pressure-decrease valve. The controller, when the target material is caused not to output from the nozzle, opens the pressure-decrease valve and decreases the pressure inside the tank. | 02-06-2014 |
20140021376 | EXTREME ULTRA VIOLET LIGHT SOURCE DEVICE - An extreme ultra violet light source device of a laser produced plasma type, in which charged particles such as ions emitted from plasma can be efficiently ejected. The extreme ultra violet light source device includes: a target nozzle that supplies a target material; a laser oscillator that applies a laser beam to the target material supplied from the target nozzle to generate plasma; collector optics that collects extreme ultra violet light radiated from the plasma; and a magnetic field forming unit that forms an asymmetric magnetic field in a position where the laser beam is applied to the target material. | 01-23-2014 |
20140001369 | CHAMBER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM | 01-02-2014 |
20130322483 | GAS DISCHARGE CHAMBER - A gas discharge chamber that uses a calcium fluoride crystal which reduces a breakage due to mechanical stress (window holder and laser gas pressure), thermal stress from light absorption, and the like, increases the degree of linear polarization of output laser, and suppresses degradation due to strong ultraviolet (ArF, in particular) laser light irradiation. A first window ( | 12-05-2013 |
20130320232 | EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION METHOD - An extreme ultraviolet light generation apparatus may include a droplet production device configured to produce a droplet of a target substance in a predetermined traveling direction, a first laser device configured to generate a first laser beam and irradiate the droplet with the first laser beam to diffuse the droplet, a second laser device configured to generate a second laser beam and irradiate the target substance diffused by irradiation of the first laser beam with the second laser beam to produce plasma of the diffused target substance and generate extreme ultraviolet light from the plasma of the target substance, and a beam shaping unit configured to elongate a beam spot of the first laser beam in the traveling direction of the droplet produced by the droplet production device. | 12-05-2013 |
20130315272 | REGENERATIVE AMPLIFIER, LASER APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - A regenerative amplifier according to one aspect of this disclosure is used in combination with a laser device, and the regenerative amplifier may include: a pair of resonator mirrors constituting an optical resonator; a slab amplifier provided between the pair of the resonator mirrors for amplifying a laser beam with a predetermined wavelength outputted from the laser device; and an optical system disposed to configure a multipass optical path along which the laser beam is reciprocated inside the slab amplifier, the optical system transferring an optical image of the laser beam at a first position as an optical image of the laser beam at a second position. | 11-28-2013 |
20130315270 | LASER APPARATUS - A laser apparatus may include an optical resonator, a laser chamber, an optical loss adjustment mechanism, and a spectral line width adjustment mechanism. The optical resonator includes a mirror configured to reflect a part of light and a grating. The laser chamber is provided in the optical resonator and contains a laser gain medium, configured to emit a laser beam. The optical loss adjustment mechanism is provided in the optical resonator and configured to adjust an optical loss of the laser beam. The spectral line width adjustment mechanism is provided in the optical resonator and configured to adjust a spectral line width of the laser beam. | 11-28-2013 |
20130279526 | LASER APPARATUS - A laser apparatus may include a first laser light source configured to emit light with a first wavelength, a second laser light source including a titanium-sapphire laser device and a plurality of wavelength conversion elements and being configured to emit light with a second wavelength being one-fourth of a wavelength of light emitted from the titanium-sapphire laser device, and a wavelength conversion element configured in such a manner that the light with the first wavelength and the light with the second wavelength are incident thereon to emit light with a wavelength of about 193 nm corresponding to a sub frequency of the light with the first wavelength and the light with the second wavelength. | 10-24-2013 |
20130256568 | EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS AND METHOD OF GENERATING ULTRAVIOLET LIGHT - An extreme ultraviolet light source apparatus, which is to generate an extreme ultraviolet light by irradiating a target with a main pulse laser light after irradiating the target with a prepulse laser light, the extreme ultraviolet light source apparatus comprises: a prepulse laser light source generating a pre-plasma by irradiating the target with the prepulse laser light while a part of the target remains, the pre-plasma being generated at a different region from a target region, the different region being located on an incident side of the prepulse laser light; and a main pulse laser light source generating the extreme ultraviolet light by irradiating the pre-plasma with the main pulse laser light. | 10-03-2013 |
20130256567 | EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An extreme ultraviolet light source apparatus in which a target material is irradiated with a laser beam and turned into plasma and extreme ultraviolet light is emitted from the plasma may include: a chamber in which the extreme ultraviolet light is generated; an electromagnetic field generation unit for generating at least one of an electric field and a magnetic field inside the chamber; and a cleaning unit for charging and separating debris adhered to an optical element inside the chamber. | 10-03-2013 |
20130250402 | LASER BEAM AMPLIFIER AND LASER APPARATUS USING THE SAME - A laser beam amplifier with high optical axis stability is provided. The laser beam amplifier includes: a container for accommodating a laser medium; a pair of electrodes for performing discharge in the laser medium to form an amplification region for a laser beam in the laser medium; and an optical system for forming an optical path between a first point, upon which the laser beam is incident, and a second point, from which the laser beam is outputted, such that the amplification region is located in the optical path between the first point and the second point, wherein the first point and the second point are conjugate to each other, and the laser beam incident upon the first point is amplified while passing through the amplification region at least twice and then transferred to the second point. | 09-26-2013 |
20130240762 | EXTREME ULTRA VIOLET LIGHT SOURCE APPARATUS - An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser. | 09-19-2013 |
20130240645 | TARGET SUPPLY DEVICE - A target supply device may include a tank formed cylindrically with a first material, a cylindrical portion for covering the tank, the cylindrical portion being formed of a second material having higher tensile strength than the first material, a first lid formed of the second material and having a through-hole, the first lid being provided at one end in an axial direction of the cylindrical portion, a second lid formed of the second material and provided at another end opposite the one end in the axial direction of the cylindrical portion, and a nozzle provided to be in fluid communication with the interior of the tank and to pass through the through-hole, the nozzle being formed of the first material. | 09-19-2013 |
20130235893 | TRANSMISSIVE OPTICAL DEVICE, LASER CHAMBER, AMPLIFIER STAGE LASER DEVICE, OSCILLATION STAGE LASER DEVICE AND LASER APPARATUS - A transmissive optical device includes a crystal part including a c-axis in a crystal structure. The crystal part is configured to include a surface to receive a laser beam. The c-axis is arranged to be inclined relative to an incident direction of the laser beam in a plane of incidence of the laser beam. | 09-12-2013 |
20130230064 | MASTER OSCILLATOR SYSTEM AND LASER APPARATUS - A master oscillator system may include a grating configured to function as one resonator mirror in an optical resonator, a spectral bandwidth tuning unit configured to tune the spectral bandwidth of a laser beam transmitted within the optical resonator, a storage unit configured to store a control value of the spectral bandwidth tuning unit corresponding to a desired spectral bandwidth and a controller configured to control the spectral bandwidth tuning unit based on the control value stored in the storage unit. | 09-05-2013 |
