ADMAP INC. Patent applications |
Patent application number | Title | Published |
20130157067 | PLASMA-RESISTANT MEMBER AND METHOD FOR REGENERATING SAME - Provided is a plasma-resistant member which can be recycled and does not easily produce particles even when exposed to plasma. Specifically provided is a plasma-resistant member which has a predetermined surface profile and is used within a plasma etching chamber. The plasma-resistant member comprises: a first SiC layer ( | 06-20-2013 |
20130112997 | SILICON CARBIDE SUBSTRATE, SEMICONDUCTOR DEVICE, AND SOI WAFER - Disclosed is a silicon carbide substrate which has less high frequency loss and excellent heat dissipating characteristics. The silicon carbide substrate (S) is provided with a first silicon carbide layer ( | 05-09-2013 |