20130228709 | TARGET SUPPLY DEVICE - A target supply device includes a reservoir for storing a liquid target material, a first electrode electrically connected to the liquid target material stored in the reservoir, a nozzle having a through-hole through which the liquid target material stored in the reservoir is discharged, a first power supply for applying a first potential to the first electrode, a circuit electrically connected to the first electrode and configured to suppress a potential variation of the first electrode, a second electrode provided to face the through-hole in the nozzle, and a second power supply for applying a second potential that is different from the first potential to the second electrode. | 09-05-2013 |
20130228695 | DEVICE FOR COLLECTING EXTREME ULTRAVIOLET LIGHT - A device for collecting EUV light from a plasma generation region includes first and second EUV collector mirrors. The first EUV collector mirror has a first spheroidal reflective surface and arranged such that a first focus of the first spheroidal reflective surface lies in the plasma generation region and a second focus of the first spheroidal reflective surface lies in a predetermined intermediate focus region. The second EUV collector mirror has a second spheroidal reflective surface and arranged such that a third focus of the second spheroidal reflective surface lies in the plasma generation region and a fourth focus of the second spheroidal reflective surface lies in the predetermined intermediate focus region. | 09-05-2013 |
20130221587 | TARGET MATERIAL REFINEMENT DEVICE AND TARGET SUPPLY APPARATUS - A target material refinement device may include a refinement tank to accommodate a target material, a heating section to heat the interior of the refinement tank, and an oxygen-atom removing section to remove oxygen atoms present in the target material. | 08-29-2013 |
20130221247 | COLLECTOR MIRROR EXCHANGING APPARATUS AND METHOD FOR EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - A collector mirror exchanging apparatus capable of safely and easily exchanging a collector mirror for collecting extreme ultra violet light emitted from plasma generated within a chamber of an extreme ultra violet light source apparatus. The collector mirror exchanging apparatus includes: a supporting base for supporting a collector mirror or a collector mirror structure; and a guiding rail disposed on the supporting base and regulating a moving direction of the collector mirror or the collector mirror structure; wherein at least the collector mirror is taken out of the chamber by moving the collector mirror or the collector mirror structure along the guiding rail on the supporting base. | 08-29-2013 |
20130221246 | TARGET SUPPLY DEVICE, EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS, AND METHOD FOR SUPPLYING TARGET - A target supply device is provided that may include a pair of rails arranged to face each other, the rails having electrically conductive properties, a target transport mechanism configured to supply a target material into a space between the rails and in contact with the rails, and a power supply connected to the rails and configured to supply a current to the target material through the rails. Methods and systems using the target supply device are also provided. | 08-29-2013 |
20130215916 | LASER APPARATUS - A laser apparatus includes a master oscillator capable of outputting a laser beam having a spectrum that includes at least three wavelength peaks, a multi-wavelength oscillation control mechanism capable of controlling energy of each of the wavelength peaks, a spectrum detecting unit that detects the spectrum of the above-mentioned laser beam, and a controller that controls the multi-wavelength oscillation control mechanism based on a detection result detected by the spectrum detecting unit. | 08-22-2013 |
20130209077 | TARGET SUPPLY APPARATUS AND TARGET SUPPLY METHOD - A target supply apparatus used in an extreme ultraviolet light apparatus that generates extreme ultraviolet light by irradiating a target with a laser beam may include a tank, a nozzle that includes a through-hole and is disposed so that the through-hole communicates with the interior of the tank, a first heater disposed along a wall of the tank, a second heater disposed along a wall of the tank in a position that is further from the nozzle than the first heater, and a control unit configured to control the first heater and the second heater so that a temperature of the first heater is greater than a temperature of the second heater. | 08-15-2013 |
20130208744 | EXCIMER LASER AND LASER DEVICE - An excimer laser may include a frame, a base plate on which the frame is disposed, an excimer laser configured to oscillate and output laser light by discharge-pumping within a chamber containing a laser gas, an optical element that is mounted upon the frame and that is disposed in the optical path of the outputted laser light and a heat removal mechanism connected to both the frame and the base plate. | 08-15-2013 |
20130208742 | OPTICAL DEVICE, LASER APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - An optical device may include: an optical module disposed in a beam delivery path of a laser beam; a beam adjusting unit disposed in the beam delivery path for adjusting the beam delivery path of the laser beam; a measuring unit disposed in the beam delivery path for detecting the beam delivery path; and a control unit for controlling the beam adjusting unit based on a detection result of the beam delivery path of the laser beam detected by the measuring unit. | 08-15-2013 |
20130206863 | TARGET SUPPLY DEVICE - A target supply device includes a target supply device body including a nozzle having a through-hole through which a target material is discharged, a piezoelectric member having first and second surfaces and connected to the target supply device body at the first surface, the piezoelectric member being configured such that a distance between the first and second surfaces changes in according with an externally supplied electric signal, an elastic member having first and second ends and connected to the second surface of the piezoelectric member at the first end, the elastic member being configured such that a distance between the first and second ends extends or contract in accordance with an externally applied force, and a regulating member configured to regulate a distance between the second end of the elastic member and the target supply device body. | 08-15-2013 |
20130202003 | WAVELENGTH CONVERTER, WAVELENGTH CONVERTING DEVICE, SOLID STATE LASER DEVICE, AND LASER SYSTEM - A wavelength converter may include a non-linear optical crystal, and an optical member bonded to a region of a contact surface of the non-linear optical crystal, located a predetermined distance or more on an inner side from an outer periphery of the contact surface. The wavelength converter may receive laser light and stably output light having a wavelength different from that of the laser light. | 08-08-2013 |
20130187065 | EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE AND CONTROL METHOD FOR EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE - A guide laser beam that has an optical axis and a beam diameter substantially equivalent to those of a driver pulsed laser beam is introduced into an amplification system that amplifies a laser beam that is output from a driver laser oscillator. The guide laser beam is output from a laser device as a continuous light, and is introduced into a light path of the driver pulsed laser beam via a guide laser beam introduction mirror. A sensor detects an angle (a direction) of a laser beam and a variation of a curvature of a wave front. A wave front correction controller outputs a signal to a wave front correction part based on a measured result of a sensor. The wave front correction part corrects a wave front of a laser beam to be a predetermined wave front according to an instruction from the wave front correction controller. | 07-25-2013 |
20130186976 | TARGET GENERATION DEVICE - A device for determining a target generation condition for a target generator which is driven by a pulse voltage to generate a droplet of a target material may include a detector configured to detect a target generated by the target generator and output a detection signal of the target, and a controller configured to control a pulse duration of the pulse voltage for driving the target generator. The controller can determine whether or not a target is generated by the target generator based on the detection signal, and determine whether or not the generated target includes a plurality of droplets based on the detection signal. | 07-25-2013 |
20130186567 | TARGET SUPPLY DEVICE - A target supply device includes a nozzle portion, a cover, a first electrode, and a potential controller. The nozzle portion has a through-hole defined therein to allow a target material to be discharged therethrough. The cover includes an electrically conductive material and is disposed to cover the nozzle portion. The cover has a through-hole defined therein to allow the target material to pass therethrough. The first electrode is disposed on the cover. The first electrode has a through-hole to allow the target material to pass therethrough. The potential controller is configured to control the first electrode to have a first potential that is lower than a second potential of the cover. | 07-25-2013 |
20130170508 | WAVELENGTH DETECTOR AND WAVELENGTH CALIBRATION SYSTEM - the wavelength detector includes a diffusion element that diffuses the laser beam; a light collection optical system provided downstream from the diffusion element; a member, including an aperture, provided downstream from the light collection optical system; a discharge tube that is provided downstream from the member and that includes a cylindrical anode and a cylindrical cathode that each have a through-hole formed therein, and that is configured so that an electrical property between the anode and the cathode changes due to an opto-galvanic effect when a laser beam having a predetermined wavelength passes through the through-hole of the cathode in a state in which a DC voltage is applied to the anode; and a high-voltage DC power source. The discharge tube is disposed so that the laser beam that passes through the aperture passes through the through-hole of the cathode of the discharge tube without directly irradiating the cathode. | 07-04-2013 |
20130163073 | SOLID-STATE LASER AMPLIFIER, LASER LIGHT AMPLIFIER, SOLID-STATE LASER DEVICE, AND LASER DEVICE - A solid-state laser amplifier may include a first amplifying module including a first optical system having two focusing optical systems disposed so that the focal points of the two focusing optical systems essentially match at a first position, and a first solid-state laser element, disposed so that a surface into which laser light enters is tilted at essentially a Brewster's angle relative to an optical path of the laser light and a second amplifying module including a second optical system having two focusing optical systems disposed so that the focal points of the two focusing optical systems essentially match at a second position, and a second solid-state laser element, disposed so that a surface into which laser light that has passed through the first amplifying module enters is tilted at essentially a Brewster's angle relative to an optical path of the laser light. | 06-27-2013 |
20130161540 | EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - An apparatus for generating extreme ultraviolet light (EUV) includes a chamber, a target supply unit, a collector mirror, an exhaust device, a gas supply device and an ultraviolet light source. The target supply unit supplies a target material to a predetermined region inside the chamber. The collector mirror collects EUV light generated from the target material. The exhaust device is connected to the chamber. The gas supply device is connected to the chamber to supply an etchant gas into the chamber. The ultraviolet light source irradiates a reflective surface of the collector mirror with ultraviolet light. | 06-27-2013 |
20130153794 | EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - An apparatus uses first and second laser beams from a laser apparatus to generate extreme ultraviolet light. The apparatus may include a chamber provided with at least one inlet through which at least one of first and second laser beams outputted from the laser apparatus travels into the chamber. A beam shaping unit is provided on a beam path of the first laser beam for transforming the first laser beam into a hollow laser beam. A first focusing optical element is provided downstream of the beam shaping unit for focusing the hollow laser beam in a first location inside the chamber. | 06-20-2013 |
20130148677 | EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE, LASER LIGHT SOURCE DEVICE FOR EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE, AND METHOD OF ADJUSTING LASER LIGHT SOURCE DEVICE FOR EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE - An EUV light source device properly compensates the wave front of laser beam which is changed by heat. A wave front compensator and a sensor are provided in an amplification system which amplifies laser beam. The sensor detects and outputs changes in the angle (direction) of laser beam and the curvature of the wave front thereof. A wave front compensation controller outputs a signal to the wave front compensator based on the measurement results from the sensor. The wave front compensator corrects the wave front of the laser beam to a predetermined wave front according to an instruction from the wave front compensation controller. | 06-13-2013 |
20130148674 | LASER APPARATUS, EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM, METHOD FOR CONTROLLING THE LASER APPARATUS, AND METHOD FOR GENERATING THE EXTREME ULTRAVIOLET LIGHT - A laser apparatus may include: a master oscillator configured to output a pulsed laser beam at a repetition rate, the master oscillator including at least one semiconductor laser apparatus; at least one amplifier configured to amplify the pulsed laser beam from the master oscillator, the at least one amplifier being configured to include at least one gain bandwidth; and a controller for controlling a parameter affecting an output wavelength of the pulsed laser beam from the master oscillator such that a wavelength chirping range of the pulsed laser beam from the master oscillator overlaps at least a part of the at least one gain bandwidth. | 06-13-2013 |
20130146682 | TARGET SUPPLY DEVICE - A target supply device may include a reservoir configured to store a target material, the reservoir having a first channel through which the target material passes, a nozzle plate having a second channel through which the target material passes after passing through the first channel, and a filter having a first surface and a second surface and provided between the reservoir and the nozzle plate such that the first surface and the reservoir are face-sealed and the second surface and the nozzle plate are face-sealed, the filter having a plurality of through-holes through which the target material passes. | 06-13-2013 |
20130135601 | TWO-BEAM INTERFERENCE APPARATUS AND TWO-BEAM INTERFERENCE EXPOSURE SYSTEM - A two-beam interference apparatus may include a wafer stage on which a wafer may be set, a beam splitter to split first laser light into second and third laser light having a beam intensity distribution elongated in a first direction within a surface of the wafer, and an optical system to guide the second and third laser light onto the wafer. The wafer is irradiated with the second laser light from a second direction perpendicular to the first direction, and the third laser light from a third direction perpendicular to the first direction but different from the second direction, to thereby cause interference of the second and third laser light on the wafer. This apparatus increases the accuracy of the two-beam interference exposure. | 05-30-2013 |
20130134330 | HOLDER DEVICE, CHAMBER APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - A holder device for holding an optical element includes a holder having first and second members to sandwich the optical element therebetween, and a sealing member for creating a seal between the second member and the optical element. | 05-30-2013 |
20130126762 | EXTREME ULTRA VIOLET LIGHT SOURCE APPARATUS - An extreme ultra violet light source apparatus in which debris moving within a chamber are prevented from reducing reflectance or transmittance of optical elements of an EUV collector mirror, etc, and extreme ultra violet light can stably be generated in a long period. The apparatus includes: a target supply unit for supplying a target to a predetermined position within a chamber; a driver laser for applying a laser beam to the target to generate first plasma; a collector mirror provided within the chamber, for collecting extreme ultra violet light radiated from the first plasma; a gas supply unit for supplying a gas into the chamber; an excitation unit for exciting the gas to generate second plasma around a region where the first plasma is generated; and an exhaust unit for exhausting the chamber and ejecting debris emitted from the first plasma to outside of the chamber. | 05-23-2013 |
20130126761 | CHAMBER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - A chamber apparatus, which may be used with an external apparatus having an obscuration region, may include: a chamber in which EUV light is generated; a collector mirror having a first through-hole formed in a region aside from the center thereof and configured to collect the EUV light generated inside the chamber, the collector mirror being positioned such that the first through-hole is located in a region substantially corresponding to the obscuration region; and an etching gas supply unit provided in the first through-hole and configured to supply an etching gas into the chamber. | 05-23-2013 |
20130126751 | OPTICAL DEVICE, LASER APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - An optical device may include: a first beam shaping unit configured to transform a first laser beam incident thereon into a second laser beam having an annular cross section; and a first focusing optical element for focusing the second laser beam in a first predetermined location so as to generate a Bessel beam. | 05-23-2013 |
20130119232 | SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT - A system for generating extreme ultraviolet light may include a chamber, a target supply device configured to supply a target material into the chamber, a laser apparatus configured to output a laser beam to irradiate the target material, a wavefront adjuster configured to adjust a wavefront of the laser beam, an imaging optical system configured to focus the laser beam reflected by the target material, an image detector configured to capture an image of the laser beam focused by the imaging optical system, and a controller configured to control the wavefront adjuster based on the captured image. | 05-16-2013 |
20130114215 | LASER APPARATUS - A laser apparatus may include: a first module including an oscillator configured to output a laser beam and an oscillator support portion for supporting the oscillator; a second module including a beam delivery unit for delivering the laser beam and a beam delivery unit support portion for supporting the beam delivery unit; a third module including an amplifier for amplifying the laser beam and an amplifier support portion for supporting the amplifier; and a frame on which the modules are placed, the frame including mounts on which the oscillator support portion, the beam delivery support portion and the amplifier support portion are placed. | 05-09-2013 |
20130107899 | LASER APPARATUS | 05-02-2013 |
20130105713 | EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS | 05-02-2013 |
20130105712 | APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT | 05-02-2013 |
20130100980 | EXCIMER LASER APPARATUS AND EXCIMER LASER SYSTEM - An excimer laser apparatus includes a gas supply unit, connected to a first receptacle that holds a first laser gas containing halogen gas and a second receptacle that holds a second laser gas having a lower halogen gas concentration than the first laser gas, that supplies the first laser gas and the second laser gas to the interior of the laser chamber. Gas pressure control in which the gas supply unit supplies the second laser gas to the interior of the laser chamber or a gas exhaust unit partially exhausts gas from within the laser chamber, and partial gas replacement control in which the gas supply unit supplies the first laser gas and the second laser gas to the interior of the laser chamber and the gas exhaust unit partially exhausts gas from within the laser chamber sequentially, may be selectively performed. | 04-25-2013 |
20130099140 | LASER APPARATUS, EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM, AND METHOD FOR GENERATING LASER BEAM - A laser apparatus may include a seed laser device configured to output a pulse laser beam, a pulse energy adjusting unit configured to vary pulse energy of the pulse laser beam, at least one amplifier for amplifying the pulse laser beam, at least one power source for varying an excitation intensity in the at least one amplifier, and a controller configured to control the pulse energy adjusting unit on a pulse-to-pulse basis for the pulse laser beam passing therethrough and to control the at least one power source for a group of multiple pulses of the pulse laser beam. | 04-25-2013 |
20130094529 | LASER APPARATUS, METHOD FOR GENERATING LASER BEAM, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - A laser apparatus for generating extreme ultraviolet (EUV) light at a wavelength of approximately 13 nm is provided. The laser apparatus may be combined with a reduced projection reflective optical system. Systems and methods for generating EUV light are also provided. | 04-18-2013 |
20130092849 | LASER DEVICE, LASER APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - A laser device having master oscillators that output seed beams is provided. The seed beams are guided from the master oscillators to a regenerative amplifier such that at least one of the seed beams enters the regenerative amplifier at an angle that differs from an angle at which another seed beam enters the regenerative amplifier. A laser apparatus and an extreme ultraviolet light generation system using the laser device are also provided. | 04-18-2013 |
20130075625 | TARGET SUPPLY UNIT AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - A target supply unit includes a nozzle through which a target material is outputted, and a first electrically conductive member having a first opening formed therein and positioned to face the nozzle in a direction into which the target material is outputted through the nozzle. The first electrically conductive member is positioned so that the first opening is located below the nozzle in a gravitational direction. The target supply unit includes a voltage generator which applies a voltage between the target material and the first electrically conductive member. | 03-28-2013 |
20130064259 | SOLID-STATE LASER APPARATUS AND LASER SYSTEM - A solid-state laser apparatus may include: a master oscillator configured to output laser light having at least one longitudinal mode, the master oscillator being capable of changing the spectral linewidth of the laser light output therefrom; at least one amplifier located downstream of the master oscillator on an optical path; a wavelength converter located downstream of the amplifier on the optical path; a detector configured to detect the spectrum of the laser light; and a controller configured to control the spectral linewidth of the laser light output from the master oscillator based on a detection result of the detector. | 03-14-2013 |
20130064258 | MASTER OSCILLATOR SYSTEM AND LASER APPARATUS - A master oscillator system may include a grating that functions as one of a plurality of resonator mirrors in an optical resonator, an optical element disposed within an optical path between the plurality of resonator mirrors, and an attitude control mechanism that adjusts an angle at which laser light traveling within the optical resonator is incident on the grating by adjusting the attitude of the optical element. | 03-14-2013 |
20130062539 | APPARATUS AND METHOD FOR MEASURING AND CONTROLLING TARGET TRAJECTORY IN CHAMBER APPARATUS - An apparatus for measuring and controlling a target trajectory within a chamber apparatus for generating extreme ultraviolet light from plasma generated by irradiating a droplet target supplied from a target injection nozzle with a driver laser beam from an external driver laser. The apparatus includes: a nozzle adjustment mechanism for adjusting at least one of a position and an angle of the target injection nozzle; a target trajectory measuring unit for measuring a target trajectory to obtain trajectory information on the target trajectory; a target trajectory angle detecting unit for obtaining a value related to an angle deviation between the target trajectory represented by the trajectory information and a predetermined target trajectory; and a nozzle adjustment controller for controlling the nozzle adjustment mechanism based on the value related to the angle deviation such that the droplet target passes through a predetermined laser beam irradiation position. | 03-14-2013 |
20130062538 | EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - An apparatus used with an external laser apparatus for generating extreme ultraviolet light includes a target storage unit for storing a target material, a nozzle unit having a through-hole in communication with the interior of the storage unit through which the target material is outputted, an electrode having a through-hole facing the nozzle unit, and a target detector for detecting a target formed of the target material and outputting a detection signal. A direct current voltage adjuster applies and adjusts a direct current between the target material and the electrode, a pressure adjuster applies and adjusts a pressure to the target material through gas, and a controller controls at least one of the direct current voltage adjuster and the pressure adjuster based on the detection signal from the target detector. | 03-14-2013 |
20130050862 | MIRROR DEVICE - A mirror device may include: a mirror including a base plate, a reflective film on a first surface of the base plate, and a plurality of first protrusions on a second surface of the base plate; a plurality of support parts for respectively supporting the plurality of the first protrusions, each support part having a groove formed therein for guiding the first protrusion; and a plurality of clamps for respectively pressing the plurality of the first protrusions against the respective grooves in the plurality of the support parts. | 02-28-2013 |
20130048886 | CHAMBER APPARATUS AND EXTREME ULTRAVIOLET (EUV) LIGHT GENERATION APPARATUS INCLUDING THE CHAMBER APPARATUS - A chamber apparatus used with a laser apparatus may include a chamber, a beam expanding optical system, and a focusing optical system. The chamber may be provided with at least one inlet, through which a laser beam outputted from the laser apparatus is introduced into the chamber. The beam expanding optical system is configured to expand the laser beam in diameter. The focusing optical system is configured to focus the laser beam that has been expanded in diameter. | 02-28-2013 |
20130048878 | TARGET SUPPLY UNIT - A target supply unit includes a nozzle unit having a through-hole to allow a target material to be outputted therethrough. A cover is provided to cover the nozzle unit, the cover having a through-hole to allow the target material to pass therethrough. A discharge device is included to pump out gas inside a space defined by the cover. | 02-28-2013 |
20130039372 | WAVELENGTH CONVERSION DEVICE, SOLID-STATE LASER APPARATUS, AND LASER SYSTEM - A wavelength conversion device may include a wavelength conversion element that converts an entering first laser beam into a second laser beam by wavelength conversion, and a cooling mechanism that cools the wavelength conversion element from at least one surface of the wavelength conversion element. | 02-14-2013 |
20130037693 | OPTICAL SYSTEM AND EXTREME ULTRAVIOLET (EUV) LIGHT GENERATION SYSTEM INCLUDING THE OPTICAL SYSTEM - An optical system used with a laser apparatus may include a focusing optical system, a beam splitter, and an optical sensor. The focusing optical system has one or more focus, for focusing a laser beam outputted from the laser apparatus. The beam splitter is disposed between the focusing optical system and the one or more focus of the focusing optical system. The optical sensor is disposed on a beam path of a laser beam split by the beam splitter. | 02-14-2013 |
20130034116 | SLAB AMPLIFICATION DEVICE, LASER APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - An EUV light generation system includes a driver laser comprising a master oscillator such as a semiconductor laser, a spatial filter, gas slab amplification devices, relay optical systems, and high-speed axial-flow amplifiers. The slab amplification devices include beam adjusting optical units disposed, respectively, at input and output sides of the slab amplifiers SA to convert the beam profile and/or polarization direction and/or an elongated direction of the beam profile with the slab amplifiers is parallel to a free space axis AF of the slab waveguides, i.e. parallel to the discharge electrodes. | 02-07-2013 |
20130032735 | LASER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM INCLUDING THE LASER APPARATUS - A laser apparatus may include: a master oscillator configured to output a pulsed laser beam at a repetition rate; at least one amplifier disposed on a beam path of the pulsed laser beam; at least one optical shutter disposed on the beam path of the pulsed laser beam; and a controller configured to switch the at least one optical shutter. | 02-07-2013 |
20130032640 | TARGET SUPPLY UNIT, MECHANISM FOR CLEANING NOZZLE THEREOF, AND METHOD FOR CLEANING THE NOZZLE - An apparatus for physically cleaning a nozzle inside a chamber may include a cleaning member disposed inside the chamber. The nozzle is configured to output a target material into the chamber in which extreme ultraviolet light is generated. The cleaning member is configured to remove the target material deposited around the nozzle. | 02-07-2013 |
20130026393 | CHAMBER APPARATUS, EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM, AND METHOD FOR CONTROLLING THE EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - A chamber apparatus for operating with a laser apparatus includes a chamber, a target supply unit, a first optical system and a second optical system. The chamber has an inlet for introducing a laser beam thereinto. The target supply unit supplies a target material to a region inside the chamber. The first optical system focuses the laser beam in the region. The guide beam output device outputs a guide beam. The second optical system directs the guide beam such that an axis of a beam path of the guide beam substantially coincides with an axis of a beam path of the laser beam and such that the guide beam enters the focusing optical system through the region. | 01-31-2013 |
20130020511 | MIRROR, MIRROR DEVICE, LASER APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - A mirror includes a mirror base provided with a flow channel through which a heat medium passes for cooling the mirror. The flow channel includes a buffer tank portion for adjusting a flow rate of the heat medium in the flow channel. A reflective film is provided on the mirror base. | 01-24-2013 |
20130020499 | WINDOW UNIT, WINDOW DEVICE, LASER APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - A window unit may include: a window configured to allow a laser beam to be transmitted therethrough; and a holder for holding the window at a periphery thereof, the holder being provided with a flow channel thereinside configured to allow a fluid to flow. | 01-24-2013 |
20130015319 | OPTICAL DEVICE, LASER APPARATUS INCLUDING THE OPTICAL DEVICE, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM INCLUDING THE LASER APPARATUSAANM Moriya; MasatoAACI Oyama-shiAACO JPAAGP Moriya; Masato Oyama-shi JPAANM Wakabayashi; OsamauAACI Hiratsuka-shiAACO JPAAGP Wakabayashi; Osamau Hiratsuka-shi JP - An optical device may include a mirror for respectively reflecting and transmitting parts of a first laser beam as first reflected and first transmitted beams, and for respectively transmitting and reflecting parts of a second laser beam as second transmitted and second reflected beams; an optical system disposed so that the first and second laser beams are such that beam paths of the first transmitted and second reflected beams are parallel or substantially coincide, or such that beam paths of the first reflected and second transmitted beams are parallel or substantially coincide; first and second measuring units configured to respectively measure a beam parameter of the first transmitted or first reflected beams, and of the second reflected or second transmitted beams; and first and second adjusting units configured to adjust the first and second laser beams based on measurement results by the measuring units. | 01-17-2013 |
20120319014 | EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE AND CONTROL METHOD FOR EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE - A guide laser beam that has an optical axis and a beam diameter substantially equivalent to those of a driver pulsed laser beam is introduced into an amplification system that amplifies a laser beam that is output from a driver laser oscillator. The guide laser beam is output from a laser device as a continuous light, and is introduced into a light path of the driver pulsed laser beam via a guide laser beam introduction mirror. A sensor detects an angle (a direction) of a laser beam and a variation of a curvature of a wave front. A wave front correction controller outputs a signal to a wave front correction part based on a measured result of a sensor. The wave front correction part corrects a wave front of a laser beam to be a predetermined wave front according to an instruction from the wave front correction controller. | 12-20-2012 |
20120305809 | APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT - An apparatus for generating extreme ultraviolet light is used with a first laser device for outputting a first laser beam. The apparatus includes a second laser device for outputting a second laser beam, a beam adjusting unit for causing beam axes of the first and second laser beams to substantially coincide with each other, a chamber, a target supply unit for supplying target materials into the chamber, a laser beam focusing optical system for focusing the first laser beam on the target material for plasma generation, an optical detection system for detecting the second laser beam and light from plasma, a focus position correction mechanism for correcting a first laser beam focusing position, and a target supply position correction mechanism for correcting a target material supplying position, and a controller for the focus position correction mechanism and the target supply position correction mechanism based on the optical detection system's detection. | 12-06-2012 |
20120298134 | METHOD FOR CLEANING OPTICAL ELEMENT OF EUV LIGHT SOURCE DEVICE AND OPTICAL ELEMENT CLEANING DEVICE - A method for cleaning an optical element of an extreme ultraviolet light source device for removing, from the optical element in a chamber, scattered matter generated together with extreme ultraviolet light by plasma formed through laser beam excitation of a target in the chamber, the method which comprises: making the scattered matter generated by the plasma no larger than nanosize by using solid tin as the target and using a CO | 11-29-2012 |
20120267553 | EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - An extreme ultraviolet light generation apparatus used in combination with a laser system, the apparatus may include: a chamber provided with at least one inlet port for introducing a laser beam outputted from the laser system into the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber, where the target material is irradiated with the laser beam; at least one optical element disposed inside the chamber; a magnetic field generation unit for generating a magnetic field around the predetermined region; an ion collection unit disposed in a direction of a line of magnetic force of the magnetic field for collection an ion which is generated when the target material is irradiated with the laser beam and is flowing along the line of magnetic force; and a gas introduction unit for introducing an etching gas into the chamber. | 10-25-2012 |
20120267343 | TEMPERATURE CONTROLLER FOR GAS LASER - A temperature controller for a gas laser which controls temperatures of a plurality of temperature-controlled apparatuses including a first temperature-controlled portion requiring a high-precision temperature-control and a second temperature-controlled portion requiring a low-precision temperature-control as compared with the first temperature-controlled portion and allowing a temperature-control with a low or high temperature as compared with the first temperature-controlled portion, comprises a first temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each first temperature-controlled portion, a second temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each second temperature-controlled portion, a first piping system connecting the first temperature control portion and each first temperature-controlled portion in parallel, and a second piping system connecting the second temperature control portion and each second temperature-controlled portion in parallel. | 10-25-2012 |
20120250710 | LASER SYSTEM AND LASER LIGHT GENERATION METHOD - A laser system may include: a master oscillator configured to output pulsed laser light; an amplification device for amplifying the pulsed laser light from the master oscillator; a first timing detector configured to detect a first timing at which the master oscillator outputs the pulsed laser light; a second timing detector configured to detect a second timing at which the amplification device discharges; and a controller configured to, based on results of detection by the first timing detector and the second timing detector, control at least one of the first timing and the second timing so that the amplification device discharges when the pulsed laser light passes through a discharge space of the amplification device. | 10-04-2012 |
20120250709 | LASER SYSTEM AND LASER LIGHT GENERATION METHOD - A laser system in this disclosure may include: a master oscillator configured to output pulsed laser light, a coherence reduction optical system configured to reduce coherence of the pulsed laser light from the master oscillator, and a controller configured to control the coherence reduction optical system so that a speckle of the pulsed laser light varies. | 10-04-2012 |
20120250708 | LASER SYSTEM AND LASER LIGHT GENERATION METHOD - A laser system may include a master oscillator that outputs pulsed laser light, an amplification device that amplifies the pulsed laser light outputted from the master oscillator, and a controller that controls the master oscillator and the amplification device. The master oscillator may have a pumping laser that outputs pumping light, a seed laser that is oscillated by the pumping light, an amplifier that amplifies the pulsed laser light outputted by the seed laser using the pumping light, and at least one optical shutter disposed in the optical path between the seed laser and the amplifier. The controller may control the opening and closing of the optical shutter and discharging of the amplification device so that the amplification device discharges when the pulsed laser light that has passed through the optical shutter passes through the amplification device. | 10-04-2012 |
20120248344 | EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - An apparatus used with a laser apparatus may include a chamber, a target supply for supplying a target material to a region inside the chamber, a laser beam focusing optical system for focusing a laser beam from the laser apparatus in the region, and an optical system for controlling a beam intensity distribution of the laser beam. | 10-04-2012 |
20120248342 | MIRROR FOR EXTREME ULTRA VIOLET, MANUFACTURING METHOD FOR MIRROR FOR EXTREME ULTRA VIOLET, AND FAR ULTRAVIOLET LIGHT SOURCE DEVICE - An EUV light source is configured for generating an EUV light for an exposure device. The EUV light source includes a chamber, a target supply device configured for supplying a target into the chamber, an optical system for introducing laser light from a driver laser into the chamber and irradiating the target with the laser light to turn the target into plasma from which EUV light is emitted, and an EUV collector mirror in the chamber. The EUV collector mirror may include a multilayered reflecting surface with grooves and collect the EUV light from the plasma to a focal spot. The grooves can be arranged in a concentric fashion, and be configured for diffracting at least light at a wavelength which is the same as that of the laser light from the driver laser. | 10-04-2012 |
20120243566 | SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT - A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light. | 09-27-2012 |
20120243565 | MASTER OSCILLATOR, LASER SYSTEM, AND LASER LIGHT GENERATION METHOD - A master oscillator may include: a pumping laser that outputs pumping light; a seed laser that is oscillated by the pumping light; an amplifier that amplifies the pulsed laser light outputted by the seed laser using the pumping light; at least one optical shutter disposed in the optical path between the seed laser and the amplifier; and a controller that causes the pumping laser to oscillate continuously at a predetermined repetition rate and that controls the optical shutter to open and close. | 09-27-2012 |
20120241649 | EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION METHOD - An EUV light generation method includes: (1) a step of supplying a target material into a chamber; and (b) a step of generating EUV light from plasma generated by irradiating the target material with a laser beam. The spatial light intensity distribution of the laser beam may be arranged so as to provide a low intensity region with a light intensity lower than a light intensity at a position away from the beam axis by a predetermined distance is present within an area extending for the predetermined distance from the beam axis. | 09-27-2012 |
20120236894 | WAVELENGTH CONVERSION DEVICE, SOLID-STATE LASER APPARATUS, AND LASER SYSTEM - A wavelength conversion device in this disclosure may include: a nonlinear crystal including a first surface; a first film to be joined to the first surface and including at least one layer; and a first prism to be joined to the first film. | 09-20-2012 |
20120236885 | LASER DEVICE FOR EXPOSURE APPARATUS - A laser device for an exposure apparatus may include: a MOPA-type or MOPO-type laser device including a seed laser and at least one gas discharge-pumped amplifier stage that receives output light from the seed laser as an input, amplifies the light, and outputs the amplified light; and at least one of a laser gas control device that at least changes the total pressure of a laser gas in said amplifier stage in accordance with requested energy and a laser power source control device that at least changes pump intensity of discharge electrodes in said amplifier stage in accordance with said requested energy, in a case where the energy of laser output light from said laser device is to be changed discontinuously in response to a request from an exposure apparatus, | 09-20-2012 |
20120236884 | LASER APPARATUS - This disclosure is directed to widen an adjustable range of the spectral linewidth of laser light output from a laser apparatus. This laser apparatus may include: (1) an excitation source configured to excite a laser medium in a laser gain space, (2) an optical resonator including an output coupler arranged on one side of an optical path through the laser gain space and a wavelength dispersion element arranged on the other side of the optical path through the laser gain space, and (3) a switching mechanism configured to switch a beam-width magnification or reduction factor by placing or removing at least one beam-width change optical system for expanding or reducing a beam width in or from an optical path between the laser gain space and the wavelength dispersion element or by inverting orientation of the at least one beam-width change optical system in the optical path. | 09-20-2012 |
20120224600 | TWO-STAGE LASER SYSTEM FOR ALIGNERS - The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser ( | 09-06-2012 |
20120217414 | APPARATUS FOR AND METHOD OF WITHDRAWING IONS IN EUV LIGHT PRODUCTION APPARATUS - An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a collector mirror that is disposed in a direction opposite to a laser light incidence direction to collect the EUV light and has a hole for the ions to pass therethrough; magnetic line of force production means that produces a magnetic line of force that is parallel or approximately parallel to the laser light incidence direction at or in the vicinity of the EUV light production point; and ion withdrawal means that is disposed on the opposite side of the collector mirror from the EUV light production point and withdraws the ions. | 08-30-2012 |
20120177072 | POLARIZATION PURITY CONTROL DEVICE AND GAS LASER APPARATUS PROVIDED WITH THE SAME - A degree of polarization control device includes:
| 07-12-2012 |
20120176036 | EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An extreme ultraviolet light source apparatus generating an extreme ultraviolet light from plasma generated by irradiating a target material with a laser light within a chamber, and controlling a flow of ions generated together with the extreme ultraviolet light using a magnetic field or an electric field, the extreme ultraviolet light source apparatus comprises an ion collector device collecting the ion via an aperture arranged at a side of the chamber, and an interrupting mechanism interrupting movement of a sputtered particle in a direction toward the aperture, the sputtered particle generated at an ion collision surface collided with the ion in the ion collector device. | 07-12-2012 |
20120175533 | EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS, METHOD FOR CONTROLLING EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS, AND RECORDING MEDIUM WITH PROGRAM RECORDED THEREON - An extreme ultraviolet light source apparatus, in which a target material is irradiated with a laser beam from a laser apparatus and the target material is turned into plasma, thereby emitting extreme ultraviolet light, may include a burst control unit configured to control irradiation of the target material is irradiated with the laser beam outputted successively in pulses from the laser apparatus when the extreme ultraviolet light is emitted successively in pulses. The target material is prevented from being turned into plasma by the laser beam while the laser beam is outputted successively in pulses from the laser apparatus when the successive pulsed emission is paused. | 07-12-2012 |
20120161040 | EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS AND METHOD OF GENERATING EXTREME ULTRAVIOLET LIGHT - An extreme ultraviolet light source apparatus, which is to generate an extreme ultraviolet light by irradiating a target with a main pulse laser light after irradiating the target with a prepulse laser light, the extreme ultraviolet light source apparatus comprises: a prepulse laser light source generating a pre-plasma by irradiating the target with the prepulse laser light while a part of the target remains, the pre-plasma being generated at a different region from a target region, the different region being located on an incident side of the prepulse laser light; and a main pulse laser light source generating the extreme ultraviolet light by irradiating the pre-plasma with the main pulse laser light. | 06-28-2012 |
20120119118 | EXTREME ULTRAVIOLET LIGHT SOURCE SYSTEM - An extreme ultraviolet (EUV) light source system in which parts of an EUV light source apparatus can easily be replaced. The system includes: (i) an extreme ultraviolet light source apparatus having a chamber in which extreme ultraviolet light is generated, a target supply unit for supplying a target material into the chamber, a driver laser for irradiating the target material supplied by the target supply unit with a laser beam to generate plasma, and a collector mirror for collecting the extreme ultraviolet light radiated from the plasma to allow the extreme ultraviolet light to enter projection optics of exposure equipment; and (ii) a lifting apparatus provided to lift and move a replacement part which is a part of the extreme ultraviolet light source apparatus. | 05-17-2012 |
20120119116 | EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An extreme ultraviolet light source apparatus in which a target material is irradiated with a laser beam and turned into plasma and extreme ultraviolet light is emitted from the plasma may include: a chamber in which the extreme ultraviolet light is generated; an electromagnetic field generation unit for generating at least one of an electric field and a magnetic field inside the chamber; and a cleaning unit for charging and separating debris adhered to an optical element inside the chamber. | 05-17-2012 |
20120097869 | EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - In an extreme ultraviolet light source apparatus generating an extreme ultraviolet light from a plasma generated by irradiating a target, which is a droplet D of molten Sn, with a laser light, and controlling the flow direction of ion generated at the generation of the extreme ultraviolet light by a magnetic field or an electric field, an ion collection cylinder | 04-26-2012 |
20120091893 | EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - In an EUV light source apparatus, a collector mirror is protected from debris damaging a mirror coating. The EUV light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target supply unit for supplying a target material into the chamber; a plasma generation laser unit for irradiating the target material within the chamber with a plasma generation laser beam to generate plasma; an ionization laser unit for irradiating neutral particles produced at plasma generation with an ionization laser beam to convert the neutral particles into ions; a collector mirror for collecting the extreme ultraviolet light radiated from the plasma; and a magnetic field or electric field forming unit for forming a magnetic field or an electric field within the chamber so as to trap the ions. | 04-19-2012 |
20120068091 | EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE, LASER LIGHT SOURCE DEVICE FOR EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE, AND METHOD FOR CONTROLLING SATURABLE ABSORBER USED IN EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE - An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump. | 03-22-2012 |
20110284774 | TARGET OUTPUT DEVICE AND EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - A target output device may include: a main body for storing a target material; a nozzle unit, connected to the main body, for outputting the target material as a target; an electrode unit provided so as to face the nozzle unit; a voltage control unit that applies predetermined voltage between the electrode unit and the target material to generate electrostatic force therebetween for pulling out the target material through the nozzle unit; a pressure control unit that applies predetermined pressure to the target material; and an output control unit that causes the target to be outputted through the nozzle unit by controlling signal output timing of each of a first timing signal and a second timing signal, the first timing signal causing the voltage control unit to apply the predetermined voltage between the target material and the electrode unit at first timing, and the second timing signal causing the pressure control unit to apply the predetermined pressure to the target material at second timing. | 11-24-2011 |
20110266468 | EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An extreme ultraviolet light source apparatus comprises a target supply unit supplying a target into a vacuum chamber, a laser oscillator outputting a laser light into the vacuum chamber, a collector mirror outputting an extreme ultraviolet light outside by reflecting the extreme ultraviolet light emitted from the target being ionized as a plasma by irradiation with the laser light at a plasma luminescence point in the vacuum chamber, and an ion debris removal unit at least a part of which is located in an obscuration region including the plasma luminescence point. | 11-03-2011 |
20110266467 | EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An extreme ultraviolet light source apparatus has a magnetic field generator which generates a magnetic field region around a direction of the magnetic field passing through a plasma region in which a plasma is to be generated and converges charged particles including ion emitted from the plasma region toward the direction of the magnetic field, a first charged particle collector (receiver) mounted at both sides of an axis of the magnetic field in the magnetic field region in order to collect (receive) the charged particles converged by the magnetic field, a target supply unit supplying a target from a nozzle located outside a converging region in which the charged particles are to be converged inside the magnetic field region in an extreme ultraviolet light generating chamber, and a target collector located at a position opposite to the nozzle, the target retrieval portion retrieving a residual target which does not contribute to generation of the plasma. | 11-03-2011 |
20110261844 | LASER SYSTEM - The higher efficiency and lower power consumption are realized in a laser system for generating a high-power short-pulse laser beam. The laser system includes a laser oscillator for generating a pulse laser beam by laser oscillation, plural amplifiers for sequentially inputting the pulse laser beam generated by the laser oscillator and amplifying the pulse laser beam, and a control unit for controlling the laser oscillator to perform burst oscillation and halting an amplification operation of at least one of the plural amplifiers in a burst halt period between burst oscillation periods. | 10-27-2011 |
20110180734 | EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a target material supply unit; an EUV light collector mirror; a driver laser; a window; a parabolic mirror which focuses collimated laser beam by reflection and is disposed within the EUV light generation chamber; an energy detector detecting energy of the laser beam diffused without being applied to a target material after being focused by the laser beam focusing optics when the EUV light is not generated; and a processing unit for judging the deterioration of the window and the parabolic mirror according to the laser beam energy detected by the energy detector. | 07-28-2011 |
20110174996 | EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS AND NOZZLE PROTECTION DEVICE - A nozzle protection device capable of protecting a target nozzle from heat of plasma without disturbing formation of a stable flow of a target material in an LPP type EUV light source apparatus. This nozzle protection device includes a cooling unit which is formed with an opening for passing the target material therethrough, and which is formed with a flow path for circulating a cooling medium inside, and an actuator which changes a position or a shape of the cooling unit between a first state of evacuating the cooling unit from a trajectory of the target material and a second state of blocking heat radiation from the plasma to the nozzle by the cooling unit while securing a path of the target material in the cooling unit. | 07-21-2011 |
20110158281 | GAS DISCHARGE CHAMBER - A gas discharge chamber that uses a calcium fluoride crystal which reduces a breakage due to mechanical stress (window holder and laser gas pressure), thermal stress from light absorption, and the like, increases the degree of linear polarization of output laser, and suppresses degradation due to strong ultraviolet (ArF, in particular) laser light irradiation. A first window ( | 06-30-2011 |
20110101863 | EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE AND METHOD FOR PRODUCING EXTREME ULTRAVIOLET LIGHT - An EUV (Extreme Ultra Violet) light source device ionizes a target material in an ionizer, and supplies the ionized target material to a point of generating a plasma. This reduces the generation of debris. The ionizer simultaneously irradiates laser beams of plural wavelengths corresponding to the excited level of tin on a target material to ionize the target material. The ionized target material is extracted from the ionizer with a high voltage applied from an ion beam extractor, and accelerated and supplied to a plasma generation chamber. When driver laser beam is irradiated on the ionized target material, a plasma is generated, thereby emitting EUV radiation. | 05-05-2011 |
20100200776 | EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE - [Problem] An extreme ultraviolet light source device in accordance with the present invention suppresses a surface that comes into contact with a target material in a molten state from being eroded by the target material, being reacted with the target material, and being cut by the target material. | 08-12-2010 |
20100181498 | Differential evacuation system - [Technical Problem] To provide a differential evacuation system capable of easily maintaining, at a low cost, a large differential pressure between a light generation chamber and an illumination optical chamber in which optical processing, e.g. exposure, is performed by using extreme ultraviolet (EUV) light generated in the light generation chamber, and yet capable of sufficiently ensuring a desired optical path. | 07-22-2010 |
20100128747 | POLARIZATION PURITY CONTROL DEVICE AND GAS LASER APPARATUS PROVIDED WITH THE SAME - A degree of polarization control device includes:
| 05-27-2010 |
20100117009 | EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE AND CONTROL METHOD FOR EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE | 05-13-2010 |
20100078580 | Extreme ultraviolet light source device, laser light source device for extreme ultraviolet light source device and method for controlling saturable absorber used in extreme ultraviolet light source device - An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump. | 04-01-2010 |
20100078577 | Extreme ultraviolet light source device, laser light source device for extreme ultraviolet light source device, and method of adjusting laser light source device for extreme ultraviolet light source device - An EUV light source device properly compensates the wave front of laser beam which is changed by heat. A wave front compensator and a sensor are provided in an amplification system which amplifies laser beam. The sensor detects and outputs changes in the angle (direction) of laser beam and the curvature of the wave front thereof. A wave front compensation controller outputs a signal to the wave front compensator based on the measurement results from the sensor. The wave front compensator corrects the wave front of the laser beam to a predetermined wave front according to an instruction from the wave front compensation controller. | 04-01-2010 |
20100054297 | OPTICAL ELEMENT FOR GAS LASER AND GAS LASER APPARATUS USING THE SAME - At least either of the light entering plane or the light exiting plane is parallel to the (111) crystal face of the CaF | 03-04-2010 |
20100025223 | Extreme Ultraviolet Light Source Device - Offset in the ejection direction of target material droplets is corrected in order to stabilize EUV output in an EUV light source device. An extreme ultraviolet light source device includes a droplet generation device | 02-04-2010 |
20090289205 | MIRROR FOR EXTREME ULTRA VIOLET, MANUFACTURING METHOD FOR MIRROR FOR EXTREME ULTRA VIOLET, AND FAR ULTRAVIOLET LIGHT SOURCE DEVICE - The EUV light source device eliminates radiation other than EUV radiation from the light which it emits, and supplies only the EUV radiation to an exposure device. A composite layer consisting of a plurality of Mo/Si pair layers is provided upon the front surface of an EUV collector mirror, and blazed grooves are formed in this composite layer. Radiation emitted from a plasma is incident upon this EUV collector mirror, and is reflected or diffracted. The reflected EUV radiation (including diffracted EUV) proceeds towards an intermediate focal point IF. The radiation of other wavelengths proceeds towards some position other than this focal point IF, because its reflection angle or diffraction angle is different. A SPF shield having an aperture portion is provided at the focal point IF. Accordingly, only the EUV radiation passes through the aperture portion and is supplied to the exposure device, while the other radiation is intercepted by the shield. | 11-26-2009 |
20090267003 | SEMICONDUCTOR EXPOSURE DEVICE USING EXTREME ULTRA VIOLET RADIATION - The exposure device is able to supply only EUV radiation to a mask, while eliminating radiation other than the EUV radiation. A multi layer made from a plurality of Mo/Si pair layers is provided upon the front surface of a mirror, and blazed grooves are formed in this multi layer. Radiation which is incident from a light source device is incident upon this mirror, and is reflected or diffracted. Since the reflected EUV radiation (including diffracted EUV radiation) and the radiation of other wavelengths are reflected or diffracted at different angles, accordingly their directions of progression are different. By eliminating the radiation of other wavelengths with an aperture and/or a dumper, it is possible to irradiate a mask only with EUV radiation of high purity. | 10-29-2009 |
20090261242 | APPARATUS FOR AND METHOD OF WITHDRAWING IONS IN EUV LIGHT PRODUCTION APPARATUS - An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a collector mirror that is disposed in a direction opposite to a laser light incidence direction to collect the EUV light and has a hole for the ions to pass therethrough; magnetic line of force production means that produces a magnetic line of force that is parallel or approximately parallel to the laser light incidence direction at or in the vicinity of the EUV light production point; and ion withdrawal means that is disposed on the opposite side of the collector mirror from the EUV light production point and withdraws the ions. | 10-22-2009 |